Abstract: A substrate processing apparatus is provided and includes: a support unit including a spin chuck and a centering jig that is on the spin chuck, the spin chuck configured to support and rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a swing arm including a correction unit that includes a sensor and an emitter, the swing arm configured to move such that the correction unit moves to a target point on the substrate, and the emitter configured to irradiate a beam towards the substrate; and a controller configured to: control the spin chuck and the swing arm; and determine whether a movement trajectory of the swing arm is aligned with a rotation center of the spin chuck based on information acquired by the sensor about the centering jig.

Abstract: Provided is a control device and a substrate processing apparatus including the same. The substrate processing apparatus includes a support unit configured to support and rotate a first substrate, the support unit including a spin chuck, a spray unit configured to spray a processing fluid on the first substrate, a correction unit on a swing arm and configured to irradiate a beam onto the first substrate when the processing fluid is provided on the first substrate, wherein the swing arm is adjacent to the spin chuck and is configured to move the correction unit to a target point on the first substrate, and a controller configured to control the spin chuck and the swing arm, and correct a position error of the swing arm using a second substrate, wherein a plurality of anchor patterns are on the second substrate.

Abstract: A control device and a substrate processing apparatus including the same are provided. The substrate processing apparatus includes: a support unit including a spin head and configured to support and to rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a correction unit in a swing arm, the correction unit configured to move to a target point on the substrate and to irradiate a beam when the processing liquid is sprayed onto the substrate; and a control unit configured to calculate the target point, wherein the control unit is configured to convert image coordinates associated with a first coordinate system and then to calculate the target point by converting the image coordinates associated with the first coordinate system into image coordinates associated with a second coordinate system, and the second coordinate system is based on rotation angles of the spin head and the swing arm.

Abstract: The present invention relates to a pickering emulsion composition using polyimide particles and a method for preparing the same. The pickering emulsion stabilized by the polyimide particles according to the present invention has a very stable dispersed phase and does not cause flocculation, creaming, coalescence and phase separation even after a long time, and has an advantage of being capable of forming both an oil-in-water type emulsion and a water-in-oil type emulsion. Further, the polyimide particles used in the present invention can be synthesized in a simple manner and have partial wettability without the surface treatment and pH control so that they can be easily used for the emulsion stabilization.

Abstract: The present invention relates to a pickering emulsion composition using polyimide particles and a method for preparing the same. The pickering emulsion stabilized by the polyimide particles according to the present invention has a very stable dispersed phase and does not cause flocculation, creaming, coalescence and phase separation even after a long time, and has an advantage of being capable of forming both an oil-in-water type emulsion and a water-in-oil type emulsion. Further, the polyimide particles used in the present invention can be synthesized in a simple manner and have partial wettability without the surface treatment and pH control so that they can be easily used for the emulsion stabilization.