Patents by Inventor Xiaoxiong Yuan

Xiaoxiong Yuan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240062999
    Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.
    Type: Application
    Filed: November 2, 2023
    Publication date: February 22, 2024
    Inventors: Yuanhong Guo, Sheng Guo, Marek Radko, Steve Sansoni, Xiaoxiong Yuan, See-Eng Phan, Yuji Murayama, Pingping Gou, Song-Moon Suh
  • Publication number: 20240003553
    Abstract: The invention discloses a ceiling cassette smart combined air conditioner, comprising a cassette body; the outer side of the front end of the cassette body is provided with an air outlet section; the cassette body is sequentially arranged and connected with a filter section, a disinfection and sterilization section, a freeze protection section, a surface cooling section, a reheat section, a humidification section, a fan section, a static pressure section and an air supply section according to the air circulation direction. The advantages of the invention: it is provided with integrated functions for detecting, displaying and controlling the indoor air quality, and can realize intelligent control and regulation of indoor air temperature, humidity, freshness, cleanliness, ultraviolet sterilization, negative oxygen ions, odor removal, formaldehyde removal and other multi-functional integration, meeting the most favorable effects of indoor health and comfort.
    Type: Application
    Filed: November 8, 2022
    Publication date: January 4, 2024
    Inventor: Xiaoxiong Yuan
  • Patent number: 11854773
    Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.
    Type: Grant
    Filed: March 26, 2021
    Date of Patent: December 26, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Yuanhong Guo, Sheng Guo, Marek Radko, Steve Sansoni, Xiaoxiong Yuan, See-Eng Phan, Yuji Murayama, Pingping Gou, Song-Moon Suh
  • Publication number: 20230222264
    Abstract: A method includes receiving, from sensors, sensor data associated with processing a substrate via a processing chamber of substrate processing equipment. The sensor data includes a first subset received from one or more first sensors and a second subset received from one or more second sensors, the first subset being mapped to the second subset. The method further includes identifying model input data and model output data. The model output data is output from a physics-based model based on model input data. The method further includes training a machine learning model with data input including the first subset and the model input data, and target output data including the second subset and the model output data to tune calibration parameters of the machine learning model. The calibration parameters are to be used by the physics-based model to perform corrective actions associated with the processing chamber.
    Type: Application
    Filed: January 7, 2022
    Publication date: July 13, 2023
    Inventors: Rohit Mahakali, Elizabeth Kathryn Neville, Adolph Miller Allen, Xiaoxiong Yuan, Weize Hu, Karthik Ramanathan
  • Patent number: 11628456
    Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The inlet port has a showerhead that the end within the container. The showerhead has at least two angled nozzles to direct the flow of gas within the cavity so that the gas flow is not perpendicular to the surface of a liquid within the ampoule.
    Type: Grant
    Filed: June 17, 2021
    Date of Patent: April 18, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Kenric Choi, Xiaoxiong Yuan, Daping Yao, Mei Chang
  • Patent number: 11598003
    Abstract: Apparatus for processing a substrate are provided herein. In some embodiments a showerhead assembly includes a gas distribution plate having a plurality of apertures; a holder having a wall, an radially inwardly extending flange extending from a lower portion of the wall and coupled to the gas distribution plate, and a radially outwardly extending flange extending from an upper portion of the wall, wherein the wall has a thickness between about 0.015 inches and about 0.2 inches; and a heating apparatus disposed above and spaced apart from the gas distribution plate, wherein the heating apparatus includes a heater configured to heat the gas distribution plate.
    Type: Grant
    Filed: September 12, 2017
    Date of Patent: March 7, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Faruk Gungor, Dien-Yeh Wu, Joel M. Huston, Mei Chang, Xiaoxiong Yuan, Kazuya Daito, Avgerinos V. Gelatos, Takashi Kuratomi, Yu Chang, Bin Cao
  • Patent number: 11555244
    Abstract: Embodiments of showerheads are provided herein. In some embodiments, a showerhead for use in a process chamber includes a gas distribution plate having an upper surface and a lower surface; a plurality of channels extending through the gas distribution plate substantially perpendicular to the lower surface; a plurality of first gas delivery holes extending from the upper surface to the lower surface between adjacent channels of the plurality of channels to deliver a first process gas through the gas distribution plate; and a plurality of second gas delivery holes extending from the plurality of channels to the lower surface to deliver a second process gas therethrough without mixing with the first process gas.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: January 17, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Pingyan Lei, Dien-Yeh Wu, Jallepally Ravi, Takashi Kuratomi, Xiaoxiong Yuan, Manjunatha Koppa, Vinod Konda Purathe
  • Publication number: 20230002894
    Abstract: A method and apparatus for processing a substrate are described herein. The methods and apparatus described enable the raising and lowering of a shadow ring within a process chamber either simultaneously with or separately from a plurality of substrate lift pins. The shadow ring is raised and lowered using a shadow ring lift assembly and may be raised to a pre-determined height above the substrate during a radical treatment operation. The shadow ring lift assembly may also raise and lower the plurality of substrate lift pins to enable both the shadow ring and the substrate lift pins to be raised to a transfer position when the substrate is being transferred into or out of the process chamber.
    Type: Application
    Filed: September 13, 2021
    Publication date: January 5, 2023
    Inventors: Zubin HUANG, Jallepally Ravi, Kai WU, Xiaoxiong YUAN
  • Patent number: 11421322
    Abstract: Embodiments of a blocker plate for use in a substrate process chamber are disclosed herein. In some embodiments, a blocker plate for use in a substrate processing chamber configured to process substrates having a given diameter includes: an annular rim; a central plate disposed within the annular rim; and a plurality of spokes coupling the central plate to the annular rim.
    Type: Grant
    Filed: July 24, 2019
    Date of Patent: August 23, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Xiaoxiong Yuan, Yu Lei, Yi Xu, Kazuya Daito, Pingyan Lei, Dien-Yeh Wu, Umesh M. Kelkar, Vikash Banthia
  • Publication number: 20210308703
    Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The inlet port has a showerhead that the end within the container. The showerhead has at least two angled nozzles to direct the flow of gas within the cavity so that the gas flow is not perpendicular to the surface of a liquid within the ampoule.
    Type: Application
    Filed: June 17, 2021
    Publication date: October 7, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Kenric Choi, Xiaoxiong Yuan, Daping Yao, Mei Chang
  • Publication number: 20210305028
    Abstract: A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.
    Type: Application
    Filed: March 26, 2021
    Publication date: September 30, 2021
    Inventors: Yuanhong Guo, Sheng Guo, Marek Radko, Steve Sansoni, Xiaoxiong Yuan, See-Eng Phan, Yuji Murayama, Pingping Gou, Song-Moon Suh
  • Publication number: 20210225640
    Abstract: A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The shaft has a vacuum conduit, a heat transfer fluid conduit and a gas conduit formed therein. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A thermocouple is embedded in the disk-shaped body. A flange extends radially outward from the cylindrical outer surface, wherein the lower surface of the disk-shaped body comprises one side of the flange. A fluid channel is formed in the disk-shaped body proximate the flange and lower surface. The fluid channel is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves are formed in the upper surface of the disk-shaped body, and are coupled by a hole in the disk-shaped body to the vacuum conduit of the shaft.
    Type: Application
    Filed: April 8, 2021
    Publication date: July 22, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Chien-Teh Kao, Joel M. Huston, Mei Chang, Xiaoxiong Yuan
  • Patent number: 11059061
    Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The inlet port has a showerhead that the end within the container. The showerhead has at least two angled nozzles to direct the flow of gas within the cavity so that the gas flow is not perpendicular to the surface of a liquid within the ampoule.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: July 13, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kenric Choi, Xiaoxiong Yuan, Daping Yao, Mei Chang
  • Publication number: 20210176831
    Abstract: Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.
    Type: Application
    Filed: November 30, 2020
    Publication date: June 10, 2021
    Inventors: Pingyan LEI, Dien-Yeh WU, Jallepally RAVI, Manjunatha KOPPA, Ambarish TOORIHAL, Sandesh YADAMANE, Vinod Konda PURATHE, Xiaoxiong YUAN
  • Publication number: 20210130956
    Abstract: Embodiments of showerheads are provided herein. In some embodiments, a showerhead for use in a process chamber includes a gas distribution plate having an upper surface and a lower surface; a plurality of channels extending through the gas distribution plate substantially perpendicular to the lower surface; a plurality of first gas delivery holes extending from the upper surface to the lower surface between adjacent channels of the plurality of channels to deliver a first process gas through the gas distribution plate; and a plurality of second gas delivery holes extending from the plurality of channels to the lower surface to deliver a second process gas therethrough without mixing with the first process gas.
    Type: Application
    Filed: October 23, 2020
    Publication date: May 6, 2021
    Inventors: Pingyan LEI, Dien-Yeh WU, Jallepally RAVI, Takashi KURATOMI, Xiaoxiong YUAN, Manjunatha KOPPA, Vinod Konda PURATHE
  • Publication number: 20210032753
    Abstract: Methods and apparatus for gas distribution in a process chamber leverage dual electrodes to provide RF power and an RF ground return in a single showerhead. In some embodiments, the apparatus includes a showerhead composed of a non-metallic material with a first gas channel and a second gas channel, the first gas channel and the second gas channel being independent of each other, and the first gas channel including a plurality of through holes from a top surface of the showerhead to a bottom surface of the showerhead and the second gas channel including a plurality of holes on the bottom surface of the showerhead connected to one or more gas inlets on a side of the showerhead, a first electrode embedded in the showerhead near a top surface of the showerhead, and a second electrode embedded in the showerhead near a bottom surface of the showerhead.
    Type: Application
    Filed: July 21, 2020
    Publication date: February 4, 2021
    Inventors: Jallepally RAVI, Dien-Yeh WU, Pingyan LEI, Manjunatha P. KOPPA, Vinod Konda PURATHE, Takashi KURATOMI, Mei CHANG, Xiaoxiong YUAN
  • Patent number: 10857655
    Abstract: Embodiments of lift pin assemblies and substrate supports having such lift pin assemblies are provided herein. In some embodiments, a lift pin assembly includes a body with a first end including a flange and an opposing second end; a bore through the body from the first end to the second end; a profile on an outer surface proximate a second end; and a collar, wherein the profile is configured to removably lock the collar onto the second end.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: December 8, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Olkan Cuvalci, Gwo-Chuan Tzu, Xiaoxiong Yuan
  • Patent number: 10752990
    Abstract: Apparatus and methods for supplying a gas to a processing chamber are described. The apparatus comprises an inlet line and an outlet line, each with two valves, in fluid communication an ampoule. A bypass line connects the inlet valve and outlet valve closest to the ampoule. The apparatus and methods of use allow a precursor residue to be removed from the delivery lines of a processing chamber.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: August 25, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Daping Yao, Kenric Choi, Xiaoxiong Yuan, Jiang Lu, Can Xu, Paul F. Ma, Mei Chang
  • Publication number: 20200230782
    Abstract: Embodiments of methods and apparatus for cleaning contaminants from a substrate are disclosed herein. In some embodiments, a substrate cleaning apparatus includes: a substrate support to support a substrate along an edge of the substrate, wherein the substrate further includes a first side and an opposing second side having contaminants disposed on the second side; a showerhead disposed a first distance of about 1.5 mm to about 4.4 mm opposite the substrate support and facing the first side of the substrate; and one or more nozzles disposed a second distance of about 1 inch to about 2 inches beneath the substrate support to discharge a mixture of solid and gaseous carbon dioxide toward the contaminants on the second side of the substrate, and wherein the one or more nozzles have an angle of about 20 to about 40 degrees.
    Type: Application
    Filed: April 2, 2020
    Publication date: July 23, 2020
    Inventors: Pulkit AGARWAL, Bonnie T. CHIA, Song-Moon SUH, Cheng-Hsiung TSAI, Dhritiman Subha KASHYAP, Xiaoxiong YUAN, Eric RIESKE
  • Publication number: 20200006054
    Abstract: A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The shaft has a vacuum conduit, a heat transfer fluid conduit and a gas conduit formed therein. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A thermocouple is embedded in the disk-shaped body. A flange extends radially outward from the cylindrical outer surface, wherein the lower surface of the disk-shaped body comprises one side of the flange. A fluid channel is formed in the disk-shaped body proximate the flange and lower surface. The fluid channel is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves are formed in the upper surface of the disk-shaped body, and are coupled by a hole in the disk-shaped body to the vacuum conduit of the shaft.
    Type: Application
    Filed: September 11, 2019
    Publication date: January 2, 2020
    Inventors: Chien-Teh KAO, Joel M. HUSTON, Mei CHANG, Xiaoxiong YUAN