Patents by Inventor Yeo-Wan Chiang

Yeo-Wan Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230243747
    Abstract: A fluorescence detection device of the present invention includes a substrate and a light source. A fluorescence enhancement layer of the substrate includes a photonic crystal which is formed from a block copolymer thus in the combination with metal particles or a metal film. An excitation light generated from the light source can illuminate a fluorescent material placed on the fluorescence enhancement layer to induce emission of a fluorescence from the fluorescent material. The fluorescence enhancement layer is provided to enhance luminous efficiency of the fluorescence, thus improving fluorescence detection sensitivity.
    Type: Application
    Filed: May 12, 2022
    Publication date: August 3, 2023
    Inventors: Yu-Ju Hung, Yeo-Wan Chiang, Chung-Ting Chang, Xiang-Fa Wu, Ci-Ren Chen
  • Publication number: 20200123334
    Abstract: A method, i.e., trapping of structural coloration (TOSC), for fabricating solid 3D network-structured photonic crystals featuring tunable visible structural colorations includes the steps: a PS-PVP copolymer is dissolved in a chloride-containing solvent and is cast as an initial film, the copolymer self-assembles into 3D periodic network-structured morphology; the copolymer in the initial film is swollen in a polar solvent to form a solvated film; the solvated film is dried to form a solid photonic crystal. During evaporation of the polar solvent, the PVP blocks of the copolymer become glassy and form a thin glassy layer on the surface of the solvated film such that the 3D network structures of the copolymer in solvated state can be preserved into the solid photonic crystal revealing the similar periodicity and dimension to that in solvated state, which is very distinct from the film having 1D lamellar structure.
    Type: Application
    Filed: November 26, 2018
    Publication date: April 23, 2020
    Inventors: Yeo-Wan Chiang, En-Li Lin, Wei-Lun Hsu
  • Patent number: 10626234
    Abstract: A method, i.e., trapping of structural coloration (TOSC), for fabricating solid 3D network-structured photonic crystals featuring tunable visible structural colorations includes the steps: a PS-PVP copolymer is dissolved in a chloride-containing solvent and is cast as an initial film, the copolymer self-assembles into 3D periodic network-structured morphology; the copolymer in the initial film is swollen in a polar solvent to form a solvated film; the solvated film is dried to form a solid photonic crystal. During evaporation of the polar solvent, the PVP blocks of the copolymer become glassy and form a thin glassy layer on the surface of the solvated film such that the 3D network structures of the copolymer in solvated state can be preserved into the solid photonic crystal revealing the similar periodicity and dimension to that in solvated state, which is very distinct from the film having 1D lamellar structure.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: April 21, 2020
    Assignee: NATIONAL SUN YAT-SEN UNIVERSITY
    Inventors: Yeo-Wan Chiang, En-Li Lin, Wei-Lun Hsu
  • Publication number: 20110003069
    Abstract: A fabrication method of a nanomaterial by using a polymeric nanoporous template is disclosed. First, a block copolymer bulk is made from a block copolymer polymerized from decomposable and undecomposable monomers. By removing the decomposable portion of the block copolymer bulk, the polymeric nanoporous template with a plurality of holes is obtained, and these holes have nanostructures with regular arrangement. By exploiting a nanoreactor concept, a sol-gel process or an electrochemical synthesis, for example, is then carried out within the template such that the holes are filled with various filler materials, such as ceramics, metals and polymers, so as to prepare a nanocomposite material having the nanostructure. After removing the polymeric nanoporous template, the nanomaterial with the nanostructure is manufactured.
    Type: Application
    Filed: December 29, 2009
    Publication date: January 6, 2011
    Applicant: NATIONAL TSING HUA UNIVERSITY
    Inventors: Rong-Ming Ho, Han-Yu Hsueh, Ming-Shiuan She, Wen-Hsien Tseng, Chun-Ku Chen, Yeo-Wan Chiang
  • Patent number: 7632544
    Abstract: A nanopatterned template for use in manufacturing nanoscale objects. The nanopatterned template contains a nanoporous thin film with a periodically ordered porous geomorphology which is made from a process comprising the steps of: (a) using a block copolymerization process to prepare a block copolymer comprising first and second polymer blocks, the first and second polymer blocks being incompatible with each other; (b) forming a thin film under conditions such that the first polymer blocks form into a periodically ordered topology; and (c) selectively degrading the first polymer blocks to cause the thin film to become a nanoporous material with a periodically ordered porous geomorphology. In a preferred embodiment, the block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, the first polymer is poly(L-lactide), and the second polymer is polystyrene.
    Type: Grant
    Filed: May 18, 2004
    Date of Patent: December 15, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Ming Ho, Hui-Wen Fan, Wen-Hsien Tseng, Yeo-Wan Chiang, Chu-Chien Lin, Bao-Tsan Ko, Bor-Hunn Huang, Hsi-Hsin Shih, Joung-Yei Chen
  • Patent number: 7135523
    Abstract: A method for making a series of nanoscale microstructures, including helical microstructures and cylindrical microstrustures. This method includes the steps of: (1) forming a chiral block copolymer containing a plurality of chiral first polymer blocks and a second polymer blocks wherein the chiral first polymer blocks have a volume fraction ranging from 20 to 49%; (2) causing a phase separation in the chiral block copolymer. In a preferred embodiment, the chiral block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, and the copolymerization process is a living copolymerization process which includes the following steps: (a) mixing styrene with BPO and 4-OH-TEMPO to form 4-hydroxy-TEMPO-terminated polystyrene; and (2) mixing the 4-hydroxy-TEMPO-terminated polystyrene with [?3-EDBP)Li2]2[(?3-nBu)Li(0.5Et2O)]2 and L-lactide in an organic solvent preferably CH2Cl2 to form the poly(styrene)-poly(L-lactide) chiral block copolymer.
    Type: Grant
    Filed: March 12, 2004
    Date of Patent: November 14, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Ming Ho, Yeo-Wan Chiang, Chu-Chieh Lin, Bao-Tsan Ko, Yi-Chun Chen, Tsai-Ming Chung, Hsi-Hsin Shih, Jassy S. J. Wang
  • Publication number: 20060211816
    Abstract: A method for making a series of nanoscale microstructures, including helical microstructures and cylindrical microstructures. This method includes the steps of: (1) forming a chiral block copolymer containing a plurality of chiral first polymer blocks and a second polymer blocks wherein the chiral first polymer blocks have a volume fraction ranging from 20 to 49%; (2) causing a phase separation in the chiral block copolymer. In a preferred embodiment, the chiral block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, and the copolymerization process is a living copolymerization process which includes the following steps: (a) mixing styrene with BPO and 4-OH-TEMPO to form 4-hydroxy-TEMPO-terminated polystyrene; and (2) mixing the 4-hydroxy-TEMPO-terminated polystyrene with [(?3-EDBP)Li2]2[(?3-nBu)Li(0.5Et2O)]2 and L-lactide in an organic solvent preferably CH2Cl2 to form the poly(styrene)-poly(L-lactide) chiral block copolymer.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 21, 2006
    Inventors: Rong-Ming Ho, Yeo-Wan Chiang, Chu-Chieh Lin, Bao-Tsan Ko, Yi-Chun Chen, Tsai-Ming Chung, Hsi-Hsin Shih, Jassy Wang
  • Publication number: 20040265548
    Abstract: A nanopatterned template for use in manufacturing nanoscale objects. The nanopatterned template contains a nanoporous thin film with a periodically ordered porous geomorphology which is made from a process comprising the steps of: (a) using a block copolymerization process to prepare a block copolymer comprising first and second polymer blocks, the first and second polymer blocks being incompatible with each other; (b) forming a thin film under conditions such that the first polymer blocks form into a periodically ordered topology; and (c) selectively degrading the first polymer blocks to cause the thin film to become a nanoporous material with a periodically ordered porous geomorphology. In a preferred embodiment, the block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, the first polymer is poly(L-lactide), and the second polymer is polystyrene.
    Type: Application
    Filed: May 18, 2004
    Publication date: December 30, 2004
    Inventors: Rong-Ming Ho, Hui-Wen Fan, Wen-Hsien Tseng, Yeo-Wan Chiang, Chu-Chien Lin, Bao-Tsan Ko, Bor-Hunn Huang, Hsi-Hsin Shih, Chen Joung-Yei