Patents by Inventor Yasuo Yamazaki

Yasuo Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110200812
    Abstract: Provided is a glass roll formed by winding a glass film into a roll, in which a minimum winding radius of the glass film is optimized. Thus, the glass film is reliably prevented from breaking due to static fatigue, and is able to be stored for long periods. A glass roll (1), which is formed by winding a glass film (2) into a roll, has a configuration in which the glass film has a minimum winding radius (R) satisfying the following relation: R?(T/2)[(2.3/?)×E?1], where ? represents flexural strength of the glass film (2) obtained by a 3-point bending test, T represents a thickness of the glass film, and E represents a Young's modulus of the glass film.
    Type: Application
    Filed: September 30, 2009
    Publication date: August 18, 2011
    Inventors: Masahiro Tomamoto, Michiharu Eta, Hidetaka Oda, Tatsuya Takaya, Yasuo Yamazaki, Hiroshi Takimoto, Shinichi Ishibashi, Keiji Takagi, Daisuke Nagata, Takahide Nakamura, Toru Sakurabayashi, Katsutoshi Fujiwara, Mitsuharu Noda, Yasuhiko Ogiso, Takahide Fujii
  • Publication number: 20110198718
    Abstract: A method for manufacturing a solid state image pickup device including a first active region provided with a first conversion unit, a second active region provided with a second conversion unit, and a third active region adjoining the first and the second active regions with a field region therebetween and being provided with a pixel transistor, the method including the steps of ion-implanting first conductivity type impurity ions to form a semiconductor region serving as a potential barrier against the signal carriers at a predetermined depth in the third active region and ion-implanting second conductivity type impurity ions into the third active region with energy lower than the above-described ion-implantation energy.
    Type: Application
    Filed: February 16, 2011
    Publication date: August 18, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hideaki Takada, Toru Koizumi, Yasuo Yamazaki, Tatsuya Ryoki
  • Publication number: 20110177325
    Abstract: To provide a glass roll capable of reliably preventing a glass film from breaking from an end surface of the glass film as an origin of breakage, a glass roll (1) is formed by winding a glass film (2) into a roll while superposing the glass film (2) on a protective sheet (3), the glass film (2) being formed by an overflow downdraw method to have a thickness of 1 ?m or more and 200 ?m or less, and to have each end surface in a width direction to form a cut surface cut by laser splitting.
    Type: Application
    Filed: September 30, 2009
    Publication date: July 21, 2011
    Inventors: Masahiro Tomamoto, Michiharu Eta, Hidetaka Oda, Tatsuya Takaya, Yasuo Yamazaki, Hiroshi Takimoto, Shinichi Ishibashi, Keiji Takagi, Daisuke Nagata, Takahide Nakamura, Toru Sakurabayashi, Katsutoshi Fujiwara, Mitsuharu Noda, Yasuhiko Ogiso, Takahide Fujii
  • Publication number: 20110177290
    Abstract: Provided is a package form, with which cleanness of a glass film is ensured and the glass film is prevented from breaking. The package form is effective in minimizing the number of glass film processing steps to be performed before packaging and after unpackaging. As the package form for a glass film, provided is a glass roll (1) formed by winding a glass film (2) into a roll while superposing the glass film (2) on a protective sheet (3), the glass film (2) being formed by an overflow downdraw method and having exposed front and back surfaces.
    Type: Application
    Filed: September 30, 2009
    Publication date: July 21, 2011
    Inventors: Masahiro Tomamoto, Michiharu Eta, Hidetaka Oda, Tatsuya Takaya, Yasuo Yamazaki, Hiroshi Takimoto, Shinichi Ishibashi, Keiji Takagi, Daisuke Nagata, Takahide Nakamura, Toru Sakurabayashi, Katsutoshi Fujiwara, Mitsuharu Noda, Yasuhiko Ogiso, Takahide Fujii
  • Publication number: 20110177347
    Abstract: Provided is a glass roll utilizing a flanged roll core, and reliably inhibiting a glass film from breaking from an end portion in a width direction thereof as an origin of breakage. A glass roll (1) is formed by winding a glass film (4) and a cushion sheet (5), under a state of being superposed, around a roll core (3) including a flange (2) at each end portion thereof, in which an end portion in a width direction of the glass film (4) is separated from the flange (2) on each side in the width direction of the glass film (4), and the cushion sheet (5) is extended beyond the end portion in the width direction of the glass film (4) to the flange (2) side, to thereby form an extension portion (5a).
    Type: Application
    Filed: September 30, 2009
    Publication date: July 21, 2011
    Inventors: Masahiro Tomamoto, Michiharu Eta, Hidetaka Oda, Tatsuya Takaya, Yasuo Yamazaki, Hiroshi Takimoto, Shinichi Ishibashi, Keiji Takagi, Daisuke Nagata, Takahide Nakamura, Toru Sakurabayashi, Katsutoshi Fujiwara, Mitsuharu Noda, Yasuhiko Ogiso, Takahide Fujii
  • Patent number: 7828107
    Abstract: A forward/reverse control system for a work machine cancels a second control state, in which forward/reverse switching control is performed by a second forward/reverse control means, by an operation of a first forward/reverse control means to return to a first control state in which forward/reverse switching control is performed by the first forward/reverse control means. The system is provided with a F-N-R lever unit 30 (the first forward/reverse control means) and F-N-R switch unit 40 (the second forward/reverse control means) that instruct forward, reverse or neutral, a controller 42 which performs forward/reverse switching control by giving priority to an instruction from the F-N-R lever unit 30 over an instruction from the F-N-R switch unit 40, and a selector switch 41 which by an operation of a switching control member 41a, instructs the controller 42 to switch to the second control state or to cancel the second control state.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: November 9, 2010
    Assignee: Hitachi Construction Machinery Co., Ltd.
    Inventors: Masaki Yoshikawa, Jujitsu Murota, Yasuo Yamazaki
  • Publication number: 20100138118
    Abstract: This invention provides a traveling system for an engineering machine, adapted to limit a maximum traveling speed of the machine without causing decreases in engineering work efficiency or in accelerating performance during a start of traveling, and to improve fuel efficiency by suppressing a loss of engine output horsepower under the limited state of the maximum traveling speed. During fourth-gear shift control process, capacities of first and second hydraulic motors 23, 24 are controlled in coordinative form and the second hydraulic motor 24 has its minimum tilting amount limited to a tilting amount limit q2cmin. In addition, when a tilting amount of the first hydraulic motor 23 reaches a minimum tilting amount q1min, the engine 10 has its maximum engine speed limited to a first engine speed limit Ncmax1 (e.g., 1,800 rpm).
    Type: Application
    Filed: July 14, 2008
    Publication date: June 3, 2010
    Applicants: HITACHI CONSTRUCTION MACHINERY CO., LTD., TCM CORPORATION
    Inventors: Hidenobu Tsukada, Kazunori Nakamura, Tsuyoshi Nakamura, Yasuo Yamazaki
  • Publication number: 20100095663
    Abstract: There are provided: a first circuit for traveling HC1, formed through a closed circuit connection of a variable displacement hydraulic pump 2 and a variable displacement hydraulic motor 3, that includes a motor control unit 10, 11 that controls a displacement of the hydraulic motor 3; a second circuit for working HC2 that drives a work hydraulic actuator 114, 115 by pressure oil from a work hydraulic pump 4; and a maximum value control unit 10 that controls a maximum displacement of the hydraulic motor 3 in accordance with load pressure Pf in the second circuit HC2. The maximum value control unit 10 decreases the maximum displacement to a minimum limit q1 corresponding to a maximum load pressure Pr in the second circuit when load pressure Pf in the second circuit exceeds a predetermined value Ps.
    Type: Application
    Filed: March 12, 2008
    Publication date: April 22, 2010
    Applicants: TCM Corporation, Hitachi Construction Machinery Co., Ltd
    Inventors: Koji Hyodo, Kazuo Chonan, Yasuo Yamazaki, Nobuhiro Suzuki, Koji Takano, Genichiro Ishimaru, Nobuyuki Hidaka, Masaki Yoshikawa
  • Publication number: 20100069199
    Abstract: A gearshift controller for an industrial vehicle, includes: a speed ratio detection unit that detects a speed ratio of speeds of an input axis and of an output axis of a torque converter; a gearshift control unit that shifts up a speed stage when the detected speed ratio is equal to or more than a first predetermined value and shifts down the speed stage when the detected speed ratio is equal to or less than a second predetermined value, which is smaller than the first predetermined value; and an operation member with which a downshift to the first speed is instructed by operation thereof by an operator. When the downshift is instructed by the operation member, the gearshift control unit controls the speed stage to be kept at the first speed for a predetermined time period regardless of the speed ratio detected by the speed ratio detection unit.
    Type: Application
    Filed: November 30, 2007
    Publication date: March 18, 2010
    Applicants: TCM Corporation, Hitachi Construction Machinery Co., Ltd.
    Inventors: Koji Hyodo, Tetsuji Tanaka, Eiichi Sakai, Genichiro Ishimaru, Tomoo Takahashi, Yasuo Yamazaki
  • Publication number: 20100024412
    Abstract: There are provided: a travel circuit HC1 that is formed through a closed circuit connection of a variable displacement hydraulic pump 2 driven by an engine 1 and a variable displacement hydraulic motor 3; a work circuit HC2 that includes a work hydraulic pump 4 that is driven by the engine 1 and a work hydraulic actuator 114, 115 that operates by pressure oil from the work hydraulic pump 4; a relief valve 14 that relieves high pressure oil of the travel circuit HC1; a rotation speed control unit 10, 18 that controls the engine rotation speed in correspondence to an operation amount of an accelerator pedal 9; a state detection unit 21, 22 that detects a vehicle state of high load travel and high load work; and a speed limitation unit 10 that reduces an upper limit of engine rotation speed when the vehicle state of high load travel and high load work is detected by the state detection unit 21, 22.
    Type: Application
    Filed: March 12, 2008
    Publication date: February 4, 2010
    Applicants: TCM CORPORATION, HITACHI CONSTRUCTION MACHINERY CO., LTD.
    Inventors: Koji Hyodo, Nobuyuki Hidaka, Masaki Yoshikawa, Tsuyoshi Takeyama, Kazuo Chonan, Yasuo Yamazaki
  • Patent number: 7365002
    Abstract: A method of manufacturing a semiconductor device. The device includes a plurality of layers on a semiconductor substrate. The method includes the steps of dividing a pattern of at least one layer into a plurality of sub-patterns, and joining the divided sub-patterns to perform patterning. A layer that includes wiring substantially affects operation of the semiconductor device depending on a positional relationship to any other wiring. The patterning is performed by one-shot exposure using a single mask.
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: April 29, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yasuo Yamazaki
  • Publication number: 20070289803
    Abstract: A forward/reverse control system for a work machine cancels a second control state, in which forward/reverse switching control is performed by a second forward/reverse control means, by an operation of a first forward/reverse control means to return to a first control state in which forward/reverse switching control is performed by the first forward/reverse control means. The system is provided with a F-N-R lever unit 30 (the first forward/reverse control means) and F-N-R switch unit 40 (the second forward/reverse control means) that instruct forward, reverse or neutral, a controller 42 which performs forward/reverse switching control by giving priority to an instruction from the F-N-R lever unit 30 over an instruction from the F-N-R switch unit 40, and a selector switch 41 which by an operation of a switching control member 41a, instructs the controller 42 to switch to the second control state or to cancel the second control state.
    Type: Application
    Filed: March 8, 2005
    Publication date: December 20, 2007
    Applicants: Hitachi Construction Machinery Co., Ltd., TCM Corporation
    Inventors: Masaki Yoshikawa, Jujitsu Murota, Yasuo Yamazaki
  • Patent number: 7052986
    Abstract: A method for manufacturing a semiconductor apparatus device includes a plurality of layers on a semiconductor substrate. The method includes the steps of dividing a pattern of at least a layer into a plurality of sub-patterns, and joining the divided sub-patterns to perform patterning. The layer including wiring substantially affects operation of the semiconductor device depending on a positional relationship to any other wiring, the patterning is performed by one-shot exposure using a single mask, and only as to the layer including the wiring substantially affecting the operation of the semiconductor device depending on the positional relationship to any other wiring, the patterning is performed by one-shot exposure, and as to all of the other layers, the patterning is performed by division exposure.
    Type: Grant
    Filed: September 22, 2003
    Date of Patent: May 30, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yasuo Yamazaki
  • Patent number: 7020592
    Abstract: When chemical process conditions and chemical species are input on a spreadsheet software (1), a chemical model is selected according to the chemical species by a software (4, 5, 6) different from the spreadsheet software (1), thermodynamic property data for the chemical model is generated, and a chemical equilibrium is evaluated based on this data. The chemical equilibrium is simulated on the spreadsheet software (1) based on this evaluation result, and the simulation result is displayed on the spreadsheet software (1).
    Type: Grant
    Filed: March 22, 2001
    Date of Patent: March 28, 2006
    Assignees: Nippon Chemical Industrial Co., Ltd., Oli Systems, Inc.
    Inventors: Yasuo Yamazaki, Hamp Turner
  • Publication number: 20050282074
    Abstract: A method of manufacturing a semiconductor device. The device includes a plurality of layers on a semiconductor substrate. The method includes the steps of dividing a pattern of at least one layer into a plurality of sub-patterns, and joining the divided sub-patterns to perform patterning. A layer that includes wiring substantially affects operation of the semiconductor device depending on a positional relationship to any other wiring. The patterning is performed by one-shot exposure using a single mask.
    Type: Application
    Filed: August 24, 2005
    Publication date: December 22, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Yasuo Yamazaki
  • Publication number: 20050181995
    Abstract: An objective of the present invention is to provide a newly isolated vascular endothelial growth factor (VEGF)-like protein having binding activity specific to a vascular endothelial growth factor receptor type 2 (KDR) but exhibiting no binding affinity to a vascular endothelial growth factor receptor type 1 (Flt-1), and thus being excellent in hypotensive effect. There have been newly purified and isolated a VEGF-like protein from a venom of Vipera ammodytes ammodytes: vammin and a VEGF-like protein from a venom of Daboia russelli russelli: VR-1 as the VEGF-like protein having binding activity specific to KDR but exhibiting no binding affinity to Flt-1, and thereby being excellent in hypotensive effect, and the amino acid sequences of these both have been analyzed in the present invention.
    Type: Application
    Filed: October 1, 2004
    Publication date: August 18, 2005
    Inventors: Hisanori Kawai, Yasuo Yamazaki, Takashi Morita
  • Publication number: 20040058516
    Abstract: A manufacturing method of a semiconductor device in which the influence of alignment errors is decreased is provided. A semiconductor device includes a plurality of elements each having the same structure composed of a plurality of layers including the same plural patterns respectively. One-shot exposure is performed for forming patterns on layers on which the patterns are formed before the formation of a pattern on the layer including wiring substantially affecting the operation of the semiconductor device when the value of the parasitic capacitance generated according to a positional relationship between the wiring and other wiring is different between elements. Division exposure is performed for forming patterns on all of the other layers on which the patterns are formed after the one-shot exposure.
    Type: Application
    Filed: September 22, 2003
    Publication date: March 25, 2004
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Yasuo Yamazaki
  • Patent number: 6708130
    Abstract: When product inspection results and an inspection frequency for each inspection item are input to the product inspection result input device 1, the inspection items are selected, the presence or absence of product inspection results required for each inspection item is determined, selection of previous product inspection results is performed via the inspection item master 2a and inspection frequency master 2b of the product standard management device 2, and product inspection results for other product batches measured previously are cited for insufficient data for each inspection item missing from the inspection results document according to the inspection item conditions of the inspection results document.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: March 16, 2004
    Assignees: Nippon Chemical Industrial Co., Ltd., The Institute of Japanese Union of Scientist Engineers
    Inventors: Yasuo Yamazaki, Masaki Majima
  • Patent number: 6658895
    Abstract: The disclosure is for a film coating which yields increased life for optical media molds and the method and apparatus for making such a film. The film is a carbon nitride layer of 0.5 to 5.0 microns thickness with 2% to 45% nitrogen coated on an underlayer. One method of making the carbon nitride film is by the use of a pulsed carbon arc to generate a carbon plasma while injecting nitrogen into the vacuum chamber in which the arc is created. Another method is to generate a radio frequency plasma in a vacuum chamber into which acetylene and nitrogen gas are injected. The carbon nitride is formed by the combination of nitrogen with the carbon from the acetylene.
    Type: Grant
    Filed: August 16, 2001
    Date of Patent: December 9, 2003
    Assignee: Richter Precision, Inc.
    Inventors: Val L. Lieberman, J. Hans Richter, Yasuo Yamazaki
  • Publication number: 20030035905
    Abstract: The disclosure is for a film coating which yields increased life for optical media molds and the method and apparatus for making such a film. The film is a carbon nitride layer of 0.5 to 5.0 microns thickness with 2% to 45% nitrogen coated on an underlayer. One method of making the carbon nitride film is by the use of a pulsed carbon arc to generate a carbon plasma while injecting nitrogen into the vacuum chamber in which the arc is created. Another method is to generate a radio frequency plasma in a vacuum chamber into which acetylene and nitrogen gas are injected. The carbon nitride is formed by the combination of nitrogen with the carbon from the acetylene.
    Type: Application
    Filed: August 16, 2001
    Publication date: February 20, 2003
    Applicant: Richter Precision, Inc.
    Inventors: Val L. Lieberman, J. Hans Richter, Yasuo Yamazaki