Abstract: A road line determination method and apparatus is provided. The method includes: performing detection of two road lines of a lane in which the vehicle is driving from a driving image; determining whether at least one road line of the two road lines is not detected; if it is determined that the at least one road line is not detected, determining at least one road line for the at least one undetected road line based on first information about a drivable road area comprising the road; and controlling driving of the vehicle based on the at least one determined road line.

Abstract: Provided are a method and apparatus for determining driving information. The apparatus generates a probability map corresponding to a target object to be detected from a driving image, extracts representative points from a candidate region of the target object detected from the driving image, extracts some of the representative points based on the probability map, calculates a confidence value for the candidate region of the target object based on the extracted some representative points, and determines driving information of the vehicle based on the confidence value.

Abstract: A distance estimating method and apparatus are provided. The method includes acquiring a real target length corresponding to target points of an object, calculating, from an input image, an image target length corresponding to the real target length, and estimating a distance from a distance estimating apparatus to the object, based on the real target length, the image target length, and a focal length thereof.

Abstract: A method of detecting a 3D object from a 2D image includes receiving a 2D image including an object, acquiring an object detection region from the 2D image, iteratively searching for candidates for a direction of a volume including the object of the 2D image in a 3D coordinate system based on the object detection region, and detecting the volume from the 3D coordinate system based on results of the iterative searching.

Abstract: Provided are an apparatus and a method for converting an image. The apparatus includes an image sensor configured to obtain an image of a road, and a processor. The processor is configured to segment an input image into a plurality of region images, determine a vanishing point corresponding to each of the plurality of region images, obtain a translation relation for converting two-dimensional (2D) coordinates of a point in a region image among the plurality of region images into three-dimensional (3D) coordinates, based on a vanishing point of the region image, and generate road profile data based on translation relations of the plurality of region images.

Abstract: A method of detecting a 3D object from a 2D image includes receiving a 2D image including an object, acquiring an object detection region from the 2D image, iteratively searching for candidates for a direction of a volume including the object of the 2D image in a 3D coordinate system based on the object detection region, and detecting the volume from the 3D coordinate system based on results of the iterative searching.

Abstract: Provided are a method and apparatus for determining driving information. The apparatus generates a probability map corresponding to a target object to be detected from a driving image, extracts representative points from a candidate region of the target object detected from the driving image, extracts some of the representative points based on the probability map, calculates a confidence value for the candidate region of the target object based on the extracted some representative points, and determines driving information of the vehicle based on the confidence value.

Abstract: Provided are an apparatus and a method for converting an image. The apparatus includes an image sensor configured to obtain an image of a road, and a processor. The processor is configured to segment an input image into a plurality of region images, determine a vanishing point corresponding to each of the plurality of region images, obtain a translation relation for converting two-dimensional (2D) coordinates of a point in a region image among the plurality of region images into three-dimensional (3D) coordinates, based on a vanishing point of the region image, and generate road profile data based on translation relations of the plurality of region images.

Abstract: A distance estimating method and apparatus are provided.

Abstract: A road line determination method and apparatus is provided. The method includes: performing detection of two road lines of a lane in which the vehicle is driving from a driving image; determining whether at least one road line of the two road lines is not detected; if it is determined that the at least one road line is not detected, determining at least one road line for the at least one undetected road line based on first information about a drivable road area comprising the road; and controlling driving of the vehicle based on the at least one determined road line.

Abstract: A reflective mask includes a first reflection layer disposed on a mask substrate, a first capping layer disposed on the first reflection layer, a second reflection pattern disposed on a portion of the first capping layer, and a phase shifter disposed between the second reflection pattern and the first capping layer to cause a phase difference between a first light reflecting from the first reflection layer and a second light reflecting from the second reflection pattern. Related methods are also provided.

Abstract: A reflective mask includes a first reflection layer disposed on a mask substrate, a first capping layer disposed on the first reflection layer, a second reflection pattern disposed on a portion of the first capping layer, and a phase shifter disposed between the second reflection pattern and the first capping layer to cause a phase difference between a first light reflecting from the first reflection layer and a second light reflecting from the second reflection pattern. Related methods are also provided.

Abstract: An extreme ultra violet (EUV) mask is disclosed, which prevents defects from shot overlap encountered in wafer exposure as well as reflection of unnecessary EUV and DUV generated in a black border region, such that a pattern CD is reduced and defects are not created. The EUV mask includes a quartz substrate, a multi-layered reflection film formed over the quartz substrate to reflect exposure light, an absorption layer formed over the multi-layered reflection film, a black border region formed over the quartz substrate that does not include the multi-layered reflection film, and a blind layer formed in a position including at least one of over the absorption layer, over the quartz substrate, and below the quartz substrate.

Abstract: A method for forming a semiconductor device is provided. More specifically, a method for forming a bulb-shaped portion of a bulb-shaped recess gate is provided to overcome an etching process margin reduction caused by a spacer oxide film formed on sidewalls of a recess and thickly laminated to a lower part of a recess. In one aspect, a buffer dielectric film pattern is formed additionally by a plasma enhanced chemical vapor deposition (PECVD) process over a hard mask pattern, so that a sufficient process margin used for forming the bulb-shaped portion is ensured and a process margin for forming a semiconductor device is increased.

Abstract: A method for forming a semiconductor device is provided. More specifically, a method for forming a bulb-shaped portion of a bulb-shaped recess gate is provided to overcome an etching process margin reduction caused by a spacer oxide film formed on sidewalls of a recess and thickly laminated to a lower part of a recess. In one aspect, a buffer dielectric film pattern is formed additionally by a plasma enhanced chemical vapor deposition (PECVD) process over a hard mask pattern, so that a sufficient process margin used for forming the bulb-shaped portion is ensured and a process margin for forming a semiconductor device is increased.

Abstract: Disclosed is a method of forming a fine pattern in a semiconductor device using a photolithography process, which comprises: coating a photoresist layer for an I-line and a positive type ArF photoresist layer on a semiconductor substrate that includes a conductive layer; performing exposure and a first baking process on the resultant substrate by using an etch-mask of a desired pattern to produce alcohol radicals (OH−) or carboxyl acid (COOH) in the positive type ArF photoresist layer, in which a silylation reaction can be produced; removing the etch-mask; performing a development process to the resultant structure to form a first photoresist pattern; performing exposure and a second baking process on the substrate that includes the first photoresist pattern; performing a silylation process to the substrate to which the second baking process has been performed, by using an HMDS to form a silicon oxide layer on the surface of the first photoresist pattern through reaction between the alcohol radicals (OH

Abstract: Disclosed is a method of forming a fine pattern in a semiconductor device using a photolithography process, which comprises: coating a photoresist layer for an I-line and a positive type ArF photoresist layer on a semiconductor substrate that includes a conductive layer; performing exposure and a first baking process on the resultant substrate by using an etch-mask of a desired pattern to produce alcohol radicals (OH−) or carboxyl acid (COOH) in the positive type ArF photoresist layer, in which a silylation reaction can be produced; removing the etch-mask; performing a development process to the resultant structure to form a first photoresist pattern; performing exposure and a second baking process on the substrate that includes the first photoresist pattern; performing a silylation process to the substrate to which the second baking process has been performed, by using an HMDS to form a silicon oxide layer on the surface of the first photoresist pattern through reaction between the alcohol radicals (OH