Patents by Inventor Yoshiaki Ikuta

Yoshiaki Ikuta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130011773
    Abstract: The present invention relates to a method for producing an optical member base material for EUVL, comprising performing the following in this order to obtain an optical member base material for EUVL: a preliminary-polishing step of preliminarily polishing a film forming surface and a back surface of the film forming surface of a glass substrate; a measuring step of measuring a total thickness distribution and a flatness of the glass substrate; and a corrective-polishing step of locally polishing only the back surface of the glass substrate depending on the measurement result of the measuring step.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 10, 2013
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hiroshi NAKANISHI, Yoshiaki IKUTA
  • Publication number: 20120231378
    Abstract: Provided are an EUV mask blank in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, a reflective layer-equipped substrate to be used for producing the EUV mask blank, and a process for producing the reflective layer-equipped substrate. A reflective layer-equipped substrate for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer.
    Type: Application
    Filed: May 23, 2012
    Publication date: September 13, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Masaki Mikami, Mitsuhiko Komakine, Yoshiaki Ikuta
  • Patent number: 8251197
    Abstract: A printed note deposit machine, comprises: a user recognition unit identifying a user with an authenticated person; an inlet unit serving as a receiving teller in which printed notes are deposited; a dispensing unit receiving printed notes deposited in the inlet unit to dispense them in sequence; an identifying unit classifying the dispensed printed notes into four categories of authenticated notes, counterfeit notes, unidentifiable notes, and rejected notes, and identified them with the four categories; a temporary money holder temporarily storing the authenticated, counterfeit, and unidentified notes but the rejected ones therein; a plurality of storage cells storing the printed notes after they are temporarily stored in the previous stage; and a rejection unit accumulating the printed notes identified with the rejected notes by the identifying unit to return them to the user.
    Type: Grant
    Filed: March 19, 2010
    Date of Patent: August 28, 2012
    Assignee: Glory Kogyo Kabushiki Kaisha
    Inventors: Hisashi Takeuchi, Yoshiaki Ikuta, Masao Sakamoto, Hirokazu Goto, Masaru Hayasako
  • Patent number: 8241821
    Abstract: Provision of an EUV mask whereby influence of EUV reflected light from an absorber film surface in the peripheral portion of a mask pattern region is suppressed at a time of carrying out EUV lithography; an EUV mask blank to be employed for producing the above EUV mask; and a process for producing the EUV mask blank.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: August 14, 2012
    Assignee: Asahi Glass Company, Limited
    Inventor: Yoshiaki Ikuta
  • Publication number: 20120196208
    Abstract: Provided are a multilayer mirror for EUVL in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, and a process for its production. A multilayer mirror for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer.
    Type: Application
    Filed: April 10, 2012
    Publication date: August 2, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Masaki MIKAMI, Mitsuhiko Komakine, Yoshiaki Ikuta
  • Patent number: 8206510
    Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.
    Type: Grant
    Filed: February 15, 2011
    Date of Patent: June 26, 2012
    Assignee: Sematech, Inc.
    Inventors: Abbas Rastegar, Yoshiaki Ikuta
  • Publication number: 20120115221
    Abstract: It is an objective of the present invention to identify SPARC protein-derived peptides that are able to induce human killer T cells and helper T cells having cytotoxic activity to tumors, and to provide a means for carrying out a tumor immunotherapy of patients with various types of cancers overexpressing SPARC. The present invention provides a peptide of any of the following: (A) a peptide which consists of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3; or (B) a peptide which consists of an amino acid sequence comprising a substitution or addition of one or several amino acids with respect to the peptide consisting of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3, and which has capacity to induce cytotoxic (killer) T cells.
    Type: Application
    Filed: September 23, 2011
    Publication date: May 10, 2012
    Applicant: ONCO THERAPY SCIENCE, INC.
    Inventors: Yasuharu NISHIMURA, Yoshiaki IKUTA, Shuichi NAKATSURU
  • Patent number: 8053557
    Abstract: It is an objective of the present invention to identify SPARC protein-derived peptides that are able to induce human killer T cells and helper T cells having cytotoxic activity to tumors, and to provide a means for carrying out a tumor immunotherapy of patients with various types of cancers overexpressing SPARC. The present invention provides a peptide of any of the following: (A) a peptide which consists of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3; or (B) a peptide which consists of an amino acid sequence comprising a substitution or addition of one or several amino acids with respect to the peptide consisting of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3, and which has capacity to induce cytotoxic (killer) T cells.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: November 8, 2011
    Assignee: Onco Therapy Science, Inc.
    Inventors: Yasuharu Nishimura, Yoshiaki Ikuta, Shuichi Nakatsuru
  • Patent number: 8052797
    Abstract: A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which includes applying a light beam in a wavelength range which makes the light absorption coefficient of at least one of a material of the substrate, a material of the inorganic coating and the inorganic foreign matters be at least 0.01/cm, to the surface of the substrate or to the surface of the inorganic coating in an application amount of at least 10 J/cm2 in an oxygen- or ozone-containing atmosphere, and exposing the surface of the substrate or the surface of the inorganic coating having a negative surface potential to an acidic solution having a pH ?6.
    Type: Grant
    Filed: October 24, 2006
    Date of Patent: November 8, 2011
    Assignee: Asahi Glass Company, Limited
    Inventor: Yoshiaki Ikuta
  • Patent number: 8017345
    Abstract: The object of the present invention is to find out another tumor marker which is useful for early diagnosis of melanoma, and provide a diagnostic kit and diagnostic method for malignant melanoma using such marker. The present invention provides a diagnostic kit for malignant melanoma, which comprises an antibody against SPARC and an antibody against GPC3.
    Type: Grant
    Filed: August 9, 2005
    Date of Patent: September 13, 2011
    Assignee: Kumamoto University
    Inventors: Yasuharu Nishimura, Tetsuya Nakatsura, Yoshiaki Ikuta
  • Publication number: 20110165504
    Abstract: Provision of an EUV mask whereby influence of EUV reflected light from an absorber film surface in the peripheral portion of a mask pattern region is suppressed at a time of carrying out EUV lithography; an EUV mask blank to be employed for producing the above EUV mask; and a process for producing the EUV mask blank.
    Type: Application
    Filed: March 2, 2011
    Publication date: July 7, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventor: Yoshiaki IKUTA
  • Patent number: 7960077
    Abstract: A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer.
    Type: Grant
    Filed: January 27, 2010
    Date of Patent: June 14, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Toshiyuki Uno, Ken Ebihara
  • Publication number: 20110132394
    Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.
    Type: Application
    Filed: February 15, 2011
    Publication date: June 9, 2011
    Inventors: Abbas Rastegar, Yoshiaki Ikuta
  • Publication number: 20110089612
    Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.
    Type: Application
    Filed: December 27, 2010
    Publication date: April 21, 2011
    Applicant: Asahi Glass Company, Limited
    Inventors: YOSHIAKI IKUTA, Yasutomi Iwahashi, Kenji Okamura
  • Patent number: 7921859
    Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.
    Type: Grant
    Filed: December 13, 2005
    Date of Patent: April 12, 2011
    Assignee: Sematech, Inc.
    Inventors: Abbas Rastegar, Yoshiaki Ikuta
  • Patent number: 7901843
    Abstract: There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.
    Type: Grant
    Filed: May 16, 2008
    Date of Patent: March 8, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Takashi Sugiyama, Yoshiaki Ikuta, Masabumi Ito
  • Publication number: 20100234205
    Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.
    Type: Application
    Filed: March 15, 2010
    Publication date: September 16, 2010
    Applicant: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Yasutomi Iwahashi, Kenji Okamura
  • Patent number: 7784307
    Abstract: To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm.sup.2-ppb).sup.-1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm.sup.2) by the laser, to be 0.Itoreq.R.Itoreq.0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: August 31, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Tomonori Ogawa, Yoshiaki Ikuta, Shinya Kikugawa
  • Publication number: 20100174403
    Abstract: A printed note deposit machine, comprises: a user recognition unit identifying a user with an authenticated person; an inlet unit serving as a receiving teller in which printed notes are deposited; a dispensing unit receiving printed notes deposited in the inlet unit to dispense them in sequence; an identifying unit classifying the dispensed printed notes into four categories of authenticated notes, counterfeit notes, unidentifiable notes, and rejected notes, and identified them with the four categories; a temporary money holder temporarily storing the authenticated, counterfeit, and unidentified notes but the rejected ones therein; a plurality of storage cells storing the printed notes after they are temporarily stored in the previous stage; and a rejection unit accumulating the printed notes identified with the rejected notes by the identifying unit to return them to the user.
    Type: Application
    Filed: March 19, 2010
    Publication date: July 8, 2010
    Applicant: GLORY KOGYO KABUSHIKI KAISHA
    Inventors: HISASHI TAKEUCHI, Yoshiaki Ikuta, Masao Sakamoto, Hirokazu Goto, Masaru Hayasako
  • Publication number: 20100167187
    Abstract: A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer.
    Type: Application
    Filed: January 27, 2010
    Publication date: July 1, 2010
    Applicant: Asahi Glass Company, Limited
    Inventors: Yoshiaki IKUTA, Toshiyuki Uno, Ken Ebihara