Patents by Inventor Youfan Gu

Youfan Gu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020139249
    Abstract: Trap apparatus and method for removing contaminants from the gaseous effluent flows from chemical vapor deposition chambers and processes by flowing the particle laden gas into an upper chamber of the trap apparatus, imparting additional kinetic energy to the powder particles to enhance separation of the powder particles from the gas, and then flowing the gas, sans the powder particles, out of the trap, while the powder particles fall into and are captured by a lower chamber positioned below the upper chamber and remote from the flowing gas. An impeller positioned in the upper chamber in the inlet path imparts the additional kinetic energy. For some reaction gas systems, an optional reactor with hydrophillic, rotating growth substrates enhance and accelerate growth of solid particles, which are then dislodged from the media, and fed by the flowing gas into the upper chamber for capture as previously described.
    Type: Application
    Filed: March 28, 2001
    Publication date: October 3, 2002
    Inventors: Darren Livingston, Youfan Gu, Paul Dozoretz, James M. Mueller
  • Publication number: 20020134244
    Abstract: A trap for condensable liquids, such as tantalum pentoxide, has a primary trapping chamber surrounding a secondary trapping chamber and a sump connected by a small enough opening to the primary or secondary chamber such that trapped liquid in the sump is effectively isolated from a gas flow through the primary and secondary chambers. Partitions and openings in the primary and secondary chambers enhance condensation while allowing condensed liquid flow that does not clog the primary and secondary chambers against the gas flow.
    Type: Application
    Filed: March 23, 2001
    Publication date: September 26, 2002
    Applicant: MKS Instruments, Inc.
    Inventor: Youfan Gu
  • Publication number: 20020053191
    Abstract: A method and apparatus for trapping AlCl3 from an aluminum etch effluent includes a housing containing disposable trapping medium with a first trapping stage and a second trapping media positioned radially outward and axially downward, respectively, from the strap inlet at respective distances to take advantage of differences in heat exchange efficiencies between the trapping media and solid AlCl3 build-up on the trapping media and of resulting changes in partial vapor pressure of AlCl3 adjacent condensation surfaces as solid AlCl3 build-up occurs to initially induce condensation and build-up near the inlet, but then preferentially flow vapor to more distant trapping media as build-up occurs before the build-up clogs the inlet.
    Type: Application
    Filed: May 2, 2001
    Publication date: May 9, 2002
    Inventor: Youfan Gu
  • Patent number: 6361607
    Abstract: A TEOS trap for controlling TEOS polymerization from reaction furnace effluent in a vacuum pump line a SiO2 CVD process includes a molecular species-selective flow impeding medium that adsorbs and retains TEOS and water molecules from the effluent long enough to consume substantially all the water molecules in TEOS hydrolysis reactions while allowing non-hydrolyzed TEOS, ethylene, and other gaseous byproducts to pass through the trap and retaining solid and liquid phase SiO2-rich TEOS polymers formed by the hydrolysis reactions in the trap for subsequent removal and disposal. The molecular species-selective flow impeding medium has a plurality of adsorption surfaces to make a surface density that performs the TEOS and water flow impeding function and solid and liquid phase TEOS polymer trapping function.
    Type: Grant
    Filed: February 12, 2001
    Date of Patent: March 26, 2002
    Assignee: MKS Instruments, Inc.
    Inventors: Paul Dozoretz, Youfan Gu
  • Publication number: 20010029889
    Abstract: Transducer apparatus and method combining both an absolute pressure sensor for sensing absolute pressure in the load lock chamber and a differential pressure sensor for sensing a pressure difference between ambient atmospheric pressure and pressure in a load lock chamber and provides control signals for opening an interior door from the load lock chamber into a vacuum processing chamber and for opening an exterior door between ambient atmosphere and the load lock chamber. The transducer can also produce signals to control transition from slow to fast vacuum pump-down of load lock chamber pressure at a predetermined pressure set point.
    Type: Application
    Filed: March 21, 2001
    Publication date: October 18, 2001
    Inventors: Garry Holcomb, Youfan Gu, James Stafford, James M. Mueller, Stacy Wade
  • Publication number: 20010017080
    Abstract: A TEOS trap for controlling TEOS polymerization from reaction furnace effluent in a vacuum pump line a SiO2 CVD process includes a molecular species-selective flow impeding medium that adsorbs and retains TEOS and water molecules from the effluent long enough to consume substantially all the water molecules in TEOS hydrolysis reactions while allowing non-hydrolyzed TEOS, ethylene, and other gaseous byproducts to pass through the trap and retaining solid and liquid phase SiO2-rich TEOS polymers formed by the hydrolysis reactions in the trap for subsequent removal and disposal. The molecular species-selective flow impeding medium has a plurality of adsorption surfaces to make a surface density that performs the TEOS and water flow impeding function and solid and liquid phase TEOS polymer trapping function.
    Type: Application
    Filed: February 12, 2001
    Publication date: August 30, 2001
    Inventors: Paul Dozoretz, Youfan Gu
  • Patent number: 6238514
    Abstract: The present invention provides an improved aluminum chloride trap having a disposable element, wherein the disposable element contains trapping media for condensing, solidifying and trapping condensable aluminum chloride vapor. The trap is designed such that the disposable element may be easily removed for rapid and safe disposal of condensed aluminum chloride solids and subsequently replaced with a new disposable element. The disposable element efficiently traps condensable aluminum chloride vapor from an aluminum etch system without the need for internal or external cooling means, such that condensable aluminum chloride vapor is prevented from condensing and depositing on the interior walls of the trap or on the interior walls of a vacuum conduit system used in an aluminum etch system.
    Type: Grant
    Filed: January 21, 2000
    Date of Patent: May 29, 2001
    Assignee: MKS Instruments, Inc.
    Inventor: Youfan Gu
  • Patent number: 6197119
    Abstract: A TEOS trap for controlling TEOS polymerization from reaction furnace effluent in a vacuum pump line a SiO2 CVD process includes a molecular species-selective flow impeding medium that adsorbs and retains TEOS and water molecules from the effluent long enough to consume substantially all the water molecules in TEOS hydrolysis reactions while allowing non-hydrolyzed TEOS, ethylene, and other gaseous byproducts to pass through the trap and retaining solid and liquid phase SiO2-rich TEOS polymers formed by the hydrolysis reactions in the trap for subsequent removal and disposal. The molecular species-selective flow impeding medium has a plurality of adsorption surfaces to make a surface density that performs the TEOS and water flow impeding fuction and solid and liquid phase TEOS polymer trapping function.
    Type: Grant
    Filed: February 18, 1999
    Date of Patent: March 6, 2001
    Assignee: MKS Instruments, Inc.
    Inventors: Paul Dozoretz, Youfan Gu
  • Patent number: 5827370
    Abstract: An apparatus for preventing the deposition and build-up of chains of polymerized TEOS molecules in the pipes downstream from a reaction furnace in a semiconductor manufacturing process includes an annular nozzle assembly positioned inside the pipes such that a plenum is formed between the annular nozzle assembly and the pipes and such that the annular nozzle forms a hollow tubular conduit for conducting effluent from the reaction furnace. The annular nozzle assembly preferably includes three hollow and generally cylindrical sections, an upstream collar, a downstream spacer ring, and a middle section(s) positioned between the upstream collar and the downstream spacer ring. The annular nozzle assembly is placed within the pipes downstream of the reaction furnace during operation and is modularly constructed so that the length of the annular nozzle assembly can be varied, depending on the length of the downstream pipes from the reaction furnace.
    Type: Grant
    Filed: January 13, 1997
    Date of Patent: October 27, 1998
    Assignee: MKS Instruments, Inc.
    Inventor: Youfan Gu
  • Patent number: 5820641
    Abstract: The liquid cooled trap for effectively and efficiently collecting condensable vapor in a chemical vapor reaction system includes two stages. The first stage includes an entrance area to the trap that is purposely designed to be large in space and a very poor heat exchanger in order to avoid condensation and resulting solid deposits that could clog the entrance port to the trap. The second stage comprises a better heat exchanger to spread the condensation and deposits efficiently over a larger surface area and a longer flow path. The second stage is a very efficient heat exchanger to clean up and remove whatever small amount of the condensable vapor remains after the first stage of the trap. The second stage includes cooling coil tubes and cooling cones or fins to increase the overall efficiency of the trap be increasing the interior surfaces upon which the flowing condensable vapor can condense, while not significantly reducing the flow conductance of the trap.
    Type: Grant
    Filed: February 9, 1996
    Date of Patent: October 13, 1998
    Assignee: MKS Instruments, Inc.
    Inventors: Youfan Gu, Dana S. Hauschultz