Patents by Inventor Youfan Gu

Youfan Gu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090228219
    Abstract: A method and apparatus integrates differential pressure measurements and absolute pressure measurements to provide virtual absolute pressure measurements over a wide range of pressures on a single integrated scale.
    Type: Application
    Filed: January 13, 2009
    Publication date: September 10, 2009
    Applicant: MKS INSTRUMENTS, INC.
    Inventors: Paul Dozoretz, Youfan Gu, Garry Holcomb, Ole Wenzel
  • Patent number: 7477996
    Abstract: A method and apparatus integrates differential pressure measurements and absolute pressure measurements to provide a continuous absolute pressure profile over a wide range of pressures on a single integrated scale. The absolute pressure measurements and differential pressure measurements are obtained, and a correlation factor between the absolute pressure measurements and the differential pressure measurements is determined. The correlation factor is used to normalize the differential pressure measurements to virtual absolute pressure values on a common absolute pressure scale with the absolute pressure measurements. An absolute pressure profile over a wide pressure range includes the absolute pressure measurements in a portion of the range where the absolute pressure measurements are accurate, and it includes the virtual absolute pressure values in another portion of the range where the differential pressure measurements are accurate.
    Type: Grant
    Filed: June 6, 2007
    Date of Patent: January 13, 2009
    Assignee: MKS Instruments, Inc.
    Inventors: Paul Dozoretz, Youfan Gu, Garry Holcomb, Ole Wenzel
  • Patent number: 7455720
    Abstract: In a deposition system, such as a TiN deposition system where TiCl4 and NH3 are reacted in a process chamber to produce TiN thin film coatings, a second reactor is included between the process chamber and the vacuum pump to react enough of the theretofore unreacted feed gases to consume substantially all of at least one of them so that further reactions that could otherwise produce solids, which cause excessive vacuum pump wear, are presented. The second reactor is preferably positioned between a cooled condensation trap downstream from the process chamber and vacuum pump, and it is also applicable in atomic layer deposition (ALD) systems for TiN, WN, and other materials as well as in chemical vapor deposition (CVD) systems for those and other materials.
    Type: Grant
    Filed: February 16, 2005
    Date of Patent: November 25, 2008
    Assignee: MKS Instruments, Inc.
    Inventor: Youfan Gu
  • Publication number: 20080023661
    Abstract: A fast-acting, pneumatic diaphragm valve includes a diaphragm valve closure member, a pneumatic piston that provides a closure force on the closure member, and a solenoid pilot valve that controls pressurized air to the piston to cause the piston to move in a reciprocal manner so that the closure member opens and closes the valve. The valve seat seal can be elastomer for enhancing speed, and the solenoid pilot valve can be positioned and configured with air flow longitudinally through or past the solenoid armature to enhance speed.
    Type: Application
    Filed: July 6, 2006
    Publication date: January 31, 2008
    Inventors: Youfan Gu, Sven Nuesken
  • Publication number: 20070288179
    Abstract: A method and apparatus integrates differential pressure measurements and absolute pressure measurements to provide virtual absolute pressure measurements over a wide range of pressures on a single integrated scale.
    Type: Application
    Filed: June 6, 2007
    Publication date: December 13, 2007
    Applicant: MKS INSTRUMENTS, INC.
    Inventors: Paul Dozoretz, Youfan Gu, Garry Holcomb, Ole Wenzel
  • Publication number: 20070235440
    Abstract: A multiple heater control system includes cables, connectors, and junction boxes for user-friendly daisy chain connections of heater controllers and heaters in various configurations or combinations of individually controlled heater series and/or master and slave heater series. The heater controllers include process control of AC power to the heaters and upper-limit safety shutoff that is substantially independent from the process control. The heater controllers also have variable levels of control, adjustment, display, and communications functionality in a base module that is expandable to various levels with expansion modules that are attachable to and detachable from the base module. Connector, cable, and junction configurations, adapters, and latch features enhance user friendliness.
    Type: Application
    Filed: April 5, 2006
    Publication date: October 11, 2007
    Inventors: Youfan Gu, Jeffrey Kiernan, Charles Lawhead, William Bohlinger, Eric Ellis, Curtis Foster, James Hentges, Mark Hoven, James Kreisel, Shawn Leininger, Robert Moran, Kurt Peterson, Jason Powell, Dale Wolfe
  • Publication number: 20060264045
    Abstract: A secondary reaction chamber with a mesh reactor element and a heater assembly are positioned in a foreline between a CVD reaction chamber and a vacuum pump to mix and react all previously unreacted precursor reactants to remove them from the effluent before they can reach and damage the vacuum pump.
    Type: Application
    Filed: May 23, 2005
    Publication date: November 23, 2006
    Inventors: Youfan Gu, David Neumeister
  • Publication number: 20060180026
    Abstract: In a deposition system, such as a TiN deposition system where TiCl4 and NH3 are reacted in a process chamber to produce TiN thin film coatings, a second reactor is included between the process chamber and the vacuum pump to react enough of the theretofore unreacted feed gases to consume substantially all of at least one of them so that further reactions that could otherwise produce solids, which cause excessive vacuum pump wear, are presented. The second reactor is preferably positioned between a cooled condensation trap downstream from the process chamber and vacuum pump, and it is also applicable in atomic layer deposition (ALD) systems for TiN, WN, and other materials as well as in chemical vapor deposition (CVD) systems for those and other materials.
    Type: Application
    Filed: February 16, 2005
    Publication date: August 17, 2006
    Inventor: Youfan Gu
  • Patent number: 7076920
    Abstract: A pirani absolute pressure sensor for sensing absolute pressure in a load lock in a range from 100 to 10?4 torr and a differential pressure sensor for sensing a pressure difference between ambient atmospheric pressure and pressure in the load lock chamber are combined together in a module with a manifold and common circuit components to provide a pressure transducer that is capable of producing not only analog output for absolute pressure measurements, but also control signals at settable absolute and differential pressure values for opening interior and exterior doors of a load lock used to shuttle wafers and other devices into and out of a vacuum processing chamber. The transducer can also produce signals to control transition from slow to fast vacuum pumping of the load lock chamber at a settable threshold pressure.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: July 18, 2006
    Assignee: MKS Instruments, Inc.
    Inventors: Garry Holcomb, Youfan Gu, James Stafford, James M. Mueller, Stacy Wade
  • Publication number: 20060004539
    Abstract: A method and apparatus integrates differential pressure measurements and absolute pressure measurements to provide virtual absolute pressure measurements over a wide range of pressures on a single integrated scale.
    Type: Application
    Filed: June 21, 2005
    Publication date: January 5, 2006
    Inventors: Paul Dozoretz, Youfan Gu, Garry Holcomb, Ole Wenzel
  • Patent number: 6909975
    Abstract: A method and apparatus integrates differential pressure measurements and absolute pressure measurements to provide virtual absolute pressure measurements over a wide range of pressures on a single integrated scale.
    Type: Grant
    Filed: November 24, 2003
    Date of Patent: June 21, 2005
    Assignee: MKS Instruments, Inc.
    Inventors: Paul Dozoretz, Youfan Gu, Garry Holcomb, Ole Wenzel
  • Publication number: 20050114070
    Abstract: A method and apparatus integrates differential pressure measurements and absolute pressure measurements to provide virtual absolute pressure measurements over a wide range of pressures on a single integrated scale.
    Type: Application
    Filed: November 24, 2003
    Publication date: May 26, 2005
    Inventors: Paul Dozoretz, Youfan Gu, Garry Holcomb, Ole Wenzel
  • Patent number: 6895178
    Abstract: The present invention provides a vapor delivery system and method for efficiently producing water vapor on demand. More particularly, the present invention produces low-temperature water vapor, without the formation of ice, by maintaining a sufficient volume of water at a sufficient temperature within a vaporizer chamber when the pressure in the vaporizer chamber is lowered.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: May 17, 2005
    Assignee: MKS Instruments, Inc.
    Inventors: Youfan Gu, Paul Dozoretz, Benjamin Goss, David Neumeister, James Mueller, Donald W. Higgins
  • Patent number: 6790258
    Abstract: A method and apparatus for trapping AlCl3 from an aluminum etch effluent includes a housing containing disposable trapping medium with a first trapping stage and a second trapping media positioned radially outward and axially downward, respectively, from the strap inlet at respective distances to take advantage of differences in heat exchange efficiencies between the trapping media and solid AlCl3 build-up on the trapping media and of resulting changes in partial vapor pressure of AlCl3 adjacent condensation surfaces as solid AlCl3 build-up occurs to initially induce condensation and build-up near the inlet, but then preferentially flow vapor to more distant trapping media as build-up occurs before the build-up clogs the inlet.
    Type: Grant
    Filed: May 2, 2001
    Date of Patent: September 14, 2004
    Assignee: MKS Instruments, Inc.
    Inventor: Youfan Gu
  • Patent number: 6672171
    Abstract: Transducer apparatus and method combining both an absolute pressure sensor for sensing absolute pressure in the load lock chamber and a differential pressure sensor for sensing a pressure difference between ambient atmospheric pressure and pressure in a load lock chamber and provides control signals for opening an interior door from the load lock chamber into a vacuum processing chamber and for opening an exterior door between ambient atmosphere and the load lock chamber. The transducer can also produce signals to control transition from slow to fast vacuum pump-down of load lock chamber pressure at a predetermined pressure set point.
    Type: Grant
    Filed: July 16, 2001
    Date of Patent: January 6, 2004
    Assignee: MKS Instruments, Inc.
    Inventors: Youfan Gu, Garry Holcomb, Ole Wenzel
  • Patent number: 6562109
    Abstract: Trap apparatus and method for removing contaminants from the gaseous effluent flows from chemical vapor deposition chambers and processes by flowing the particle laden gas into an upper chamber of the trap apparatus, imparting additional kinetic energy to the powder particles to enhance separation of the powder particles from the gas, and then flowing the gas, sans the powder particles, out of the trap, while the powder particles fall into and are captured by a lower chamber positioned below the upper chamber and remote from the flowing gas. An impeller positioned in the upper chamber in the inlet path imparts the additional kinetic energy. For some reaction gas systems, an optional reactor with hydrophillic, rotating growth substrates enhance and accelerate growth of solid particles, which are then dislodged from the media, and fed by the flowing gas into the upper chamber for capture as previously described.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: May 13, 2003
    Assignee: MKS Instruments, Inc.
    Inventors: Darren Livingston, Youfan Gu, Paul Dozoretz, James M. Mueller
  • Publication number: 20030063901
    Abstract: The present invention provides a vapor delivery system and method for efficiently producing water vapor on demand. More particularly, the present invention produces low-temperature water vapor, without the formation of ice, by maintaining a sufficient volume of water at a sufficient temperature within a vaporizer chamber when the pressure in the vaporizer chamber is lowered.
    Type: Application
    Filed: July 16, 2002
    Publication date: April 3, 2003
    Inventors: Youfan Gu, Paul Dozoretz, Benjamin Goss, David Neumeister, James Mueller, Donald W. Higgins
  • Publication number: 20030010129
    Abstract: Transducer apparatus and method combining both an absolute pressure sensor for sensing absolute pressure in the load lock chamber and a differential pressure sensor for sensing a pressure difference between ambient atmospheric pressure and pressure in a load lock chamber and provides control signals for opening an interior door from the load lock chamber into a vacuum processing chamber and for opening an exterior door between ambient atmosphere and the load lock chamber. The transducer can also produce signals to control transition from slow to fast vacuum pump-down of load lock chamber pressure at a predetermined pressure set point.
    Type: Application
    Filed: July 16, 2001
    Publication date: January 16, 2003
    Inventors: Youfan Gu, Garry Holcomb, Ole Wenzel
  • Patent number: 6488745
    Abstract: A trap for condensable liquids, such as tantalum pentoxide, has a primary trapping chamber surrounding a secondary trapping chamber and a sump connected by a small enough opening to the primary or secondary chamber such that trapped liquid in the sump is effectively isolated from a gas flow through the primary and secondary chambers. Partitions and openings in the primary and secondary chambers enhance condensation while allowing condensed liquid flow that does not clog the primary and secondary chambers against the gas flow.
    Type: Grant
    Filed: March 23, 2001
    Date of Patent: December 3, 2002
    Assignee: MKS Instruments, Inc.
    Inventor: Youfan Gu
  • Publication number: 20020139249
    Abstract: Trap apparatus and method for removing contaminants from the gaseous effluent flows from chemical vapor deposition chambers and processes by flowing the particle laden gas into an upper chamber of the trap apparatus, imparting additional kinetic energy to the powder particles to enhance separation of the powder particles from the gas, and then flowing the gas, sans the powder particles, out of the trap, while the powder particles fall into and are captured by a lower chamber positioned below the upper chamber and remote from the flowing gas. An impeller positioned in the upper chamber in the inlet path imparts the additional kinetic energy. For some reaction gas systems, an optional reactor with hydrophillic, rotating growth substrates enhance and accelerate growth of solid particles, which are then dislodged from the media, and fed by the flowing gas into the upper chamber for capture as previously described.
    Type: Application
    Filed: March 28, 2001
    Publication date: October 3, 2002
    Inventors: Darren Livingston, Youfan Gu, Paul Dozoretz, James M. Mueller