Patents by Inventor Yoshihisa Tokumaru

Yoshihisa Tokumaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11114695
    Abstract: To provide an electrolytic solution that suppresses increase in the OH? ion concentration even in the case of electrochemical changes and thereby reduces deterioration or corrosion of resin, rubber, or metal to improve the reliability of an electrochemical device, an electrolyte used in the electrolytic solution, and an electrochemical device comprising the electrolytic solution. The electrolyte, for example, comprises a compound having a cation unit represented by the following formula and an electrolyte (a quaternary ammonium salt or the like). (In the formula, R1, R2, R3, and R4 are the same or different and each represent an alkyl group or an alkoxyalkyl group; R1 and R2 may together form a ring such as a pyrrolidine ring and a piperidine ring; and R3 and R4 may together form a ring such as a pyrrolidine ring and a piperidine ring.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: September 7, 2021
    Assignee: OTSUKA CHEMICAL CO., LTD.
    Inventors: Taiji Nakagawa, Yoshihisa Tokumaru, Shoji Hiketa
  • Patent number: 10593488
    Abstract: The present invention provides a nonaqueous electrolytic solution that provides an electric double layer capacitor having excellent durability. The nonaqueous electrolytic solution of the present invention is a nonaqueous electrolytic solution for electric double layer capacitors prepared by dissolving a quaternary ammonium salt as an electrolyte in a nonaqueous solvent, and the nonaqueous electrolytic solution has an alkali metal cation concentration of 0.1 to 30 ppm.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: March 17, 2020
    Assignee: OTSUKA CHEMICAL CO., LTD.
    Inventors: Yoshihisa Tokumaru, Yoshihiro Okada, Taiji Nakagawa, Shoji Hiketa, Koichi Sorajo
  • Publication number: 20190273284
    Abstract: To provide an electrolytic solution that suppresses increase in the OH? ion concentration even in the case of electrochemical changes and thereby reduces deterioration or corrosion of resin, rubber, or metal to improve the reliability of an electrochemical device, an electrolyte used in the electrolytic solution, and an electrochemical device comprising the electrolytic solution. The electrolyte, for example, comprises a compound having a cation unit represented by the following formula and an electrolyte (a quaternary ammonium salt or the like). (In the formula, R1, R2, R3, and R4 are the same or different and each represent an alkyl group or an alkoxyalkyl group; R1 and R2 may together form a ring such as a pyrrolidine ring and a piperidine ring; and R3 and R4 may together form a ring such as a pyrrolidine ring and a piperidine ring.
    Type: Application
    Filed: July 31, 2017
    Publication date: September 5, 2019
    Applicant: OTSUKA CHEMICAL CO., LTD.
    Inventors: Taiji NAKAGAWA, Yoshihisa TOKUMARU, Shoji HIKETA
  • Patent number: 9905375
    Abstract: Provided is a nonaqueous electrolytic solution that provides an electric double layer capacitor having excellent durability. The nonaqueous electrolytic solution is prepared by dissolving a quaternary ammonium salt as an electrolyte in a nonaqueous solvent, and the nonaqueous electrolytic solution comprises a diethylpyrrolidinium salt and/or a 1-ethyl-1,3-dimethylpyrrolidinium salt.
    Type: Grant
    Filed: June 3, 2014
    Date of Patent: February 27, 2018
    Assignee: OTSUKA CHEMICAL CO., LTD.
    Inventors: Yoshihisa Tokumaru, Taiji Nakagawa, Shoji Hiketa, Koichi Sorajo
  • Publication number: 20170330700
    Abstract: The present invention provides a nonaqueous electrolytic solution that provides an electric double layer capacitor having excellent durability. The nonaqueous electrolytic solution of the present invention is a nonaqueous electrolytic solution for electric double layer capacitors prepared by dissolving a quaternary ammonium salt as an electrolyte in a nonaqueous solvent, and the nonaqueous electrolytic solution has an alkali metal cation concentration of 0.1 to 30 ppm.
    Type: Application
    Filed: December 11, 2014
    Publication date: November 16, 2017
    Applicant: OTSUKA CHEMICAL CO., LTD.
    Inventors: Yoshihisa TOKUMARU, Yoshihiro OKADA, Taiji NAKAGAWA, Shoji HIKETA, Koichi SORAJO
  • Publication number: 20160372274
    Abstract: Provided is a nonaqueous electrolytic solution that provides an electric double layer capacitor having excellent durability. The nonaqueous electrolytic solution is prepared by dissolving a quaternary ammonium salt as an electrolyte in a nonaqueous solvent, and the nonaqueous electrolytic solution comprises a diethylpyrrolidinium salt and/or a 1-ethyl-1,3-dimethylpyrrolidinium salt.
    Type: Application
    Filed: June 3, 2014
    Publication date: December 22, 2016
    Applicant: OTSUKA CHEMICAL CO., LTD.
    Inventors: Yoshihisa TOKUMARU, Taiji NAKAGAWA, Shoji HIKETA, Koichi SORAJO
  • Patent number: 7714125
    Abstract: An object of the invention is to provide an industrially advantageous process capable of remarkably suppressing the generation of an undesirable by-product cepham compound to thereby efficiently produce a desired 2?-methyl-2?-[(1,2,3-triazol-1-yl)methyl]penam-3?-carboxylic acid ester. In the present invention, a diphenylmethyl 2?-bromomethyl-2?-methylpenam-3?-carboxylate (BMPB) is reacted with 1,2,3-triazole in a halogenated hydrocarbon solvent at ?5° C. or lower. The reaction in a halogenated hydrocarbon solvent at ?5° C. or less can remarkably suppress the generation of an undesirable by-product cepham compound, so that the desired diphenylmethyl 2?-methyl-2?-[(1,2,3-triazol-1-yl)methyl]penam-3?-carboxylate (TMPB) can be efficiently produced.
    Type: Grant
    Filed: October 25, 2005
    Date of Patent: May 11, 2010
    Assignee: Otsuka Chemical Co., Ltd.
    Inventors: Isao Wada, Yoshihisa Tokumaru, Akihiro Shimabayashi
  • Patent number: 7547777
    Abstract: The present invention provides novel 2?-methyl-2?-[(1,2,3-triazol-1-yl)methyl]penam-3?-carboxylic acid benzhydryl ester (TMPB)-acetone crystals for use in the production of 2?-methyl-2?-[(1,2,3-triazol-1-yl)methyl]penam-3?-carboxylic acid 1,1-dioxide benzhydryl ester (TAZB); a process for producing the TMPB-acetone crystals comprising the steps of (A) concentrating a TMPB-containing organic solvent solution, (B) dissolving the resulting concentrate in acetone, and (C) precipitating TMPB-acetone crystals from the acetone solution thus obtained; and a process for producing TAZB comprising the step of reacting the TMPB-acetone crystals with an oxidizing agent.
    Type: Grant
    Filed: October 8, 2004
    Date of Patent: June 16, 2009
    Assignees: Otsuka Chemical Co., Ltd., Taiho Pharmaceutical Co., Ltd.
    Inventors: Yoshihisa Tokumaru, Akihiro Shimabayashi
  • Patent number: 7514553
    Abstract: A process for preparing a penicillanic acid compound of the formula (2) comprising reacting a halogenated penicillanic acid compound of the formula (1), (a) in the presence of a metal bismuth or bismuth compound, (b) with a metal having a lower standard oxidation-reduction potential than bismuth to obtain the compound (2) (X and Y are a hydrogen atom or halogen atom, provided that X and Y are not hydrogen atoms at the same time, n is an integer of 0 to 2, R is carboxylic acid protecting group) (n and R are same as above).
    Type: Grant
    Filed: September 2, 2004
    Date of Patent: April 7, 2009
    Assignees: Otsuka Chemical Co., Ltd., Taiho Pharmaceutical Co., Ltd.
    Inventors: Yoshihisa Tokumaru, Norio Saito, Makoto Akizuki
  • Publication number: 20090012287
    Abstract: An object of the invention is to provide an industrially advantageous process capable of remarkably suppressing the generation of an undesirable by-product cepham compound to thereby efficiently produce a desired 2?-methyl-2?-[(1,2,3-triazol-1-yl)methyl]penam-3?-carboxylic acid ester. In the present invention, a diphenylmethyl 2?-bromomethyl-2?-methylpenam-3?-carboxylate (BMPB) is reacted with 1,2,3-triazole in a halogenated hydrocarbon solvent at ?5° C. or lower. The reaction in a halogenated hydrocarbon solvent at ?5° C. or less can remarkably suppress the generation of an undesirable by-product cepham compound, so that the desired diphenylmethyl 2?-methyl-2?-[(1,2,3-triazol-1-yl)methyl]penam-3?-carboxylate (TMPB) can be efficiently produced.
    Type: Application
    Filed: October 25, 2005
    Publication date: January 8, 2009
    Inventors: Isao Wada, Yoshihisa Tokumaru, Akihiro Shimabayashi
  • Publication number: 20070060559
    Abstract: The present invention provides novel 2?-methyl-2?-[(1,2,3-triazol-1-yl)methyl]penam-3?-carboxylic acid benzhydryl ester (TMPB)-acetone crystals for use in the production of 2?-methyl-2?-[(1,2,3-triazol-1-yl)methyl]penam-3?-carboxylic acid 1,1-dioxide benzhydryl ester (TAZB); a process for producing the TMPB-acetone crystals comprising the steps of (A) concentrating a TMPB-containing organic solvent solution, (B) dissolving the resulting concentrate in acetone, and (C) precipitating TMPB-acetone crystals from the acetone solution thus obtained; and a process for producing TAZB comprising the step of reacting the TMPB-acetone crystals with an oxidizing agent.
    Type: Application
    Filed: October 8, 2004
    Publication date: March 15, 2007
    Inventors: Yoshihisa Tokumaru, Akihiro Shimabayashi
  • Publication number: 20060281917
    Abstract: A process for preparing a penicillanic acid compound of the formula (2) comprising reacting a halogenated penicillanic acid compound of the formula (1), (a) in the presence of a metal bismuth or bismuth compound, (b) with a metal having a lower standard oxidation-reduction potential than bismuth to obtain the compound (2) (X and Y are a hydrogen atom or halogen atom, provided that X and Y are not hydrogen atoms at the same time, n is an integer of 0 to 2, R is carboxylic acid protecting group) (n and R are same as above).
    Type: Application
    Filed: September 2, 2004
    Publication date: December 14, 2006
    Inventors: Yoshihisa Tokumaru, Norio Saito, Makoto Akizuki
  • Patent number: 6339152
    Abstract: The present invention is directed to a process for preparing an exo-methylenepenam compound wherein a cephem compound is reduced with a metal having a standard oxidation-reduction potential of up to −0.3 (V/SCE) in an amount of at least one mole per mole of the cephem compound and with a metal compound having a higher standard oxidation reduction potential than the metal and in an amount of 0.
    Type: Grant
    Filed: September 7, 1999
    Date of Patent: January 15, 2002
    Assignee: Otsuka Kagaku Kabushiki Kaisha
    Inventors: Sigeru Torii, Hideo Tanaka, Yutaka Kameyama, Yoshihisa Tokumaru
  • Patent number: 6063918
    Abstract: A process for preparing a 2-isocephem derivative characterized in that a thioacetic acid derivative which itself is basic or a mixture of a base and a thioacetic acid derivative is caused to act on a 2-azetidinyl-3,4-dihalogeno-2-butenoic acid compound represented by the general formula (1) in a water-containing organic solvent to obtain a 3-halomethyl-2-isocephem derivative represented by the general formula (2), and a process for preparing a 2-oxaisocephem derivative characterized in that a base is caused to act on a 2-azetidinyl-3,4-dihalogeno-2-butenoic acid compound represented by the general formula (1) in a water-containing organic solvent to obtain a 3-halomethyl-2-oxaisocephem derivative represented by the general formula (3) ##STR1## wherein R.sup.1 is a hydrogen atom, amino or protected amino, R.sup.2 is a hydrogen atom or lower alkoxyl, R.sup.1 and R.sup.2, when taken together, form a cyclic amino protecting group, R.sup.
    Type: Grant
    Filed: July 7, 1997
    Date of Patent: May 16, 2000
    Assignee: Otsuka Kagaku Kabushiki Kaisha
    Inventors: Michio Sasaoka, Daisuke Suzuki, Delsoo Suh, Yoshihisa Tokumaru
  • Patent number: 5688942
    Abstract: A process for preparing a 2-isocephem derivative characterized in that a thioacetic acid derivative which itself is basic or a mixture of a base and a thioacetic acid derivative is caused to act on a 2-azetidinyl-3,4-dihalogeno-2-butenoic acid compound represented by the general formula (1) in a water-containing organic solvent to obtain a 3-halomethyl-2-isocephem derivative represented by the general formula (2), and a process for preparing a 2-oxaisocephem derivative characterized in that a base is caused to act on a 2-azetidinyl-3,4-dihalogeno-2-butenoic acid compound represented by the general formula (1) in a water-containing organic solvent to obtain a 3-halomethyl-2-oxaisocephem derivative represented by the general formula (3) ##STR1## wherein R.sup.1 is a hydrogen atom, amino or protected amino, R.sup.2 is a hydrogen atom or lower alkoxyl, R.sup.1 and R.sup.2, when taken together, form a cyclic amino protecting group, R.sup.
    Type: Grant
    Filed: November 6, 1996
    Date of Patent: November 18, 1997
    Assignee: Otsuka Kagaku Kabushiki Kaisha
    Inventors: Michio Sasaoka, Daisuke Suzuki, Delsoo Suh, Yoshihisa Tokumaru