Patents by Inventor XiaoMin Yang

XiaoMin Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180216169
    Abstract: Apparatus and methods to sequence DNA. A DNA sequencing device includes a passage, a first electrode, and a second electrode. The passage has a width and a length. The first and second electrodes are exposed within the passage and spaced apart from each other to form an electrode gap. The electrode gap is no greater than about 2 nm. The DNA sequencing device is operable to measure with the first and second electrodes a change in electronic signal in response to nucleotides of a DNA strand passing through the electrode gap.
    Type: Application
    Filed: February 1, 2018
    Publication date: August 2, 2018
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventors: Koichi WAGO, ShuaiGang XIAO, Xiaomin YANG, Kim Yang LEE, David S. KUO, Thomas Young CHANG
  • Patent number: 9992767
    Abstract: Provided are a data transmission method and device, which relate to the field of communications. The method includes: when data is transmitted between an REC and one or more REs, arranging extended control words of the one or more REs in a plurality of superframes, wherein connotations of the extended control words at a same position in different superframes are different, and sending the plurality of superframes to an opposite end. By arranging extended control words of one or more REs in a plurality of superframes and different connotations of the extended control words at the same position in different superframes, the solution solves the problem that the requirements cannot be satisfied due to the limited number of control words in the protocol, and has the beneficial effect of increasing control words in the protocol.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: June 5, 2018
    Assignee: ZTE CORPORATION
    Inventors: Yonghua Li, Xiaomin Yang, Yangfeng Wang, Sheng You, Diqiang Zhang
  • Patent number: 9934806
    Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.
    Type: Grant
    Filed: January 10, 2017
    Date of Patent: April 3, 2018
    Assignee: Seagate Technology LLC
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Koichi Wago
  • Patent number: 9928867
    Abstract: Provided herein are apparatuses and methods, including patterning a first set of features in a servo zone to form a patterned servo zone while a first mask protects a data zone from the patterning. The first mask may be removed from the data zone. The apparatuses and methods may further include patterning a second set of features in the data zone to form a patterned data zone while a second mask protects the patterned servo zone from the patterning.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: March 27, 2018
    Assignee: Seagate Technology LLC
    Inventors: Shuaigang Xiao, XiaoMin Yang, ZhaoNing Yu, Yautzong Hsu
  • Patent number: 9865294
    Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: January 9, 2018
    Assignee: Seagate Technology LLC
    Inventors: ShuaiGang Xiao, XiaoMin Yang, David S. Kuo, Kim Yang Lee, Yautzong Hsu
  • Patent number: 9837274
    Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: December 5, 2017
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, Zhaoning Yu, Kim Y. Lee, David S. Kuo
  • Publication number: 20170307976
    Abstract: Provided herein is a method, including creating a first layer over a substrate, wherein the first layer is configured for directed self-assembly of a block copolymer thereover; creating a continuous second layer over the first layer by directed self-assembly of a block copolymer, wherein the second layer is also configured for directed self-assembly of a block copolymer thereover; and creating a third layer over the continuous second layer by directed self-assembly of a block copolymer. Also provided is an apparatus, comprising a continuous first layer comprising a thin film of a first, phase-separated block copolymer, wherein the first layer comprises a first chemoepitaxial template configured for directed self-assembly of a block copolymer thereon; and a second layer on the first layer, wherein the second layer comprises a thin film of a second, phase-separated block copolymer.
    Type: Application
    Filed: November 18, 2014
    Publication date: October 26, 2017
    Inventors: XiaoMin YANG, Shuaigang XIAO, Kim Y. LEE, David S. KUO
  • Patent number: 9773520
    Abstract: The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: September 26, 2017
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, HongYing Wang, Kim Y. Lee
  • Publication number: 20170125049
    Abstract: Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.
    Type: Application
    Filed: January 10, 2017
    Publication date: May 4, 2017
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Koichi Wago
  • Patent number: 9638995
    Abstract: The embodiments disclose a method including depositing a resist layer using a mixture of several different length polymer strings materials spanning a range of natural periodicity, and imprinting the mixture of several different length polymer strings using sheared guiding patterns to increase flexibility.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: May 2, 2017
    Assignee: Seagate Technology LLC
    Inventors: René van de Veerdonk, XiaoMin Yang, Kim Lee, Justin Hwu
  • Patent number: 9626996
    Abstract: Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.
    Type: Grant
    Filed: January 2, 2015
    Date of Patent: April 18, 2017
    Assignee: Seagate Technologies LLC
    Inventors: XiaoMin Yang, Zhaoning Yu, Kim Yang Lee, Michael Feldbaum, Yautzong Hsu, Wei Hu, Shuaigang Xiao, Henry Yang, HongYing Wang, Rene Johannes Marinus van de Veerdonk, David Kuo
  • Patent number: 9620161
    Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: April 11, 2017
    Assignee: Seagate Technology LLC
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Koichi Wago
  • Publication number: 20170084300
    Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
    Type: Application
    Filed: August 10, 2016
    Publication date: March 23, 2017
    Inventors: ShuaiGang Xiao, XiaoMin Yang, David S. Kuo, Kim Yang Lee, Yautzong Hsu
  • Publication number: 20170025141
    Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.
    Type: Application
    Filed: October 10, 2016
    Publication date: January 26, 2017
    Inventors: XiaoMin Yang, Shuaigang Xiao, Kim Y. Lee, Koichi Wago, Philip Steiner
  • Publication number: 20170025140
    Abstract: Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.
    Type: Application
    Filed: April 16, 2015
    Publication date: January 26, 2017
    Applicant: Seagate Technology LLC
    Inventors: Shuaigang Xiao, David S. Kuo, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, David Koichi
  • Patent number: 9489974
    Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: November 8, 2016
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Kim Y. Lee, Koichi Wago, Philip Steiner
  • Patent number: 9469525
    Abstract: A method of self-assembling density multiplied block copolymers (BCP) structures includes applying a block copolymer (BCP) to a feature-imprinted resist layer. The BCP is thermally annealed to laterally segregate the BCP into self-assembled columns of a first polymer block surrounded by a second polymer block.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: October 18, 2016
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Wei Hu, Zhaoning Yu, Justin Jia-Jen Hwu, Kim Yang Lee
  • Patent number: 9424872
    Abstract: Provided herein is an apparatus including a rectangular array of rectangular protrusions in a first region corresponding to a data region; and a hexagonal array of circular protrusions in a second region corresponding to a servo region, wherein a first global protrusion density for the first region is greater than a second global protrusion density for the second region. Also provided herein is a method including forming a first template; forming a second template; and cross-imprinting the first template and the second template to form a third template corresponding to the foregoing apparatus.
    Type: Grant
    Filed: July 31, 2015
    Date of Patent: August 23, 2016
    Assignee: Seagate Technologies LLC
    Inventors: Shuaigang Xiao, XiaoMin Yang, Kim Y. Lee, Yautzong Hsu, Hongying Wang
  • Publication number: 20160181102
    Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
    Type: Application
    Filed: February 26, 2016
    Publication date: June 23, 2016
    Inventors: XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, Zhaoning Yu, Kim Y. Lee, David S. Kuo
  • Patent number: 9299609
    Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.
    Type: Grant
    Filed: July 23, 2014
    Date of Patent: March 29, 2016
    Assignee: Seagate Technology LLC
    Inventors: XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, Zhaoning Yu, Kim Y. Lee, David S. Kuo