Patents by Inventor Yeo Jin Lee

Yeo Jin Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955281
    Abstract: An electronic component includes: a multilayer capacitor including a capacitor body and a pair of external electrodes, respectively disposed on external surfaces of the capacitor body in a first direction; and an interposer disposed below the multilayer capacitor and including an interposer body, a pair of via holes penetrating through the interposer body, and a pair of via electrodes, respectively disposed in the via holes to be connected to the pair of external electrodes, respectively. 0.24T?t?0.3T, where “T” is a maximum height of the multilayer capacitor and “t” is a maximum height of the interposer.
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: April 9, 2024
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Jae Hoon Kim, Chang Hee Lee, Jea Hoon Lee, Hye Jin Kim, Yeo Ju Cho
  • Patent number: 10938026
    Abstract: The present invention provides a silicon nanowire structure embedded in nickel silicide nanowires for lithium-based battery anodes and anodes including the same. In particular, a Si nanowire structure embedded in NiSix nanowires according to the present invention may provide a solution to a problem, such as disconnection of Si nanowires from a current collector shown when the Si nanowires are expanded by alloying with Li or contracted during the use of a battery, and the like, by flexibly embedding the Si nanowires in the NiSix nanowires.
    Type: Grant
    Filed: May 1, 2019
    Date of Patent: March 2, 2021
    Assignees: Hyundai Motor Company, Research & Business Foundation Sungkyunkwan University, Kia Motors Corporation
    Inventors: Kyo Min Shin, Sa Heum Kim, Hong Seok Min, Mihai Robert Zamfir, Je Mee Joe, Didier Pribat, Yeo Jin Lee
  • Publication number: 20190273253
    Abstract: The present invention provides a silicon nanowire structure embedded in nickel silicide nanowires for lithium-based battery anodes and anodes including the same. In particular, a Si nanowire structure embedded in NiSix nanowires according to the present invention may provide a solution to a problem, such as disconnection of Si nanowires from a current collector shown when the Si nanowires are expanded by alloying with Li or contracted during the use of a battery, and the like, by flexibly embedding the Si nanowires in the NiSix nanowires.
    Type: Application
    Filed: May 1, 2019
    Publication date: September 5, 2019
    Inventors: Kyo Min Shin, Sa Heum Kim, Hong Seok Min, Mihai Robert Zamfir, Je Mee Joe, Didier Pribat, Yeo Jin Lee
  • Patent number: 10319995
    Abstract: The present invention provides a silicon nanowire structure embedded in nickel silicide nanowires for lithium-based battery anodes and anodes including the same. In particular, a Si nanowire structure embedded in NiSix nanowires according to the present invention may provide a solution to a problem, such as disconnection of Si nanowires from a current collector shown when the Si nanowires are expanded by alloying with Li or contracted during the use of a battery, and the like, by flexibly embedding the Si nanowires in the NiSix nanowires.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: June 11, 2019
    Assignees: Hyundai Motor Company, Research & Business Foundation Sungkyunkwan University
    Inventors: Kyo Min Shin, Sa Heum Kim, Hong Seok Min, Mihai Robert Zamfir, Je Mee Joe, Didier Pribat, Yeo Jin Lee
  • Patent number: 9379019
    Abstract: In a method, an isolation layer pattern is formed on a substrate to define first and second active fins. An ARC layer is formed on the isolation layer pattern to at least partially cover sidewalls of the first and second active fins. A level of a top surface of the ARC layer is equal to or less than, and equal to or greater than half of, those of the first and second active fins. A photoresist layer is formed on the first and second active fins and the ARC layer. A portion of the photoresist layer is removed to form a photoresist pattern covering the first active fin and exposing the second active fin. A portion of the ARC layer under the removed portion of the photoresist layer is removed to form an ARC layer pattern. Impurities are implanted into the exposed second active fin to form an impurity region.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: June 28, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Bum-Joon Youn, Tae-Sun Kim, Yeo-Jin Lee, Yu-Ra Kim, Jin-Man Kim, Jae-Kyung Seo, Ki-Man Lee
  • Publication number: 20160099177
    Abstract: In a method, an isolation layer pattern is formed on a substrate to define first and second active fins. An ARC layer is formed on the isolation layer pattern to at least partially cover sidewalls of the first and second active fins. A level of a top surface of the ARC layer is equal to or less than, and equal to or greater than half of, those of the first and second active fins. A photoresist layer is formed on the first and second active fins and the ARC layer. A portion of the photoresist layer is removed to form a photoresist pattern covering the first active fin and exposing the second active fin. A portion of the ARC layer under the removed portion of the photoresist layer is removed to form an ARC layer pattern. Impurities are implanted into the exposed second active fin to form an impurity region.
    Type: Application
    Filed: May 1, 2015
    Publication date: April 7, 2016
    Inventors: Bum-Joon YOUN, Tae-Sun KIM, Yeo-Jin LEE, Yu-Ra KIM, Jin-Man KIM, Jae-Kyung SEO, Ki-Man LEE
  • Publication number: 20150200391
    Abstract: The present invention provides a silicon nanowire structure embedded in nickel silicide nanowires for lithium-based battery anodes and anodes including the same. In particular, a Si nanowire structure embedded in NiSix nanowires according to the present invention may provide a solution to a problem, such as disconnection of Si nanowires from a current collector shown when the Si nanowires are expanded by alloying with Li or contracted during the use of a battery, and the like, by flexibly embedding the Si nanowires in the NiSix nanowires.
    Type: Application
    Filed: November 17, 2014
    Publication date: July 16, 2015
    Inventors: Kyo Min Shin, Sa Heum Kim, Hong Seok Min, Mihai Robert Zamfir, Je Mee Joe, Didier Pribat, Yeo Jin Lee