Patents by Inventor Yasuharu Murakami

Yasuharu Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230225658
    Abstract: A wearable electrode includes an electrode (203) fixed to garment (21) such that the electrode (203) can simultaneously come in contact with the skin of respective parts from the ventral side to the dorsal side of the upper left part of the body of a wearer (20), and an electrode (204) fixed to the garment such that the electrode (204) can simultaneously come in contact with the skin of respective parts from the ventral side to the dorsal side of the upper right part of the body of the wearer (20). The electrodes (203, 204) are installed such that the attaching positions gradually descend from the ventral side to the dorsal side with the wearer (20) standing upright, or the attaching positions gradually ascend from the ventral side to the dorsal side with the wearer (20) standing upright.
    Type: Application
    Filed: March 27, 2023
    Publication date: July 20, 2023
    Inventors: Takako ISHIHARA, Kazuhiko TAKAGAHARA, Hiromi TAKARADA, Emiko ISHIKAWA, Masanobu SATO, Yasuharu MURAKAMI
  • Patent number: 11660034
    Abstract: A wearable electrode includes an electrode (203) fixed to garment (21) such that the electrode (203) can simultaneously come in contact with the skin of respective parts from the ventral side to the dorsal side of the upper left part of the body of a wearer (20), and an electrode (204) fixed to the garment such that the electrode (204) can simultaneously come in contact with the skin of respective parts from the ventral side to the dorsal side of the upper right part of the body of the wearer (20). The electrodes (203, 204) are installed such that the attaching positions gradually descend from the ventral side to the dorsal side with the wearer (20) standing upright, or the attaching positions gradually ascend from the ventral side to the dorsal side with the wearer (20) standing upright.
    Type: Grant
    Filed: October 16, 2017
    Date of Patent: May 30, 2023
    Assignees: NIPPON TELEGRAPH AND TELEPHONE CORPORATION, TORAY INDUSTRIES, INC.
    Inventors: Takako Ishihara, Kazuhiko Takagahara, Hiromi Takarada, Emiko Ishikawa, Masanobu Sato, Yasuharu Murakami
  • Patent number: 10795469
    Abstract: A laminate which includes a substrate 230, conductive fibers 221 and a resin layer, wherein, in said laminate, a ratio of increase in resistance after irradiation with light emitted from a xenon lamp at an intensity of 60 W/m2 (integrated value of spectral irradiance at a wavelength of 300 nm to 400 nm) for 300 hours is 20% or less.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: October 6, 2020
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Masahiko Ebihara, Emiko Oota, Yasuharu Murakami
  • Publication number: 20200205487
    Abstract: A garment having an opening and closing portion for putting on and taking off the garment on a front body, wherein a tab is placed at any position on each of a left and a right outside the opening and closing portion, wherein an upper end portion of the tab is attached to an upper end of the opening and closing portion in conformity to the opening and closing portion, and a distance from the upper end of the opening and closing portion to a position at which a zipper is attached to the opening and closing portion is at least 1 cm.
    Type: Application
    Filed: March 14, 2017
    Publication date: July 2, 2020
    Inventors: Nobutoshi Fujihara, Yasuharu Murakami, Emiko Ishikawa
  • Patent number: 10663861
    Abstract: The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g or greater, a photopolymerizable compound and a photopolymerization initiator, and having a thickness of 10 ?m or smaller, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections of the photosensitive layer other than the prescribed sections are removed to form a cured film pattern of the prescribed sections of the photosensitive layer, wherein the photosensitive resin composition comprises an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator.
    Type: Grant
    Filed: May 21, 2018
    Date of Patent: May 26, 2020
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Yasuharu Murakami, Hiroshi Yamazaki, Yoshimi Igarashi, Naoki Sasahara, Ikuo Mukai
  • Publication number: 20200147551
    Abstract: An object of the present invention is to provide a porous membrane for membrane distillation excellent in thermal insulation properties. The porous membrane for membrane distillation of the present invention contains aerogel particles.
    Type: Application
    Filed: July 20, 2018
    Publication date: May 14, 2020
    Inventors: Mitsunori IWAMURO, Yasuharu MURAKAMI, Tatsuya MAKINO
  • Publication number: 20190274573
    Abstract: A wearable electrode includes an electrode (203) fixed to garment (21) such that the electrode (203) can simultaneously come in contact with the skin of respective parts from the ventral side to the dorsal side of the upper left part of the body of a wearer (20), and an electrode (204) fixed to the garment such that the electrode (204) can simultaneously come in contact with the skin of respective parts from the ventral side to the dorsal side of the upper right part of the body of the wearer (20). The electrodes (203, 204) are installed such that the attaching positions gradually descend from the ventral side to the dorsal side with the wearer (20) standing upright, or the attaching positions gradually ascend from the ventral side to the dorsal side with the wearer (20) standing upright.
    Type: Application
    Filed: October 16, 2017
    Publication date: September 12, 2019
    Inventors: Takako ISHIHARA, Kazuhiko TAKAGAHARA, Hiromi TAKARADA, Emiko ISHIKAWA, Masanobu SATO, Yasuharu MURAKAMI
  • Publication number: 20190261921
    Abstract: A biosignal detecting garment includes: a crop top type or brassiere type garment body; an under belt that have a fastening tool capable of adjusting a chest circumference size and that is disposed in a lower portion of the garment body; at least two electrodes formed of an electroconductive fiber; a connector for installing a measurement device configured to detect a biosignal; and a wiring portion configured to electrically connect the electrodes and the connector. The electrodes, the connector, and the wiring portion are installed in the under belt, the garment body has a length from an apex of a shoulder portion of the garment body to an upper portion of the under belt of 20.0 cm or more and 35.0 cm or less, and the under belt is formed in a bag shape with two pieces stacked.
    Type: Application
    Filed: September 5, 2017
    Publication date: August 29, 2019
    Inventors: Azuki Otsuka, Emiko Ishikawa, Yasuharu Murakami, Takako Ishihara, Kazuhiko Takagahara, Kouji Fujii
  • Patent number: 10386719
    Abstract: The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g or greater, a photopolymerizable compound and a photopolymerization initiator, and having a thickness of 10 ?m or smaller, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections of the photosensitive layer other than the prescribed sections are removed to form a cured film pattern of the prescribed sections of the photosensitive layer, wherein the photosensitive resin composition comprises an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: August 20, 2019
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Yasuharu Murakami, Hiroshi Yamazaki, Yoshimi Igarashi, Naoki Sasahara, Ikuo Mukai
  • Patent number: 10353289
    Abstract: The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g or greater, a photopolymerizable compound and a photopolymerization initiator, and having a thickness of 10 ?m or smaller, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections of the photosensitive layer other than the prescribed sections are removed to form a cured film pattern of the prescribed sections of the photosensitive layer, wherein the photosensitive resin composition comprises an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: July 16, 2019
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Yasuharu Murakami, Hiroshi Yamazaki, Yoshimi Igarashi, Naoki Sasahara, Ikuo Mukai
  • Patent number: 10353293
    Abstract: The conductive pattern formation method according to the present invention comprises a step of providing a photosensitive conductive film including a conductive layer containing conductive fibers, a photosensitive resin layer containing a photosensitive resin and an inorganic filler, and a support film in this order, and laminating the conductive layer and the photosensitive resin layer on a base material such that the conductive layer side is closely bonded to the base material, and a step of exposing and developing the photosensitive resin layer and the conductive layer on the base material to form a conductive pattern.
    Type: Grant
    Filed: August 28, 2014
    Date of Patent: July 16, 2019
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Masahiko Ebihara, Emiko Oota, Yasuharu Murakami, Hiroshi Yamazaki, Hiroyuki Tanaka
  • Patent number: 10324375
    Abstract: Provided is a photosensitive resin composition comprising (A) a resin having a phenolic hydroxyl group; (B) an aliphatic or alicyclic epoxy compound having two or more oxirane rings; (C) a photosensitive acid generator; and (D) a solvent; wherein the photosensitive resin composition comprises 20 to 70 parts by mass of the component (B) relative to 100 parts by mass of the component (A).
    Type: Grant
    Filed: November 5, 2013
    Date of Patent: June 18, 2019
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Kenichi Iwashita, Yasuharu Murakami, Hanako Yori, Tetsuya Kato
  • Publication number: 20180321587
    Abstract: The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g or greater, a photopolymerizable compound and a photopolymerization initiator, and having a thickness of 10 ?m or smaller, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections of the photosensitive layer other than the prescribed sections are removed to form a cured film pattern of the prescribed sections of the photosensitive layer, wherein the photosensitive resin composition comprises an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator.
    Type: Application
    Filed: May 21, 2018
    Publication date: November 8, 2018
    Inventors: Yasuharu MURAKAMI, Hiroshi YAMAZAKI, Yoshimi IGARASHI, Naoki SASAHARA, Ikuo MUKAI
  • Patent number: 10042254
    Abstract: In the method for forming a protective coat on an electrode for a touch panel according to the invention, a photosensitive layer comprising a photosensitive resin composition containing a binder polymer having a carboxyl group and an acid value of 30 to 120 mgKOH/g, a photopolymerizable compound having at least three ethylenic unsaturated groups, and a photopolymerization initiator, is formed on a base material having an electrode for a touch panel, prescribed sections of the photosensitive layer are cured by irradiation with active light rays and then the sections other than the prescribed sections are removed, to form a protective coat comprising the cured sections of the photosensitive resin composition covering all or a portion of the electrode.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: August 7, 2018
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Ikuo Mukai, Yasuharu Murakami, Naoki Sasahara, Hiroshi Yamazaki
  • Patent number: 9964849
    Abstract: The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g or greater, a photopolymerizable compound and a photopolymerization initiator, and having a thickness of 10 ?m or smaller, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections of the photosensitive layer other than the prescribed sections are removed to form a cured film pattern of the prescribed sections of the photosensitive layer, wherein the photosensitive resin composition comprises an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator.
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: May 8, 2018
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Yasuharu Murakami, Hiroshi Yamazaki, Yoshimi Igarashi, Naoki Sasahara, Ikuo Mukai
  • Patent number: 9829791
    Abstract: A photosensitive resin composition comprises a component (A): a resin having a phenolic hydroxyl group; a component (B): an aliphatic compound having two or more functional groups, the functional groups being one or more group selected from an acryloyloxy group, a methacryloyloxy group, a glycidyloxy group and a hydroxyl group; a component (C): a photosensitive acid generator; and a component (D): an inorganic filler having an average particle diameter of 100 nm or less.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: November 28, 2017
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Kenichi Iwashita, Tetsuya Kato, Masahiko Ebihara, Yasuharu Murakami
  • Publication number: 20170219923
    Abstract: A photosensitive resin composition, comprising a binder polymer, a photopolymerizable compound, and a photopolymerization initiator, wherein the photopolymerization initiator contains a compound represented by the following general formula (1): [In the formula (1), R1, R2, R3 and R4 each independently represent an alkyl group, an aryl group, an aralkyl group, —OR5, —COOR6 or —OCOR7; and R5, R6 and R7 each independently represent an alkyl group, an aryl group or an aralkyl group.
    Type: Application
    Filed: July 22, 2015
    Publication date: August 3, 2017
    Inventors: Emiko OOTA, Masahiko EBIHARA, Yasuharu MURAKAMI, Xuesong JIANG
  • Patent number: 9709887
    Abstract: A photosensitive conductive film includes: a support film; and a photosensitive layer which is provided on the support film, wherein the photosensitive layer contains a plurality of conductive fibers, and an average value of the shortest distances between each of the conductive fibers and the surface at the side of the support film of the photosensitive layer is 0.1 to 50 nm.
    Type: Grant
    Filed: March 9, 2015
    Date of Patent: July 18, 2017
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Emiko Oota, Masahiko Ebihara, Yasuharu Murakami
  • Publication number: 20170184965
    Abstract: The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g or greater, a photopolymerizable compound and a photopolymerization initiator, and having a thickness of 10 ?m or smaller, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections of the photosensitive layer other than the prescribed sections are removed to form a cured film pattern of the prescribed sections of the photosensitive layer, wherein the photosensitive resin composition comprises an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator.
    Type: Application
    Filed: March 15, 2017
    Publication date: June 29, 2017
    Inventors: Yasuharu MURAKAMI, Hiroshi YAMAZAKI, Yoshimi IGARASHI, Naoki SASAHARA, Ikuo MUKAI
  • Publication number: 20170003588
    Abstract: A photosensitive conductive film includes: a support film; and a photosensitive layer which is provided on the support film, wherein the photosensitive layer contains a plurality of conductive fibers, and an average value of the shortest distances between each of the conductive fibers and the surface at the side of the support film of the photosensitive layer is 0.1 to 50 nm.
    Type: Application
    Filed: March 9, 2015
    Publication date: January 5, 2017
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Emiko OOTA, Masahiko EBIHARA, Yasuharu MURAKAMI