Patents by Inventor Xiaojia Z. Wang

Xiaojia Z. Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflection film
    Patent number: 6815056
    Abstract: An antireflection coating comprises one or more inorganic antireflection layers (typically metal oxide or silica layers) and a polymer layer cured in situ, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 to 700 nm and a thickness of from about 20 to about 200 nm. The polymer layer provides good scratch and fingerprint protection, and also enables the thicknesses of the inorganic antireflection layers to be reduced, thereby reducing the cost of the coating.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: November 9, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Hyung-Chul Choi, Robert L. Jones, Pradnya V. Nagarkar, William K. Smyth, Xiaojia Z. Wang
  • Antireflection film
    Publication number: 20030021972
    Abstract: An antireflection coating comprises one or more inorganic antireflection layers (typically metal oxide or silica layers) and a polymer layer cured in situ, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 to 700 nm and a thickness of from about 20 to about 200 nm. The polymer layer provides good scratch and fingerprint protection, and also enables the thicknesses of the inorganic antireflection layers to be reduced, thereby reducing the cost of the coating.
    Type: Application
    Filed: September 23, 2002
    Publication date: January 30, 2003
    Inventors: Hyung-Chul Choi, Robert L. Jones, Pradnya V. Nagarkar, William K. Smyth, Xiaojia Z. Wang
  • ANTIREFLECTION FILM
    Publication number: 20020155265
    Abstract: An antireflection coating comprises one or more inorganic antireflection layers (typically metal oxide or silica layers) and a polymer layer cured in situ, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 to 700 nm and a thickness of from about 20 to about 200 nm. The polymer layer provides good scratch and fingerprint protection, and also enables the thicknesses of the inorganic antireflection layers to be reduced, thereby reducing the cost of the coating.
    Type: Application
    Filed: February 19, 1998
    Publication date: October 24, 2002
    Inventors: HYUNG-CHUL CHOI, ROBERT L. JONES, PRADNYA V NAGARKAR, WILLIAM K SMYTH, XIAOJIA Z WANG, YEE HO CHIA
  • Antireflection film
    Patent number: 6464822
    Abstract: An antireflection coating includes one or more inorganic antireflection layers (typically metal oxide or silica layers) and a polymer layer cured in situ, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 to 700 nm and a thickness of from about 20 to about 200 nm. The polymer layer provides good scratch and fingerprint protection, and also enables the thicknesses of the inorganic antireflection layers to be reduced, thereby reducing the cost of the coating.
    Type: Grant
    Filed: February 19, 1998
    Date of Patent: October 15, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Hyung-Chul Choi, Robert L. Jones, Pradnya V. Nagarkar, William K. Smyth, Xiaojia Z. Wang, Yee Ho Chia
  • Ink jet recording sheet
    Patent number: 5942335
    Abstract: An ink jet recording sheet comprises a support carrying an ink-receiving layer, this layer comprising a hydrophilic polymer, preferably poly(vinyl alcohol) and a poly(vinylpyridine). The images formed using this sheet display good water fastness.
    Type: Grant
    Filed: April 21, 1997
    Date of Patent: August 24, 1999
    Assignee: Polaroid Corporation
    Inventors: Yung T. Chen, Gerald P. Harwood, Jr., Shawn P. Lambert, Kenneth J. McCarthy, Richard J. Murphy, Michael S. Viola, Xiaojia Z. Wang
  • Process for the polymerization of 4-vinyl pyridine monomers
    Patent number: 5861230
    Abstract: There is described a novel process of polymerizing 4-vinyl pyridine monomer in an aqueous polymerization system which comprises preparing an aqueous solution of polyvinyl alcohol, and contacting said aqueous solution of a polyvinyl alcohol with less than about 10% by weight of 4-vinyl pyridine monomer and a water-soluble initiator capable of decomposing to give free radicals.The resultant dispersion of the novel polymerization process comprises a homogeneous, i.e., weight average molecular weight and particle size, poly-4-vinylpyridine, with no appreciable residual 4-vinyl pyridine monomer.The resultant dispersion may be used to coat image- and ink-receiving layers of image-recording materials and ink jet recording sheets, respectively.
    Type: Grant
    Filed: April 21, 1997
    Date of Patent: January 19, 1999
    Assignee: Polaroid Corporation
    Inventors: Shawn P. Lambert, Xiaojia Z. Wang