Patents by Inventor Yasuhiko Nonaka

Yasuhiko Nonaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5793157
    Abstract: A cathode ray tube has a cathode structure including a cathode body comprised of porous refractory metal impregnated with electron-emissive material, a metal cup for containing the cathode body therein, a metal sleeve having a closed end and mounting a heater therein, a cylindrical metal eyelet and a plurality of thin metal wires stretched across one end of the metal eyelet and suspending the metal cup and the metal sleeve concentrically with and in the cylindrical metal eyelet. The metal cup and the closed end of the metal sleeve are fixed with the plurality of thin metal wires interposed therebetween, and ends of the plurality of thin metal wires are welded to a metal flange formed at the one end of the metal eyelet. The metal cup can be welded to the closed end of the metal sleeve by an electron beam with the plurality of thin metal wires interposed therebetween.
    Type: Grant
    Filed: March 14, 1996
    Date of Patent: August 11, 1998
    Assignees: Hitachi, Ltd., Hitachi Electronic Devices Co., Ltd.
    Inventors: Hiroshi Takakura, Takashi Kono, Michihide Shibata, Yasuhiko Nonaka
  • Patent number: 5233265
    Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property. In one aspect of the present invention, the amorphous semiconductor layer is amorphous Se. In another aspect of the present invention, the amorphous semiconductor layer is composed mainly of tetrahedral elements including at least an element of hydrogen or halogens. When using the amorphous semiconductor layer composed mainly of tetrahedral elements, the charge multiplication effect is produced mainly in the interior of the amorphous semiconductor, and thus it is possible to obtain a thermally stable photoconductive device having a high sensitivity while keeping a good photoresponse.
    Type: Grant
    Filed: August 1, 1990
    Date of Patent: August 3, 1993
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Yukio Takasaki, Kazutaka Tsuji, Tatsuo Makishima, Tadaaki Hirai, Sachio Ishioka, Tatsuro Kawamura, Keiichi Shidara, Eikyu Hiruma, Kenkichi Tanioka, Junichi Yamazaki, Kenji Sameshima, Hirokazu Matsubara, Kazuhisa Taketoshi, Mitsuo Kosugi, Shiro Suzuki, Takashi Yamashita, Masaaki Aiba, Yoshizumi Ikeda, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Hirofumi Ogawa
  • Patent number: 5101255
    Abstract: Disclosed is a photoelectric conversion device which comprises: a photoconductive layer made of amorphous semiconductor material which shows charge multiplication and which converts photo signals into electric signals; and a substrate having electric circuits or the like (for example switching elements) for reading the electric signals. The amorphous semiconductor material used according to the invention shows the charge multiplication action under predetermined intensity of electric field so that a high sensitive photoelectric conversion device having a gain which is not smaller than 1 is realized.
    Type: Grant
    Filed: July 24, 1989
    Date of Patent: March 31, 1992
    Inventors: Sachio Ishioka, Yukio Takasaki, Tadaaki Hirai, Kazutaka Tsuji, Tatsuo Makishima, Yasuhiko Nonaka, Tatsuro Kawamura, Takashi Yamashita, Kazuhisa Taketoshi, Keiichi Shidara, Fumihiko Ando, Kenkichi Tanioka
  • Patent number: 4952839
    Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property.
    Type: Grant
    Filed: October 12, 1989
    Date of Patent: August 28, 1990
    Assignees: Hitachi, Ltd, Nippon Hoso Kyokai
    Inventors: Kenkichi Tanioka, Mitsuo Kosugi, Junichi Yamazaki, Keiichi Shidara, Kazuhisa Taketoshi, Tatsuro Kawamura, Eikyuu Hiruma, Shiro Suzuki, Takashi Yamashita, Masaaki Aiba, Yochizumi Ikeda, Tadaaki Hirai, Yukio Takasaki, Sachio Ishioka, Tatsuo Makishima, Kenji Sameshima, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Kazutaka Tsuji, Hirofumi Ogawa
  • Patent number: 4888521
    Abstract: A photoconductive device having a photoconductive layer which includes an amorphous semiconductor layer capable of charge multiplication in at least a part thereof is disclosed. The method of operating such a photoconductive device is also disclosed. By using the avalanche effect of the amorphous semiconductor layer, it is possible to realize a highly sensitive photoconductive device while maintaining low lag property.
    Type: Grant
    Filed: July 2, 1987
    Date of Patent: December 19, 1989
    Assignees: Hitachi Ltd., Nippon Hoso Kyokai
    Inventors: Kenkichi Tanioka, Keiichi Shidara, Tatsuro Kawamura, Junichi Yamazaki, Eikyuu Hiruma, Kazuhisa Taketoshi, Shiro Suzuki, Takashi Yamashita, Mitsuo Kosugi, Yochizumi Ikeda, Masaaki Aiba, Tadaaki Hirai, Yukio Takasaki, Sachio Ishioka, Tatsuo Makishima, Kenji Sameshima, Tsuyoshi Uda, Naohiro Goto, Yasuhiko Nonaka, Eisuke Inoue, Kazutaka Tsuji, Hirofumi Ogawa
  • Patent number: 4866332
    Abstract: A target of an image pickup tube, having a transparent substrate, a transparent conductive film, a p-type photoconductive film made mainly from amorphous Se, and an n-type conductive film capable of forming a rectifying contact at the interface with the p-type photoconductive film, using the rectifying contact as a reverse bias, characterized in that the p-type photoconductive film containing at least a region having more than 35%, and to 60% by weight of Te in the film thickness direction, and at least a region containing 0.005 to 5% by weight of at least a material capable of forming shallow levels in the amorphous Se in the film thickness direction, has good after-image characteristics even if operated at a high temperature.
    Type: Grant
    Filed: February 19, 1987
    Date of Patent: September 12, 1989
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Yukio Takasaki, Tatsuo Makishima, Kazutaka Tsuji, Tadaaki Hirai, Eisuke Inoue, Yasuhiko Nonaka, Naohiro Goto, Masanao Yamamoto, Keiichi Shidara, Kenkichi Tanioka, Takashi Yamashita, Tatsuro Kawamura, Eikyuu Hiruma, Shirou Suzuki, Masaaki Aiba
  • Patent number: 4816715
    Abstract: There is disclosed an image pick-up tube target comprising an N-type conductive film formed on a transparent substrate, and a P-type photoconductive film in rectifying contact with the N-type conductive film and comprising a first layer containing As and Se, the average concentration of As in the first layer being below 8% by weight, a second layer containing As and Se, a third layer containing As and Se, the concentration of As being in the range of 8 to 20% by weight and thickness of the third layer being in the range of 5 to 50% of the total thickness of the P-type photoconductive film, in the order named, and a beam landing layer.
    Type: Grant
    Filed: July 9, 1987
    Date of Patent: March 28, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Takaaki Unnai, Yasuhiko Nonaka, Eisuke Inoue
  • Patent number: 4682077
    Abstract: A camera tube device for use in a television camera comprises an electron gun including a cathode electrode for emission of an electron beam, and first and second grid electrodes respectively having apertures for controlling the diameter of the electron beam. The aperture of the second grid electrode is sufficiently smaller than the aperture of the first grid electrode. The first grid electrode is applied with a positive voltage relative to the cathode electrode and the second grid electrode is applied with a positive voltage relative to the cathode electrode which is higher than that applied to the first grid electrode. The positive voltage applied to the first grid electrode has such a value that forms the electron beam having passed through the aperture of the first grid electrode into a laminar flow beam.
    Type: Grant
    Filed: July 15, 1985
    Date of Patent: July 21, 1987
    Assignees: Nippon Hoso Kyokai, Hitachi, Ltd.
    Inventors: Masanori Maruyama, Masamichi Moriya, Shinichi Kato, Masakazu Fukushima, Yasuhiko Nonaka, Chihaya Ogusu
  • Patent number: 4617248
    Abstract: A structure of a photoconductive film related to a target of an image pickup tube of the photo conductivity type is disclosed. This photoconductive film is formed from mainly Se and Te is added in a central part thereof. Further, As, which is considered to form a deep trap level which captures electrons in Se and GaF.sub.3, etc. which form negative space charges by capturing electrons in Se are added in the region adjacent to the region where Te exists. In addition, a thickness of film in the region where GaF.sub.3, etc. exists is selected to be thinner (not smaller than 20 .ANG. and not larger than 90 .ANG.) than a value which has been adopted so far.
    Type: Grant
    Filed: May 20, 1985
    Date of Patent: October 14, 1986
    Assignees: Nippon Hoso Kyokai, Hitachi, Ltd.
    Inventors: Kenkichi Tanioka, Keiichi Shidara, Takao Kuriyama, Yukio Takasaki, Tadaaki Hirai, Yasuhiko Nonaka, Eisuke Inoue
  • Patent number: 4587456
    Abstract: An image pickup tube target includes a Se-As-Te photoconductive layer whose arsenic concentration changes in a direction of thickness of the Se-As-Te photoconductive layer, a carrier extraction layer having a high arsenic concentration and being contiguous to the Se-As-Te photoconductive layer, a capacitive layer having a low arsenic concentration and being contiguous to the carrier extraction layer, a doped layer obtained by doping In.sub.2 O.sub.3, MoO.sub.2 or a mixture thereof in an interface between the carrier extraction layer and the capacitive layer.
    Type: Grant
    Filed: January 17, 1984
    Date of Patent: May 6, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Eisuke Inoue, Yasuhiko Nonaka, Masanao Yamamoto
  • Patent number: 4563611
    Abstract: A photoconductive image pick-up tube target comprises a transparent substrate, an N-type conductive film formed on the transparent substrate, and a P-type photoconductive film in rectifying contact with the N-type conductive film and containing Se, As and Te as sensitizer. The P-type photoconductive film includes a first layer contiguous to the N-type conductive film and containing 94.+-.1% by weight of Se and 6.+-.0.5% by weight of As, a second layer formed on the first layer and containing 64.+-.4% by weight of Se, 3.+-.0.5% by weight of As, and 33.+-.2% by weight of Te, a third layer formed on the second layer and containing Se and As, and a fluoride doped region extending over the first layer and a front half layer of the second layer and having a fluoride concentration of 0.1 to 3.0% by weight. The third layer has an As concentration which has a peak of 28.+-.1% by weight at a site contiguous to a rear half layer of the second layer and reduces gradually.
    Type: Grant
    Filed: November 2, 1983
    Date of Patent: January 7, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiko Nonaka, Eisuke Inoue, Keiichi Shidara, Kenkichi Tanioka
  • Patent number: 4463279
    Abstract: A photoconductive film comprising a photo-conductive layer which is mainly made of selenium and a region added with tellurium in a direction of the thickness of the layer, wherein at least either one of a portion in a direction of hole flow of said region added with tellurium and a portion in the hole flow of another region which is located adjacent to said region added with tellurium is doped with at least one member selected from the group consisting of an oxide, a fluoride and elements which belong to the group II, III and VII, which are capable of forming a negative space charge in selenium, at a concentration in a range of 10 ppm to 1% by weight on an average. Typical examples of such oxide, fluoride and element include CuO, In.sub.2 O.sub.3, SeO.sub.2, V.sub.2 O.sub.5, MoO.sub.3, WO.sub.3, GaF.sub.2 InF.sub.3, Zn, Ga, In, Cl, I, Br and the like. The after image characteristic ascribable to incident light of high intensity can be significantly improved.
    Type: Grant
    Filed: May 21, 1982
    Date of Patent: July 31, 1984
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Keiichi Shidara, Kenkichi Tanioka, Teruo Uchida, Chushirou Kusano, Yukio Takasaki, Yasuhiko Nonaka, Eisuke Inoue
  • Patent number: 4445131
    Abstract: A photoconductive image pick-up tube target comprising an N-type semiconductor film formed on a transparent substrate, and a P-type photoconductive film in rectifying contact with the N-type semiconductor film and containing Se and As and also Te as sensitizers. A layer of said P-type photoconductive film between the N-type semiconductor film and a Te-containing layer of the P-type photoconductive film has an As concentration distribution which is lower on the side of the N-type conductive film and higher on the side of the Te-containing layer.
    Type: Grant
    Filed: November 9, 1981
    Date of Patent: April 24, 1984
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Yasuhiko Nonaka, Keiichi Shidara, Naohiro Goto
  • Patent number: 4330733
    Abstract: A photoconductive target having an electrode and a P-type conductive layer mainly made of Se and making rectifying contact at an interface with the electrode, with at least Te being doped in a portion of the P-type conductive layer. At least one metal fluoride forming shallow levels is doped in the region where the signal current is generated for the most part of the P-type conductive layer with an average concentration of not less than 50 ppm and not more than 5% by weight. The metal fluoride is preferably at least one selected from the group consisting of LiF, NaF, MgF.sub.2, CaF.sub.2, BaF.sub.2, AlF.sub.3, CrF.sub.3, MnF.sub.2, CoF.sub.2, PbF.sub.2, CeF.sub.3 and TlF. The high light sticking of the photoconductive target can thus be considerably reduced.
    Type: Grant
    Filed: May 22, 1980
    Date of Patent: May 18, 1982
    Assignees: Nippon Hoso Kyokai, Hitachi, Ltd.
    Inventors: Keiichi Shidara, Naohiro Goto, Tatsuro Kawamura, Eikyu Hiruma, Yohitsumu Ikeda, Kenkichi Tanioka, Tadaaki Hirai, Yukio Takasaki, Chushirou Kusano, Tsuyoshi Uda, Yasuhiko Nonaka
  • Patent number: 4277515
    Abstract: The target comprises a transparent substrate, an N-type transparent conductive film formed on the substrate, a P-type photoconductive film formed on the N-type conductive film and a heterojunction formed at the interface between the N- and P-type films. The P-type photoconductive film contains selenium, tellurium and arsenic of which selenium and arsenic are distributed continuously from the heterojunction throughout the thickness of the P-type photoconductive film whereas the distribution of tellurium is spaced from the heterojunction and localized in the vicinity of the heterojunction. The total amount of arsenic contained in the P-type photoconductive film ranges from 2.5 to 6% by weight.
    Type: Grant
    Filed: October 11, 1979
    Date of Patent: July 7, 1981
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Yasuhiko Nonaka, Naohiro Goto, Keiichi Shidara
  • Patent number: 4219831
    Abstract: The target comprises a transparent substrate, an N-type transparent conductive film formed on the substrate, a P-type photoconductive film formed on the N-type conductive film and a heterojunction formed at the interface between the N- and P-type films. The P-type photoconductive film contains selenium, tellurium and arsenic of which selenium and arsenic are distributed continuously from the heterojunction throughout the thickness of the P-type photoconductive film whereas the distribution of tellurium is spaced from the heterojunction and localized in the vicinity of the heterojunction. The total amount of arsenic contained in the P-type photoconductive film ranges from 2.5 to 6% by weight.
    Type: Grant
    Filed: October 31, 1977
    Date of Patent: August 26, 1980
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Yasuhiko Nonaka, Naohiro Goto, Keiichi Shidara
  • Patent number: 4207836
    Abstract: A vacuum vapor-deposition apparatus comprising a turntable for holding some substrates subjected to vapor-deposition, on its circumferential portions; a plurality of evaporating boats disposed opposite to the circumferential portions of the turntable; a plurality of SCR boat power sources for respectively heating the plural evaporating boats; and at least one quartz deposition monitor provided on the turntable, wherein the turntable is rotated for vacuum vapor-deposition so that the evaporated materials from the respective boats are periodically deposited on some substrates to form the start of the successively evaporated materials.
    Type: Grant
    Filed: June 22, 1978
    Date of Patent: June 17, 1980
    Assignee: Hitachi, Ltd.
    Inventor: Yasuhiko Nonaka
  • Patent number: 4178196
    Abstract: A method for manufacturing an image pickup tube target is disclosed, in which, in evaporating a porous Sb.sub.2 S.sub.3 film in a low pressure insert gas, the amount of pre-evaporation of Sb.sub.2 S.sub.3 is decreased as the number of times of repetitive use of an evaporation boat increases in which Sb.sub.2 S.sub.3 is placed for evaporation, whereby an Sb.sub.2 S.sub.3 film having a given porosity is formed.
    Type: Grant
    Filed: May 22, 1978
    Date of Patent: December 11, 1979
    Assignee: Hitachi, Ltd.
    Inventor: Yasuhiko Nonaka
  • Patent number: 4007473
    Abstract: In a target structure for use in a photoconductive image pickup tube, a P-type photoconductive film is deposited on an N-type transparent conductive film which is deposited on a transparent substrate. The P-type photosensitive film comprises first and second photoconductive substances. The commencement of the deposition of the first photoconductive substance is delayed a predetermined time from that of the second photoconductive substance thereby forming a film of the first photoconductive substance which is not contiguous to the junction surface between the N-type transparent conductive film and the P-type photoconductive film.
    Type: Grant
    Filed: May 23, 1975
    Date of Patent: February 8, 1977
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Yasuhiko Nonaka, Tadaaki Hirai, Naohiro Goto, Keiichi Shidara
  • Patent number: 4007395
    Abstract: In a method of manufacturing a target structure for use in a photoconductive image pickup tube when depositing a P-type photoconductive film on an N-type transparent conductive film deposited on one side of a transparent substrate which acts as an incident window of the image pickup tube, the P-type photoconductive film is made up of first and second photoconductive substances. The commencement of the deposition of the first photoconductive substance is delayed a predetermined time than that of the second photoconductive substance and the deposition of the first photoconductive substance is terminated before completion of the deposition of the second photoconductive material thereby forming a layer of the first photoconductive substance not contiguous to the junction between the N-type transparent conductive film and the P-type photoconductive film and having a predetermined thickness.
    Type: Grant
    Filed: May 23, 1975
    Date of Patent: February 8, 1977
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Yasuhiko Nonaka, Naohiro Goto, Keiichi Shidara