Patents by Inventor Yasushi Mizuno

Yasushi Mizuno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130052550
    Abstract: The present invention provides a fuel cell system including a reformer that reforms a raw fuel using a reforming catalyst to generate reformed gas, a fuel cell that generates electric power using the reformed gas generated by the reformer, a heat exchanger that exchanges heat between heat of combustion exhaust gas discharged from the fuel cell and water introduced thereinto, a condenser that condenses steam contained in the combustion exhaust gas discharged from primary side downstream of the heat exchanger to recover water, a pump for supplying the water to secondary side upstream of the heat exchanger; a hot-water temperature measurement instrument that measures temperature of hot water at secondary side downstream of the heat exchanger, and a control unit that controls a supply amount by the pump.
    Type: Application
    Filed: March 28, 2011
    Publication date: February 28, 2013
    Applicant: JX NIPPON OIL & ENERGY CORPORATION
    Inventors: Yasushi Mizuno, Takeshi Ibuka, Yukihiro Kawaji, Shou Yokoyama, Takashi Ichiya
  • Patent number: 8384877
    Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
    Type: Grant
    Filed: June 7, 2007
    Date of Patent: February 26, 2013
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Patent number: 8174668
    Abstract: A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: May 8, 2012
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Patent number: 8169592
    Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.
    Type: Grant
    Filed: May 16, 2008
    Date of Patent: May 1, 2012
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Patent number: 8139198
    Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
    Type: Grant
    Filed: April 14, 2006
    Date of Patent: March 20, 2012
    Assignee: Nikon Corporation
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
  • Patent number: 8130363
    Abstract: A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
    Type: Grant
    Filed: May 16, 2008
    Date of Patent: March 6, 2012
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Patent number: 8125612
    Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
    Type: Grant
    Filed: November 22, 2006
    Date of Patent: February 28, 2012
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Yasushi Mizuno, Kenichi Shiraishi
  • Publication number: 20120015306
    Abstract: [Problem] It is to provide an illumination optical system, exposure apparatus and device manufacturing method allowing adjustment of the light intensity distribution on the illumination target surface.
    Type: Application
    Filed: June 24, 2011
    Publication date: January 19, 2012
    Applicant: Niko Corporation
    Inventors: Hirohisa TANAKA, Yasushi Mizuno
  • Patent number: 8072576
    Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
    Type: Grant
    Filed: June 7, 2007
    Date of Patent: December 6, 2011
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Patent number: 8004653
    Abstract: A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
    Type: Grant
    Filed: May 16, 2008
    Date of Patent: August 23, 2011
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Publication number: 20110199594
    Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.
    Type: Application
    Filed: April 21, 2011
    Publication date: August 18, 2011
    Applicant: NIKON CORPORATION
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Patent number: 7995187
    Abstract: A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: August 9, 2011
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Publication number: 20110073883
    Abstract: An LED lamp A1 is elongated in an axial direction x and includes a plurality of LED modules 30. Respective main light irradiation directions of the LED modules 30 are directed outward in radial directions that are perpendicular to the axial direction x, and the main light irradiation directions of the LED modules 30 are different from each other as viewed in the axial direction x. This arrangement provides a wider light irradiation range as viewed in the axial direction x.
    Type: Application
    Filed: May 28, 2009
    Publication date: March 31, 2011
    Applicant: ROHM CO., LTD.
    Inventors: Hideharu Osawa, Yasushi Mizuno
  • Publication number: 20110039175
    Abstract: Provided is a method for operating an indirect internal reforming SOFC system, in which the temperature of a reformer can be maintained stably and suitably. A method for operating an indirect internal reforming solid oxide fuel cell system including a reformer including a reforming catalyst layer, for producing a reformed gas from a hydrocarbon-based fuel, a solid oxide fuel cell for generating electric power using the reformed gas obtained in the reformer, and a combustion region for combusting an anode off-gas discharged from the solid oxide fuel cell, wherein the reformer is disposed at a position where the reformer can receive combustion heat generated in the combustion region, the method including the step of controlling the temperature of the reforming catalyst layer by changing the electric power generation output value of the solid oxide fuel cell.
    Type: Application
    Filed: April 8, 2009
    Publication date: February 17, 2011
    Applicant: JX NIPPON OIL & ENERGY CORPORATION
    Inventors: Shou Yokoyama, Yasushi Mizuno, Tomotaka Ishida
  • Patent number: 7889320
    Abstract: The present invention provides a variable slit apparatus, which can rapidly change the shape of the slit width of the illumination light while finely controlling the shape of the slit-shaped illumination light, an illumination apparatus that uses such, an exposure apparatus, and the like. The variable slit apparatus for forming a slit-shaped illumination light comprises: a first light-shielding mechanism that comprises a plurality of blades for defining one long side of the illumination light; a second light-mechanism configured to define another long side of the illumination light; and a drive mechanism that changes the width of the illumination light in the latitudinal direction orthogonal to the longitudinal direction by driving the first light-shielding mechanism and the second light-shielding mechanism.
    Type: Grant
    Filed: May 10, 2006
    Date of Patent: February 15, 2011
    Assignee: Nikon Corporation
    Inventors: Eizo Ohya, Kyoji Nakamura, Yasushi Mizuno
  • Patent number: 7837858
    Abstract: For shortening the starting time of an autothermal reformer, the autothermal reformer is started by a method comprising: a first preheating step of heating a reforming catalyst up to a predetermined temperature with use of heating means, the heating means being positioned upstream of the reforming catalyst to heat the reforming catalyst; a second preheating step of stopping the heating after arrival at the predetermined temperature, feeding vaporized fuel and air to the reforming catalyst at the predetermined temperature, allowing the fuel to be oxidized by the reforming catalyst and thereby heating the reforming catalyst; and a starting step of also supplying steam to the reforming catalyst heated by the second preheating step and starting autothermal reforming under the condition for a steady state.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: November 23, 2010
    Assignee: Nippon Oil Corporation
    Inventors: Yukihiro Sugiura, Yasushi Mizuno
  • Patent number: 7667829
    Abstract: An optical property measurement apparatus is equipped with an optical system unit that selectively places an opening section for passing illumination light, a microlens array for measuring wavefront aberration, and a polarization detection system for measuring a polarization state of the illumination light on an optical path of the illumination light. Accordingly an illumination shape and a size of an illumination optical system, wavefront aberration of a projection optical system and a polarization state of the illumination light can be measured together. Therefore, for example, even when exposure is performed with polarized illumination that is a type of modified illumination, highly-accurate exposure can be achieved by adjusting various optical systems based on the measurement results.
    Type: Grant
    Filed: August 9, 2005
    Date of Patent: February 23, 2010
    Assignee: Nikon Corporation
    Inventors: Koji Kaise, Toru Fujii, Yasushi Mizuno
  • Publication number: 20090291336
    Abstract: There are provided an SOFC system using kerosene as a reforming raw material, the SOFC system being capable of effectively cooling the cell and capable of being stably operated with no decreased efficiency, and an operating method thereof. The solid oxide fuel cell system includes reforming means for reforming kerosene to obtain a reformed gas, a methanation catalyst layer disposed downstream of the reforming means and capable of promoting a methanation reaction, cooling means for cooling the methanation catalyst layer, and a solid oxide fuel cell disposed downstream of the methanation catalyst layer. The operating method of a solid oxide fuel cell system includes reforming kerosene to obtain a reformed gas, performing a methanation reaction to increase a methane amount in the reformed gas, and supplying a gas obtained in the methanation to a solid oxide fuel cell.
    Type: Application
    Filed: April 4, 2007
    Publication date: November 26, 2009
    Applicant: NIPPON OIL CORPORATION
    Inventors: Yasushi Mizuno, Osamu Sadakane, Yukihiro Sugiura, Iwao Anzai
  • Publication number: 20090284727
    Abstract: An illumination optical system is one for illuminating a surface to be illuminated with light from a light source, which has a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator, and an optical attenuator arranged on a predetermined surface in an optical path behind the optical integrator and having an attenuation characteristic of varying an attenuation rate depending upon an angle of incidence to the predetermined surface.
    Type: Application
    Filed: February 5, 2009
    Publication date: November 19, 2009
    Applicant: NIKON CORPORATION
    Inventors: Kouji Muramatsu, Osamu Tanitsu, Hirohisa Tanaka, Masaya Yamamoto, Norio Miyake, Yasushi Mizuno, Ryuji Takaya, Risa Yoshimoto, Hiroyuki Hirota
  • Publication number: 20090223861
    Abstract: For shortening the starting time of an autothermal reformer, the autothermal reformer is started by a method comprising: a first preheating step of heating a reforming catalyst up to a predetermined temperature with use of heating means, the heating means being positioned upstream of the reforming catalyst to heat the reforming catalyst; a second preheating step of stopping the heating after arrival at the predetermined temperature, feeding vaporized fuel and air to the reforming catalyst at the predetermined temperature, allowing the fuel to be oxidized by the reforming catalyst and thereby heating the reforming catalyst; and a starting step of also supplying steam to the reforming catalyst heated by the second preheating step and starting autothermal reforming under the condition for a steady state.
    Type: Application
    Filed: September 21, 2006
    Publication date: September 10, 2009
    Applicant: NIPPON OIL CORPORATION
    Inventors: Yukihiro Sugiura, Yasushi Mizuno