Abstract: A thermoelectric conversion element includes: a thermoelectric member that is columnar; an insulator formed around the thermoelectric member; and a metal layer formed continuously on an edge surface of the thermoelectric member and an edge surface of the insulator. An edge portion of the thermoelectric member and an edge portion of the insulator define a gap covered with the metal layer. The inner portion of the gap covered with the metal layer is a void.

Abstract: A thermoelectric conversion element includes a thermoelectric member that is columnar and an insulator formed around the thermoelectric member. Particles are enclosed between the thermoelectric member and the insulator.

Abstract: A thermoelectric conversion element includes: a thermoelectric member that is columnar; an insulator formed around the thermoelectric member; and a metal layer formed continuously on an edge surface of the thermoelectric member and an edge surface of the insulator. An edge portion of the thermoelectric member and an edge portion of the insulator define a gap covered with the metal layer. The inner portion of the gap covered with the metal layer is a void.

Abstract: A thermoelectric conversion element includes a thermoelectric member that is columnar and an insulator formed around the thermoelectric member. Particles are enclosed between the thermoelectric member and the insulator.

Abstract: A method of thin film formation includes: preparing a substrate; forming a thin film above the substrate; and crystallizing the thin film by irradiating the thin film with a light beam, in which the crystallizing includes steps of: crystallizing the thin film in a first region into a first crystalline thin film by irradiating the first region while scanning a first light beam relative to the substrate, the first region including at least one of: edge portions of the substrate; and a region through which a cutting line passes when the substrate is cut; and subsequently crystallizing the thin film in a second region into a second crystalline thin film by irradiating at least the second region while scanning a second light beam relative to the substrate, and the thin film has a higher absorption ratio of the second light beam than that of the first crystalline thin film.

Abstract: A method of thin film formation includes: preparing a substrate; forming a thin film above the substrate; and crystallizing the thin film by irradiating the thin film with a light beam, in which the crystallizing includes steps of: crystallizing the thin film in a first region into a first crystalline thin film by irradiating the first region while scanning a first light beam relative to the substrate, the first region including at least one of: edge portions of the substrate; and a region through which a cutting line passes when the substrate is cut; and subsequently crystallizing the thin film in a second region into a second crystalline thin film by irradiating at least the second region while scanning a second light beam relative to the substrate, and the thin film has a higher absorption ratio of the second light beam than that of the first crystalline thin film.

Abstract: A plasma display panel is formed of a front panel including display electrodes, a dielectric layer, and a protective layer which are formed on a glass substrate, and a rear panel including electrodes, barrier ribs, and phosphor layers all of which are formed on a substrate. The front panel and the rear panel confront each other, and peripheries thereof are sealed to form a discharge space therebetween. The dielectric layer of the front panel contains Bi2O3 and at least CuO and CoO, and the total content expressed in mole % of CuO and CoO falls within a range from 0.03% to 0.3%.

Abstract: A plasma display panel is formed of front panel including at least display electrodes, dielectric layer that are formed on glass substrate, and a rear panel including electrodes, barrier ribs, and phosphor layers that are formed on a substrate. Dielectric layer is formed of multiple layers, i.e. lower dielectric layer and upper dielectric layer, and these layers are made of identical material to each other, and the material contains CaO and BaO, and the content of CaO is greater than that of BaO.

Abstract: A plasma display panel is formed of a front panel including display electrodes, a dielectric layer, and a protective layer that are formed on a glass substrate, and a rear panel including electrodes, barrier ribs, and phosphor layers that are formed on a substrate. The front panel and the rear panel are faced with each other, and peripheries thereof are sealed to form a discharge space therebetween. The dielectric layer of the front panel contains Bi2O3 and at least CaO and BaO, and the content expressed in mole % of CaO is greater than that of BaO.

Abstract: A plasma display panel is formed of a front panel including display electrodes, a dielectric layer, and a protective layer that are formed on a glass substrate, and a rear panel including electrodes, barrier ribs, and phosphor layers that are formed on a substrate. The front panel and the rear panel are faced with each other, and peripheries thereof are sealed to form a discharge space therebetween. The dielectric layer of the front panel contains Bi2O3 and at least two kinds of R2O, where R is selected from the group consisting of Li, Na, and K.

Abstract: A plasma display panel (PDP) is made of front panel (2) and a rear panel. The front panel includes display electrodes (6), dielectric layer (8), and protective layer (8) that are formed on glass substrate (3). The rear panel includes electrodes, barrier ribs, and phosphor layers that are formed on a substrate. The front panel and the rear panel are faced with each other, and the peripheries thereof are sealed to form a discharge space therebetween. Each of display electrodes (6) contains at least silver. Dielectric layer (8) is made of first dielectric layer (81) that contains bismuth oxide and calcium oxide and covers display electrodes (6), and second dielectric layer (82) that contains bismuth oxide and barium oxide and covers first dielectric layer (81).

Abstract: A plasma display panel (PDP) is made of front panel (2) and a rear panel. The front panel includes display electrodes (6), dielectric layer (8), and protective layer (9) that are formed on front glass substrate (3). The rear panel includes electrodes, barrier ribs, and phosphor layers that are formed on a substrate. The front panel and the rear panel are faced with each other, and the peripheries thereof are sealed to form a discharge space therebetween. Each of display electrodes (6) contains at least silver. Dielectric layer (8) is made of first dielectric layer (81) that contains bismuth oxide covering display electrodes (6), and second dielectric layer (82) that contains bismuth oxide covering first dielectric layer (81). The content of bismuth oxide in second dielectric layer (82) is smaller than the content of bismuth oxide in first dielectric layer (81).

Abstract: A plasma display panel is formed of a front panel including display electrodes, a dielectric layer, and a protective layer which are formed on a glass substrate, and a rear panel including electrodes, barrier ribs, and phosphor layers all of which are formed on a substrate. The front panel and the rear panel confront each other, and peripheries thereof are sealed to form a discharge space therebetween. The dielectric layer of the front panel contains Bi2O3 and at least CuO and CoO, and the total content expressed in mole % of CuO and CoO falls within a range from 0.03% to 0.3%.

Abstract: A plasma display panel (PDP) is made of front panel (2) and a rear panel. The front panel includes display electrodes (6), dielectric layer (8), and protective layer (8) that are formed on glass substrate (3). The rear panel includes electrodes, barrier ribs, and phosphor layers that are formed on a substrate. The front panel and the rear panel are faced with each other, and the peripheries thereof are sealed to form a discharge space therebetween. Each of display electrodes (6) contains at least silver. Dielectric layer (8) is made of first dielectric layer (81) that contains bismuth oxide and calcium oxide and covers display electrodes (6), and second dielectric layer (82) that contains bismuth oxide and barium oxide and covers first dielectric layer (81).

Abstract: Disclosed is a PDP wherein a discharge space is formed by arranging a front plate (2) and a back plate as to face each other, and hermetically sealing around the front and back plates. The front plate (2) is obtained by forming at least a display electrode (6) and a dielectric layer (8) on a front glass substrate (3), and the back plate is obtained by forming an electrode, a partition wall and a phosphor layer on a substrate. The dielectric layer (8) is composed of a plurality of layers, namely a lower dielectric layer (8a) and an upper dielectric layer (8b), and the lower dielectric layer (8a) and the upper dielectric layer (8b) are made of the same material which contains CaO and BaO with the CaO content being more than the BaO content.

Abstract: A plasma display panel (PDP) is made of front panel (2) and a rear panel. The front panel includes display electrodes (6), dielectric layer (8), and protective layer (8) that are formed on glass substrate (3). The rear panel includes electrodes, barrier ribs, and phosphor layers that are formed on a substrate. The front panel and the rear panel are faced with each other, and the peripheries thereof are sealed to form a discharge space therebetween. Each of display electrodes (6) contains at least silver. Dielectric layer (8) is made of first dielectric layer (81) that contains bismuth oxide and calcium oxide and covers display electrodes (6), and second dielectric layer (82) that contains bismuth oxide and barium oxide and covers first dielectric layer (81).

Abstract: A plasma display panel is formed of a front panel including display electrodes, a dielectric layer, and a protective layer that are formed on a glass substrate, and a rear panel including electrodes, barrier ribs, and phosphor layers that are formed on a substrate. The front panel and the rear panel are faced with each other, and peripheries thereof are sealed to form a discharge space therebetween. The dielectric layer of the front panel contains Bi2O3 and at least two kinds of R2O, where R is selected from the group consisting of Li, Na, and K.

Abstract: A plasma display panel is formed of a front panel including display electrodes, a dielectric layer, and a protective layer that are formed on a glass substrate, and a rear panel including electrodes, barrier ribs, and phosphor layers that are formed on a substrate. The front panel and the rear panel are faced with each other, and peripheries thereof are sealed to form a discharge space therebetween. The dielectric layer of the front panel contains Bi2O3 and at least CaO and BaO, and the content expressed in mole % of CaO is greater than that of BaO.