Patents by Inventor Xiaoyuan Hu

Xiaoyuan Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8942842
    Abstract: A method of generating a library of reference spectra includes storing an optical model for a layer stack having at a plurality of layers, receiving user input identifying a set of one or more refractive index functions and a set of one or more extinction coefficient functions a first layer from the plurality of layers, wherein the set of one or more refractive index functions includes a plurality of different refractive index functions or the set of one or more extinction coefficient functions includes a plurality of different extinction coefficient functions, and for each combination of a refractive index function from the set of refractive index functions and an extinction coefficient function from the set of extinction coefficient functions, calculating a reference spectrum using the optical model based on the refractive index function, the extinction coefficient function and a first thickness of the first layer.
    Type: Grant
    Filed: April 28, 2011
    Date of Patent: January 27, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Jeffrey Drue David, Dominic J. Benvegnu, Xiaoyuan Hu
  • Patent number: 8892568
    Abstract: A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
    Type: Grant
    Filed: October 10, 2011
    Date of Patent: November 18, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Jeffrey Drue David, Dominic J. Benvegnu, Xiaoyuan Hu
  • Patent number: 8814631
    Abstract: A method of polishing includes polishing a substrate, receiving an identification of a selected spectral feature to monitor during polishing, measuring a sequence of spectra of light reflected from the substrate while the substrate is being polished, determining a location value and an associated intensity value of the selected spectral feature for each of the spectra in the sequence of spectra to generate a sequence of coordinates, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of coordinates. At least some of the spectra of the sequence differ due to material being removed during the polishing, and the coordinates are pairs of location values and associated intensity values.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: August 26, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Jeffrey Drue David, Xiaoyuan Hu, Zhize Zhu, Harry Q. Lee
  • Publication number: 20120276815
    Abstract: A method of generating a library of reference spectra includes storing an optical model for a layer stack having at a plurality of layers, receiving user input identifying a set of one or more refractive index functions and a set of one or more extinction coefficient functions a first layer from the plurality of layers, wherein the set of one or more refractive index functions includes a plurality of different refractive index functions or the set of one or more extinction coefficient functions includes a plurality of different extinction coefficient functions, and for each combination of a refractive index function from the set of refractive index functions and an extinction coefficient function from the set of extinction coefficient functions, calculating a reference spectrum using the optical model based on the refractive index function, the extinction coefficient function and a first thickness of the first layer.
    Type: Application
    Filed: April 28, 2011
    Publication date: November 1, 2012
    Inventors: Jeffrey Drue David, Dominic J. Benvegnu, Xiaoyuan Hu
  • Publication number: 20120278028
    Abstract: A method of generating a library of reference spectra, includes receiving a first spectrum representing a reflectance of a first stack of layers on a substrate, the first stack including a first dielectric layer, receiving a second spectrum representing a reflectance of a second stack layer on the substrate, the second stack including the first dielectric layer and a second dielectric layer that is not in the first stack, receiving user input identifying a plurality of different contribution percentages for at least one of the first stack or the second stack on the substrate, and for each contribution percentage from the plurality of different contribution percentages, calculating a reference spectrum from the first spectrum, the second spectrum and the contribution percentage.
    Type: Application
    Filed: April 28, 2011
    Publication date: November 1, 2012
    Inventors: Jeffrey Drue David, Dominic J. Benvegnu, Xiaoyuan Hu
  • Publication number: 20120096006
    Abstract: A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
    Type: Application
    Filed: October 10, 2011
    Publication date: April 19, 2012
    Inventors: Jeffrey Drue David, Dominic J. Benvegnu, Xiaoyuan Hu
  • Publication number: 20120034845
    Abstract: A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
    Type: Application
    Filed: August 4, 2011
    Publication date: February 9, 2012
    Inventors: Xiaoyuan Hu, Zhihong Wang, Harry Q. Lee, Zhize Zhu, Jeffrey Drue David, Dominic J. Benvegnu, Jimin Zhang, Wen-Chiang Tu
  • Publication number: 20120021672
    Abstract: A method of polishing includes polishing a substrate, receiving an identification of a selected spectral feature to monitor during polishing, measuring a sequence of spectra of light reflected from the substrate while the substrate is being polished, determining a location value and an associated intensity value of the selected spectral feature for each of the spectra in the sequence of spectra to generate a sequence of coordinates, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of coordinates. At least some of the spectra of the sequence differ due to material being removed during the polishing, and the coordinates are pairs of location values and associated intensity values.
    Type: Application
    Filed: July 20, 2011
    Publication date: January 26, 2012
    Inventors: Jeffrey Drue David, Xiaoyuan Hu, Zhize Zhu, Harry Q. Lee
  • Publication number: 20120003759
    Abstract: Embodiments described herein relate to methods of detecting an endpoint for a target substrate during chemical mechanical polishing process. In one embodiment, the method includes polishing one or more target substrates at a first film removal rate to provide reference spectra, polishing one or more target substrates at a second film removal rate to provide current spectra of the one or more target substrates, wherein the second film removal rate is different from the first film removal rate, identifying an interface transition between different layers formed on the one or more target substrates using a sequence of endpoint values obtained based on the reference spectra collected during polishing of the one or more reference substrates, and comparing each current spectrum obtained from current spectra of the one or more target substrates to the reference spectra to obtain the sequence of endpoint values.
    Type: Application
    Filed: June 17, 2011
    Publication date: January 5, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Xiaoyuan Hu, Zhihong Wang, Wen-Chiang Tu
  • Publication number: 20060177815
    Abstract: Provided are methods, devices and systems that utilize dielectrophoretic forces to separate a target species from a plurality of species in a sample.
    Type: Application
    Filed: November 28, 2005
    Publication date: August 10, 2006
    Applicant: The Regents of the University of California
    Inventors: Hyongsok Soh, Jean Wang, Unyoung Kim, Xiaoyuan Hu, Jiangrong Qian, Carl Meinhart