Abstract: In general, in a multipole lens of an aberration corrector of a charged particle beam device, there is only one condition that can be set where both a spherical aberration correction condition and magnetic saturation are satisfied. Therefore, a plurality of acceleration voltages cannot be handled. Consequently, the present invention provides a spherical aberration corrector that satisfies the magnetic saturation state for a plurality of aberration correction conditions by selectively magnetizing a plurality of pole groups of the multipole lens according to the changes in the objective lens magnetization current.

Abstract: In general, in a multipole lens of an aberration corrector of a charged particle beam device, there is only one condition that can be set where both a spherical aberration correction condition and magnetic saturation are satisfied. Therefore, a plurality of acceleration voltages cannot be handled. Consequently, the present invention provides a spherical aberration corrector that satisfies the magnetic saturation state for a plurality of aberration correction conditions by selectively magnetizing a plurality of pole groups of the multipole lens according to the changes in the objective lens magnetization current.

Abstract: This charged particle beam device comprises: an electron beam source (1); a charged particle optical system that includes an object lens (9) and that irradiates a sample (10) with electrons emitted from the electron beam source (1) as an electron beam (2); an aberration corrector (6) that corrects aberrations in the charged particle optical system; and a control unit (24) that controls the components of the charged particle optical system and the aberration corrector (6). The charged particle beam device further comprises an automatic aberration-correcting device (17) that autonomously acquires, through leaning, optimum adjustment procedures in order to reduce the time required for correcting parasitic aberrations that arise in the aberration corrector (6).

Abstract: This charged particle beam device comprises: an electron beam source (1); a charged particle optical system that includes an object lens (9) and that irradiates a sample (10) with electrons emitted from the electron beam source (1) as an electron beam (2); an aberration corrector (6) that corrects aberrations in the charged particle optical system; and a control unit (24) that controls the components of the charged particle optical system and the aberration corrector (6). The charged particle beam device further comprises an automatic aberration-correcting device (17) that autonomously acquires, through leaning, optimum adjustment procedures in order to reduce the time required for correcting parasitic aberrations that arise in the aberration corrector (6).

Abstract: An aberration correction device includes, between a TEM objective lens and an STEM objective lens, a transfer lens group for transferring a coma-free surface of the TEM objective lens to a multipolar lens, a transfer lens group for transferring the coma-free surface of the TEM objective lens to a multipolar lens, and a transfer lens for correcting fifth-order spherical aberration of the STEM objective lens.

Abstract: To provide an aberration correction device and a charged particle beam device employing same that are jointly usable with a tunneling electron microscope (TEM) and a scanning tunneling electron microscope (SEM), an aberration correction device (1) comprises, between a TEM objective lens (6a) and an STEM objective lens (6b): a transfer lens group (4, 5), for transferring a coma-free surface (11) of the TEM objective lens (6a) to a multipolar lens (3); a transfer lens group (7, 8) for transferring the coma-free surface of the TEM objective lens to a multipolar lens (2); and a transfer lens (13) for correcting fifth-order spherical aberration of the STEM objective lens (6b).

Abstract: To provide an aberration correction configuration that can realize both an aberration correction function for a long focus and an aberration correction function for a short focus. While having a conventional aberration correction apparatus configuration that has two rotationally symmetric lenses arranged between two multipole lenses, three rotationally symmetric lenses are disposed between an objective lens and a multipole lens instead of the conventional arrangement in which two rotationally symmetric lenses are disposed therebetween. When using the objective lens with a long focal length, aberrations are corrected using two rotationally symmetric lenses among three rotationally symmetric lenses disposed between the objective lens and the multipole lens. When using the objective lens with a short focal length, e.g.

Abstract: To provide an aberration corrector that guarantees freedom in designing a coma-free plane transfer portion even when the mechanical configuration of the aberration corrector is already decided, and has a flexible adjustment margin regarding the corrector exterior. The aberration corrector causes an electron beam trajectory emanating from a specimen plane (physical surface of objective lens) to be incident in parallel with a multipole lens (HEX1 18), and causes an electron beam trajectory emanating from an objective-lens coma-free plane or a minimum plane of a fifth-order aberration (objective lens center) to form an image on a center plane of a multipole lens of the 4f system. Thus, antisymmetric transfer is performed between two multipole lenses (HEX1 18, HEX2 19) to correct a spherical aberration in the 4f system, and a coma-free plane or a minimum plane of a fifth-order aberration is transferred to suppress occurrence of coma aberrations or fifth-order aberrations. (See FIG.

Abstract: To provide an aberration correction configuration that can realize both an aberration correction function for a long focus and an aberration correction function for a short focus. While having a conventional aberration correction apparatus configuration that has two rotationally symmetric lenses arranged between two multiple lenses, three rotationally symmetric lenses are disposed between an objective lens and a multiple lens instead of the conventional arrangement in which two rotationally symmetric lenses are disposed therebetween. When using the objective lens with a long focal length, aberrations are corrected using two rotationally symmetric lenses among three rotationally symmetric lenses disposed between the objective lens and the multiple lens. When using the objective lens with a short focal length, e.g.

Abstract: In this information transmission system, a PCM encoder is provided for time-division multiplexing multichannel audio signals and a digital character information signal to generate a time-division multiplexed, or TDM, information signal. The TDM information signal is angle-modulated by the modulator to generate an angle-modulated information signal. This signal is supplied to a frequency-division multiplexer, which multiplexes the angle-modulated information signal and an image signal so as to generate a frequency-division multiplexed, or FDM, information signal which is adapted to be supplied to a certain subscriber.