Patents by Inventor Yasushi Obara

Yasushi Obara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11145492
    Abstract: A local dry etching apparatus includes a vacuum chamber that has a predetermined degree of vacuum therewithin, a nozzle including a first end and a second end, at least the first end of the nozzle open to the vacuum chamber, a discharge tube including a first end that is connected to the second end of the nozzle, a plasma generator provided in the discharge tube, an electromagnetic wave irradiation part configured to oscillate electromagnetic waves and connected to the discharge tube via the electromagnetic wave transmitter to introduce the oscillated electromagnetic waves to the plasma generator, and a spacer interposed between the nozzle and the discharge tube.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: October 12, 2021
    Assignee: SPEEDFAM CO., LTD.
    Inventor: Yasushi Obara
  • Publication number: 20200135429
    Abstract: A local dry etching apparatus includes a vacuum chamber that has a predetermined degree of vacuum therewithin, a nozzle including a first end and a second end, at least the first end of the nozzle open to the vacuum chamber, a discharge tube including a first end that is connected to the second end of the nozzle, a plasma generator provided in the discharge tube, an electromagnetic wave irradiation part configured to oscillate electromagnetic waves and connected to the discharge tube via the electromagnetic wave transmitter to introduce the oscillated electromagnetic waves to the plasma generator, and a spacer interposed between the nozzle and the discharge tube.
    Type: Application
    Filed: September 26, 2019
    Publication date: April 30, 2020
    Inventor: Yasushi OBARA
  • Publication number: 20170278674
    Abstract: A local dry etching apparatus includes a vacuum chamber, a nozzle opened in the vacuum chamber, a discharge tube connected to the nozzle, a workpiece table disposed in the vacuum chamber for mounting a workpiece thereon, a table driving device, a table driving control device, an electromagnetic wave oscillator, a gas supply device for supplying a raw material gas to the discharge tube, a plasma generation portion formed in the discharge tube, and an electromagnetic wave transmission unit for irradiation of electromagnetic waves oscillated in the electromagnetic wave oscillator to the plasma generation portion, in which the nozzle and the discharge tube are composed of separate parts and a temperature adjusting unit is provided for adjusting the temperature of at least one of the nozzle and the discharge tube.
    Type: Application
    Filed: March 20, 2017
    Publication date: September 28, 2017
    Applicant: SPEEDFAM Co., Ltd.
    Inventor: Yasushi OBARA
  • Publication number: 20160203989
    Abstract: A local dry etching apparatus includes a vacuum chamber, a single workpiece table, a plurality of discharge tubes, a raw material gas supply device for supplying a raw material gas to a selected discharge tube, a single electromagnetic wave oscillator capable of output adjustment, and waveguides provided with an electromagnetic wave switcher. A discharge tube selected from the plurality of discharge tubes to be irradiated with the electromagnetic wave is switched sequentially by the electromagnetic wave switcher.
    Type: Application
    Filed: September 4, 2014
    Publication date: July 14, 2016
    Applicant: SPEEDFAM Co., Ltd.
    Inventor: Yasushi OBARA
  • Publication number: 20160104601
    Abstract: A local dry etching apparatus includes a single vacuum chamber, a plurality of gas introduction units each including a discharge tube having an injection port opened in the vacuum chamber, a single workpiece table disposed in the vacuum chamber and mounting a workpiece thereon, a table driving device, a table driving control device, a gas supply device for supplying raw material gases to the gas introduction units, a single electromagnetic wave oscillator, plasma generation portions each formed to each of the discharge tubes of the gas introduction units, and an electromagnetic wave transmission unit having an electromagnetic wave switching unit capable of switching an electromagnetic wave such that one of the plasma generation portions is irradiated with the electromagnetic wave, in which the respective gas introduction units inject plasma having different fabrication characteristics.
    Type: Application
    Filed: October 6, 2015
    Publication date: April 14, 2016
    Applicant: SPEEDFAM Co., Ltd.
    Inventor: Yasushi OBARA
  • Patent number: 6129776
    Abstract: A method for operating a shaft furnace which comprises charging the furnace with an iron source having a low degree of metallization and thus requiring reduction, an iron source having a high degree of metallization and thus requiring nothing but melting, and a solid fuel, and blowing an oxygen-containing gas at ordinary or higher temperature up to 600.degree. C. into the furnace through tuyeres to reduce and melt the iron sources. The optimal values of .eta.co (gas utilization factor) are determined from the average degree of metallization of the iron sources, and the shaft furnace is controlled so that the effluent gas from the furnace has the optimal .eta.co values. The control is accomplished by regulating the height of the charge, regulating the height of the coke bed, etc., using multistage tuyeres, and radially partitioning the charge. Thus, the iron sources can be efficiently reduced and melted at a low fuel ratio.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: October 10, 2000
    Assignee: Nippon Steel Corporation
    Inventors: Masaaki Naito, Norimitsu Konno, Yasuhiko Fujiwara, Kyoichi Araki, Teruhiko Kokubun, Tadashi Obara, Yasushi Obara