Abstract: Provided is a liquid sample analysis chip reading system. The reading system includes an analysis chip, a light emitting part, a plurality of light wave-guides, and a light receiving part. The analysis chip includes a plurality of detecting parts. The light emitting part includes three light sources emitting light having wavelengths (or colors) different from each other. The plurality of light wave-guides irradiate the light emitted from the light emitting part onto the plurality of corresponding detecting parts, respectively. The light receiving part includes a plurality of light receiving devices for receiving the light having a specific color reflected from each of the plurality of corresponding detecting parts of the analysis chip. The three light sources are discontinuously controlled to emit light onto the plurality of light wave-guides.

Abstract: Provided is a microfluidic device. The microfluidic device includes a sample storage chamber storing sample fluid therein, a detection chamber connected to the sample storage chamber and detecting a specific material of the sample fluid, a cleaning liquid storage chamber connected to the detection chamber and storing cleaning liquid therein, a plurality of fluid passages interconnecting the chambers, and a micropump transferring the cleaning liquid. The microfluidic device precisely inspects a sample fluid although a small amount of the sample fluid flows.

Abstract: Provided are coated nanoparticles and a method for coating nanoparticles. The coated nanoparticles are coated with proteins to prevent aggregation of the coated nanoparticles. The method for coating nanoparticles may include mixing an excessive amount of proteins with the nanoparticles. Alternatively, the method for coating nanoparticles may include coating with first proteins, treating with ultrasonic waves, and coating with second proteins.

Abstract: Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT.

Abstract: Provided is a disposable multi-layered filtration device for the separation of blood plasma which can be applied to a biochip and appropriate for disposal uses. The filtration device for the separation of blood plasma includes: an upper substrate including a blood inlet; an intermediate substrate including a filtering unit for extracting blood plasma from blood flowing through the blood inlet; and a lower substrate including an air outlet, wherein the upper substrate, the intermediate substrate, and the lower substrate are stacked and adhered.

Abstract: A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second surface facing each other. The image data may include a first side and a second side corresponding to the first surface and the second surface of the measurement pattern, respectively. The image data may be edited to increase an overlap length of the first and second sides. A measurement window crossing the first and second sides in the edited image data is set. A distance between the first and second sides in the measurement window is measured.

Abstract: Disclosed are a novel virus suppressing factor (VSF) protein having antiviral activity against a variety of viruses and a hybridoma secreting such a VSF protein. In addition, the present invention discloses a pharmaceutical composition comprising the VSF protein for prevention or treatment of viral infections in humans and animals, and a method of preventing or treating viral infections using such a pharmaceutical composition. The VSF protein has strong antiviral activity against a variety of viruses.

Abstract: A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.

Abstract: A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second surface facing each other. The image data may include a first side and a second side corresponding to the first surface and the second surface of the measurement pattern, respectively. The image data may be edited to increase an overlap length of the first and second sides. A measurement window crossing the first and second sides in the edited image data is set. A distance between the first and second sides in the measurement window is measured.

Abstract: A dry etching apparatus may include a dry etching chamber and a door chamber. The apparatus may further include a load lock chamber configured to connect the dry etching chamber and the door chamber in a vacuum state. A gas injector and an ionizer may be configured inside the door chamber or the load lock chamber. A gas supplying source may be disposed out of the chambers to supply a determined gas to the gas injector and the ionizer. A method of fabricating a phase shift mask using the dry etching apparatus may include removing particles attached to the surface of a mask in the door chamber or the load lock chamber during an etch process by the gas injector and the ionizer configured inside the door chamber or the load lock chamber of the etching apparatus.

Abstract: A method of making a photomask ensures that the mask pattern is precisely formed. A mask blank is provided in which an opaque film and a mask film are disposed on a transparent substrate. The mask film and the opaque film are successively etched to form an opaque pattern and a mask pattern. Next, a dimension of the opaque pattern is measured. If the measured dimension of the opaque pattern is smaller than a reference value, the opaque pattern is etched using the mask pattern as an etching mask to attain the desired dimension of the opaque pattern. The mask pattern is then removed.

Abstract: Disclosed are a novel virus suppressing factor (VSF) protein having antiviral activity against a variety of viruses and a hybridoma secreting such a VSF protein. In addition, the present invention discloses a pharmaceutical composition comprising the VSF protein for prevention or treatment of viral infections in humans and animals, and a method of preventing or treating viral infections using such a pharmaceutical composition. The VSF protein has strong antiviral activity against a variety of viruses.

Abstract: A photomask includes a mask substrate formed of a transparent nonconductor, a plurality of opaque conductive patterns formed on the mask substrate and separated from one another, and one or more conductive lines for connecting one of the conductive patterns with at least one adjacent conductive patterns. Electric charges, which accumulate in conductive patterns when using a focused ion beam (FIB) system, are dispersed through the conductive lines. The contrast of images of photomask patterns is increased by dispersion of electric charges, thereby improving the images of photomask patterns.

Abstract: A method of making a photomask ensures that the mask pattern is precisely formed. A mask blank is provided in which an opaque film and a mask film are disposed on a transparent substrate. The mask film and the opaque film are successively etched to form an opaque pattern and a mask pattern. Next, a dimension of the opaque pattern is measured. If the measured dimension of the opaque pattern is smaller than a reference value, the opaque pattern is etched using the mask pattern as an etching mask to attain the desired dimension of the opaque pattern. The mask pattern is then removed.

Abstract: A mask pattern of a phase shift mask for use in photolithography is repaired. First, an imaginary correction pattern is devised according to the pattern of a mask layer that is disposed on the surface of a transparent plate constituting the body of the mask. The surface of the mask body is etched to a predetermined depth according to the imaginary correction pattern, at a location adjacent the mask layer, to thereby form a recess in the mask body. A phase shifter having a predetermined thickness is then formed by depositing phase shifting material in the recess.

Abstract: A photomask includes a mask substrate formed of a transparent nonconductor, a plurality of opaque conductive patterns formed on the mask substrate and separated from one another, and one or more conductive lines for connecting one of the conductive patterns with at least one adjacent conductive patterns. Electric charges, which accumulate in conductive patterns when using a focused ion beam (FIB) system, are dispersed through the conductive lines. The contrast of images of photomask patterns is increased by dispersion of electric charges, thereby improving the images of photomask patterns.

Abstract: A three-step method is used to repair an opaque defect in a photomask having a transparent substrate, and a light transmission portion disposed on the substrate and defining an opening the image of which is to be transferred to a layer on a semiconductor substrate. First, the thickness of the opaque defect is reduced by etching away only some of the defect. Second, a correction film is selectively formed over the entire surface of the substrate of the photomask in the opening defined by the light transmission portion with the exception of the region occupied by the pre-etched defect. Next, the correction film and the pre-etched defect are simultaneously etched away.

Abstract: A three-step method is used to repair an opaque defect in a photomask having a transparent substrate, and a light transmission portion disposed on the substrate and defining an opening the image of which is to be transferred to a layer on a semiconductor substrate. First, the thickness of the opaque defect is reduced by etching away only some of the defect. Second, a correction film is selectively formed over the entire surface of the substrate of the photomask in the opening defined by the light transmission portion with the exception of the region occupied by the pre-etched defect. Next, the correction film and the pre-etched defect are simultaneously etched away.