Abstract: A system is provided including a chamber having an internal environment different from an external environment. The chamber includes a transmission line, disposed through a partition wall of the chamber, for transmitting an electromagnetic wave therethrough. A plurality of generators, disposed outside the chamber, are included for generating electromagnetic waves for measurement, and a first multiplex/demultiplex unit is disposed outside the chamber for multiplexing a plurality of electromagnetic waves from the plurality of generators and sending a multiplexed electromagnetic wave to the transmission line and demultiplexing a multiplexed electromagnetic wave received from the transmission line. A second multiplex/demultiplex unit is disposed inside the chamber for multiplexing a plurality of electromagnetic waves and sending a multiplexed electromagnetic wave to the transmission line and demultiplexing a multiplexed electromagnetic wave received from the transmission line.

Abstract: A system including a chamber having an internal environment different from an external environment includes a transmission line, disposed through a partition wall of the chamber, for transmitting an electromagnetic wave therethrough; a plurality of generators, disposed outside the chamber, for generating electromagnetic waves for measurement, respectively; a first multiplex/demultiplex unit, disposed outside the chamber, for multiplexing a plurality of electromagnetic waves from the plurality of generators and sending a multiplexed electromagnetic wave to the transmission line and demultiplexing a multiplexed electromagnetic wave received from the transmission line; a second multiplex/demultiplex unit, disposed inside the chamber, for multiplexing a plurality of electromagnetic waves and sending a multiplexed electromagnetic wave to the transmission line and demultiplexing a multiplexed electromagnetic wave received from the transmission line; and a plurality of measurement units, disposed inside the chamber,

Abstract: An apparatus for fabricating a device includes a stage for holding a substrate to be treated, a hand for carrying the substrate to the stage, and a mark detecting system for detecting a mark formed on the substrate, before the substrate is transferred to the stage, in order to roughly position the substrate. The hand is provided with a reference mark which can be detected by the mark detecting system, and the mark detecting system detects a mark of the substrate and the reference mark of the hand. Also, the hand can carry the substrate to the stage after rotating the stage in a rotational direction in response to a value detected by the mark detecting system.

Abstract: A wafer prober for use in the examination of electric characteristics of semiconductor chips formed on a semiconductor wafer is disclosed. Foe examination, probing needles provided on a probe card are press-contacted to electrode pads of an individual chip. Prior to the examination, the probing needles are press-contacted to a non-chip region of the wafer, in which portion no chip is formed, so that traces of tips of the probing needles are formed on this non-chip region. The positional relation between the traces of the needle tips and the electrode pads is detected and, on the basis of the detection, the probing needles are relatively aligned with the electrode pads. Thus, the alignment of the probing needles and the electrode pads can be made fully automatically. In another aspect, by the formation of the traces of the needle tips, the measurement necessary for the alignment can be made easily and accurately, with the result that the alignment can be made efficiently.