Patents by Inventor Yotaro Hattori
Yotaro Hattori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20130237629Abstract: The present invention is a curable resin composition comprising a copolymer (A) represented by the following general formula (1), silica fine particles (B), a reactive monomer (C) and a polymerization initiator (D). In the general formula (1), X is an atomic group formed by removing “k” mercapto groups from a multifunctional thiol compound having at least “k” mercapto groups; Y is a monovalent organic group derived from a copolymer formed by copolymerizing unsaturated monomers; and “k” is an integer of 3 to 10. The present invention can provide a hard coat agent which has low curing shrinkage and which has both low curing shrinkage and antiblocking properties as needed; a hard coat film and a hard-coat treated plastic substrate having high pencil hardness and low curling properties, by using this hard coat agent.Type: ApplicationFiled: November 8, 2011Publication date: September 12, 2013Applicant: SHOWA DENKO K.K.Inventors: Mitsuru Doi, Yoshikatsu Yasui, Nobuaki Ishii, Isao Ohtake, Katsuro Urakawa, Hiroko Oi, Yotaro Hattori
-
Patent number: 8399569Abstract: An object of the present invention is to provide a reactive urethane compound having superior curability, adhesion to substrates, transparency, molecular flexibility, and mechanical properties, a curable composition containing the compound, and a cured material formed from the composition. An ethylenically-unsaturated-group containing reactive urethane compound of the present invention is represented by formula (I): wherein R1 and R2 are each independently a hydrogen atom or an alkylene group; R3 is a hydrogen atom, a alkyl group, or an aryl group; R4 is a single bond or an alkylene group; R5 is a hydrogen atom or a methyl group; R6 is an oxygen atom, a sulfur atom, or an imino group; n is 2 to 12; m is 1 to 300; and X is an aliphatic, aromatic or heterocyclic compound residue.Type: GrantFiled: May 21, 2008Date of Patent: March 19, 2013Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Yoshifumi Urakawa
-
Patent number: 8349934Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; RType: GrantFiled: December 10, 2009Date of Patent: January 8, 2013Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
-
Patent number: 8283095Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).Type: GrantFiled: August 14, 2007Date of Patent: October 9, 2012Assignee: Showa Denko K.K.Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
-
Patent number: 8053167Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.Type: GrantFiled: November 15, 2007Date of Patent: November 8, 2011Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
-
Publication number: 20110263779Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; RType: ApplicationFiled: December 10, 2009Publication date: October 27, 2011Applicant: SHOWA DENKO K.K.Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
-
Patent number: 8044235Abstract: A monomer is provided which is excellent in reactivity, can give high heat resistance and high refractive index, and has two or more polymerizable functional groups with different polymerization properties and an aromatic ring in the molecule. An industrial advantageous process for producing the monomer is also provided. The monomer is an aromatic isocyanate compound containing a (meth)acryloyl group, and is represented by Formula (I): wherein R1 is a single bond or a linear or branched alkylene group of 1 to 5 carbon atoms, R2 is a hydrogen atom or a methyl group, R3 is a single bond or a linear or branched alkylene group of 1 to 3 carbon atoms, X is independently a halogen atom or an electron-withdrawing group, m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 3, and 1?m+n?5.Type: GrantFiled: March 15, 2006Date of Patent: October 25, 2011Assignee: Showa Denko K.K.Inventors: Kaneo Nozawa, Katsutoshi Ohno, Yotaro Hattori
-
Publication number: 20110077334Abstract: It is an object of the present invention to provide a curable composition capable of forming a heat-resistant cured film which is excellent in surface hardness, is good in flexibility and bending properties, and has strength and flexibility that are compatible with each other, and a cured product (film) of the composition. The curable composition includes a reactive (meth)acrylate polymer (A) having a monomer unit represented by the following formula (1), a polymerization initiator (B) and a reactive monomer(C): wherein R1 is a hydrogen atom, a methyl group or an ethyl group, R2 is a hydrogen atom or a methyl group, X1 is a straight-chain or branched hydrocarbon group of 2 to 6 carbon atoms or an alcohol residue of polyethylene glycol, polypropylene glycol or caprolactone-modified both-terminal diol, n is an integer of 2 to 4, and m is an integer of 1 to 5.Type: ApplicationFiled: May 20, 2009Publication date: March 31, 2011Applicant: SHOWA DENKO K.K.Inventors: Hiroko OI, Yotaro Hattori, Nobuaki Ishii, Katsumi Murofushi
-
Patent number: 7888399Abstract: The present invention relates to a curable composition having high adhesiveness and transparency, comprising a thiol compound containing two or more groups represented by formula (1): wherein the symbols in the formula have the meanings as described in the specification; and an urethane compound containing an ethylenically unsaturated double bond represented by formula (2): wherein the symbols in the formula have the meanings as described in the specification.Type: GrantFiled: January 25, 2007Date of Patent: February 15, 2011Assignee: Showa Denko K.K.Inventors: Hideo Miyata, Katsuro Urakawa, Haruhiko Ikeda, Yotaro Hattori
-
Publication number: 20100233596Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).Type: ApplicationFiled: August 14, 2007Publication date: September 16, 2010Applicant: SHOWA DENKO K.K.Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
-
Publication number: 20100210812Abstract: It is an object of the present invention to provide a curable composition having excellent curability and capable of forming a cured film which is excellent in surface hardness, scratch resistance, flexibility, bending property, transparency and curling property, and a cured product thereof. The curable composition of the present invention is characterized by comprising (A) a urethane compound represented by the following general formula (1), (B) a thiol compound and (C) a polymerization initiator.Type: ApplicationFiled: June 26, 2008Publication date: August 19, 2010Applicant: SHOWA DENKO K.K.Inventors: Yoshifumi Urakawa, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Haruhiko Ikeda, Katsumi Murofushi
-
Publication number: 20100174109Abstract: To provide a method for producing an ethylenically unsaturated group-containing isocyanate compound having an ether bond under such conditions that the ether bond is unlikely to be cleaved and the polymerization of an unsaturated group can be suppressed. The method for producing an ethylenically unsaturated group-containing isocyanate compound having an ether bond of the present invention is a method for producing an ethylenically unsaturated double bond-containing isocyanate compound from an amino alcohol having an ether bond and is characterized in that a reaction solvent in which the solubility of hydrogen chloride is 0.1 mole percent or less at 25° C. is used.Type: ApplicationFiled: May 19, 2008Publication date: July 8, 2010Applicant: SHOWA DENKO K.K.Inventors: Kaneo Nozawa, Katsutoshi Ohno, Yotaro Hattori
-
Publication number: 20100160557Abstract: An object of the present invention is to provide a reactive urethane compound having superior curability, adhesion to substrates, transparency, molecular flexibility, and mechanical properties, a curable composition containing the compound, and a cured material formed from the composition. An ethylenically-unsaturated-group containing reactive urethane compound of the present invention is represented by formula (I): wherein R1 and R2 are each independently a hydrogen atom or an alkylene group; R3 is a hydrogen atom, a alkyl group, or an aryl group; R4 is a single bond or an alkylene group; R5 is a hydrogen atom or a methyl group; R6 is an oxygen atom, a sulfur atom, or an imino group; n is 2 to 12; m is 1 to 300; and X is an aliphatic, aromatic or heterocyclic compound residue.Type: ApplicationFiled: May 21, 2008Publication date: June 24, 2010Applicant: SHOWA DENKO K.K.Inventors: Katsumi Murofushi, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Yoshifumi Urakawa
-
Publication number: 20100087611Abstract: It is an object of the present invention to provide a urethane compound capable of providing a cured product which is excellent in surface hardness, scratch resistance, flexibility and bending property, has reduced curling property and also has good transparency, a curable composition containing the same and a cured product thereof. The curable composition of the present invention is characterized by containing a specific urethane compound having an isocyanurate ring skeleton and a polymerization initiator.Type: ApplicationFiled: April 24, 2008Publication date: April 8, 2010Applicant: SHOWA DENKO K.K.Inventors: Yoshifumi Urakawa, Nobuaki Ishii, Nobuyuki Mitarai, Yotaro Hattori, Hiroko Oi, Katsumi Murofushi
-
Publication number: 20100029876Abstract: A polymerization accelerator includes a specific thiol compound. A curable composition of excellent thermal stability contains the polymerization accelerator. A cured product is obtained from the curable composition. The polymerization accelerator includes a thiol compound having two or more groups represented by Formula (1) below: wherein R1 is a hydrogen atom or a C1-10 alkyl group, and m is an integer of 0, 1 or 2.Type: ApplicationFiled: June 13, 2007Publication date: February 4, 2010Inventors: Hideo Miyata, Haruhiko Ikeda, Katsumi Murofushi, Yotaro Hattori, Katsuro Urakawa
-
Publication number: 20090054543Abstract: A monomer is provided which is excellent in reactivity, can give high heat resistance and high refractive index, and has two or more polymerizable functional groups with different polymerization properties and an aromatic ring in the molecule. An industrial advantageous process for producing the monomer is also provided. The monomer is an aromatic isocyanate compound containing a (meth)acryloyl group, and is represented by Formula (I): wherein R1 is a single bond or a linear or branched alkylene group of 1 to 5 carbon atoms, R2 is a hydrogen atom or a methyl group, R3 is a single bond or a linear or branched alkylene group of 1 to 3 carbon atoms, X is independently a halogen atom or an electron-withdrawing group, m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 3, and 1?m+n?5.Type: ApplicationFiled: March 15, 2006Publication date: February 26, 2009Applicant: SHOWA DENKO K.K.Inventors: Kaneo Nozawa, Katsutoshi Ohno, Yotaro Hattori
-
Publication number: 20090023831Abstract: The present invention relates to a curable composition having high adhesiveness and transparency, comprising a thiol compound containing two or more groups represented by formula (1): wherein the symbols in the formula have the meanings as described in the specification; and an urethane compound containing an ethylenically unsaturated double bond represented by formula (2): wherein the symbols in the formula have the meanings as described in the specification.Type: ApplicationFiled: January 25, 2007Publication date: January 22, 2009Inventors: Hideo Miyata, Katsuro Urakawa, Haruhiko Ikeda, Yotaro Hattori