Patents by Inventor Young Nam Choi

Young Nam Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10903490
    Abstract: Disclosed is a lithium complex oxide and method of manufacturing the same, more particularly, a lithium complex oxide effective in improving the characteristics of capacity, resistance, and lifetime with reduced residual lithium and with different interplanar distances of crystalline structure between a primary particle locating in an internal part of secondary particle and a primary particle locating on the surface part of the secondary particle, and a method of preparing the same.
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: January 26, 2021
    Assignee: ECOPRO BM CO., LTD.
    Inventors: Moon Ho Choi, Jong Seung Shin, Dong Hee Kim, Suk Yong Jeon, Hyun Jong Yu, Kyoung Jun Lee, Young Nam Park
  • Publication number: 20200338652
    Abstract: The present disclosure relates to a cutting insert, and a cutting insert according to the present disclosure comprises: an upper surface and a lower surface oriented in opposite directions; a first and a second shorter side surface connecting the upper surface and the lower surface to each other and oriented in opposite directions; a first and a second longer side surfaces connecting the upper surface and the lower surface to each other, connecting the first and the second shorter side surfaces to each other, oriented in opposite directions, and being longer than the first and the second shorter side surfaces; and a through hole extending through the upper surface and the lower surface, wherein when viewed toward the upper surface, the first longer side surface has two side portions, each side portion having an inclined shape with reference to the center portion.
    Type: Application
    Filed: August 31, 2018
    Publication date: October 29, 2020
    Applicant: KORLOY INC.
    Inventors: Young Nam CHOI, Sang Yong LEE, Young Heum KIM, Sun Yong AHN
  • Publication number: 20200277298
    Abstract: The present disclosure provides a compound of Chemical Formula (1) or a pharmaceutically acceptable salt thereof, and a pharmaceutical composition comprising the same: wherein X, Z, R1 and R2 are as defined in the specification. The compound of Chemical Formula (1) or pharmaceutically acceptable salt thereof acts as a positive allosteric modulator of metabotropic glutamate receptor subtype 5 (mGluR5), thereby being useful in the prevention or treatment of disorder mediated by glutamate dysfunction and mGluR5.
    Type: Application
    Filed: April 17, 2020
    Publication date: September 3, 2020
    Inventors: Chun Eung PARK, Young Koo JANG, Yong Je SHIN, Ji Yeon KIM, Seung Mo HAM, Yong Gil KIM, Hye Kyung MIN, Soo Bong CHA, Hyo Jun JUNG, Ju Young LEE, Seung Nam HAN, Jin Yong CHUNG, Eun Ju CHOI, Chan Mi JOUNG, Jong Sil PARK, Ji Won LEE, Nahm Ryune CHO, Eun Ju RYU, Cheol Young MAENG
  • Publication number: 20200220095
    Abstract: An organic light emitting display device includes a substrate with a first emitting region adjacent a second emitting region, a first anode in the first emitting region, a first organic light emitting layer on the first anode, a second anode in the second emitting region, and a second organic light emitting layer on a part of the first anode and the second anode. The second organic light emitting layer includes a material different from the first organic light emitting layer.
    Type: Application
    Filed: March 20, 2020
    Publication date: July 9, 2020
    Inventors: Sang Hyun CHOI, Young Nam YUN
  • Patent number: 10700355
    Abstract: Disclosed is a lithium complex oxide and method of manufacturing the same, more particularly, a lithium complex oxide effective in improving the characteristics of capacity, resistance, and lifetime with reduced residual lithium and with different interplanar distances of crystalline structure between a primary particle locating in a internal part of secondary particle and a primary particle locating on the surface part of the secondary particle, and a method of preparing the same.
    Type: Grant
    Filed: October 2, 2019
    Date of Patent: June 30, 2020
    Assignee: ECOPRO BM CO., LTD.
    Inventors: Moon Ho Choi, Jong Seung Shin, Dong Hee Kim, Suk Yong Jeon, Hyun Jong Yu, Kyoung Jun Lee, Young Nam Park
  • Patent number: 10693136
    Abstract: Disclosed is a lithium complex oxide and method of manufacturing the same, more particularly, a lithium complex oxide effective in improving the characteristics of capacity, resistance, and lifetime with reduced residual lithium and with different interplanar distances of crystalline structure between a primary particle locating in a internal part of secondary particle and a primary particle locating on the surface part of the secondary particle, and a method of preparing the same.
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: June 23, 2020
    Assignee: ECOPRO BM CO., LTD.
    Inventors: Moon Ho Choi, Jong Seung Shin, Dong Hee Kim, Suk Yong Jeon, Hyun Jong Yu, Kyoung Jun Lee, Young Nam Park
  • Patent number: 10622577
    Abstract: An organic light emitting display device includes a substrate with a first emitting region adjacent a second emitting region, a first anode in the first emitting region, a first organic light emitting layer on the first anode, a second anode in the second emitting region, and a second organic light emitting layer on a part of the first anode and the second anode. The second organic light emitting layer includes a material different from the first organic light emitting layer.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: April 14, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sang Hyun Choi, Young Nam Yun
  • Patent number: 10607853
    Abstract: The present invention relates to a CMP slurry composition for polishing a copper line, the CMP slurry composition comprising a colloidal silica, an oxidizing agent, a complexing agent, a corrosion inhibitor, a pH regulator, and ultrapure water. The colloidal silica has a specific surface area (BET) of 72.9 to 88.5 m2/g, and 0.1 to 2 wt % of the colloidal silica is included in the CMP slurry composition. The CMP slurry composition has an excellent copper line polishing rate, has a low number of defects and minimizes scratches after polishing, and can minimize dishing.
    Type: Grant
    Filed: October 12, 2015
    Date of Patent: March 31, 2020
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jong Il Noh, Dong Hun Kang, Jeong Hwan Jeong, Young Nam Choi
  • Patent number: 10556277
    Abstract: The technical objective of the present invention is to provide a double-sided cutting insert having a high feed rate, which can increase the edge strength and reduce the cutting load, and thus can be suitable for high feed rate processing.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: February 11, 2020
    Assignee: KORLOY INC.
    Inventors: Sang Yong Lee, Young Nam Choi, Jae Yeong Mun, Sun Yong Ahn
  • Publication number: 20200036006
    Abstract: Disclosed is a lithium complex oxide and method of manufacturing the same, more particularly, a lithium complex oxide effective in improving the characteristics of capacity, resistance, and lifetime with reduced residual lithium and with different interplanar distances of crystalline structure between a primary particle locating in a internal part of secondary particle and a primary particle locating on the surface part of the secondary particle, and a method of preparing the same.
    Type: Application
    Filed: October 2, 2019
    Publication date: January 30, 2020
    Inventors: Moon Ho CHOI, Jong Seung SHIN, Dong Hee KIM, Suk Yong JEON, Hyun Jong YU, Kyoung Jun LEE, Young Nam PARK
  • Publication number: 20200030885
    Abstract: The technical objective of the present invention is to provide a cutting insert cooling device capable of easily mounting a spraying member to a cutting tool while preventing the rotation thereof and eliminating the risk of losing a screw. To this end, the cutting insert cooling device according to the present invention, capable of spraying cooling water toward the cutting insert coupled to the cutting tool, comprises: a head part which forms the terminal end portion of the cutting tool and has a cooling water guide flow path part, and to which the cutting insert is coupled; a spraying member having a cooling water spouting flow path part to spray, toward the cutting insert, the cooling water guided through the cooling water guide flow path part; and an attaching and detaching unit that slides the spraying member to the head part so as to attach and detach the same.
    Type: Application
    Filed: March 14, 2018
    Publication date: January 30, 2020
    Applicant: KORLOY INC.
    Inventors: Jae Yeong MUN, Byung Hoon MIN, Sang Yong LEE, Young Nam CHOI, Sun Yong AHN, Young Heum KIM
  • Publication number: 20200023446
    Abstract: The present disclosure's technical object is to provide a high feed cutting insert capable of providing a sufficient entering angle while ensuring rigidity of a cutting tool's bottom part.
    Type: Application
    Filed: March 13, 2018
    Publication date: January 23, 2020
    Applicant: KORLOY INC.
    Inventors: Sang Yong LEE, Young Nam CHOI, Jae Man PARK
  • Publication number: 20190388981
    Abstract: The technical problem to be solved by the present disclosure is to provide a single-sided high feed cutting insert which can have increased edge strength and reduced cutting load so as to be suitable for high feed machining. To this end, the single-sided high feed cutting insert of the present disclosure comprises: a short cutting edge disposed between a major surface and a short lateral surface; a long cutting edge disposed between the major surface and a long lateral surface; and a corner cutting edge disposed between the short cutting edge and the long cutting edge, wherein the short cutting edge has an outwardly convex curved shape when viewed from the major surface, and a minor surface has a straight shape when viewed from the short and long lateral surfaces, respectively.
    Type: Application
    Filed: December 15, 2017
    Publication date: December 26, 2019
    Applicant: KORLOY INC.
    Inventors: Sang Yong LEE, Young Nam CHOI, Jae Man PARK
  • Patent number: 10483540
    Abstract: Disclosed is a lithium complex oxide and method of manufacturing the same, more particularly, a lithium complex oxide effective in improving the characteristics of capacity, resistance, and lifetime with reduced residual lithium and with different interplanar distances of crystalline structure between a primary particle locating in a internal part of secondary particle and a primary particle locating on the surface part of the secondary particle, and a method of preparing the same.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: November 19, 2019
    Assignee: ECOPRO BM CO., LTD.
    Inventors: Moon Ho Choi, Jong Seung Shin, Dong Hee Kim, Suk Yong Jeon, Hyun Jong Yu, Kyoung Jun Lee, Young Nam Park
  • Publication number: 20190157672
    Abstract: The present invention relates to a lithium metal complex oxide and a preparation method thereof, and more particularly, to a lithium metal complex oxide mixed with a metal compound for a lithium reaction, stirred and heat-treated to allow residual lithium and a metal compound for reducing lithium (or a metal compound for lithium reduction) to react with each other on a surface to form a product, which is included in the lithium metal complex oxide, in which the content of Ni3+ is higher than the content of Ni2+ and a ratio of Ni3+/Ni2+ is 1.5 or greater so that life characteristics and capacity characteristics are improved, while residual lithium is reduced, and a preparation method thereof.
    Type: Application
    Filed: November 23, 2018
    Publication date: May 23, 2019
    Inventors: Moon Ho Choi, Jong Hwan Park, Gyeong Jae Heo, Hyun Jong Yu, Yonghwan Gwon, Young Nam Park, Eun Byeol Hyeong
  • Patent number: 10259055
    Abstract: The purpose of the present invention is to provide a cutting insert capable of reducing cutting load and enhancing squareness.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: April 16, 2019
    Assignee: KORLOY INC.
    Inventors: Young-nam Choi, Sang-yong Lee, Sun-yong Ahn
  • Publication number: 20180333791
    Abstract: The technical objective of the present invention is to provide a double-sided cutting insert having a high feed rate, which can increase the edge strength and reduce the cutting load, and thus can be suitable for high feed rate processing.
    Type: Application
    Filed: August 30, 2016
    Publication date: November 22, 2018
    Applicant: KORLOY INC.
    Inventors: Sang Yong LEE, Young Nam CHOI, Jae Yeong MUN, Sun Yong AHN
  • Publication number: 20180085836
    Abstract: The purpose of the present invention is to provide a cutting insert capable of reducing cutting load and enhancing squareness.
    Type: Application
    Filed: March 3, 2016
    Publication date: March 29, 2018
    Applicant: KORLOY INC.
    Inventors: Young-nam CHOI, Sang-yong LEE, Sun-yong AHN
  • Publication number: 20170271172
    Abstract: The present invention relates to a CMP slurry composition for polishing a copper line, the CMP slurry composition comprising a colloidal silica, an oxidizing agent, a complexing agent, a corrosion inhibitor, a pH regulator, and ultrapure water. The colloidal silica has a specific surface area (BET) of 72.9 to 88.5 m2/g, and 0.1 to 2 wt % of the colloidal silica is included in the CMP slurry composition. The CMP slurry composition has an excellent copper line polishing rate, has a low number of defects and minimizes scratches after polishing, and can minimize dishing.
    Type: Application
    Filed: October 12, 2015
    Publication date: September 21, 2017
    Inventors: Jong IL NOH, Dong Hun KANG, Jeong Hwan JEONG, Young Nam CHOI
  • Patent number: 9593260
    Abstract: The present invention relates to a CMP slurry composition for polishing copper, comprising: polishing particles; a complexing agent; a corrosion inhibitor; and deionized water. The complexing agent comprises one or more organic acids selected from oxalic acid, malic acid, malonic acid, and formic acid, and glycine.
    Type: Grant
    Filed: June 21, 2013
    Date of Patent: March 14, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Jong Il Noh, Dong Hun Kang, Tae Wan Kim, Jeong Hwan Jeong, Young Nam Choi, Chang Ki Hong