Patents by Inventor Yotaro Hattori

Yotaro Hattori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130237629
    Abstract: The present invention is a curable resin composition comprising a copolymer (A) represented by the following general formula (1), silica fine particles (B), a reactive monomer (C) and a polymerization initiator (D). In the general formula (1), X is an atomic group formed by removing “k” mercapto groups from a multifunctional thiol compound having at least “k” mercapto groups; Y is a monovalent organic group derived from a copolymer formed by copolymerizing unsaturated monomers; and “k” is an integer of 3 to 10. The present invention can provide a hard coat agent which has low curing shrinkage and which has both low curing shrinkage and antiblocking properties as needed; a hard coat film and a hard-coat treated plastic substrate having high pencil hardness and low curling properties, by using this hard coat agent.
    Type: Application
    Filed: November 8, 2011
    Publication date: September 12, 2013
    Applicant: SHOWA DENKO K.K.
    Inventors: Mitsuru Doi, Yoshikatsu Yasui, Nobuaki Ishii, Isao Ohtake, Katsuro Urakawa, Hiroko Oi, Yotaro Hattori
  • Patent number: 8399569
    Abstract: An object of the present invention is to provide a reactive urethane compound having superior curability, adhesion to substrates, transparency, molecular flexibility, and mechanical properties, a curable composition containing the compound, and a cured material formed from the composition. An ethylenically-unsaturated-group containing reactive urethane compound of the present invention is represented by formula (I): wherein R1 and R2 are each independently a hydrogen atom or an alkylene group; R3 is a hydrogen atom, a alkyl group, or an aryl group; R4 is a single bond or an alkylene group; R5 is a hydrogen atom or a methyl group; R6 is an oxygen atom, a sulfur atom, or an imino group; n is 2 to 12; m is 1 to 300; and X is an aliphatic, aromatic or heterocyclic compound residue.
    Type: Grant
    Filed: May 21, 2008
    Date of Patent: March 19, 2013
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Yoshifumi Urakawa
  • Patent number: 8349934
    Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; R
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: January 8, 2013
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
  • Patent number: 8283095
    Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).
    Type: Grant
    Filed: August 14, 2007
    Date of Patent: October 9, 2012
    Assignee: Showa Denko K.K.
    Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
  • Patent number: 8053167
    Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.
    Type: Grant
    Filed: November 15, 2007
    Date of Patent: November 8, 2011
    Assignee: Showa Denko K.K.
    Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
  • Publication number: 20110263779
    Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; R
    Type: Application
    Filed: December 10, 2009
    Publication date: October 27, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
  • Patent number: 8044235
    Abstract: A monomer is provided which is excellent in reactivity, can give high heat resistance and high refractive index, and has two or more polymerizable functional groups with different polymerization properties and an aromatic ring in the molecule. An industrial advantageous process for producing the monomer is also provided. The monomer is an aromatic isocyanate compound containing a (meth)acryloyl group, and is represented by Formula (I): wherein R1 is a single bond or a linear or branched alkylene group of 1 to 5 carbon atoms, R2 is a hydrogen atom or a methyl group, R3 is a single bond or a linear or branched alkylene group of 1 to 3 carbon atoms, X is independently a halogen atom or an electron-withdrawing group, m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 3, and 1?m+n?5.
    Type: Grant
    Filed: March 15, 2006
    Date of Patent: October 25, 2011
    Assignee: Showa Denko K.K.
    Inventors: Kaneo Nozawa, Katsutoshi Ohno, Yotaro Hattori
  • Publication number: 20110077334
    Abstract: It is an object of the present invention to provide a curable composition capable of forming a heat-resistant cured film which is excellent in surface hardness, is good in flexibility and bending properties, and has strength and flexibility that are compatible with each other, and a cured product (film) of the composition. The curable composition includes a reactive (meth)acrylate polymer (A) having a monomer unit represented by the following formula (1), a polymerization initiator (B) and a reactive monomer(C): wherein R1 is a hydrogen atom, a methyl group or an ethyl group, R2 is a hydrogen atom or a methyl group, X1 is a straight-chain or branched hydrocarbon group of 2 to 6 carbon atoms or an alcohol residue of polyethylene glycol, polypropylene glycol or caprolactone-modified both-terminal diol, n is an integer of 2 to 4, and m is an integer of 1 to 5.
    Type: Application
    Filed: May 20, 2009
    Publication date: March 31, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Hiroko OI, Yotaro Hattori, Nobuaki Ishii, Katsumi Murofushi
  • Patent number: 7888399
    Abstract: The present invention relates to a curable composition having high adhesiveness and transparency, comprising a thiol compound containing two or more groups represented by formula (1): wherein the symbols in the formula have the meanings as described in the specification; and an urethane compound containing an ethylenically unsaturated double bond represented by formula (2): wherein the symbols in the formula have the meanings as described in the specification.
    Type: Grant
    Filed: January 25, 2007
    Date of Patent: February 15, 2011
    Assignee: Showa Denko K.K.
    Inventors: Hideo Miyata, Katsuro Urakawa, Haruhiko Ikeda, Yotaro Hattori
  • Publication number: 20100233596
    Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).
    Type: Application
    Filed: August 14, 2007
    Publication date: September 16, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
  • Publication number: 20100210812
    Abstract: It is an object of the present invention to provide a curable composition having excellent curability and capable of forming a cured film which is excellent in surface hardness, scratch resistance, flexibility, bending property, transparency and curling property, and a cured product thereof. The curable composition of the present invention is characterized by comprising (A) a urethane compound represented by the following general formula (1), (B) a thiol compound and (C) a polymerization initiator.
    Type: Application
    Filed: June 26, 2008
    Publication date: August 19, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshifumi Urakawa, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Haruhiko Ikeda, Katsumi Murofushi
  • Publication number: 20100174109
    Abstract: To provide a method for producing an ethylenically unsaturated group-containing isocyanate compound having an ether bond under such conditions that the ether bond is unlikely to be cleaved and the polymerization of an unsaturated group can be suppressed. The method for producing an ethylenically unsaturated group-containing isocyanate compound having an ether bond of the present invention is a method for producing an ethylenically unsaturated double bond-containing isocyanate compound from an amino alcohol having an ether bond and is characterized in that a reaction solvent in which the solubility of hydrogen chloride is 0.1 mole percent or less at 25° C. is used.
    Type: Application
    Filed: May 19, 2008
    Publication date: July 8, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Kaneo Nozawa, Katsutoshi Ohno, Yotaro Hattori
  • Publication number: 20100160557
    Abstract: An object of the present invention is to provide a reactive urethane compound having superior curability, adhesion to substrates, transparency, molecular flexibility, and mechanical properties, a curable composition containing the compound, and a cured material formed from the composition. An ethylenically-unsaturated-group containing reactive urethane compound of the present invention is represented by formula (I): wherein R1 and R2 are each independently a hydrogen atom or an alkylene group; R3 is a hydrogen atom, a alkyl group, or an aryl group; R4 is a single bond or an alkylene group; R5 is a hydrogen atom or a methyl group; R6 is an oxygen atom, a sulfur atom, or an imino group; n is 2 to 12; m is 1 to 300; and X is an aliphatic, aromatic or heterocyclic compound residue.
    Type: Application
    Filed: May 21, 2008
    Publication date: June 24, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Katsumi Murofushi, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Yoshifumi Urakawa
  • Publication number: 20100087611
    Abstract: It is an object of the present invention to provide a urethane compound capable of providing a cured product which is excellent in surface hardness, scratch resistance, flexibility and bending property, has reduced curling property and also has good transparency, a curable composition containing the same and a cured product thereof. The curable composition of the present invention is characterized by containing a specific urethane compound having an isocyanurate ring skeleton and a polymerization initiator.
    Type: Application
    Filed: April 24, 2008
    Publication date: April 8, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshifumi Urakawa, Nobuaki Ishii, Nobuyuki Mitarai, Yotaro Hattori, Hiroko Oi, Katsumi Murofushi
  • Publication number: 20100029876
    Abstract: A polymerization accelerator includes a specific thiol compound. A curable composition of excellent thermal stability contains the polymerization accelerator. A cured product is obtained from the curable composition. The polymerization accelerator includes a thiol compound having two or more groups represented by Formula (1) below: wherein R1 is a hydrogen atom or a C1-10 alkyl group, and m is an integer of 0, 1 or 2.
    Type: Application
    Filed: June 13, 2007
    Publication date: February 4, 2010
    Inventors: Hideo Miyata, Haruhiko Ikeda, Katsumi Murofushi, Yotaro Hattori, Katsuro Urakawa
  • Publication number: 20090054543
    Abstract: A monomer is provided which is excellent in reactivity, can give high heat resistance and high refractive index, and has two or more polymerizable functional groups with different polymerization properties and an aromatic ring in the molecule. An industrial advantageous process for producing the monomer is also provided. The monomer is an aromatic isocyanate compound containing a (meth)acryloyl group, and is represented by Formula (I): wherein R1 is a single bond or a linear or branched alkylene group of 1 to 5 carbon atoms, R2 is a hydrogen atom or a methyl group, R3 is a single bond or a linear or branched alkylene group of 1 to 3 carbon atoms, X is independently a halogen atom or an electron-withdrawing group, m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 3, and 1?m+n?5.
    Type: Application
    Filed: March 15, 2006
    Publication date: February 26, 2009
    Applicant: SHOWA DENKO K.K.
    Inventors: Kaneo Nozawa, Katsutoshi Ohno, Yotaro Hattori
  • Publication number: 20090023831
    Abstract: The present invention relates to a curable composition having high adhesiveness and transparency, comprising a thiol compound containing two or more groups represented by formula (1): wherein the symbols in the formula have the meanings as described in the specification; and an urethane compound containing an ethylenically unsaturated double bond represented by formula (2): wherein the symbols in the formula have the meanings as described in the specification.
    Type: Application
    Filed: January 25, 2007
    Publication date: January 22, 2009
    Inventors: Hideo Miyata, Katsuro Urakawa, Haruhiko Ikeda, Yotaro Hattori