Patents by Inventor Yinghai Ma

Yinghai Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210217780
    Abstract: An array substrate and a display screen, where the array substrate includes a display area and a wiring area located on one side of the display area, the wiring area includes an upper wiring layer and a lower wiring layer laminated with the upper wiring layer, the upper wiring layer and the lower wiring layer are separated by an insulating layer group, the insulating layer group includes an insulating sub-layer and an insulating organic compensator formed on the insulating sub-layer, the insulating organic compensator is configured to compensate for at least part of a recess on an upper surface of the insulating sub-layer.
    Type: Application
    Filed: March 31, 2021
    Publication date: July 15, 2021
    Applicant: Yungu (Gu'an) Technology Co., Ltd.
    Inventors: Yang LI, Yinghai MA, Feng YU, Xiaojia LIU, Jiuzhan ZHANG
  • Patent number: 10622582
    Abstract: Disclosed is a substrate for a display panel, a manufacturing method thereof, and a display panel and encapsulation method. The substrate includes a carrier substrate and at least one auxiliary encapsulation component disposed on the carrier substrate. A protrusion is formed at a side of the auxiliary encapsulation component away from the carrier substrate and protrudes in a direction parallel to the surface of the carrier substrate.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: April 14, 2020
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Yinghai Ma, Yueping Zuo
  • Patent number: 10468266
    Abstract: A dry etching method includes performing at least two etching steps, and further includes injecting protective gas into an etch chamber for processing between any two successive etching steps, wherein the protective gas generates plasma to neutralize electrons accumulated on a side wall of an etching trench. According to the present disclosure, hydrogen plasma is added in an etching process to remove the electrons accumulated on the side wall of the etching trench so as to reduce the microetching effect in multiple etching. In this way, process stability and reliability of a display substrate are improved.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: November 5, 2019
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Yinghai Ma, Liangjian Li, Yueping Zuo
  • Publication number: 20190058152
    Abstract: The present disclosure provides a substrate for a display panel, manufacturing method thereof, a display panel and encapsulation method. The substrate includes a carrier substrate and at least one auxiliary encapsulation component disposed on the carrier substrate. A protrusion is formed at aside of the auxiliary encapsulation component away from the carrier substrate and protrudes in the direction parallel to the surface of the carrier substrate. The substrate for a display panel, manufacturing method thereof, the display panel and the encapsulation method provided by the present disclosure improve the adhesion of the encapsulation, thus prolonging the lifetime of product.
    Type: Application
    Filed: September 22, 2017
    Publication date: February 21, 2019
    Inventors: Yinghai MA, Yueping ZUO
  • Publication number: 20180233376
    Abstract: A dry etching method includes performing at least two etching steps, and further includes injecting protective gas into an etch chamber for processing between any two successive etching steps, wherein the protective gas generates plasma to neutralize electrons accumulated on a side wall of an etching trench. According to the present disclosure, hydrogen plasma is added in an etching process to remove the electrons accumulated on the side wall of the etching trench so as to reduce the microetching effect in multiple etching. In this way, process stability and reliability of a display substrate are improved.
    Type: Application
    Filed: April 7, 2016
    Publication date: August 16, 2018
    Applicant: Boe Technology Group Co., Ltd.
    Inventors: Yinghai MA, Liangjian LI, Yueping ZUO
  • Patent number: 9997547
    Abstract: The present application discloses a method of fabricating a display apparatus, comprising providing a carrier substrate comprising a base substrate and an adhesive layer over the base substrate, wherein the base substrate comprises a plurality of fluid passages between the base substrate and the adhesive layer, and a plurality of fluid inlets connected with the plurality of fluid passages; forming a product substrate on a side of the adhesive layer distal to the base substrate; dispensing a detaching agent through the plurality of fluid inlets to the plurality of fluid passages, and contacting the detaching agent with the adhesive layer through the plurality of fluid passages; and detaching the product substrate from the carrier substrate.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: June 12, 2018
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Yueping Zuo, Chien Hung Liu, Liangjian Li, Yinghai Ma
  • Publication number: 20180025915
    Abstract: A dry etching method includes performing at least two etching steps, and further includes injecting protective gas into an etch chamber for processing between any two successive etching steps, wherein the protective gas generates plasma to neutralize electrons accumulated on a side wall of an etching trench. According to the present disclosure, hydrogen plasma is added in an etching process to remove the electrons accumulated on the side wall of the etching trench so as to reduce the microetching effect in multiple etching. In this way, process stability and reliability of a display substrate are improved.
    Type: Application
    Filed: April 7, 2016
    Publication date: January 25, 2018
    Applicant: Boe Technology Group Co., Ltd.
    Inventors: Yinghai MA, Liangjian LI, Yueping ZUO
  • Patent number: 9876038
    Abstract: A manufacturing method of an array substrate comprises: forming a source and a drain of a thin film transistor on a base; forming a first insulation layer; forming an active layer of the thin film transistor; forming a second insulation layer; forming a first via hole and a second via hole in the first insulation layer and the second insulation layer above the source and the drain, by etching, and forming a third via hole and a fourth via hole in the second insulation layer above the active layer, by etching; forming a first connection line connecting the source with the active layer through the first via hole and the third via hole, a second connection line connecting the drain with the active layer and the pixel electrode through the second via hole and the fourth via hole and a pixel electrode.
    Type: Grant
    Filed: August 17, 2016
    Date of Patent: January 23, 2018
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Yinghai Ma, Liangjian Li, Yueping Zuo
  • Patent number: 9711602
    Abstract: The present application discloses a thin film transistor comprising active layer on a base substrate; an insulating layer over the active layer, the insulating layer comprising a source via and a drain via, each of which extending through the insulating layer; a source electrode within the source via in contact with the active layer; and a drain electrode within the drain via in contact with the active layer.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: July 18, 2017
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Liangjian Li, Yueping Zuo, Yinghai Ma, Xiaowei Xu
  • Publication number: 20170194363
    Abstract: A manufacturing method of an array substrate comprises: forming a source and a drain of a thin film transistor on a base; forming a first insulation layer; forming an active layer of the thin film transistor; forming a second insulation layer; forming a first via hole and a second via hole in the first insulation layer and the second insulation layer above the source and the drain, by etching, and forming a third via hole and a fourth via hole in the second insulation layer above the active layer, by etching; forming a first connection line connecting the source with the active layer through the first via hole and the third via hole, a second connection line connecting the drain with the active layer and the pixel electrode through the second via hole and the fourth via hole and a pixel electrode.
    Type: Application
    Filed: August 17, 2016
    Publication date: July 6, 2017
    Inventors: Yinghai MA, Liangjian LI, Yueping ZUO
  • Publication number: 20170148884
    Abstract: The present application discloses a thin film transistor comprising active layer on a base substrate; an insulating layer over fee active layer, the insulating layer comprising a source via and a drain via, each of which extending through the insulating layer; a source electrode within the source via in contact with the active layer; and a drain electrode within the drain via in contact with the active layer.
    Type: Application
    Filed: February 22, 2016
    Publication date: May 25, 2017
    Applicant: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Liangjian Li, Yueping Zuo, Yinghai Ma, Xiaowei Xu
  • Publication number: 20170141135
    Abstract: The present application discloses a method of fabricating a display apparatus, comprising providing a carrier substrate comprising a base substrate and an adhesive layer over the base substrate, wherein the base substrate comprises a plurality of fluid passages between the base substrate and the adhesive layer, and a plurality of fluid inlets connected with the plurality of fluid passages; forming a product substrate on a side of the adhesive layer distal to the base substrate; dispensing a detaching agent through the plurality of fluid inlets to the plurality of fluid passages, and contacting the detaching agent with the adhesive layer through the plurality of fluid passages; and detaching the product substrate from the carrier substrate.
    Type: Application
    Filed: February 22, 2016
    Publication date: May 18, 2017
    Applicant: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Yueping Zuo, Chien Hung Liu, Liangjian Li, Yinghai Ma