Patents by Inventor Yao-Hung Yang

Yao-Hung Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10889694
    Abstract: A method of preparing polyamide (PA) powders includes the steps of: heating a composition including PA granules, a nucleating agent and an organic solvent under normal pressure to T1 not lower than melting point (Tm) of PA granules and maintaining at T1 to dissolve PA granules; cooling the heated composition to T2 to nucleate the dissolved PA granules and maintaining at T2 to crystallize, where 15° C.?Tm?T2?33° C.; cooling the crystallization product to precipitate PA; and washing the precipitated product to remove the organic solvent. The weight ratio of PA granules to the nucleating agent is 100:1, and the weight ratio of PA granules to the organic solvent ranges from 0.11 to saturation solubility of PA granules in the organic solvent.
    Type: Grant
    Filed: July 1, 2019
    Date of Patent: January 12, 2021
    Assignee: Taiwan Green Point Enterprises Co., Ltd.
    Inventors: Chia-Hung Yang, Yu-Pao Huang, Hsing-Fu Yeh, Yao-Tang Ke, Feng-Lin Chen, Yung-Chih Chen, Yi-Chung Su
  • Publication number: 20200302186
    Abstract: A person re-identification method, a person re-identification system and an image screening method are provided. The person re-identification method includes the following steps. A plurality of identified images of an identified person are analyzed to obtain an interrelated array, which records a plurality of degrees of association among the identified images. The interrelated array is converted to a directed graph having at least one connected group. A representative path of each connected group is obtained. According to each representative path, a part of the identified images are outputted as at least one representative image set for performing a person re-identification process on an image to be identified.
    Type: Application
    Filed: July 24, 2019
    Publication date: September 24, 2020
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Chin Yang, Ming-Hung Cheng, Chih-Chung Kao
  • Publication number: 20200079044
    Abstract: A method of reclaiming a used seal includes boiling the used seal in a liquid, and after boiling the used seal in the liquid, baking the used seal. The boiling the used seal may include boiling for a predetermined boiling time in the liquid, and the baking the used seal may include baking the used seal for a predetermined bake time at a predetermined temperature.
    Type: Application
    Filed: September 6, 2018
    Publication date: March 12, 2020
    Inventors: Shagun P. MAHESHWARI, Yao-Hung YANG, Tom K. CHO, Yu-Chi YEH, Andrew YU, Aniruddha PAL, Siamak SALIMIAN
  • Publication number: 20200025292
    Abstract: A sealing member is provided, including a plurality of nodes and a plurality of antinodes. Each sealing member can be rotated to expose non-damaged lobes for sealing, and prevents the sealing member from falling out of the lobed groove. A chamber is provided, including a groove that the sealing member is placed in. A method of rotating and placing the sealing member is provided, including a rotation to expose nondamaged portions of the sealing member.
    Type: Application
    Filed: July 19, 2019
    Publication date: January 23, 2020
    Inventors: Shagun P. MAHESHWARI, Yao-Hung YANG, King F. LEE, Andrew YU, Aniruddha PAL, Tom K. CHO, Chien-Min LIAO
  • Publication number: 20200010626
    Abstract: A method of preparing polyamide (PA) powders includes the steps of: heating a composition including PA granules, a nucleating agent and an organic solvent under normal pressure to T1 not lower than melting point (Tm) of PA granules and maintaining at T1 to dissolve PA granules; cooling the heated composition to T2 to nucleate the dissolved PA granules and maintaining at T2 to crystallize, where 15° C.?Tm?T2?33° C.; cooling the crystallization product to precipitate PA; and washing the precipitated product to remove the organic solvent. The weight ratio of PA granules to the nucleating agent is 100:1, and the weight ratio of PA granules to the organic solvent ranges from 0.11 to saturation solubility of PA granules in the organic solvent.
    Type: Application
    Filed: July 1, 2019
    Publication date: January 9, 2020
    Applicant: Taiwan Green Point Enterprises Co., Ltd.
    Inventors: Chia-Hung Yang, Yu-Pao Huang, Hsing-Fu Yeh, Yao-Tang Ke, Feng-Lin Chen, Yung-Chih Chen, Yi-Chung Su
  • Patent number: 10514523
    Abstract: An optical image capturing system and an electronic using the same are disclosed. The optical image capturing system includes at least two lenses, an image plane, and a first position element. In certain condition, the design of the optical image capturing system may simantaneously inhibit the deviation of effect focal length and improve the imagining quality in response to temperature fluctuation.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: December 24, 2019
    Assignee: ABILITY OPTO-ELECTRONICS TECHNOLOGY CO. LTD.
    Inventors: Chien-Hsun Lai, Yeong-Ming Chang, Chen-Hung Tsai, Ying-Jung Chen, Yao-Wei Liu, Hui-Hsuan Yang
  • Patent number: 9089007
    Abstract: Methods and substrate processing systems are provided for controlling substrate heating efficiency and generating a desired temperature profile on the surface of a substrate when the substrate is disposed on a substrate support surface of a substrate support assembly. The substrate support assembly is provided with minimum software control and hardware requirement and includes a heating element comprised of multiple heating elements sections. The heating element is connected to a power source for adjusting the temperature outputs of the multiple heating element sections and providing adjustable multi-heating zones and desired temperature distribution over the substrate support surface of the substrate support assembly within a process chamber.
    Type: Grant
    Filed: February 14, 2013
    Date of Patent: July 21, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Yao-Hung Yang, Jeonghoon Oh, Frank F. Hooshdaran, Tom K. Cho, Tao Hou
  • Patent number: 8911151
    Abstract: A bushing assembly for supporting a substrate within a processing chamber is generally provided. In one aspect, the bushing assembly comprises a tubular body having an outer perimeter and an aperture extending therethrough, a first ring having a first inner edge, the first ring disposed in the aperture in an upper portion of the tubular body, and a second ring having a second inner edge, the second ring disposed in the aperture in a lower portion of the tubular body. In another aspect, the first inner edge has a first radius of curvature, and the second inner edge has a second radius of curvature. In another aspect, a first inner edge diameter, a second inner edge diameter, the first radius of curvature, and the second radius of curvature are selected such that a support pin extending through the aperture contacts the bushing assembly on at most two points.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: December 16, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Tao Hou, Jeonghoon Oh, Tom K. Cho, Andrzej Matlosz, Frank F. Hooshdaran, Yao-Hung Yang
  • Publication number: 20130287529
    Abstract: A substrate processing system with independent substrate placement capability to two or more substrate support assemblies is provided. Two different sets of fixed-length lift pins are disposed on two or more substrate support lift pin assemblies of two or more process chambers, where the length of each lift pin in one process chamber is different from the length of each lift pin in another process chamber. The substrate processing system includes simplified mechanical substrate support lift pin mechanisms and minimum accessory parts cooperating with a substrate transfer mechanism (e.g., a transfer robot) for efficient and independent loading, unloading, and transfer of one or more substrates between two or more processing regions in a twin chamber or between two or more process chambers. A method for positioning one or more substrates to be loaded, unloaded, or processed independently or simultaneously in two or more processing regions or process chambers is provided.
    Type: Application
    Filed: March 15, 2013
    Publication date: October 31, 2013
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Yao-Hung YANG, Jeonghoon OH, Frank F. HOOSHDARAN, Tom K. CHO, Tao HOU, Yuanhung GUO
  • Publication number: 20130284721
    Abstract: Methods and substrate processing systems are provided for controlling substrate heating efficiency and generating a desired temperature profile on the surface of a substrate when the substrate is disposed on a substrate support surface of a substrate support assembly. The substrate support assembly is provided with minimum software control and hardware requirement and includes a heating element comprised of multiple heating elements sections. The heating element is connected to a power source for adjusting the temperature outputs of the multiple heating element sections and providing adjustable multi-heating zones and desired temperature distribution over the substrate support surface of the substrate support assembly within a process chamber.
    Type: Application
    Filed: February 14, 2013
    Publication date: October 31, 2013
    Inventors: Yao-Hung Yang, Jeonghoon Oh, Frank F. Hooshdaran, Tom K. Cho, Tao Hou
  • Publication number: 20130122611
    Abstract: The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
    Type: Application
    Filed: November 5, 2012
    Publication date: May 16, 2013
    Inventors: YAO-HUNG YANG, Abhijit Kangude, Sanjeev Baluja, Michael Martinelli, Liliya Krivulina, Thomas Nowak, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson
  • Patent number: 8338809
    Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
    Type: Grant
    Filed: June 20, 2011
    Date of Patent: December 25, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
  • Patent number: 8309421
    Abstract: The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
    Type: Grant
    Filed: January 21, 2011
    Date of Patent: November 13, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Yao-Hung Yang, Abhijit Kangude, Sanjeev Baluja, Michael Martinelli, Liliya Krivulina, Thomas Nowak, Juan Carlos Rocha-Alvarez, Scott Hendrickson
  • Publication number: 20120129275
    Abstract: The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
    Type: Application
    Filed: January 21, 2011
    Publication date: May 24, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Yao-Hung Yang, Abhijit Kangude, Sanjeev Baluja, Michael Martinelli, Liliya Krivulina, Thomas Nowak, Juan Carlos Rocha-Alvarez, Scott Hendrickson
  • Publication number: 20110248183
    Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
    Type: Application
    Filed: June 20, 2011
    Publication date: October 13, 2011
    Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
  • Patent number: 7964858
    Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
    Type: Grant
    Filed: October 21, 2008
    Date of Patent: June 21, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
  • Publication number: 20100096569
    Abstract: An ultraviolet-transmitting microwave reflector for a substrate processing chamber, comprises a micromesh screen extending across the metallic frame. In one version, the micromesh screen comprises at least one electroformed layer. A method of fabricating the microwave reflector comprises electroforming a metallic frame surrounding a micromesh screen such that the micromesh screen comprises an open area of greater than 80% of the total area.
    Type: Application
    Filed: October 21, 2008
    Publication date: April 22, 2010
    Inventors: Tuan Anh Nguyen, Yao-Hung Yang, Sanjeev Baluja, Thomas Nowak, Juan Carlos Rocha-Alvarez
  • Publication number: 20100096564
    Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
    Type: Application
    Filed: October 21, 2008
    Publication date: April 22, 2010
    Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
  • Publication number: 20070273731
    Abstract: A method for driving an ink jet head (10) having a piezoelectric actuator (103) includes the steps of: (a) transmitting a negative electrical pulse (31) to drive the piezoelectric actuator to transform in a manner such that ink is filled into an ink chamber (102) of the ink jet head; and (b) transmitting a positive electrical pulse (32) to drive the piezoelectric actuator to transform in a manner such that the ink is ejected out of the ink chamber.
    Type: Application
    Filed: May 26, 2006
    Publication date: November 29, 2007
    Applicant: ICF Technology Limited
    Inventors: Whu-Ming Young, Yao-Hung Yang