Patents by Inventor Yoshiaki Ikuta

Yoshiaki Ikuta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070059608
    Abstract: A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.
    Type: Application
    Filed: September 12, 2005
    Publication date: March 15, 2007
    Applicant: ASAHI GLASS COMPANY, LTD.
    Inventors: Yoshiaki Ikuta, Hiroshi Kojima, Kouji Otsuka
  • Publication number: 20070027018
    Abstract: To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm2-ppb)?1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm2) by the laser, to be 0?R?0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.
    Type: Application
    Filed: October 2, 2006
    Publication date: February 1, 2007
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Tomonori Ogawa, Yoshiaki Ikuta, Shinya Kikugawa
  • Publication number: 20060207629
    Abstract: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.
    Type: Application
    Filed: December 13, 2005
    Publication date: September 21, 2006
    Inventors: Abbas Rastegar, Yoshiaki Ikuta
  • Publication number: 20060183623
    Abstract: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.
    Type: Application
    Filed: April 6, 2006
    Publication date: August 17, 2006
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Yoshiaki Ikuta, Noriyuki Agata
  • Patent number: 7022633
    Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm?1 (I2250) to the scattering peak intensity of 800 cm?1 (I800), i.e. I2250/I800, of at most 1×10?4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10?3 cm?1.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: April 4, 2006
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Noriaki Shimodaira, Akio Masui, Shuhei Yoshizawa
  • Publication number: 20060007433
    Abstract: A defect repair device includes a defect inspection unit configured to find a size of a protruding defect on a front surface of a multi-layer film having a rear surface opposite to the front surface, a calculation unit configured to calculate a repair energy so as to repair the protruding defect based on the size of the protruding defect found by the defect inspection unit, an energy supplier, and an energy controller configured to control the energy supplier to supply the repair energy calculated by the calculation unit to a portion in the multi-layer film from the rear surface of the multi-layer film so as to cause a decrease in a volume of the portion and retract the protruding defect into the multi-layer film.
    Type: Application
    Filed: July 8, 2004
    Publication date: January 12, 2006
    Applicant: ASAHI GLASS COMPANY LTD.
    Inventors: Yoshiaki Ikuta, Toshiyuki Uno
  • Publication number: 20050176572
    Abstract: Disclosed is a synthetic silica glass for use with light having a wavelength of 150 to 200 nm, which has an OH group at a concentration of less than 1 ppm, an oxygen-excess type defect at a concentration of 1×1016 defects/cm3 or less, a hydrogen molecule at a concentration of less than 1×1017 molecules/cm3, and a non-bridging oxygen radical at a concentration of 1×1016 radicals/cm3 or less in the state after the synthetic silica glass is irradiated with light of a xenon excimer lamp having an energy density of 10 mW/cm2 and 3 kJ/cm2 or with light of an F2 laser by 107 pulses at an energy density of 10 mJ/cm2/pulse. The synthetic silica glass can exhibit excellent resistance to ultraviolet light with a wavelength of 150 to 190 nm when incorporated in a device using ultraviolet light with a wavelength of 150 to 190 nm as a light source.
    Type: Application
    Filed: March 26, 2003
    Publication date: August 11, 2005
    Inventors: Hideo Hosono, Kouichi Kajihara, Masahiro Hirano, Yoshiaki Ikuta, Shinya Kikukawa
  • Publication number: 20050068644
    Abstract: A synthetic quartz glass for an optical member, which is to be used in an optical device employing an ArF excimer laser beam as a light source at an energy density of at most 2 mJ/cm2/pulse or in an optical device employing a KrF excimer laser beam as a light source at an energy density of at most 30 mJ/cm2/pulse, characterized in that the hydrogen molecule concentration is within a range of at least 1×1016 molecules/cm3 and less than 5×1016 molecules/cm3.
    Type: Application
    Filed: October 22, 2004
    Publication date: March 31, 2005
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yoshiaki Ikuta, Noriyuki Agata
  • Publication number: 20040205025
    Abstract: A printed note deposit machine, comprises: a user recognition unit identifying a user with an authenticated person; an inlet unit serving as a receiving teller in which printed notes are deposited; a dispensing unit receiving printed notes deposited in the inlet unit to dispense them in sequence; an identifying unit classifying the dispensed printed notes into four categories of authenticated notes, counterfeit notes, unidentifiable notes, and rejected notes, and identified them with the four categories; a temporary money holder temporarily storing the authenticated, counterfeit, and unidentified notes but the rejected ones therein; a plurality of storage cells storing the printed notes after they are temporarily stored in the previous stage; and a rejection unit accumulating the printed notes identified with the rejected notes by the identifying unit to return them to the user.
    Type: Application
    Filed: April 9, 2004
    Publication date: October 14, 2004
    Inventors: Hisashi Takeuchi, Yoshiaki Ikuta, Masao Sakamoto, Hirokazu Goto, Masaru Hayasako
  • Patent number: 6749053
    Abstract: The invention includes a bill processing unit into which a bill is fed and in which the bill is examined. The bill that has been examined and approved by the bill processing unit is received and stored by a storage unit. The bill processing unit and the storage unit are separated by a partition. A passage opening is formed in the partition through which the bill passes. According to the invention, even if the bill processing unit is destroyed, the bills in the storage unit may not be stolen. That is, protection against theft may be improved.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: June 15, 2004
    Assignee: Glory Kogyo Kabushiki Kaisha
    Inventor: Yoshiaki Ikuta
  • Publication number: 20030195107
    Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.
    Type: Application
    Filed: December 12, 2002
    Publication date: October 16, 2003
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Noriaki Shimodaira, Akio Masui, Shuhei Yoshizawa
  • Patent number: 6611317
    Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm−1 or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm−1.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: August 26, 2003
    Assignees: Asahi Glass Company, Limited, Semiconductor Leading Edge Technologies, Inc.
    Inventors: Tohru Ogawa, Hideo Hosono, Shinya Kikugawa, Yoshiaki Ikuta, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa
  • Patent number: 6576578
    Abstract: A synthetic quartz glass to be used for light with a wavelength of from 150 to 200 nm, wherein the OH group concentration is at most 100 ppm, the hydrogen molecule concentration is at most 1×1017 molecules/cm3, reduction type defects are at most 1×1015 defects/cm3, and the relation between &Dgr;k163 and &Dgr;k190, as between before and after irradiation of ultraviolet rays, satisfies 0<&Dgr;k163<&Dgr;k190, and a process for its production.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: June 10, 2003
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa
  • Patent number: 6544914
    Abstract: A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths of not longer than 165 nm.
    Type: Grant
    Filed: December 28, 2000
    Date of Patent: April 8, 2003
    Assignee: Asahi Glass Company, Limited
    Inventors: Shinya Kikugawa, Yoshiaki Ikuta, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa
  • Publication number: 20030051507
    Abstract: A process for producing a synthetic silica glass optical component which contains at least 1×1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1×1017 molecules/cm3 at a temperature of from 300 to 600° C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.
    Type: Application
    Filed: October 30, 2002
    Publication date: March 20, 2003
    Applicant: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa
  • Patent number: 6499317
    Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.
    Type: Grant
    Filed: October 17, 2000
    Date of Patent: December 31, 2002
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Noriaki Shimodaira, Akio Masui, Shuhei Yoshizawa
  • Patent number: 6475575
    Abstract: It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.
    Type: Grant
    Filed: August 6, 2001
    Date of Patent: November 5, 2002
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Hitoshi Mishiro, Hiroshi Arishima, Kaname Okada, Katsuhiro Matsumoto
  • Publication number: 20010035361
    Abstract: A container for accommodating an optical article made of synthetic quartz glass includes synthetic resin as a base material, and a coating film provided on a substantially entire area of at least an inner surface thereof, the coating film being substantially impermeable to a gas evolved from the synthetic resin as the basic material of the container.
    Type: Application
    Filed: March 1, 2001
    Publication date: November 1, 2001
    Applicant: Asahi Glass Company, Limited
    Inventors: Hitoshi Mishiro, Shinya Kikugawa, Yoshiaki Ikuta
  • Publication number: 20010015309
    Abstract: The invention includes a bill processing unit into which a bill is fed and in which the bill is discriminated. The bill that has been discriminated and approved by the bill processing unit is received and stored by a storage unit. The bill processing unit and the storage unit are separated by a partition. A passage opening is formed in the partition through which the bill passes. According to the invention, even if the bill processing unit is destroyed, the bills in the storage unit may not be stolen. That is, protection against steal may be improved.
    Type: Application
    Filed: February 22, 2001
    Publication date: August 23, 2001
    Inventor: Yoshiaki Ikuta
  • Patent number: 4919207
    Abstract: The present invention is directed to a method for drawing up a special crude oil which is characterized by comprising the steps of extracting and separating a gas oil from a crude oil containing a great deal of wax or a high-viscosity crude oil which has been drawn up through an oil well, and drawing up the crude oil containing a great deal of wax or the high-viscosity crude oil, while injecting a part of the thus separated gas oil into the oil well. For the extraction and separation of the gas oil, a recycle oil is employed.
    Type: Grant
    Filed: May 22, 1989
    Date of Patent: April 24, 1990
    Assignee: Mitsubishi Jukogyo Kabushiki Kaisha
    Inventors: Yoshiaki Ikuta, Masayuki Moriwaki, Masato Kaneko