Patents by Inventor Xingzhou Jin

Xingzhou Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
    Publication number: 20090267239
    Abstract: A photosensitive resin composition comprising parts by mass of polycondensate (A) having a structure resulting from dehydration condensation between one or two or more tetracarboxylic acid dianhydride and one or two or more armatic diamines having mutually ortho-positioned amino and phenolic hydroxyl groups and 1 to 100 parts by mass of photosensitive diazonaphthoquinone compound (B), wherein the polycondensate (A) has a weight average molecular weight of 3000 to 70,000.
    Type: Application
    Filed: September 1, 2006
    Publication date: October 29, 2009
    Applicants: ASAHI KASEI EMD CORPORATION, PI R&D CO., LTD.
    Inventors: Takayuki Kanada, Hiroyuki Hanahata, Xingzhou Jin, Shuzo Waki
  • Solvent-soluble block copolymide composition and process for producing the same
    Publication number: 20050272907
    Abstract: The invention provides a block copolymerization polyimide composition comprising a block copolymerization polyimide obtained by heating a tetracarboxylic dianhydride and a diamine in at least one solvent selected from a ketone, an ether and an ester and in the presence of a catalyst generated from a lactone and a base, a positive type block copolymerization polyimide composition or ink containing a photooxygenation agent, and processes of producing them. The block copolymerization polyimide composition of the invention is never whitened even in the air.
    Type: Application
    Filed: January 15, 2003
    Publication date: December 8, 2005
    Inventors: Xingzhou Jin, Hiroyuki Ishii, Masataka Miyamura, HIroshi Itatani, Shinichiro Hori, Akihito Taniguchi