Patents by Inventor Yasuhiro Gunji

Yasuhiro Gunji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200056029
    Abstract: [Object] To provide a technology for imparting favorable slidability to fluorine rubber. [Solving Means] A composition for a sealing member includes: 100 parts by weight of an uncrosslinked fluorine rubber component; and 0.5 to 50 (inclusive) parts by weight of a particulate resin. The particulate resin includes a compatible portion and a lubrication portion, the compatible portion having compatibility with the fluorine rubber component, the lubrication portion having lubricity with respect to the fluorine rubber component. During molding of the composition for a sealing member, crosslinking of the fluorine rubber component progresses and at least a part of the particulate resin moves to a surface due to an action of the lubrication portion. As a result, a surface layer portion including a compatible portion and a lubrication portion is formed on a surface of a molded sealing member.
    Type: Application
    Filed: March 27, 2018
    Publication date: February 20, 2020
    Inventors: Shiori IRIE, Yasuhiro GUNJI, Noriaki YAMAMOTO, Hajime YANAGAWA
  • Publication number: 20200040175
    Abstract: [Object] To provide a ring-shaped sealing member having both the sealing property and slidability. [Solving Means] A sealing member is formed in a ring shape and has a sliding surface. The sealing member includes: 100 parts by weight of fluorine rubber; and 0.5 to 50 (inclusive) parts by weight of a particulate resin. The particulate resin includes a compatible portion and a lubrication portion, the compatible portion having compatibility with the fluorine rubber, the lubrication portion having lubricity with respect to the fluorine rubber. A Shore A hardness measured using the sliding surface as a pressing surface is not less than 80. In this sealing member, since rubber elasticity is achieved by the fluorine rubber, a favorable sealing property can be realized. Further, it is possible to impart high slidability to the sealing member by the action of the lubrication portion of the particulate resin. Therefore, this sealing member has both the sealing property and slidability.
    Type: Application
    Filed: March 27, 2018
    Publication date: February 6, 2020
    Inventors: Akihiro OWADA, Takashi SHINADA, Takuya OKAMOTO, Shiori IRIE, Yasuhiro GUNJI, Noriaki YAMAMOTO, Hajime YANAGAWA
  • Patent number: 9598528
    Abstract: A crystalline epoxy resin is modified to provide an epoxy resin composition capable of producing a cured product with excellent cured product properties. The modified epoxy resin composition comprises compound A having in its molecule a functional group represented by formula (1): (where each of R1 and R2 is an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an aralkyl group, a heterocyclic group, or a halogenated, aminated or nitrated derivative thereof), and compound B having a glycidyl group in its molecule. The compound A is preferably a compound resulting from replacement of from at least one to at most n glycidyl groups among n glycidyl groups in a molecule (where n is an integer of from 2 to 16) with the functional group of the formula (1). The compound B is preferably a compound having n glycidyl groups (where n is an integer of from 2 to 16) in its molecule.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: March 21, 2017
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Yasuhiro Gunji, Toshiaki Takeyama
  • Patent number: 8900376
    Abstract: There is provided a water-soluble flux composition for soldering which is excellent particularly in heat resistance and flux residues after soldering of which can be easily removed by washing with water or warm water. The flux composition for soldering contains a compound of formula (1): wherein R1, R2, R3, R4, R5 and R6 independently of one another are a hydrocarbon group or hydrogen atom, and A1, A2 and A3 independently of one another are hydroxy group or an organic group of formula (2): and at least one of A1, A2 and A3 is an organic group of formula (2).
    Type: Grant
    Filed: July 15, 2005
    Date of Patent: December 2, 2014
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Yasuhiro Gunji, Toshiaki Takeyama
  • Patent number: 8565509
    Abstract: The operation rate of a circuit pattern inspecting apparatus is prevented from deteriorating by measuring image noise of the circuit pattern inspecting apparatus and detecting the sign that the apparatus is to be in an abnormal state. Provided is the circuit pattern inspecting apparatus wherein circuit pattern abnormalities are detected by irradiating a substrate having a circuit pattern formed thereon with an electron beam and detecting generated secondary electrons or reflected electrons. The circuit pattern inspecting apparatus is provided with: an image processing section wherein an image is generated based on the signal intensities of the detected secondary electrons or those of the reflected electrons and the image is displayed for a display apparatus of the interface; and a control section which analyzes the frequency of noise included in the image.
    Type: Grant
    Filed: October 19, 2009
    Date of Patent: October 22, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyuki Takahashi, Yasuhiro Gunji, Hirokazu Ito
  • Patent number: 8421010
    Abstract: There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format.
    Type: Grant
    Filed: August 28, 2009
    Date of Patent: April 16, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Hiroi, Yasuhiro Gunji, Hiroshi Miyai, Masaaki Nojiri
  • Patent number: 8242443
    Abstract: A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: August 14, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Yasuhiro Gunji, Yoshiyuki Shichida
  • Patent number: 8207513
    Abstract: A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: June 26, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuko Sasaki, Yasuhiro Gunji, Zhaohui Cheng
  • Patent number: 8168950
    Abstract: The present invention has a subject to provide an apparatus that optimizes scanning in accordance with circumstances or purposes, reduces distortion of images, and improves throughput, image quality, and defect detection rate by controlling deflection of a charged particle beam in a stage tracking system.
    Type: Grant
    Filed: November 19, 2008
    Date of Patent: May 1, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kanji Furuhashi, Shuji Kikuchi, Akira Karakama, Yasuhiro Gunji
  • Publication number: 20120091339
    Abstract: A charged-particle microscope device and a method of controlling charged-particle beams are provided, which are capable of signal detection at the time when the charged state of an observation sample or a defect portion becomes optimum. Charge accumulation-waiting time T from an initial irradiation with an electron beam 21 for enhancing charge accumulation on an observation sample 100 until a next irradiation with the electron beam 21 for sample observation is set depending on the state of the observation sample 100 or a defect portion 112 generated on the observation sample 100. The irradiation with the electron beam 21 for enhancing charge accumulation and the irradiation with the electron beam 21 for sample observation are performed on the observation sample 100 on the basis of the charge accumulation-waiting time T.
    Type: Application
    Filed: June 15, 2010
    Publication date: April 19, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yusuke Ominami, Hiroshi Miyai, Yasuhiro Gunji
  • Patent number: 8086022
    Abstract: An inspection system uses a scanning electron microscope that detects a high-precision electron beam image, and at the same time removes restrictions for a low sampling rate. A sampled signal is obtained by sampling an analog brightness signal generated by a secondary electron detector at a predetermined sampling rate, and contiguous digital values contained in the sampled signal are added on an N by N digital value basis to generate a digital brightness signal whose frequency is equal to 1/N of the sampling frequency. Each, digital value contained in the digital brightness signal is divided by N to generate a digital signal made of digital values having a number of bits equal to that of the sampled signal and to generate an image signal in which each digital value of the digital signal forms one pixel data.
    Type: Grant
    Filed: July 24, 2008
    Date of Patent: December 27, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroshi Miyai, Yusuke Ominami, Yasuhiro Gunji
  • Patent number: 8086021
    Abstract: The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.
    Type: Grant
    Filed: February 9, 2009
    Date of Patent: December 27, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Hiroshi Miyai, Yasuhiro Gunji
  • Publication number: 20110255773
    Abstract: The operation rate of a circuit pattern inspecting apparatus is prevented from deteriorating by measuring image noise of the circuit pattern inspecting apparatus and detecting the sign that the apparatus is to be in an abnormal state. Provided is the circuit pattern inspecting apparatus wherein circuit pattern abnormalities are detected by irradiating a substrate having a circuit pattern formed thereon with an electron beam and detecting generated secondary electrons or reflected electrons. The circuit pattern inspecting apparatus is provided with: an image processing section wherein an image is generated based on the signal intensities of the detected secondary electrons or those of the reflected electrons and the image is displayed for a display apparatus of the interface; and a control section which analyzes the frequency of noise included in the image.
    Type: Application
    Filed: October 19, 2009
    Publication date: October 20, 2011
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroyuki Takahashi, Yasuhiro Gunji, Hirokazu Ito
  • Patent number: 7999565
    Abstract: A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed.
    Type: Grant
    Filed: January 5, 2009
    Date of Patent: August 16, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasuhiro Gunji, Hiroshi Miyai, Shigeya Tanaka
  • Publication number: 20110163230
    Abstract: There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format.
    Type: Application
    Filed: August 28, 2009
    Publication date: July 7, 2011
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takashi Hiroi, Yasuhiro Gunji, Hiroshi Miyai, Masaaki Nojiri
  • Publication number: 20100314542
    Abstract: A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.
    Type: Application
    Filed: August 20, 2010
    Publication date: December 16, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yusuke OMINAMI, Yasuhiro Gunji, Yoshiyuki Shichida
  • Patent number: 7838828
    Abstract: A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.
    Type: Grant
    Filed: June 3, 2008
    Date of Patent: November 23, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Yasuhiro Gunji, Yoshiyuki Shichida
  • Publication number: 20100051806
    Abstract: A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
    Type: Application
    Filed: November 10, 2009
    Publication date: March 4, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yuko Sasaki, Yasuhiro Gunji, Zhaohui Cheng
  • Publication number: 20090309022
    Abstract: An object of the present invention provides an inspection apparatus and an inspection method which use an electron beam image to accurately detect a defect that is difficult to detect in an optical image, the apparatus and method also enabling prevention of a possible decrease in focus accuracy of an inspection image which affect the defect detection.
    Type: Application
    Filed: June 8, 2009
    Publication date: December 17, 2009
    Inventors: Yasuhiro GUNJI, Akira Fujii, Hiroyuki Takahashi, Ryuichi Funatsu, Toshifumi Honda, Takashi Hiroi, Hiroshi Makino
  • Publication number: 20090208092
    Abstract: The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.
    Type: Application
    Filed: February 9, 2009
    Publication date: August 20, 2009
    Inventors: Yusuke Ominami, Hiroshi Miyai, Yasuhiro Gunji