Patents by Inventor Yasutaka Nishi

Yasutaka Nishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11177399
    Abstract: The nanoparticle assembly includes nanoparticles having an average primary particle size of 60 nm or less, and the nanoparticle assembly has a diameter of more than 500 nm and 5 ?m or less.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: November 16, 2021
    Assignees: NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITY, NIKON CORPORATION
    Inventors: Takao Namihira, Yasutaka Nishi, Makoto Nakazumi, Koichiro Iwahori
  • Publication number: 20210291222
    Abstract: A mist generating apparatus sprays a surface of an object (P) to be treated with a carrier gas (CGS) of mist (Mst) of a solution containing fine particles or molecules of a material substance, so that a layer of the material substance is deposited on the surface of the object (P) to be treated. The mist generating device includes a mist generator (14) for atomizing the solution to feed the carrier gas (CGS) containing the mist (Mst), and an ultraviolet irradiator (20B) for applying ultraviolet rays having a wavelength of 400 nm or lower to the mist (Mst) floating in the carrier gas (CGS) in a flow path extending from the mist generator (14) until the carrier gas (CGS) is sprayed on the surface of the object (P) to be treated.
    Type: Application
    Filed: January 29, 2021
    Publication date: September 23, 2021
    Applicant: NIKON CORPORATION
    Inventor: Yasutaka NISHI
  • Publication number: 20210002495
    Abstract: Provided is ITO particles satisfying a relationship expressed in Expression (1) given below. 16×S/P2?0.330 . . . (1) (In the expression, S indicates a particle area in a TEM photographed image, and P indicates a perimeter of the particle.
    Type: Application
    Filed: July 14, 2020
    Publication date: January 7, 2021
    Applicants: TOHOKU UNIVERSITY, NIKON CORPORATION
    Inventors: Atsushi Muramatsu, Kiyoshi Kanie, Ryoko Suzuki, Yasutaka Nishi, Makoto Nakazumi
  • Publication number: 20200290082
    Abstract: A thin film forming apparatus including: a first chamber configured to generate a mist of a dispersion liquid, and including an outlet; a second chamber configured to receive the generated mist from the first chamber and collect particles of the generated mist having a size greater than a predetermined value, and including an inlet provided on a top of the second chamber and connected to the outlet of the first chamber, and an outlet provided on the top of the second chamber and configured to transfer, as homogenized mist, particles of the generated mist having a size less than or equal to the predetermined value due to the effect of gravity on the particles of the mist; and a third chamber configured to receive the homogenized mist from the second chamber, and including an inlet connected to the outlet of the second chamber.
    Type: Application
    Filed: June 2, 2020
    Publication date: September 17, 2020
    Applicant: NIKON CORPORATION
    Inventors: Yasutaka NISHI, Makoto NAKAZUMI
  • Patent number: 10749035
    Abstract: There is provided a semiconductor device including: a first electrode; a second electrode; and a semiconductor layer in contact with the first electrode and the second electrode, in which the semiconductor layer is a spinel-type oxide containing zinc (Zn) and gallium (Ga).
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: August 18, 2020
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi
  • Patent number: 10702887
    Abstract: A thin film forming apparatus including: a first chamber configured to generate a mist of a dispersion liquid, and including an outlet; a second chamber configured to receive the generated mist from the first chamber and collect particles of the generated mist having a size greater than a predetermined value, and including an inlet provided on a top of the second chamber and connected to the outlet of the first chamber, and an outlet provided on the top of the second chamber and configured to transfer, as homogenized mist, particles of the generated mist having a size less than or equal to the predetermined value due to the effect of gravity on the particles of the mist; and a third chamber configured to receive the homogenized mist from the second chamber, and including an inlet connected to the outlet of the second chamber.
    Type: Grant
    Filed: May 9, 2019
    Date of Patent: July 7, 2020
    Assignee: NIKON CORPORATION
    Inventors: Yasutaka Nishi, Makoto Nakazumi
  • Patent number: 10438814
    Abstract: An object is to provide a novel method in place of the above-described conventional technology, as a technique for obtaining a thin film with a wiring pattern applied. A method for manufacturing a wiring pattern according to the present invention is characterized in that the method includes: a laminate forming step of forming a laminate by bringing a first member that has a resist layer and a metal layer formed on the resist layer into contact with a second member that includes a substrate; a resist layer patterning step of subjecting the resist layer to patterning; and an etching step of selectively removing the metal layer.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: October 8, 2019
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi, Kei Nara
  • Publication number: 20190262858
    Abstract: A thin film forming apparatus including: a first chamber configured to generate a mist of a dispersion liquid, and including an outlet; a second chamber configured to receive the generated mist from the first chamber and collect particles of the generated mist having a size greater than a predetermined value, and including an inlet provided on a top of the second chamber and connected to the outlet of the first chamber, and an outlet provided on the top of the second chamber and configured to transfer, as homogenized mist, particles of the generated mist having a size less than or equal to the predetermined value due to the effect of gravity on the particles of the mist; and a third chamber configured to receive the homogenized mist from the second chamber, and including an inlet connected to the outlet of the second chamber.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Applicant: NIKON CORPORATION
    Inventors: Yasutaka NISHI, Makoto NAKAZUMI
  • Patent number: 10328453
    Abstract: In order to provide a novel method of obtaining a thin film to replace the related art, provided is a method of manufacturing a thin film, including: generating mist of a dispersion liquid containing fine particles; supplying the generated mist of the dispersion liquid onto a substrate; and drying the dispersion liquid supplied onto the substrate.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: June 25, 2019
    Assignee: NIKON CORPORATION
    Inventors: Yasutaka Nishi, Makoto Nakazumi
  • Publication number: 20190181268
    Abstract: There is provided a semiconductor device including: a first electrode; a second electrode; and a semiconductor layer in contact with the first electrode and the second electrode, in which the semiconductor layer is a spinel-type oxide containing zinc (Zn) and gallium (Ga).
    Type: Application
    Filed: January 18, 2019
    Publication date: June 13, 2019
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, Yasutaka NISHI
  • Publication number: 20190165190
    Abstract: The nanoparticle assembly includes nanoparticles having an average primary particle size of 60 nm or less, and the nanoparticle assembly has a diameter of more than 500 nm and 5 ?m or less.
    Type: Application
    Filed: January 31, 2019
    Publication date: May 30, 2019
    Applicants: National University Corporation Kumamoto University, NIKON CORPORATION
    Inventors: Takao NAMIHIRA, Yasutaka NISHI, Makoto NAKAZUMI, Koichiro IWAHORI
  • Publication number: 20180108539
    Abstract: An object is to provide a novel method in place of the above-described conventional technology, as a technique for obtaining a thin film with a wiring pattern applied. A method for manufacturing a wiring pattern according to the present invention is characterized in that the method includes: a laminate forming step of forming a laminate by bringing a first member that has a resist layer and a metal layer formed on the resist layer into contact with a second member that includes a substrate; a resist layer patterning step of subjecting the resist layer to patterning; and an etching step of selectively removing the metal layer.
    Type: Application
    Filed: December 15, 2017
    Publication date: April 19, 2018
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, Yasutaka NISHI, Kei NARA
  • Publication number: 20180066361
    Abstract: An object of the invention is to provide a thin film manufacturing device which further reduces a load on a substrate. Provided is a thin film manufacturing device for forming a thin film on a substrate by supplying a mist of a solution including a thin-film forming material to the substrate, characterized in that the device includes: a plasma generation unit including a first electrode and a second electrode disposed closer to one surface of the substrate, which generates plasma between the first electrode and the second electrode; and a mist supply unit which passes the mist between the first electrode and the second electrode and supplies the mist to the substrate.
    Type: Application
    Filed: August 18, 2017
    Publication date: March 8, 2018
    Applicants: NIKON CORPORATION, NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITY
    Inventors: Kei NARA, Makoto NAKAZUMI, Yasutaka NISHI, Yusui NAKAMURA, Takao NAMIHIRA, Norimitsu TAKAMURA
  • Patent number: 9799510
    Abstract: Provided is a technology for efficiently obtaining a metal oxide film having good adhesiveness. A method of producing a metal oxide film includes: an application step of applying a solution containing an organic metal complex onto a substrate; an ozone exposure step of exposing the resultant coating film to ozone; and a heating step of heating the coating film.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: October 24, 2017
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi
  • Publication number: 20170025644
    Abstract: A film forming apparatus, a substrate processing apparatus, and a device manufacturing method are provided, which improve the film thickness uniformity of a thin film that is formed on a substrate by spraying a thin film material. The film forming apparatus which forms a thin film on a substrate is provided with a nozzle that sprays a thin film material and an exhaust unit that discharges a gas. An exhaust port of the exhaust unit is arranged on a side that is opposite to the direction in which the gravity acts with respect to the substrate. The substrate processing apparatus performs a predetermined process on the substrate using the film forming apparatus. The device manufacturing method manufactures a device using the film forming apparatus.
    Type: Application
    Filed: October 3, 2016
    Publication date: January 26, 2017
    Applicant: NIKON CORPORATION
    Inventors: Yasutaka NISHI, Makoto NAKAZUMI
  • Patent number: 9536912
    Abstract: A method of transferring a thin film is a method of transferring a thin film formed on a first substrate to a second substrate, the method including: allowing the first substrate to come into contact with a liquid to swell the first substrate; allowing the second substrate and the thin film to come into contact with each other via the liquid; and drying the liquid to allow the thin film to adhere to the second substrate.
    Type: Grant
    Filed: July 14, 2015
    Date of Patent: January 3, 2017
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi
  • Publication number: 20160221031
    Abstract: In order to provide a novel method of obtaining a thin film to replace the related art, provided is a method of manufacturing a thin film, including: generating mist of a dispersion liquid containing fine particles; supplying the generated mist of the dispersion liquid onto a substrate; and drying the dispersion liquid supplied onto the substrate.
    Type: Application
    Filed: April 13, 2016
    Publication date: August 4, 2016
    Applicant: NIKON CORPORATION
    Inventors: Yasutaka NISHI, Makoto NAKAZUMI
  • Publication number: 20160163538
    Abstract: Provided is a technology for efficiently obtaining a metal oxide film having good adhesiveness. A method of producing a metal oxide film includes: an application step of applying a solution containing an organic metal complex onto a substrate; an ozone exposure step of exposing the resultant coating film to ozone; and a heating step of heating the coating film.
    Type: Application
    Filed: January 28, 2016
    Publication date: June 9, 2016
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, Yasutaka Nishi
  • Patent number: 9337320
    Abstract: A method of manufacturing a zinc oxide thin film includes: immersing a base having a conductive portion in at least part of the base, in a solution containing zinc ions, hydroxide ions, and zinc complex ions; and by applying an alternating current to the conductive portion, forming a zinc oxide thin film on a region of the base, the region including the conductive portion.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: May 10, 2016
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi
  • Publication number: 20150318306
    Abstract: A method of transferring a thin film is a method of transferring a thin film formed on a first substrate to a second substrate, the method including: allowing the first substrate to come into contact with a liquid to swell the first substrate; allowing the second substrate and the thin film to come into contact with each other via the liquid; and drying the liquid to allow the thin film to adhere to the second substrate.
    Type: Application
    Filed: July 14, 2015
    Publication date: November 5, 2015
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, Yasutaka NISHI