Patents by Inventor Young Soo Seo

Young Soo Seo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11765976
    Abstract: Proposed is a method for producing a polymeric piezoelectric composite having boron nitride nanotubes (BNNT) dispersed therein, the method including: a solution-providing step for providing a polymeric solution; a dispersing step for dispersing BNNT in the polymeric solution; and an electro spinning step for electro spinning the polymeric solution with BNNT dispersed therein, thereby producing micro- and/or nano fibers based polymeric piezoelectric composites.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: September 19, 2023
    Assignee: NAiEEL Technology
    Inventors: Jaewoo Kim, Duckbong Seo, Byunghoon Kim, Junghwan Jung, Inpil Kang, Young-Soo Seo, Hoon Huh
  • Publication number: 20220196964
    Abstract: The present embodiment relates to a liquid lens comprising: a case forming a chamber therein; a liquid disposed in the chamber; and a heating member disposed in the case and heating the liquid, wherein the case comprises: a first plate through which an optical axis passes, and disposed on one side of the liquid; and a second plate through which the optical axis passes, and disposed on the other side of the liquid, the thickness of the first plate on the optical axis is thinner than that of the second plate on the optical axis, and the chamber is filled with a single liquid.
    Type: Application
    Filed: April 6, 2020
    Publication date: June 23, 2022
    Applicants: LG INNOTEK CO., LTD., CORNING INCORPORATED
    Inventors: Young Soo SEO, Jae Keun PARK
  • Patent number: 11155699
    Abstract: Provided are nanocellulose composite and preparation method thereof. The method comprises preparing cellulose nanofiber, mixing the cellulose nanofiber with a silica precursor in a solvent to attach silica particles to the surface of the cellulose nanofiber, or to form a silica coating layer on the surface of the cellulose nanofiber, and mixing the cellulose nanofiber with the silica particles or the silica coating layer with a polymer. According to the present invention, by using surface vitrification-treated nano cellulose, nanocellulose polymer composites that exhibits high mechanical properties such as impact resistance as well as excellent heat resistance can be prepared.
    Type: Grant
    Filed: April 12, 2018
    Date of Patent: October 26, 2021
    Assignee: INDUSTRY-ACADEMIA COOPERATION GROUP OF SEJONG UNIVERSITY
    Inventors: Young Soo Seo, Sang Yul Park, Hyo Sun Kim, Song Hee Lee
  • Patent number: 10898882
    Abstract: The boron nitride nanostructure according to an embodiment of the present invention forms defects through surface modification and incorporates the metallic nanoparticles on the surface defects.
    Type: Grant
    Filed: January 21, 2019
    Date of Patent: January 26, 2021
    Assignee: NAIEEL TECHNOLOGY
    Inventors: Jaewoo Kim, Young-Soo Seo, Tae Jin Kim, Jun Ki Kim, Won-Il Lee, Duckbong Seo
  • Publication number: 20200357979
    Abstract: Proposed is a method for producing a polymeric piezoelectric composite having boron nitride nanotubes (BNNT) dispersed therein, the method including: a solution-providing step for providing a polymeric solution; a dispersing step for dispersing BNNT in the polymeric solution; and an electro spinning step for electro spinning the polymeric solution with BNNT dispersed therein, thereby producing micro- and/or nano fibers based polymeric piezoelectric composites.
    Type: Application
    Filed: November 21, 2019
    Publication date: November 12, 2020
    Inventors: Jaewoo Kim, Duckbong Seo, Byunghoon Kim, Junghwan Jung, Inpil Kang, Young-Soo Seo, Hoon Huh
  • Publication number: 20200157318
    Abstract: Provided are nanocellulose composite and preparation method thereof. The method comprises preparing cellulose nanofiber, mixing the cellulose nanofiber with a silica precursor in a solvent to attach silica particles to the surface of the cellulose nanofiber, or to form a silica coating layer on the surface of the cellulose nanofiber, and mixing the cellulose nanofiber with the silica particles or the silica coating layer with a polymer. According to the present invention, by using surface vitrification-treated nano cellulose, nanocellulose polymer composites that exhibits high mechanical properties such as impact resistance as well as excellent heat resistance can be prepared.
    Type: Application
    Filed: April 12, 2018
    Publication date: May 21, 2020
    Applicant: INDUSTRY-ACADEMIA COOPERATION GROUP OF SEJONG UNIVERSITY
    Inventors: Young Soo SEO, Sang Yul PARK, Hyo Sun KIM, Song Hee LEE
  • Publication number: 20190329228
    Abstract: The boron nitride nanostructure according to an embodiment of the present invention forms defects through surface modification and incorporates the metallic nanoparticles on the surface defects.
    Type: Application
    Filed: January 21, 2019
    Publication date: October 31, 2019
    Inventors: Jaewoo KIM, Young-Soo SEO, Tae Jin KIM, Jun Ki KIM, Won-II LEE, Duckbong SEO
  • Patent number: 10069044
    Abstract: There are provided a microcapsular quantum dot-polymer composite, a method for producing the composite, optical elements, and a method for producing the optical elements. In order to produce the microcapsular quantum dot-polymer composite, a polymer having a functional group in the side chain is firstly heated in a first solvent to form a polymer solution. A quantum dot suspension consisting of quantum dots capped by a capping layer dispersed in a second solvent is added to the polymer solution to form a mixed solution. The mixed solution is cooled to form the quantum dot-polymer composite consisting of the quantum dots dispersed in the polymer matrix.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 4, 2018
    Assignee: INDUSTRY-ACADEMIA COOPERATION GROUP OF SEJONG UNIV
    Inventors: Young Soo Seo, Hee Sung Yang, Sang Yul Park, Hye Mi Son, Hyo Sun Kim
  • Publication number: 20160168706
    Abstract: Provided are a liner assembly and a substrate processing apparatus including the liner assembly. The liner assembly includes a side liner, an intermediate liner, and a lower liner. The side liner has a cylindrical shape with upper and lower portions opened. The intermediate liner is disposed under the side liner and has a plurality of first holes passing therethrough in a vertical direction. The lower liner is disposed under the intermediate liner. Here, the plurality of first holes are formed in different sizes and numbers in a plurality of regions.
    Type: Application
    Filed: February 11, 2016
    Publication date: June 16, 2016
    Inventors: Young-Soo SEO, Young-Ki HAN, Jun-Hyeok LEE, Woo-Sik SHIN, Noh-Sun MYOUNG
  • Publication number: 20160160351
    Abstract: Provided are a liner assembly and a substrate processing apparatus including the liner assembly. The liner assembly includes a side liner, an intermediate liner, and a lower liner. The side liner has a cylindrical shape with upper and lower portions opened. The intermediate liner is disposed under the side liner and has a plurality of first holes passing therethrough in a vertical direction. The lower liner is disposed under the intermediate liner. Here, the plurality of first holes are formed in different sizes and numbers in a plurality of regions.
    Type: Application
    Filed: February 11, 2016
    Publication date: June 9, 2016
    Inventors: Young-Soo SEO, Young-Ki HAN, Jun-Hyeok LEE, Woo-Sik SHIN, Noh-Sun MYOUNG
  • Publication number: 20150348755
    Abstract: Provided is a gas distribution apparatus including first and second regions vertically separated therein. In the first region, a first process gas supplied to the first region from the outside is injected after being excited into a plasma state, and in the second region, a second process gas supplied after being excited into a plasma state from the outside is injected after being accommodated.
    Type: Application
    Filed: May 9, 2015
    Publication date: December 3, 2015
    Inventors: Young-Ki HAN, Young-Soo SEO, Suk Ki MIN, Jun-Hyeok LEE, Kyu-Sang LEE
  • Publication number: 20150072092
    Abstract: There are provided a microcapsular quantum dot-polymer composite, a method for producing the composite, optical elements, and a method for producing the optical elements. In order to produce the microcapsular quantum dot-polymer composite, a polymer having a functional group in the side chain is firstly heated in a first solvent to form a polymer solution. A quantum dot suspension consisting of quantum dots capped by a capping layer dispersed in a second solvent is added to the polymer solution to form a mixed solution. The mixed solution is cooled to form the quantum dot-polymer composite consisting of the quantum dots dispersed in the polymer matrix.
    Type: Application
    Filed: March 15, 2013
    Publication date: March 12, 2015
    Inventors: Young Soo Seo, Hee Sung Yang, Sang Yul Park, Hye Mi Son, Hyo Sun Kim
  • Patent number: 8927630
    Abstract: The present disclosure relates to a silane-containing inorganic nanofiller, a varnish including the silane-containing inorganic nanofiller, an enameled wire including the silane-containing inorganic nanofiller, and a method for preparing the enameled wire.
    Type: Grant
    Filed: June 22, 2012
    Date of Patent: January 6, 2015
    Assignee: Sejong University Industry Academy Cooperation Foundation
    Inventors: Young-Soo Seo, Yongbeom Kim
  • Publication number: 20140332498
    Abstract: Provided are a substrate holder, a substrate supporting apparatus, a substrate processing apparatus, and a substrate processing method. Particularly, there are provided a substrate holder, a substrate supporting apparatus, a substrate processing apparatus, and a substrate processing method that are adapted to improve process efficiency and etch uniformity at the back surface of a substrate.
    Type: Application
    Filed: July 21, 2014
    Publication date: November 13, 2014
    Inventors: Young Ki HAN, Young Soo SEO, Hyoung Won KIM, Chi Kug YOON, Sang Hoon LEE
  • Patent number: 8864936
    Abstract: There are provided an apparatus and method for processing a substrate. By using the apparatus and method, plasma processing can be individually performed on each of edge and rear regions of a substrate in a single chamber. The apparatus includes a chamber providing a reaction space; a stage installed in the chamber; a plasma shielding unit installed opposite to the stage in the chamber; a support unit for supporting a substrate between the stage and the plasma shielding unit; a first supply pipe provided at the stage to supply a reaction or non-reaction gas to one surface of the substrate; and second and third supply pipes provided at the plasma shielding unit, the second supply pipe supplying a reaction gas to the other surface of the substrate, the third supply pipe supplying a non-reaction gas to the other surface.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: October 21, 2014
    Assignee: Charm Engineering Co., Ltd.
    Inventors: Young Ki Han, Young Soo Seo
  • Publication number: 20140283746
    Abstract: Provided are a liner assembly and a substrate processing apparatus including the liner assembly. The liner assembly includes a side liner, an intermediate liner, and a lower liner. The side liner has a cylindrical shape with upper and lower portions opened. The intermediate liner is disposed under the side liner and has a plurality of first holes passing therethrough in a vertical direction. The lower liner is disposed under the intermediate liner. Here, the plurality of first holes are formed in different sizes and numbers in a plurality of regions.
    Type: Application
    Filed: June 11, 2013
    Publication date: September 25, 2014
    Inventors: Young-Soo SEO, Young-Ki HAN, Jun-Hyeok LEE, Woo-Sik SHIN, Noh-Sun MYOUNG
  • Publication number: 20140251540
    Abstract: Provided is a substrate processing apparatus including a chamber provided with a reaction space and formed with an exhaustion opening in a center of a bottom, a substrate supporter provided in the chamber and supporting a substrate, a gas injection assembly provided to be opposite to the substrate supporter, injecting a processing gas, and generating plasma thereof, and an exhauster connected to the exhaustion opening and provided below the chamber to exhaust an inside of the chamber, in which the substrate supporter includes a substrate support supporting the substrate and a plurality of supporting posts supporting an outside of the substrate support disposing the exhausting opening therebetween.
    Type: Application
    Filed: March 11, 2014
    Publication date: September 11, 2014
    Applicant: CHARM ENGINEERING CO., LTD.
    Inventors: Young-Soo SEO, Young-Ki HAN, Jun-Hyeok LEE, Kyu-Sang LEE
  • Publication number: 20130153263
    Abstract: The present disclosure relates to a silane-containing inorganic nanofiller, a varnish including the silane-containing inorganic nanofiller, an enameled wire including the silane-containing inorganic nanofiller, and a method for preparing the enameled wire.
    Type: Application
    Filed: June 22, 2012
    Publication date: June 20, 2013
    Applicant: Sejong University Industry Academy Cooperation Foundation
    Inventors: Young-Soo SEO, Yongbeom KIM
  • Patent number: 8373086
    Abstract: Provided are a plasma processing apparatus and method. The plasma processing apparatus includes a chamber, an upper electrode, a lower electrode, a substrate support, and a movement member. The upper electrode is disposed at an inner upper portion of the chamber. The lower electrode faces the upper electrode at an inner lower portion of the chamber to support a substrate such that a bevel of the substrate is exposed in a substrate level etching process. The substrate support is disposed between the upper electrode and the lower electrode to support the substrate such that a central region of a bottom surface of the substrate is exposed in a substrate backside etching process. The movement member is configured to move the substrate support to separate the substrate from the substrate support in the substrate backside etching process.
    Type: Grant
    Filed: April 6, 2009
    Date of Patent: February 12, 2013
    Assignee: Charm Engineering Co., Ltd.
    Inventors: Hyoung Won Kim, Young Soo Seo, Chi Kug Yoon, Jun Hyeok Lee, Young Ki Han, Jae Chul Choi
  • Patent number: 8217575
    Abstract: A plasma display panel (PDP) including: first and second opposing substrates; a discharge layer disposed between the substrates, having discharge cells; address electrodes disposed on the first substrate, extending in a first direction, across the discharge cells; and display electrodes disposed on the second substrate, extending across the discharge cells in a second direction. The discharge layer includes: a discharge enhancement layer disposed on the first substrate, having first spaces; and a barrier rib layer disposed on the discharge enhancement layer, having second spaces that are connected to the first spaces, so as to form the discharge cells. The discharge enhancement layer further includes a perimeter member disposed in a dummy area provided at the edges of an effective area of the PDP.
    Type: Grant
    Filed: October 11, 2010
    Date of Patent: July 10, 2012
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Soon-Dong Jeong, Jae-Huy Park, Kyoung-Sik Jeon, Sun-Sik Kong, Bon-Joo Koo, Jung-Min Kim, Young-Soo Seo, Hyoung-Bin Park, Yu-Il Jang, Sung-Mun Ryu, Chong-In Chung, Sang-Hyuck Ahn, Jung-Sup Kwak