Abstract: An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined; a stage changing a position of the light concentrating unit; a first actuator changing a travel direction of the main pulse laser light; an EUV light sensor detecting EUV energy; a laser energy sensor detecting pulse energy of the main pulse laser light; and an EUV light generation control unit controlling the stage so that temporal variation of the EUV energy decreases and controlling the first actuator so that a ratio of the EUV energy to the pulse energy increases.

Abstract: An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.

Abstract: An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.

Abstract: A laser system according to the present disclosure includes: a laser apparatus configured to emit a laser beam; a transmission optical system disposed on a path between the laser apparatus and a target supplied into an EUV chamber in which EUV light is generated; a reflection optical system configured to reflect, toward the target, the laser beam from the transmission optical system; a first sensor configured to detect the laser beam traveling from the laser apparatus toward the reflection optical system; a second sensor configured to detect return light of the laser beam reflected by the reflection optical system and traveling backward to the laser apparatus; and a control unit configured to determine that the reflection optical system is damaged when no anomaly of the laser beam is detected and a light amount of the return light exceeds a predetermined light amount value.

Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism.

Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism.

Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.

Abstract: A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.

Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a droplet detection unit configured to detect a droplet passing through a predetermined position between a target supply unit and a plasma generation region; and a control unit configured to control a laser apparatus configured to output the pulse laser beam. The control unit performs control to determine whether there is a defective droplet based on a droplet detection signal obtained from the droplet detection unit and to stop, when it is determined that there is a defective droplet, irradiation of the defective droplet determined to be defective, a preceding droplet output one droplet before the defective droplet, and a following droplet output one droplet after the defective droplet with the pulse laser beam.

Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a droplet detection unit configured to detect a droplet passing through a predetermined position between a target supply unit and a plasma generation region; and a control unit configured to control a laser apparatus configured to output the pulse laser beam. The control unit performs control to determine whether there is a defective droplet based on a droplet detection signal obtained from the droplet detection unit and to stop, when it is determined that there is a defective droplet, irradiation of the defective droplet determined to be defective, a preceding droplet output one droplet before the defective droplet, and a following droplet output one droplet after the defective droplet with the pulse laser beam.

Abstract: A target supply device according to an aspect of the present disclosure includes a vibration element configured to generate a droplet by vibrating a target substance to be output from a nozzle 80, a droplet detection unit configured to detect the droplet, and a control unit 70. A first detection threshold and a second detection threshold to be compared with a detection signal from the droplet detection unit are set to the control unit 70. The first detection threshold is used to generate a light emission trigger for a laser beam. The second detection threshold has a smaller absolute value from a base line of the detection signal than the first detection threshold. The control unit 70 calculates an evaluation parameter for a satellite based on the detection signal and the second detection threshold, and determines a duty value of an electric signal suitable for operation of the vibration element based on the evaluation parameter.

Abstract: An EUV light generating apparatus includes: EUV light sensors configured to measure energy of EUV light from mutually different directions, the EUV light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the EUV light becomes a target desired centroid, the centroid of the EUV light being specified from measurement results of the EUV light sensors. The controller calibrates the target desired centroid based on EUV light centroids obtained from the energy of the EUV light measured by the EUV light sensors, and a parameter related to the measured energy of the EUV light corresponding to the EUV light centroids.

Abstract: A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.

Abstract: A target supply device according to an aspect of the present disclosure includes a vibration element configured to generate a droplet by vibrating a target substance to be output from a nozzle 80, a droplet detection unit configured to detect the droplet, and a control unit 70. A first detection threshold and a second detection threshold to be compared with a detection signal from the droplet detection unit are set to the control unit 70. The first detection threshold is used to generate a light emission trigger for a laser beam. The second detection threshold has a smaller absolute value from a base line of the detection signal than the first detection threshold. The control unit 70 calculates an evaluation parameter for a satellite based on the detection signal and the second detection threshold, and determines a duty value of an electric signal suitable for operation of the vibration element based on the evaluation parameter.

Abstract: An EUV light generating apparatus includes: EUV light sensors configured to measure energy of EUV light from mutually different directions, the EUV light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the EUV light becomes a target centroid, the centroid of the EUV light being specified from measurement results of the EUV light sensors. The controller calibrates the target centroid based on EUV light centroids obtained from the energy of the EUV light measured by the EUV light sensors, and a parameter related to the measured energy of the EUV light corresponding to the EUV light centroids.

Abstract: A laser system according to the present disclosure includes: a laser apparatus configured to emit a laser beam; a transmission optical system disposed on a path between the laser apparatus and a target supplied into an EUV chamber in which EUV light is generated; a reflection optical system configured to reflect, toward the target, the laser beam from the transmission optical system; a first sensor configured to detect the laser beam traveling from the laser apparatus toward the reflection optical system; a second sensor configured to detect return light of the laser beam reflected by the reflection optical system and traveling backward to the laser apparatus; and a control unit configured to determine that the reflection optical system is damaged when no anomaly of the laser beam is detected and a light amount of the return light exceeds a predetermined light amount value.

Abstract: The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.

Abstract: An EUV light generation system includes: a target supply unit; a prepulse laser that outputs a prepulse laser beam; a main pulse laser that outputs a main pulse laser; a light focusing optical system that focuses the prepulse and main pulse laser beams on a predetermined region; an actuator that changes a focusing position of the prepulse laser beam by the light focusing optical system; a first sensor that captures an image of a target; and a control unit that stores a reference position of the actuator, calculates a predetermined parameter on the target after irradiation with the prepulse laser beam and before irradiation with the main pulse laser beam based on image data obtained from the first sensor, and controls the actuator to approach the reference position if the predetermined parameter does not satisfy a first condition.

Abstract: Provided is an illumination device that can be made thin and increases the efficiency of extracting light to the outside. The present invention is provided with: light-emitting structures wherein a blue light-emitting element is embedded in a transparent resin having a convex surface shape; a substrate wherein the light-emitting structures are disposed two-dimensionally; a diffuser plate that diffuses the blue light of the blue light-emitting elements; and a fluorescent sheet that is disposed spaced from the substrate and that contains a particulate fluorescent body that obtains a white light from the blue light of the blue light-emitting elements.

Abstract: An extreme ultraviolet light generating apparatus includes a laser device, a target detector, and a controller. The laser device emits a pulsed laser beam. The target detector detects a target substance supplied as an application target for the laser beam to the inside of a chamber. The controller controls the laser device based on a burst signal in which a burst period and an idle period are repeated. In the burst period, an extreme ultraviolet light beam has to be generated. In the idle period, the generation of the extreme ultraviolet light beam has to be paused. When a size of a target substance detected at the target detector in the idle period is greater than a predetermined size, the controller may reduce an intensity of a laser beam entering the inside of the chamber from the laser device.