Abstract: To provide electrode catalyst which has the catalyst activity and durability at a practically durable level and contributes to lowering of the cost in comparison with the conventional Pt/C catalyst. The electrode catalyst has a support and catalyst particles supported on the support. The catalyst particle has the core part, the first shell part formed on the core part, and the second shell part formed on the first shell part. The core part contains W compound including at least W carbide, the first shell part contains simple Pd, and the second shell part contains simple Pt.

Abstract: To provide electrode catalyst (core-shell catalyst) having an excellent catalyst activity which contributes to lower the cost of the PEFC. The electrode catalyst has catalyst particles supported an a support. The catalyst particle has a core part containing simple Pd and a shell part containing simple Pt. A percentage RC (atom %) of the carbon of the support and a percentage RPd (atom %) of the simple Pd in an analytical region near a surface measured by X-ray photoelectron spectroscopy (XPS) satisfy the conditions of the following equation (1): 2.15?[100×RPd/(RPd+RC)].

Abstract: Provided is an electrode catalyst in which the contents of chlorine (Cl) species and bromine (Br) species are reduced to a predetermined level or lower, capable of exhibiting sufficient catalyst performance. The electrode catalyst has a core-shell structure including a support, a core part formed on the support and a shell part formed to cover at least a part of the surface of the core part. A concentration of bromine (Br) species of the electrode catalyst as measured by X-ray fluorescence (XRF) spectroscopy is 400 ppm or less, and a concentration of chlorine (Cl) species of the electrode catalyst as measured by X-ray fluorescence (XRF) spectroscopy is 900 ppm or less.

Abstract: A semiconductor device comprises a semiconductor element 12 including electrodes 12G, 12S on a front surface and conductive posts 14, 14?, 14? including one end which is soldered to electrodes 12G, 12S of the semiconductor element 12. The conductive posts 14, 14?, 14? includes a solder absorbing portion 14b having a larger surface area per unit length than that of a bottom portion at a position apart from the one end by a length equal to a height of a bottom portion 14a in an extending direction. When the conductive post is joined by a solder, the solder melted and flowing across a surface of the conductive post is absorbed in a large surface of the solder absorbing portion, thereby preventing the solder from reaching a wiring substrate.

Abstract: Provided is an electrode catalyst that can exhibit sufficient performance, is suitable for mass production, and is suitable for reducing production costs, even when containing a relatively high concentration of chlorine. The electrode catalyst has a core-shell structure including a support; a core part that is formed on the support; and a shell part that is formed so as to cover at least one portion of the surface of the core part. A concentration of bromine (Br) species of the electrode catalyst as measured by X-ray fluorescence (XRF) spectroscopy is 500 ppm or less, and a concentration of chlorine (Cl) species of the electrode catalyst as measured by X-ray fluorescence (XRF) spectroscopy is 8,500 ppm or less.

Abstract: Provided is an electrode catalyst in which the contents of chlorine (Cl) species and bromine (Br) species are reduced to a predetermined level or lower, capable of exhibiting sufficient catalyst performance. The electrode catalyst has a core-shell structure including a support, a core part formed on the support and a shell part formed to cover at least a part of the surface of the core part. A concentration of bromine (Br) species of the electrode catalyst as measured by X-ray fluorescence (XRF) spectroscopy is 400 ppm or less, and a concentration of chlorine (Cl) species of the electrode catalyst as measured by X-ray fluorescence (XRF) spectroscopy is 900 ppm or less.

Abstract: A semiconductor device includes an insulating substrate including an insulating plate and a circuit plate disposed on a main surface of the insulating plate; a semiconductor chip having a front surface provided with an electrode and a rear surface fixed to the circuit plate; a printed circuit board facing the insulating substrate and including a metal layer; a conductive post having one end electrically and mechanically connected to the electrode and another end electrically and mechanically connected to the metal layer; a passive element fixed to the printed circuit board; and a plurality of positioning posts fixed to the printed circuit board to position the passive element.

Abstract: A semiconductor device includes an insulating substrate having a circuit plate on a principal surface thereof; a semiconductor element fixed to the circuit plate; an external terminal having one end fixed to the circuit plate; and a printed circuit board facing the principal surface of the insulating substrate, and having a through-hole for passing through the external terminal. A rigidity of a peripheral region of the through-hole is lower than a rigidity of other regions.

Abstract: PROBLEM: To provide a finishing method for a painted surface that can reduce the number of processing steps, and that can shorten the finish polishing time and reduce the polishing area. RESOLUTION MEANS: The painted surface finishing method of an embodiment of the present disclosure includes a step of removing irregularities in a painted surface using a polishing material including a polishing layer with a structural surface where a plurality of three-dimensional elements are arranged, and providing a surface suitable for finish polishing; and a step of finish polishing the surface; wherein the polishing layer contains abrasive diamond particles with an average particle diameter of 0.5 to 5 ?m, and a binder containing an epoxy resin.

Abstract: Problem: To provide an abrasive pad and abrading method using same that are capable of extending the life of the abrasive pad when applied to abrading the surface of glass substrates, and that can ensure abrading capability that is appropriate for abrading the surface of glass substrates.

Abstract: A semiconductor device includes a plurality of semiconductor units each including a laminated substrate formed by laminating an insulating board and a circuit board and a semiconductor element joined to the circuit board using a joining material which irreversibly makes a phase transition into a solid-phase state. In addition, the semiconductor device may include a base plate to which each of the plurality of semiconductor units is joined using solder and a connection unit which electrically connects the plurality of semiconductor units in parallel.

Abstract: To provide an abrasive material having a structured surface that is excellent in preventing adhesion and accumulation of foreign objects, and a manufacturing method thereof. The abrasive material of an embodiment of the present disclosure is an abrasive material having an abrasive layer with a structured surface with a plurality of three-dimensional elements arranged thereon, a surface treatment selected from the group consisting of fluoride treatment and silicon treatment being performed on at least a portion of the structured surface, and the fluoride treatment being selected from the group consisting of plasma treatment, chemical vapor deposition, physical vapor deposition, and fluorine gas treatment.

Abstract: Provided is an electrode catalyst production method capable of obtaining, through an easy operation, an electrode catalyst whose chlorine (Cl) species content has been reliably and sufficiently reduced, even when using as an electrode catalyst raw material an electrode catalyst precursor containing a high concentration of chlorine. The method is to produce an electrode catalyst having a core-shell structure including a support, a core part formed on the support and a shell part formed to cover at least a part of a surface of the core part.

Abstract: Provided is an electrode catalyst that can exhibit sufficient performance, is suitable for mass production, and is suitable for reducing production costs, even when containing a relatively high concentration of chlorine. The electrode catalyst has a core-shell structure including a support; a core part that is formed on the support; and a shell part that is formed so as to cover at least one portion of the surface of the core part. The electrode catalyst concurrently fulfills conditions expressed by the following formulae (1) and (2): (X1/M)?1.2 . . . (1) (X2/M)?47.0 . . . (2) (in the formula (1) and the formula (2), M represents an amount of substance (number of atoms) of one or more constituent metal elements of the shell part, X1 represents an amount of substance (number of atoms) of bromine (Br), and X2 represents an amount of substance (number of atoms) of chlorine (Cl)).

Abstract: To provide electrode catalyst which has the catalyst activity and durability at a practically durable level and contributes to lowering of the cost in comparison with the conventional Pt/C catalyst. The electrode catalyst has a support and catalyst particles supported on the support. The catalyst particle has the core part, the first shell part formed on the core part, and the second shell part formed on the first shell part. The core part contains W compound including at least W carbide, the first shell part contains simple Pd, and the second shell part contains simple Pt.

Abstract: Provided is an electrode catalyst that can exhibit sufficient performance, is suitable for mass production, and is suitable for reducing production costs, even when containing a relatively high concentration of chlorine. The electrode catalyst has a core-shell structure including a support; a core part that is formed on the support; and a shell part that is formed so as to cover at least one portion of the surface of the core part. The electrode catalyst concurrently fulfills conditions expressed by the following formulae (1) and (2): (X1/M)?1.2 . . . (1) (X2/M)?47.0 . . . (2) (in the formula (1) and the formula (2), M represents an amount of substance (number of atoms) of one or more constituent metal elements of the shell part, X1 represents an amount of substance (number of atoms) of bromine (Br), and X2 represents an amount of substance (number of atoms) of chlorine (Cl)).

Abstract: Provided is a production method of an electrode catalyst that can reduce the content of chlorine species reliably and sufficiently through a simple operation, even when using an electrode catalyst precursor containing a high concentration of chlorine (Cl) species as a raw material of the electrode catalyst. The production method of the electrode catalyst has a core-shell structure including a core part formed on a support and a shell part formed to cover at least a part of a surface of the core part.

Abstract: A semiconductor device including a semiconductor chip, a first electrode pad and second electrode pad included on one surface of the semiconductor chip, a first conductive post joined by a joining material to the first electrode pad, a plurality of second conductive posts joined by a joining material to the second electrode pad, and a printed substrate, disposed opposing the one surface of the semiconductor chip, on which is formed an electrical circuit to which the first conductive post and second conductive posts are connected. The second conductive posts on the side near the first conductive post are arrayed avoiding a short-circuit prevention region at a distance such that the joining material of the first conductive post and the joining material of the second conductive posts do not link.

Abstract: Provided is a production method of an electrode catalyst that can reduce the content of chlorine species reliably and sufficiently through a simple operation, even when using an electrode catalyst precursor containing a high concentration of chlorine (Cl) species as a raw material of the electrode catalyst. The production method of the electrode catalyst has a core-shell structure including a core part formed on a support and a shell part formed to cover at least a part of a surface of the core part.

Abstract: Provided is an electrode catalyst that can exhibit sufficient performance, is suitable for mass production, and is suitable for reducing production costs, even when containing a relatively high concentration of chlorine. The electrode catalyst has a core-shell structure including a support; a core part that is formed on the support; and a shell part that is formed so as to cover at least one portion of the surface of the core part. A concentration of bromine (Br) species of the electrode catalyst as measured by X-ray fluorescence (XRF) spectroscopy is 500 ppm or less, and a concentration of chlorine (Cl) species of the electrode catalyst as measured by X-ray fluorescence (XRF) spectroscopy is 8,500 ppm or less.