Patents by Inventor Yoshimitsu Ikari

Yoshimitsu Ikari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9828205
    Abstract: A glass film transfer apparatus includes a wind-off section that winds off the glass film from a roll around which the glass film is wound, a long interleaf being laminated on the glass film; a glass film transfer section that transfers the glass film which is wound off from the wind-off section and is separated from the interleaf; a take-up section that takes up the glass film transferred by the glass film transfer section in the form of roll, while laminating the long interleaf on the glass film; and an interleaf transfer section that carries out the interleaf separated from the glass film which is wound off from the wind-off section, and carries in the interleaf toward the take-up section. Furthermore, the glass film transfer apparatus includes a take-up adjusting mechanism that adjusts a take-up state of the interleaf and the glass film in the take-up section.
    Type: Grant
    Filed: July 19, 2013
    Date of Patent: November 28, 2017
    Assignee: KOBE STEEL, LTD.
    Inventors: Hiroshi Tamagaki, Yoshimitsu Ikari, Naoki Ohba, Takeshi Sakurai
  • Patent number: 9260776
    Abstract: In forming alumina films on substrates by sputtering of an aluminum metal target in an oxidizing gas-containing atmosphere, film formation is carried out intermittently in a plurality of substeps while restricting a thickness of the film formed in each substep to at most 5 nm. A turntable is disposed to face a direction of sputtering of the aluminum metal target and the substrates are fixed to the turntable.
    Type: Grant
    Filed: May 24, 2011
    Date of Patent: February 16, 2016
    Assignee: Kobe Steel, Ltd.
    Inventors: Toshimitsu Kohara, Hiroshi Tamagaki, Yoshimitsu Ikari
  • Publication number: 20150246787
    Abstract: A glass film transfer apparatus includes a wind-off section that winds off the glass film from a roll around which the glass film is wound, a long interleaf being laminated on the glass film; a glass film transfer section that transfers the glass film which is wound off from the wind-off section and is separated from the interleaf; a take-up section that takes up the glass film transferred by the glass film transfer section in the form of roll, while laminating the long interleaf on the glass film; and an interleaf transfer section that carries out the interleaf separated from the glass film which is wound off from the wind-off section, and carries in the interleaf toward the take-up section. Furthermore, the glass film transfer apparatus includes a take-up adjusting mechanism that adjusts a take-up state of the interleaf and the glass film in the take-up section.
    Type: Application
    Filed: July 19, 2013
    Publication date: September 3, 2015
    Applicants: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), NIPPON ELECTRIC GLASS CO., LTD.
    Inventors: Hiroshi Tamagaki, Yoshimitsu Ikari, Naoki Ohba, Takeshi Sakurai
  • Patent number: 8323807
    Abstract: The present invention provides a process for producing an alumina coating comprised mainly of ? crystal structure on a base material.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: December 4, 2012
    Assignee: Kobe Steel, Ltd.
    Inventors: Toshimitsu Kohara, Yoshimitsu Ikari, Hiroshi Tamagaki
  • Patent number: 8163140
    Abstract: The present invention provides a method for reactive sputtering in which a reactive sputtering apparatus including a sputtering vaporization source 2 provided with a metal target disposed in a vacuum chamber 1, a sputtering power source 4 to drive the sputtering vaporization source 2, and an introduction mechanism 5 to introduce an inert gas for sputtering and a reaction gas for forming a compound with sputtered metal into the vacuum chamber 1 is used, and reactive sputtering film formation is performed on a substrate 3 disposed in the above-described vacuum chamber, wherein the method includes the steps of performing constant-voltage control to control the voltage of the above-described sputtering power source 4 at a target voltage Vs and, in addition, performing target voltage control at a control speed lower than the speed of the above-described constant-voltage control, the target voltage control operating the above-described target voltage Vs in order that the spectrum of plasma emission generated forwar
    Type: Grant
    Filed: May 26, 2003
    Date of Patent: April 24, 2012
    Assignee: Kobe Steel, Ltd.
    Inventors: Yoshimitsu Ikari, Hiroshi Tamagaki, Toshimitsu Kohara
  • Publication number: 20110220486
    Abstract: In forming alumina films on substrates by sputtering of an aluminum metal target in an oxidizing gas-containing atmosphere, film formation is carried out intermittently in a plurality of substeps while restricting a thickness of the film formed in each substep to at most 5 nm. A turntable is disposed to face a direction of sputtering of the aluminum metal target and the substrates are fixed to the turntable.
    Type: Application
    Filed: May 24, 2011
    Publication date: September 15, 2011
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd)
    Inventors: Toshimitsu KOHARA, Hiroshi TAMAGAKI, Yoshimitsu IKARI
  • Patent number: 7967957
    Abstract: For forming alumina films on substrates by sputtering of an aluminum metal target in an oxidizing gas-containing atmosphere, a method of producing ? crystal structure-based alumina films efficiently includes as an early film formation, forming films under conditions suited for formation of ? crystal structure alumina. For example the forming forms films of ?crystal structure alumina in a poisoning mode discharge condition only in an early stage of film formation.
    Type: Grant
    Filed: August 8, 2003
    Date of Patent: June 28, 2011
    Assignee: Kobe Steel, Ltd.
    Inventors: Toshimitsu Kohara, Hiroshi Tamagaki, Yoshimitsu Ikari
  • Publication number: 20090214894
    Abstract: The present invention provides a process for producing an alumina coating comprised mainly of ? crystal structure on a base material.
    Type: Application
    Filed: March 12, 2009
    Publication date: August 27, 2009
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd)
    Inventors: Toshimitsu KOHARA, Yoshimitsu IKARI, Hiroshi TAMAGAKI
  • Publication number: 20090173625
    Abstract: The present invention provides a process for producing an alumina coating comprised mainly of ? crystal structure on a base material.
    Type: Application
    Filed: March 12, 2009
    Publication date: July 9, 2009
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd)
    Inventors: Toshimitsu KOHARA, Yoshimitsu IKARI, Hiroshi TAMAGAKI
  • Patent number: 7531212
    Abstract: The present invention provides a process for producing an alumina coating comprised mainly of ? crystal structure on a base material.
    Type: Grant
    Filed: August 8, 2003
    Date of Patent: May 12, 2009
    Assignee: Kobe Steel, Ltd.
    Inventors: Toshimitsu Kohara, Yoshimitsu Ikari, Hiroshi Tamagaki
  • Publication number: 20060006059
    Abstract: For forming alumina films on substrates by sputtering of an aluminum metal target in an oxidizing gas-containing atmosphere, a method of producing ? crystal structure-based alumina films efficiently includes as an early film formation, forming films under conditions suited for formation of ? crystal structure alumina. For example the forming forms films of ? crystal structure alumina in a poisoning mode discharge condition only in an early stage of film formation.
    Type: Application
    Filed: August 8, 2003
    Publication date: January 12, 2006
    Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO
    Inventors: Toshimitsu Kohara, Hiroshi Tamagaki, Yoshimitsu Ikari
  • Publication number: 20050276990
    Abstract: A process for producing an alumina coating composed mainly of a-type crystal structure especially excelling in heat resistance, comprising (1) providing a laminate coating including a hard coating composed of a metal component containing Al and Ti as unavoidable elements and a compound of B, C, N, O, etc., oxidizing the hard coating to thereby form an oxide-containing layer, and forming an alumina coating composed mainly of a-type crystal structure on the oxide-containing layer. Alternatively, the process comprises (2) forming a hard coating composed of a metal whose standard free energy for oxide formation is greater than that of aluminum and a compound of B, C, N, O, etc., oxidizing the surface of the hard coating to thereby form an oxide-containing layer, and forming an alumina coating while being accompanied by reduction of the oxide at the surface of the oxide-containing layer.
    Type: Application
    Filed: August 8, 2003
    Publication date: December 15, 2005
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd)
    Inventors: Toshimitsu Kohara, Yoshimitsu Ikari, Hiroshi Tamagaki
  • Publication number: 20050205413
    Abstract: The present invention provides a method for reactive sputtering in which a reactive sputtering apparatus including a sputtering vaporization source 2 provided with a metal target disposed in a vacuum chamber 1, a sputtering power source 4 to drive the sputtering vaporization source 2, and an introduction mechanism 5 to introduce an inert gas for sputtering and a reaction gas for forming a compound with sputtered metal into the vacuum chamber 1 is used, and reactive sputtering film formation is performed on a substrate 3 disposed in the above-described vacuum chamber, wherein the method includes the steps of performing constant-voltage control to control the voltage of the above-described sputtering power source 4 at a target voltage Vs and, in addition, performing target voltage control at a control speed lower than the speed of the above-described constant-voltage control, the target voltage control operating the above-described target voltage Vs in order that the spectrum of plasma emission generated forwar
    Type: Application
    Filed: May 26, 2003
    Publication date: September 22, 2005
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.)
    Inventors: Yoshimitsu Ikari, Hiroshi Tamagaki, Toshimitsu Kohara