Patents by Inventor Yasuhide Naito

Yasuhide Naito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11127577
    Abstract: A laser desorption/ionization method includes a first process of preparing a sample support body. The sample support body includes a substrate, an ionization substrate, and a support that supports the ionization substrate with respect to the substrate such that a first surface of the ionization substrate is separated from the substrate. A plurality of through-holes are formed at least in measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. Further, the laser desorption/ionization method includes a second process of dropping the sample on the measurement regions of the ionization substrate, and a third process of, after the sample has infiltrated into the ionization substrate, ionizing components of the sample by applying a laser beam to the second surface while applying a voltage to the conductive layer.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: September 21, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Takayuki Ohmura, Masahiro Kotani
  • Patent number: 11101122
    Abstract: A laser desorption/ionization method, includes: a first step of preparing a sample support body including a substrate on which plurality of through holes opening to a first surface and a second surface facing each other are formed, and a conductive layer provided on at least the first surface; a second step of mounting a sample on a mounting surface of a mounting portion, and of disposing the sample support body on the sample such that the second surface is in contact with the sample; a third step of introducing a matrix solution into the plurality of through holes; and a fourth step of ionizing a component of the sample that is mixed with the matrix solution and is moved to the first surface side from the second surface side through the through hole by irradiating the first surface with laser light while a voltage is applied to the conductive layer.
    Type: Grant
    Filed: August 6, 2018
    Date of Patent: August 24, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11031228
    Abstract: A mass spectrometry device according to one aspect of the invention includes: a sample stage on which a sample is placed and on which a sample support having a substrate, in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided, and a conductive layer, which covers at least a portion of the one surface which is not provided with the through-holes, is placed such that the other surface faces the sample; a laser beam application unit that controls application of a laser beam such that the laser beam is applied to an imaging target region on the one surface; and a detector that detects the sample ionized by the application of the laser beam in a state where a positional relation of the sample in the imaging target region is maintained.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: June 8, 2021
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Publication number: 20210033564
    Abstract: A sample support body includes: a substrate having a first surface and a second surface opposite to each other; and a conductive layer provided on at least the first surface. A plurality of through-holes, which open to the second surface and to a third surface of the conductive layer which is locate at a side opposite to the substrate, are provided in the substrate and the conductive layer. A protective film having a higher affinity with water than the substrate is provided on the second surface, the third surface, and each inner surface of the plurality of through-holes.
    Type: Application
    Filed: January 8, 2019
    Publication date: February 4, 2021
    Applicant: Hamamatsu Photonics K.K.
    Inventors: Yasuhide NAITO, Takayuki OHMURA, Masahiro KOTANI
  • Publication number: 20200386712
    Abstract: Provided is a sample support body that includes: a substrate having a first surface and a second surface opposite to each other; and a conductive layer provided on at least the first surface. A plurality of through-holes, which open to the second surface and a third surface of the conductive layer which is located on a side opposite to the substrate, are formed in the substrate and the conductive layer. At least one of the second surface and the third surface is subjected to surface treatment for providing a difference in an affinity with water between a surface close to the second surface and a surface close to the third surface.
    Type: Application
    Filed: January 8, 2019
    Publication date: December 10, 2020
    Applicant: Hamamatsu Photonics K.K.
    Inventors: Yasuhide NAITO, Takayuki OHMURA, Masahiro KOTANI
  • Publication number: 20200279729
    Abstract: A laser desorption/ionization method, includes: a first step of preparing a sample support body including a substrate on which a plurality of through holes opening to a first surface and a second surface facing each other are formed, a conductive layer provided on at least the first surface, and a solvent provided in the plurality of through holes with refractoriness in a vacuum; a second step of mounting a sample on a mounting surface of a mounting portion, and of disposing the sample support body on the sample such that the second surface is in contact with the sample; and a third step of ionizing a component of the sample that is mixed with the solvent and is moved to the first surface side from the second surface side through the through hole by irradiating the first surface with laser beam while applying a voltage to the conductive layer.
    Type: Application
    Filed: October 5, 2018
    Publication date: September 3, 2020
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Takayuki OHMURA, Masahiro KOTANI
  • Publication number: 20200273691
    Abstract: A laser desorption/ionization method, includes: a first step of preparing a sample support body including a substrate on which a plurality of through holes opening to a first surface and a second surface facing each other are formed, and a conductive layer provided on at least the first surface; a second step of introducing a sample and a solvent having refractoriness in a vacuum into the plurality of through holes; and a third step of ionizing a component of the sample by irradiating the first surface with laser beam while applying a voltage to the conductive layer.
    Type: Application
    Filed: October 5, 2018
    Publication date: August 27, 2020
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Takayuki OHMURA, Masahiro KOTANI
  • Publication number: 20200273689
    Abstract: A laser desorption/ionization method includes a first process of preparing a sample support body. The sample support body includes a substrate, an ionization substrate, and a support that supports the ionization substrate with respect to the substrate such that a first surface of the ionization substrate is separated from the substrate. A plurality of through-holes are formed at least in measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. Further, the laser desorption/ionization method includes a second process of dropping the sample on the measurement regions of the ionization substrate, and a third process of, after the sample has infiltrated into the ionization substrate, ionizing components of the sample by applying a laser beam to the second surface while applying a voltage to the conductive layer.
    Type: Application
    Filed: August 3, 2018
    Publication date: August 27, 2020
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Takayuki OHMURA, Masahiro KOTANI
  • Publication number: 20200266043
    Abstract: A laser desorption/ionization method, includes: a first step of preparing a sample support body including a substrate on which plurality of through holes opening to a first surface and a second surface facing each other are formed, and a conductive layer provided on at least the first surface; a second step of mounting a sample on a mounting surface of a mounting portion, and of disposing the sample support body on the sample such that the second surface is in contact with the sample; a third step of introducing a matrix solution into the plurality of through holes; and a fourth step of ionizing a component of the sample that is mixed with the matrix solution and is moved to the first surface side from the second surface side through the through hole by irradiating the first surface with laser light while a voltage is applied to the conductive layer.
    Type: Application
    Filed: August 6, 2018
    Publication date: August 20, 2020
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Masahiro KOTANI, Takayuki OHMURA
  • Publication number: 20200258730
    Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.
    Type: Application
    Filed: May 1, 2020
    Publication date: August 13, 2020
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Masahiro KOTANI, Takayuki OHMURA
  • Patent number: 10679835
    Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.
    Type: Grant
    Filed: January 2, 2019
    Date of Patent: June 9, 2020
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Publication number: 20200013608
    Abstract: A mass spectrometry device according to one aspect of the invention includes: a sample stage on which a sample is placed and on which a sample support having a substrate, in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided, and a conductive layer, which covers at least a portion of the one surface which is not provided with the through-holes, is placed such that the other surface faces the sample; a laser beam application unit that controls application of a laser beam such that the laser beam is applied to an imaging target region on the one surface; and a detector that detects the sample ionized by the application of the laser beam in a state where a positional relation of the sample in the imaging target region is maintained.
    Type: Application
    Filed: March 1, 2018
    Publication date: January 9, 2020
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Masahiro KOTANI, Takayuki OHMURA
  • Publication number: 20190139750
    Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.
    Type: Application
    Filed: January 2, 2019
    Publication date: May 9, 2019
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Masahiro KOTANI, Takayuki OHMURA
  • Patent number: 10224195
    Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support having a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided and a conductive layer that covers at least the one surface; a second process of placing a sample on a sample stage and arranging the sample support on the sample such that the other surface faces the sample; and a third process of applying a laser beam to the one surface and ionizing the sample moved from the other surface side to the one surface side via the through-holes due to a capillary phenomenon.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: March 5, 2019
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Patent number: 10103016
    Abstract: A sample support according to an aspect is a sample support for a surface-assisted laser desorption/ionization method, and includes: a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided; and a conductive layer that is formed of a conductive material and covers at least the one surface. The through-holes have a width of 1 to 700 nm, and the substrate has a thickness of 1 to 50 ?m.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: October 16, 2018
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Publication number: 20180158660
    Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support having a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided and a conductive layer that covers at least the one surface; a second process of placing a sample on a sample stage and arranging the sample support on the sample such that the other surface faces the sample; and a third process of applying a laser beam to the one surface and ionizing the sample moved from the other surface side to the one surface side via the through-holes due to a capillary phenomenon.
    Type: Application
    Filed: August 26, 2016
    Publication date: June 7, 2018
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Masahiro KOTANI, Takayuki OHMURA
  • Publication number: 20170358436
    Abstract: A sample support according to an aspect is a sample support for a surface-assisted laser desorption/ionization method, and includes: a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided; and a conductive layer that is formed of a conductive material and covers at least the one surface. The through-holes have a width of 1 to 700 nm, and the substrate has a thickness of 1 to 50 ?m.
    Type: Application
    Filed: August 26, 2016
    Publication date: December 14, 2017
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide NAITO, Masahiro KOTANI, Takayuki OHMURA
  • Publication number: 20110042564
    Abstract: A laser ablation mass analyzing apparatus includes a sample stage, a laser irradiation unit, a pneumatic transport unit, an ion source, and an analyzer. The sample stage holds a hair sample to be positioned accurately, and the laser irradiation unit irradiates an optional position on the hair such as a tip of the hair to generate ablation. The elements contained in the hair atomized by the ablation are extracted by the pneumatic transport system, and reach the ion source. Neutral atoms of the elements contained in the hair are ionized in the ion source by electron beam irradiation or light irradiation, to analyze mass of the ions obtained of the elements contained in the hair, by the analyzer.
    Type: Application
    Filed: August 20, 2009
    Publication date: February 24, 2011
    Inventors: Yasuhide Naito, Manabu Heya, Naohisa Miyazaki