Patents by Inventor Yoshikazu Yamagata

Yoshikazu Yamagata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5830258
    Abstract: A method of recovering resources in a resin-molded electrical rotating device (1,2) in which electromagnetic members (1a,1b,2a) are molded with resin molding (1c,2c) with fine voids so as to be integrally made into a solid body, and a resin for molding of the rotating device (1,2). The method has the steps of disintegrating the resin molding (1c,2c) by chemically decomposing and/or eluting so as to remove the resin molding (1c,2c) from the electromagnetic members (1a,1b,2a) and separating and recovering at least metal components in the electromagnetic members (1a,1b,2a) as the resources.
    Type: Grant
    Filed: June 12, 1996
    Date of Patent: November 3, 1998
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Fumitoshi Yamashita, Seiji Kurozumi, Junko Kaneko, Akihiko Watanabe, Hiroshi Ohnishi, Takahiko Terada, Yoshikazu Yamagata
  • Patent number: 5574002
    Abstract: A cleaning agent composition is disclosed which is excellent in removing ability of the soldering flux, wax and machine oil, easy in waste water disposal, and free from the global environmental concern, allowing safe operation. The composition comprises: A) at least one member selected from the group consisting of propylene glycol monoalkyl ether having a C.sub.4-6 alkyl group and dipropylene glycol monoalkyl ether having a C.sub.3-6 alkyl group, B) at least one member selected from the group consisting of methanol, ethanol, 1-propanol and 2-propanol, and C) water.
    Type: Grant
    Filed: February 16, 1995
    Date of Patent: November 12, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tohru Shiino, Kenichi Nobuta, Yoshikazu Yamagata
  • Patent number: 5536982
    Abstract: The invention concerns an ultra thin polymer film electret comprising a polymer and a substrate having a surface electric charge, wherein a side chain of the polymer and the substrate are physically or chemically bonded. A method of manufacturing an ultra thin polymer film electret comprising: adsorbing a monomolecular film comprising a unsaturated group or a laminated film comprising the monomolecular film on to a substrate surface, irradiating the monomolecular film or the laminated film with an energy beam to polymerize the unsaturated groups and applying a high voltage to the film is also disclosed. Further, a method of manufacturing an ultra thin polymer film electret comprising: physically bonding a side chain of the polymer to a substrate surface to form a thin film and applying a high voltage to the thin film is also disclosed.
    Type: Grant
    Filed: July 25, 1995
    Date of Patent: July 16, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Yoshikazu Yamagata, Kazufumi Ogawa
  • Patent number: 5436033
    Abstract: The invention concerns an ultra thin polymer film electret comprising a polymer and a substrate having a surface electric charge, wherein a side chain of the polymer and the substrate are physically or chemically bonded. A method of manufacturing an ultra thin polymer film electret comprising: adsorbing a monomolecular film comprising a unsaturated group or a laminated film comprising the monomolecular film on to a substrate surface, irradiating the monomolecular film or the laminated film with an energy beam to polymerize the unsaturated groups and applying a high voltage to the film is also disclosed. Further, a method of manufacturing an ultra thin polymer film electret comprising: physically bonding a side chain of the polymer to a substrate surface to form a thin film and applying a high voltage to the thin film is also disclosed.
    Type: Grant
    Filed: August 1, 1994
    Date of Patent: July 25, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Yoshikazu Yamagata, Kazufumi Ogawa
  • Patent number: 5246740
    Abstract: According to the present invention, a lamination of organic monomolecular films is formed by a chemical adsorption technique. The representative example of the chemical adsorbent used in this invention is a hydrocarbon having trichlorosilyl group at one molecular end, and dialkylsilyl group at the other end. This chemical adsorbent binds to a base plate through silioxane linkage to form a first monomolecular film. It also binds to the first monomolecular film through siloxane linkage to form a second monomolecular film. As a result, a lamination of organic monomolecular films with desirable properties can be formed.
    Type: Grant
    Filed: January 10, 1991
    Date of Patent: September 21, 1993
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Kazufumi Ogawa, Yoshikazu Yamagata
  • Patent number: 5234718
    Abstract: A method of manufacturing a chemically adsorbed monomolecular or polymer film by a dehydrochlorination reaction brought about by contacting a substrate having hydrophilic groups at the surface with a non-aqueous organic solvent containing a compound having a halogen-based functional group able to react with a hydrophilic group at one end is disclosed. A basic compound is present in the non-aqueous organic solvent. Molecules having a functional group able to react with a hydrophilic group at one end are dissolved in the solvent obtained by adding the basic compound to the non-aqueous organic solvent. The substrate is contacted with the solution to form a chemically adsorbed monomolecular or polymer film. The film is formed efficiently and in a short period of time.
    Type: Grant
    Filed: February 18, 1992
    Date of Patent: August 10, 1993
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Yoshikazu Yamagata, Kazufumi Ogawa
  • Patent number: 5143750
    Abstract: According to the invention, a chemically adsorbing material is reacted with a substrate surface having active hydrogen groups by dipping the substrate into a solution of the chemically adsorbing material simultaneous and applying ultrasonic waves to the solution. In this way, a high concentration monomolecular and/or polymer film substantially free from pin holes can be formed in a short period of time. That is, while the ultrasonic waves are applied, a chemical adsorbing material having an end functional chlorosilyl group is adsorbed onto the substrate surface, thereby forming a chemically adsorbed monomolecular and/or polymer film. The frequency of the ultrasonic waves are suitably in a range of 25 to 50 kHz. In addition, after formation of the adsorbed film, the substrate is washed for making monomolecular film by dipping it in a washing solution while applying ultrasonic waves. In this way, non-reacted chemical adsorbing material remaining on the substrate can be efficiently washed away.
    Type: Grant
    Filed: December 19, 1991
    Date of Patent: September 1, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshikazu Yamagata, Norihisa Mino, Kazufumi Ogawa, Mamoru Soga