Patents by Inventor Yoshitaka Komuro

Yoshitaka Komuro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10414918
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 5, 2017
    Date of Patent: September 17, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Masahiro Shiosaki, Takuya Ikeda, Takaya Maehashi
  • Patent number: 10394122
    Abstract: A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rb1 represents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yb1 represents a divalent linking group containing an ester bond (—C(?O)—O— or —O—C(?O)—), Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mm+ represents an m-valent organic cation.
    Type: Grant
    Filed: June 23, 2017
    Date of Patent: August 27, 2019
    Assignee: TOYKO OHKA KOGYO CO., LTD.
    Inventors: Issei Suzuki, Masahito Yahagi, Yuki Fukumura, Kazuaki Ebisawa, Yoshitaka Komuro, Toshikazu Takayama, Takashi Kamizono, Tatsuya Fujii
  • Patent number: 10366888
    Abstract: A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: July 30, 2019
    Assignees: Tokyo Electron Limited, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kazuki Yamada, Masatoshi Yamato, Hidetami Yaegashi, Yoshitaka Komuro, Takehiro Seshimo, Katsumi Ohmori
  • Patent number: 10324377
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: June 18, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Taku Hirayama, Daisuke Kawana, Yoshitaka Komuro, Masatoshi Arai, Shogo Matsumaru, Kenta Suzuki, Takashi Kamizono, Tatsuya Fujii
  • Patent number: 10317797
    Abstract: A pattern forming method includes forming a first film patterned in a line and space shape on an underlayer film, the line and space shape including lines and a space arranged therebetween, forming a second film to cover the first film, removing the second film to form the second film on a side surface of the first film in a line shape, forming a third film to cover the first film and the second film, removing the third film formed on the first film and the second film to form the third film on a side surface of the second film, and converting the third film after removing the third film formed on the first film and the second film, wherein the third film is comprised of an organic metal compound, the organic metal compound having characteristic to increase etching tolerance when the organic metal compound undergoes a predetermined process.
    Type: Grant
    Filed: November 20, 2017
    Date of Patent: June 11, 2019
    Assignees: Tokyo Electron Limited, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hidetami Yaegashi, Kenichi Oyama, Katsumi Ohmori, Yoshitaka Komuro, Takehiro Seshimo
  • Patent number: 10295905
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: May 21, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Takaya Maehashi
  • Publication number: 20180374695
    Abstract: A pattern forming method includes forming a first organic film by coating an etching target film with a composition including a polymer including a cross-linkable component, infiltrating an inorganic substance into the first organic film, cross-linking the polymer, forming a second organic film on the first organic film, forming a second organic film pattern by patterning the second organic film, forming a first organic film pattern having a pitch reduced to one-half of a pitch of the second organic film pattern by patterning the first organic film by a self-aligned patterning method that uses the second organic film pattern as a core pattern, forming an etching target film pattern having a pitch reduced to one-half of a pitch of the first organic film pattern by patterning the etching target film by a self-aligned patterning method that uses the first organic film pattern as a core pattern.
    Type: Application
    Filed: June 14, 2018
    Publication date: December 27, 2018
    Inventors: Kazuki YAMADA, Masatoshi YAMATO, Hidetami YAEGASHI, Yoshitaka KOMURO, Takehiro SESHIMO, Katsumi OHMORI
  • Patent number: 10100134
    Abstract: A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: October 16, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masatoshi Arai, Yoshitaka Komuro, Akiya Kawaue
  • Publication number: 20180143536
    Abstract: A pattern forming method includes forming a first film patterned in a line and space shape on an underlayer film, the line and space shape including lines and a space arranged therebetween, forming a second film to cover the first film, removing the second film to form the second film on a side surface of the first film in a line shape, forming a third film to cover the first film and the second film, removing the third film formed on the first film and the second film to form the third film on a side surface of the second film, and converting the third film after removing the third film formed on the first film and the second film, wherein the third film is comprised of an organic metal compound, the organic metal compound having characteristic to increase etching tolerance when the organic metal compound undergoes a predetermined process.
    Type: Application
    Filed: November 20, 2017
    Publication date: May 24, 2018
    Inventors: Hidetami YAEGASHI, Kenichi OYAMA, Katsumi OHMORI, Yoshitaka KOMURO, Takehiro SESHIMO
  • Publication number: 20180024433
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Application
    Filed: July 17, 2017
    Publication date: January 25, 2018
    Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Takaya MAEHASHI
  • Publication number: 20180022916
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Application
    Filed: July 5, 2017
    Publication date: January 25, 2018
    Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Masahiro SHIOSAKI, Takuya IKEDA, Takaya MAEHASHI
  • Patent number: 9862695
    Abstract: Disclosed is a monomer containing an N-acylcarbamoyl group and a lactone skeleton. The monomer is exemplified by Formula (1): where Ra is selected typically from hydrogen and C1-C6 alkyl; R1 is, independently in each occurrence, selected typically from halogen and optionally halogenated C1-C6 alkyl; “A” is selected from C1-C6 alkylene, oxygen, sulfur, and non-bond; m represents an integer of 0 to 8; X represents, independently in each occurrence, specific N-acylcarbamoyl; n represents an integer of 1 to 9; and Y represents a C1-C6 divalent organic group.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: January 9, 2018
    Assignees: DAICEL CORPORATION, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hiroshi Koyama, Masamichi Nishimura, Naoki Yamashita, Yoshitaka Komuro, Tomoyuki Hirano, Yoshiyuki Utsumi
  • Publication number: 20170369698
    Abstract: A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rb1 represents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yb1 represents a divalent linking group containing an ester bond (—C(?O)—O— or —O—C(?O)—), Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mm+ represents an m-valent organic cation.
    Type: Application
    Filed: June 23, 2017
    Publication date: December 28, 2017
    Inventors: Issei SUZUKI, Masahito YAHAGI, Yuki FUKUMURA, Kazuaki EBISAWA, Yoshitaka KOMURO, Toshikazu TAKAYAMA, Takashi KAMIZONO, Tatsuya FUJII
  • Patent number: 9766541
    Abstract: A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0): Z01 to Z04 each independently represent a substituent having electron withdrawing properties, Rb21 and Rb22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0? represents an organic anion.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: September 19, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hiroto Yamazaki, Yoshitaka Komuro, Masatoshi Arai, Daisuke Kawana, Kenta Suzuki, Tatsuya Fujii
  • Publication number: 20170166664
    Abstract: A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
    Type: Application
    Filed: December 5, 2016
    Publication date: June 15, 2017
    Inventors: Masatoshi ARAI, Yoshitaka KOMURO, Akiya KAWAUE
  • Patent number: 9639002
    Abstract: A method of forming a resist pattern including forming a resist film on a substrate using a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of the acid; exposing the resist film; and patterning the exposed resist film by negative-tone development using a developing solution containing an organic solvent, to form a resist pattern. The resist composition includes a polymeric compound having at least two kinds of specific structural units.
    Type: Grant
    Filed: October 1, 2015
    Date of Patent: May 2, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masatoshi Arai, Yoshitaka Komuro, Daichi Takaki
  • Patent number: 9606433
    Abstract: There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0) shown below. In the formula, A? represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; R1 represents a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group; and W2 represents a group which is formed by polymerization reaction of a group containing a polymerizable group.
    Type: Grant
    Filed: May 15, 2013
    Date of Patent: March 28, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshiyuki Utsumi, Masatoshi Arai, Takahiro Dazai, Yoshitaka Komuro
  • Patent number: 9557647
    Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid generator which generates acid upon exposure, the base component containing a polymeric compound containing a structural unit represented by general formula (a0-1) and the acid generator containing a compound represented by general formula (b1). In the formulae, R represents H, an alkyl group of C1 to 5 or a halogenated alkyl group of C1 to 5; Ya1 represents a single bond or a divalent linking group; La1 and La2 represents —SO2— or —C(?O)—; Ra1 represents a cyclic group which may have a substituent and the like; n1 and n2 represents 0 or 1; R11 represents a cyclic group of C5 to 30 which may have a substituent; V11 represents a single bond or an alkylene group of C1 to 6; L11 represents an ester bond; Y11 represents an alkylene group of C1 to 5 which may have a fluorine atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m.
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: January 31, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Takaya Maehashi, Takashi Nagamine
  • Publication number: 20160376233
    Abstract: A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0): Z01 to Z04 each independently represent a substituent having electron withdrawing properties, Rb21 and Rb22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0? represents an organic anion.
    Type: Application
    Filed: June 17, 2016
    Publication date: December 29, 2016
    Inventors: Hiroto YAMAZAKI, Yoshitaka KOMURO, Masatoshi ARAI, Daisuke KAWANA, Kenta SUZUKI, Tatsuya FUJII
  • Publication number: 20160363860
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.
    Type: Application
    Filed: June 6, 2016
    Publication date: December 15, 2016
    Inventors: Taku HIRAYAMA, Daisuke KAWANA, Yoshitaka KOMURO, Masatoshi ARAI, Shogo MATSUMARU, Kenta SUZUKI, Takashi KAMIZONO, Tatsuya FUJII