Patents by Inventor Yosuke Okamoto

Yosuke Okamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8832607
    Abstract: According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: September 9, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takashi Koike, Hiroyuki Mizuno, Yosuke Okamoto
  • Publication number: 20140240704
    Abstract: According to one embodiment, a measurement mark includes: a first line pattern, first lines extending in a first direction, the first lines arranged in a second direction in the first line pattern, the first line pattern capable of forming a first moire pattern by overlapping with an arrangement pattern including a pattern, and a first polymer and a second polymer being alternately arranged in the pattern; a second line pattern, second lines extending in the first direction, the second lines being arranged in the second direction in the second line pattern, the second line pattern capable of forming a second moire pattern by overlapping with the arrangement pattern; and a reference pattern with a reference position configured to assess a first shift amount from the reference position of the first moire pattern and a second shift amount from the reference position of the second moire pattern.
    Type: Application
    Filed: July 17, 2013
    Publication date: August 28, 2014
    Inventors: Nobuhiro KOMINE, Yosuke OKAMOTO
  • Publication number: 20140240892
    Abstract: According to one embodiment, an electrostatic chuck is capable of holding a reticle by electrostatic attraction force. The reticle has a planar external shape of a rectangle or a square. The electrostatic chuck includes: a first attraction unit capable of attracting the reticle by the electrostatic attraction force; and a substrate supporting the first attraction unit. The first attraction unit is symmetrical with respect to a first line when the reticle is attracted to the first attraction unit. The first line crosses two opposing sides of the rectangle or the square.
    Type: Application
    Filed: July 23, 2013
    Publication date: August 28, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yosuke OKAMOTO, Nobuhiro KOMINE
  • Patent number: 8790851
    Abstract: A photo mask for exposing according to an embodiment includes a mark pattern arranged in a mark region that is different from an effective region to form a semiconductor device; and a regular pattern arranged in the mark region and around the mark pattern and smaller than the mark pattern in size and pitch.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: July 29, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yosuke Okamoto, Kazutaka Ishigo, Taketo Kuriyama
  • Patent number: 8778570
    Abstract: According to one embodiment, a photomask includes a substrate, a film portion, a pattern, and a plurality of detection marks. The film portion is provided on a surface of the substrate. The film portion has a light transmittance lower than light transmittance of the substrate. The pattern is provided in a surface of the film portion. The pattern is configured to be transferred to a transfer target. The plurality of detection marks is provided in the film portion, with intensity of light transmitted through the detection marks being suppressed so as to suppress transfer the detection marks to the transfer target.
    Type: Grant
    Filed: March 1, 2012
    Date of Patent: July 15, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kentaro Okuda, Yosuke Okamoto, Takaki Hashimoto, Hidenori Sato
  • Publication number: 20140192335
    Abstract: An EUV exposure apparatus according to embodiments includes a reticle stage which suctions a rear surface side of an EUV mask to retain the EUV mask. In addition, the EUV exposure apparatus includes a detection unit which detects a position of a measurement mark formed on the rear surface of the EUV mask in the state where the EUV mask is suctioned on the reticle stage. In addition, the EUV exposure apparatus includes a control unit which calculates a distortion amount of the EUV mask based on the position of the measurement mark and performs exposure control on a wafer while correcting the distortion amount.
    Type: Application
    Filed: March 13, 2013
    Publication date: July 10, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yoshinori HAGIO, Yosuke OKAMOTO
  • Publication number: 20140065528
    Abstract: An exposure apparatus according to an embodiment controls the positioning between layers using an alignment correction value calculated on the basis of lower layer position information of a lower-layer-side pattern and upper layer position information of an upper-layer-side pattern. The lower layer position information includes alignment data, a focus map, and a correction value which is set on the basis of the previous substrate. The upper layer position information includes alignment data, a focus map, and a correction value which is a correction value for the positioning and is used when the upper-layer-side pattern is transferred.
    Type: Application
    Filed: February 27, 2013
    Publication date: March 6, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kentaro KASA, Manabu Takakuwa, Yosuke Okamoto, Masamichi Kishimoto
  • Publication number: 20140065522
    Abstract: According to one embodiment, a positional deviation measuring method includes measuring a positional deviation of a device pattern formed in a lower layer portion using an alignment mark of the lower layer portion as a reference; measuring a positional deviation of a device pattern formed in an upper layer portion above the lower layer portion using an alignment mark of the upper layer portion as a reference; measuring a positional deviation between the alignment mark of the lower layer portion and the alignment mark of the upper layer portion; and calculating a positional deviation between the device patterns based on the positional deviation between the alignment marks.
    Type: Application
    Filed: December 21, 2012
    Publication date: March 6, 2014
    Inventors: Yoshinori HAGIO, Yosuke Okamoto
  • Publication number: 20140061969
    Abstract: According to one embodiment, a patterning method includes releasing the template from the cured imprint resist, aligning an alignment mark formed in the non-imprint portion of the template with the transfer pattern of the alignment pattern without causing the alignment mark to contact the imprint resist, and causing the main pattern and the alignment pattern of the template to contact an imprint resist that is supplied to a shot region adjacent to the cured imprint resist and uncured. The method includes curing the imprint resist of the adjacent shot region in the state of the template being in contact to form the transfer pattern of the main pattern and the transfer pattern of the alignment pattern in the imprint resist.
    Type: Application
    Filed: December 20, 2012
    Publication date: March 6, 2014
    Inventors: Yosuke OKAMOTO, Kazuo Tawarayama, Nobuhiro Komine
  • Publication number: 20130298087
    Abstract: According to one embodiment, generating virtual data by mirroring data based on a dimension measurement result in a measurement region on an inner side of a shot region to a non-shot region on an outer side of a shot edge, and calculating dose data of the measurement region and a non-measurement region based on data in the measurement region and the virtual data are included.
    Type: Application
    Filed: July 1, 2013
    Publication date: November 7, 2013
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yosuke Okamoto, Takashi Koike
  • Publication number: 20130252176
    Abstract: According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good.
    Type: Application
    Filed: August 30, 2012
    Publication date: September 26, 2013
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Takashi KOIKE, Hiroyuki Mizuno, Yosuke Okamoto
  • Publication number: 20130252429
    Abstract: A photo mask for exposing according to an embodiment includes a mark pattern arranged in a mark region that is different from an effective region to form a semiconductor device; and a regular pattern arranged in the mark region and around the mark pattern and smaller than the mark pattern in size and pitch.
    Type: Application
    Filed: August 8, 2012
    Publication date: September 26, 2013
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yosuke OKAMOTO, Kazutaka ISHIGO, Taketo KURIYAMA
  • Patent number: 8504951
    Abstract: According to one embodiment, generating virtual data by mirroring data based on a dimension measurement result in a measurement region on an inner side of a shot region to a non-shot region on an outer side of a shot edge, and calculating dose data of the measurement region and a non-measurement region based on data in the measurement region and the virtual data are included.
    Type: Grant
    Filed: June 24, 2011
    Date of Patent: August 6, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yosuke Okamoto, Takashi Koike
  • Publication number: 20130148120
    Abstract: According to one embodiment, an overlay measuring method includes calculating a first symmetry center coordinate on a basis of reflected light from first and second overlay measurement marks formed by using a first layer, calculating a second symmetry center coordinate on a basis of reflected light from third and fourth overlay measurement marks by using a second layer, and calculating an overlay displacement amount in a predetermined direction between the first layer and the second layer on a basis of the first and second symmetry center coordinates, in which the first to fourth overlay measurement marks have a plurality of space widths or pattern widths in the predetermined direction.
    Type: Application
    Filed: August 3, 2012
    Publication date: June 13, 2013
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yosuke OKAMOTO, Taketo KURIYAMA
  • Patent number: 8320658
    Abstract: An unevenness inspection method for inspecting presence of unevenness in a panel material, the method includes: acquiring a plurality of primary images by imaging the panel material under inspection on a plurality of levels of condition; creating a plurality of secondary images by processing the plurality of primary images to enhance variation of the image; creating a composite image by combining the plurality of secondary images with a prescribed weighting; and determining the presence of unevenness using the composite image, the prescribed weighting being determined so that a region having the unevenness can be distinguished from the other region, when the plurality of secondary images are created for the panel material for training use having unevenness and are combined into a composite image.
    Type: Grant
    Filed: September 7, 2007
    Date of Patent: November 27, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroyuki Tanizaki, Naoko Toyoshima, Yosuke Okamoto, Yasunori Takase
  • Publication number: 20120225374
    Abstract: According to one embodiment, a photomask includes a substrate, a film portion, a pattern, and a plurality of detection marks. The film portion is provided on a surface of the substrate. The film portion has a light transmittance lower than light transmittance of the substrate. The pattern is provided in a surface of the film portion. The pattern is configured to be transferred to a transfer target. The plurality of detection marks is provided in the film portion, with intensity of light transmitted through the detection marks being suppressed so as to suppress transfer the detection marks to the transfer target.
    Type: Application
    Filed: March 1, 2012
    Publication date: September 6, 2012
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kentaro OKUDA, Yosuke Okamoto, Takaki Hashimoto, Hidenori Sato
  • Publication number: 20120066653
    Abstract: According to one embodiment, generating virtual data by mirroring data based on a dimension measurement result in a measurement region on an inner side of a shot region to a non-shot region on an outer side of a shot edge, and calculating dose data of the measurement region and a non-measurement region based on data in the measurement region and the virtual data are included.
    Type: Application
    Filed: June 24, 2011
    Publication date: March 15, 2012
    Inventors: Yosuke OKAMOTO, Takashi Koike
  • Patent number: 7953263
    Abstract: An X-ray CT apparatus includes a unit which extracts a high-contrast region of comparatively high X-ray attenuation coefficient from an image, units which generate an unsharp image concerning the high-contrast region, on the basis of the position of the extracted high-contrast region and a point spread function peculiar to the apparatus, and a unit which subtracts the unsharp image from the original image in order to generate a low-contrast image concerning a low-contrast region of comparatively low X-ray attenuation coefficient.
    Type: Grant
    Filed: May 25, 2007
    Date of Patent: May 31, 2011
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Medical Systems Corporation
    Inventors: Yosuke Okamoto, Satoru Nakanishi
  • Publication number: 20100183563
    Abstract: The present invention provides a dentinogenesis inducer and dentinogenesis pulp-capping material, which are effectively used for formation (regeneration) of dentin. The present invention also provides a method of producing odontoblasts useful for dental regenerative therapy and the application of the obtained odontoblasts. The dentinogenesis inducer and the dentinogenesis pulp-capping material of the present invention are both characterized by the use of an HMG-CoA reductase inhibitor as an active ingredient. Additionally, odontoblasts can be produced by culturing cells capable of differentiating into odontoblasts in the presence of the HMG-CoA reductase inhibitor.
    Type: Application
    Filed: March 28, 2008
    Publication date: July 22, 2010
    Applicant: ORGAN TECHNOLOGIES, INC.
    Inventors: Takuo Kuboki, Mitsuaki Ono, Wataru Sonoyama, Takuo Fujisawa, Kengo Shimono, Masamitsu Oshima, Yosuke Okamoto
  • Patent number: 7609803
    Abstract: A method for estimating a scattered ray intensity distribution in an X-ray CT apparatus, the method includes: irradiating a subject with X-rays; and configuring a cross-sectional image of the subject by detecting the X-rays passing through the subject, on the basis of a path length of a scattered ray passing through the subject, an X-ray absorption coefficient of the subject and an X-ray scattering probability of the subject, intensity of the scattered ray being calculated.
    Type: Grant
    Filed: October 2, 2008
    Date of Patent: October 27, 2009
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Medical Systems Corporation
    Inventors: Yosuke Okamoto, Naruomi Akino