Patents by Inventor Yoshiaki Ikuta
Yoshiaki Ikuta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20130011773Abstract: The present invention relates to a method for producing an optical member base material for EUVL, comprising performing the following in this order to obtain an optical member base material for EUVL: a preliminary-polishing step of preliminarily polishing a film forming surface and a back surface of the film forming surface of a glass substrate; a measuring step of measuring a total thickness distribution and a flatness of the glass substrate; and a corrective-polishing step of locally polishing only the back surface of the glass substrate depending on the measurement result of the measuring step.Type: ApplicationFiled: September 14, 2012Publication date: January 10, 2013Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Hiroshi NAKANISHI, Yoshiaki IKUTA
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Publication number: 20120231378Abstract: Provided are an EUV mask blank in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, a reflective layer-equipped substrate to be used for producing the EUV mask blank, and a process for producing the reflective layer-equipped substrate. A reflective layer-equipped substrate for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer.Type: ApplicationFiled: May 23, 2012Publication date: September 13, 2012Applicant: Asahi Glass Company, LimitedInventors: Masaki Mikami, Mitsuhiko Komakine, Yoshiaki Ikuta
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Patent number: 8251197Abstract: A printed note deposit machine, comprises: a user recognition unit identifying a user with an authenticated person; an inlet unit serving as a receiving teller in which printed notes are deposited; a dispensing unit receiving printed notes deposited in the inlet unit to dispense them in sequence; an identifying unit classifying the dispensed printed notes into four categories of authenticated notes, counterfeit notes, unidentifiable notes, and rejected notes, and identified them with the four categories; a temporary money holder temporarily storing the authenticated, counterfeit, and unidentified notes but the rejected ones therein; a plurality of storage cells storing the printed notes after they are temporarily stored in the previous stage; and a rejection unit accumulating the printed notes identified with the rejected notes by the identifying unit to return them to the user.Type: GrantFiled: March 19, 2010Date of Patent: August 28, 2012Assignee: Glory Kogyo Kabushiki KaishaInventors: Hisashi Takeuchi, Yoshiaki Ikuta, Masao Sakamoto, Hirokazu Goto, Masaru Hayasako
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Patent number: 8241821Abstract: Provision of an EUV mask whereby influence of EUV reflected light from an absorber film surface in the peripheral portion of a mask pattern region is suppressed at a time of carrying out EUV lithography; an EUV mask blank to be employed for producing the above EUV mask; and a process for producing the EUV mask blank.Type: GrantFiled: March 2, 2011Date of Patent: August 14, 2012Assignee: Asahi Glass Company, LimitedInventor: Yoshiaki Ikuta
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Publication number: 20120196208Abstract: Provided are a multilayer mirror for EUVL in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, and a process for its production. A multilayer mirror for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer.Type: ApplicationFiled: April 10, 2012Publication date: August 2, 2012Applicant: Asahi Glass Company, LimitedInventors: Masaki MIKAMI, Mitsuhiko Komakine, Yoshiaki Ikuta
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Patent number: 8206510Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.Type: GrantFiled: February 15, 2011Date of Patent: June 26, 2012Assignee: Sematech, Inc.Inventors: Abbas Rastegar, Yoshiaki Ikuta
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Publication number: 20120115221Abstract: It is an objective of the present invention to identify SPARC protein-derived peptides that are able to induce human killer T cells and helper T cells having cytotoxic activity to tumors, and to provide a means for carrying out a tumor immunotherapy of patients with various types of cancers overexpressing SPARC. The present invention provides a peptide of any of the following: (A) a peptide which consists of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3; or (B) a peptide which consists of an amino acid sequence comprising a substitution or addition of one or several amino acids with respect to the peptide consisting of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3, and which has capacity to induce cytotoxic (killer) T cells.Type: ApplicationFiled: September 23, 2011Publication date: May 10, 2012Applicant: ONCO THERAPY SCIENCE, INC.Inventors: Yasuharu NISHIMURA, Yoshiaki IKUTA, Shuichi NAKATSURU
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Patent number: 8052797Abstract: A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which includes applying a light beam in a wavelength range which makes the light absorption coefficient of at least one of a material of the substrate, a material of the inorganic coating and the inorganic foreign matters be at least 0.01/cm, to the surface of the substrate or to the surface of the inorganic coating in an application amount of at least 10 J/cm2 in an oxygen- or ozone-containing atmosphere, and exposing the surface of the substrate or the surface of the inorganic coating having a negative surface potential to an acidic solution having a pH ?6.Type: GrantFiled: October 24, 2006Date of Patent: November 8, 2011Assignee: Asahi Glass Company, LimitedInventor: Yoshiaki Ikuta
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Patent number: 8053557Abstract: It is an objective of the present invention to identify SPARC protein-derived peptides that are able to induce human killer T cells and helper T cells having cytotoxic activity to tumors, and to provide a means for carrying out a tumor immunotherapy of patients with various types of cancers overexpressing SPARC. The present invention provides a peptide of any of the following: (A) a peptide which consists of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3; or (B) a peptide which consists of an amino acid sequence comprising a substitution or addition of one or several amino acids with respect to the peptide consisting of the amino acid sequence as shown in any one of SEQ ID NOS: 1 to 3, and which has capacity to induce cytotoxic (killer) T cells.Type: GrantFiled: June 15, 2007Date of Patent: November 8, 2011Assignee: Onco Therapy Science, Inc.Inventors: Yasuharu Nishimura, Yoshiaki Ikuta, Shuichi Nakatsuru
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Patent number: 8017345Abstract: The object of the present invention is to find out another tumor marker which is useful for early diagnosis of melanoma, and provide a diagnostic kit and diagnostic method for malignant melanoma using such marker. The present invention provides a diagnostic kit for malignant melanoma, which comprises an antibody against SPARC and an antibody against GPC3.Type: GrantFiled: August 9, 2005Date of Patent: September 13, 2011Assignee: Kumamoto UniversityInventors: Yasuharu Nishimura, Tetsuya Nakatsura, Yoshiaki Ikuta
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Publication number: 20110165504Abstract: Provision of an EUV mask whereby influence of EUV reflected light from an absorber film surface in the peripheral portion of a mask pattern region is suppressed at a time of carrying out EUV lithography; an EUV mask blank to be employed for producing the above EUV mask; and a process for producing the EUV mask blank.Type: ApplicationFiled: March 2, 2011Publication date: July 7, 2011Applicant: ASAHI GLASS COMPANY, LIMITEDInventor: Yoshiaki IKUTA
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Patent number: 7960077Abstract: A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer.Type: GrantFiled: January 27, 2010Date of Patent: June 14, 2011Assignee: Asahi Glass Company, LimitedInventors: Yoshiaki Ikuta, Toshiyuki Uno, Ken Ebihara
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Publication number: 20110132394Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.Type: ApplicationFiled: February 15, 2011Publication date: June 9, 2011Inventors: Abbas Rastegar, Yoshiaki Ikuta
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Publication number: 20110089612Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.Type: ApplicationFiled: December 27, 2010Publication date: April 21, 2011Applicant: Asahi Glass Company, LimitedInventors: YOSHIAKI IKUTA, Yasutomi Iwahashi, Kenji Okamura
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Patent number: 7921859Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.Type: GrantFiled: December 13, 2005Date of Patent: April 12, 2011Assignee: Sematech, Inc.Inventors: Abbas Rastegar, Yoshiaki Ikuta
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Patent number: 7901843Abstract: There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.Type: GrantFiled: May 16, 2008Date of Patent: March 8, 2011Assignee: Asahi Glass Company, LimitedInventors: Takashi Sugiyama, Yoshiaki Ikuta, Masabumi Ito
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Publication number: 20100234205Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.Type: ApplicationFiled: March 15, 2010Publication date: September 16, 2010Applicant: Asahi Glass Company, LimitedInventors: Yoshiaki Ikuta, Yasutomi Iwahashi, Kenji Okamura
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Patent number: 7784307Abstract: To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm.sup.2-ppb).sup.-1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm.sup.2) by the laser, to be 0.Itoreq.R.Itoreq.0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.Type: GrantFiled: October 2, 2006Date of Patent: August 31, 2010Assignee: Asahi Glass Company, LimitedInventors: Tomonori Ogawa, Yoshiaki Ikuta, Shinya Kikugawa
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Publication number: 20100174403Abstract: A printed note deposit machine, comprises: a user recognition unit identifying a user with an authenticated person; an inlet unit serving as a receiving teller in which printed notes are deposited; a dispensing unit receiving printed notes deposited in the inlet unit to dispense them in sequence; an identifying unit classifying the dispensed printed notes into four categories of authenticated notes, counterfeit notes, unidentifiable notes, and rejected notes, and identified them with the four categories; a temporary money holder temporarily storing the authenticated, counterfeit, and unidentified notes but the rejected ones therein; a plurality of storage cells storing the printed notes after they are temporarily stored in the previous stage; and a rejection unit accumulating the printed notes identified with the rejected notes by the identifying unit to return them to the user.Type: ApplicationFiled: March 19, 2010Publication date: July 8, 2010Applicant: GLORY KOGYO KABUSHIKI KAISHAInventors: HISASHI TAKEUCHI, Yoshiaki Ikuta, Masao Sakamoto, Hirokazu Goto, Masaru Hayasako
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Publication number: 20100167187Abstract: A reflective mask blank for EUV lithography including a substrate having a front surface and a rear surface, a reflective layer formed over the front surface of the substrate, an absorbing layer formed over the reflective layer, and a chucking layer formed on the rear surface of the substrate and positioned to chuck the substrate to an electrostatic chuck. The substrate has a non-conducting portion which eliminates electrical conduction between the reflective layer and the chucking layer and electrical conduction between the absorbing layer and the chucking layer, and the non-conducting portion is formed by forming a portion of the substrate covered with one or more covering members and preventing formation of the reflective layer and the absorbing layer.Type: ApplicationFiled: January 27, 2010Publication date: July 1, 2010Applicant: Asahi Glass Company, LimitedInventors: Yoshiaki IKUTA, Toshiyuki Uno, Ken Ebihara