Patents by Inventor Yasuharu SHIRAISHI

Yasuharu SHIRAISHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210294217
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III), and one or more selected from the group consisting of a compound represented by General Formula (1) and a compound represented by General Formula (2).
    Type: Application
    Filed: May 14, 2021
    Publication date: September 23, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Masafumi Kojima, Minoru Uemura, Kei Yamamoto, Yasuharu Shiraishi, Keiyu Ou
  • Publication number: 20200050106
    Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)??Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.
    Type: Application
    Filed: October 17, 2019
    Publication date: February 13, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro SHIRAKAWA, Hajime FURUTANI, Mitsuhiro FUJITA, Tomotaka TSUCHIMURA, Takashi KAWASHIMA, Michihiro OGAWA, Akihiro KANEKO, Hironori OKA, Yasuharu SHIRAISHI
  • Patent number: 10215898
    Abstract: Provided are a near infrared ray absorbent composition which can form a cured film having excellent near infrared ray shielding properties, a near infrared ray cut filter, a manufacturing method of a near infrared ray cut filter, a solid image pickup element, and a camera module. The near infrared ray absorbent composition includes a copper complex that is other than a copper phthalocyanine complex and has a maximum absorption wavelength in a wavelength range of 700 to 1,200 nm and in which a molar light absorption coefficient at the maximum absorption wavelength is greater than or equal to 100 (L/mol·cm).
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: February 26, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Kouitsu Sasaki, Takashi Kawashima, Seiichi Hitomi, Yasuharu Shiraishi
  • Publication number: 20170227690
    Abstract: Provided are a near infrared ray absorbent composition which can form a cured film having excellent near infrared ray shielding properties, a near infrared ray cut filter, a manufacturing method of a near infrared ray cut filter, a solid image pickup element, and a camera module. The near infrared ray absorbent composition includes a copper complex that is other than a copper phthalocyanine complex and has a maximum absorption wavelength in a wavelength range of 700 to 1,200 nm and in which a molar light absorption coefficient at the maximum absorption wavelength is greater than or equal to 100 (L/mol·cm).
    Type: Application
    Filed: April 26, 2017
    Publication date: August 10, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Kouitsu SASAKI, Takashi KAWASHIMA, Seiichi HITOMI, Yasuharu SHIRAISHI