Patents by Inventor Yuichi Satsu

Yuichi Satsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060191601
    Abstract: A permanent magnet type electric rotating machine having a high resistance permanent magnet used for the electric rotating machine, the permanent magnet containing a magnetic powder and a fluorine compound, in which the current waveform is controlled for reducing the loss to satisfy a relation: A<C<B and restrict the 7th higher-harmonic component to 20% or less where A is the content for the 5th higher harmonic component, B is the content for the 7th higher harmonic component, and C is the content for the 11th higher harmonic component, assuming the total of contents for the fundamental components of a current supplied to the findings being 100%.
    Type: Application
    Filed: February 17, 2006
    Publication date: August 31, 2006
    Inventors: Matahiro Komuro, Yuichi Satsu, Haruo Koharagi, Yuji Enomoto
  • Publication number: 20060022175
    Abstract: In a ferromagnetic material containing at least one kind of rare-earth element, a layer containing at least one kind of alkaline earth element or rare-earth element and fluorine is formed at the grain boundary or near the powder surface of the ferromagnetic material. A further layer containing at least one kind of rare-earth element, having a fluorine concentration lower than that of the layer described first and having a rare-earth element concentration higher than that of the host phase of the ferromagnetic material, or an oxide layer containing a rare-earth element is formed in adjacent with a portion of the layer described first.
    Type: Application
    Filed: July 27, 2005
    Publication date: February 2, 2006
    Inventors: Matahiro Komuro, Yuichi Satsu, Kunihiro Maeda, Yuzo Kozono
  • Publication number: 20050284545
    Abstract: The object of the present invention is to provide a rare earth magnet which enables to achieve a good balance between high coercive force and high residual magnetic flux density, and its manufacturing method. The present invention provides a rare earth magnet in which a layered grain boundary phase is formed on a surface or a potion of a grain boundary of Nd2Fe14B which is a main phase of an R—Fe—B (R is a rare-earth element) based magnet, and wherein the grain boundary phase contains a fluoride compound, and wherein a thickness of the fluoride compound is 10 ?m or less, or a thickness of the fluoride compound is from 0.1 ?m to 10 ?m, and wherein the coverage of the fluoride compound over a main phase particle is 50% or more on average.
    Type: Application
    Filed: June 22, 2005
    Publication date: December 29, 2005
    Inventors: Matahiro Komuro, Yuichi Satsu
  • Patent number: 6946198
    Abstract: A solvent-free thermosetting resin composition which comprises an epoxy resin (a) and a product (b) of the reaction of an organosilicon compound, represented by the general formula (1) (where R is an organic group containing a functional group reactive with an epoxy resin by addition reaction; and R1 is a methyl or ethyl group), with water, the product (b) containing organosilicon compound polycondensates formed in the epoxy resin (a) and having a degree of polycondensation of 2 or higher, and which has a low viscosity at a room temperature (25° C.) and gives a cured resin having intact material properties, especially intact high-temperature mechanical properties; a process for producing the resin composition; and a product obtained by applying the composition.
    Type: Grant
    Filed: June 25, 2003
    Date of Patent: September 20, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Akio Takahashi, Yuichi Satsu, Harukazu Nakai, Masao Suzuki, Yuzo Ito, Shuichi Oohara
  • Patent number: 6946405
    Abstract: An organic polymer film of low dielectric constant and high heating resistance which is applicable as an insulating layer of a semiconductor devices is provided, as well as a manufacturing method for the film and a semiconductor device incorporating the film.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: September 20, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Akio Takahashi, Yuichi Satsu, Yoshiko Nakai, Igor Yefimovich Kardash, Andrei Vladimirovich Pebalk, Sergei Nicolaevich Chvalun, Karen Andranikovich Mailyan, Harukazu Nakai
  • Patent number: 6924971
    Abstract: A high dielectric composite material obtained by subjecting submicron particles of an inorganic filler containing a metal as its essential component to an insulating treatment such as a chemical treatment, further subjecting to a surface treatment for improving their compatibility with organic resins, and then dispersing in an organic resin, has a dielectric constant of 15 or above, with its dielectric loss tangent in the frequency region of from 100 MHz to 80 GHz being 0.1 or less, and can therefore be used effectively for multilayer wiring boards and module substrates.
    Type: Grant
    Filed: August 7, 2002
    Date of Patent: August 2, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Yuichi Satsu, Akio Takahashi, Tadashi Fujieda, Takumi Ueno, Haruo Akahoshi
  • Publication number: 20050156287
    Abstract: An organic polymer film of low dielectric constant and high heating resistance which is applicable as insulating layers of semiconductor devices, a method of manufacturing the organic polymer film, and a semiconductor device using the organic polymer film.
    Type: Application
    Filed: July 22, 2002
    Publication date: July 21, 2005
    Inventors: Akio Takahashi, Yuichi Satsu, Harukazu Nakai, Yoshiko Nakai, Igor Kardash, Andrei Pebalk, Sergei Chvalun, Kearen Mailyan
  • Publication number: 20050142429
    Abstract: A catalytic material and electrode of the present invention are characterized in that the catalyst carrier constituting the above-mentioned catalytic material and electrode includes at least one member selected from the group consisting of nitrogen atoms, oxygen atoms, phosphor atoms, and sulfur atoms. Since the cohesion or growth of catalyst grains can hereby be suppressed, it is possible to provide a highly active catalyst, a high-performance electrode, and a high-output-density fuel cell which uses the same.
    Type: Application
    Filed: February 22, 2005
    Publication date: June 30, 2005
    Inventors: Shuichi Suzuki, Chahn Lee, Yuichi Satsu, Kishio Hidaka, Mitsuo Hayashibara, Yoshiyuki Takamori, Tomoichi Kamo, Yasuhisa Aono
  • Publication number: 20050014388
    Abstract: An organic polymer film of low dielectric constant and high heating resistance which is applicable as an insulating layer of a semiconductor devices is provided, as well as a manufacturing method for the film and a semiconductor device incorporating the film.
    Type: Application
    Filed: July 22, 2002
    Publication date: January 20, 2005
    Inventors: Akio Takahashi, Yuichi Satsu, Harakazu Nakai, Yoshiko Nakai, Igor Kardash, Andrei Pebalk, Sergei Chvalun, Karen Mailyan
  • Patent number: 6821657
    Abstract: A solvent-free thermosetting resin composition which comprises an epoxy resin (a) and a product (b) of the reaction of an organosilicon compound, represented by the general formula (1) (where R is an organic group containing a functional group reactive with an epoxy resin by addition reaction; and R1 is a methyl or ethyl group), with water, the product (b) containing organosilicon compound polycondensates formed in the epoxy resin (a) and having a degree of polycondensation of 2 or higher, and which has a low viscosity at a room temperature (25° C.) and gives a cured resin having intact material properties, especially intact high-temperature mechanical properties; a process for producing the resin composition; and a product obtained by applying the composition.
    Type: Grant
    Filed: September 25, 2002
    Date of Patent: November 23, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Akio Takahashi, Yuichi Satsu, Harukazu Nakai, Masao Suzuki, Yuzo Ito, Shuichi Oohara
  • Publication number: 20040143062
    Abstract: A thermosetting resin composition is produced by heat treating a mixture of a polyaddition thermosetting resin, a silicic compound of the formula 1
    Type: Application
    Filed: January 8, 2004
    Publication date: July 22, 2004
    Inventors: Yuichi Satsu, Harukazu Nakai, Akio Takahashi, Masao Suzuki, Katsuo Sugawara
  • Patent number: 6762511
    Abstract: A device allows for continuous regulation of the composition of a fluid mixture that includes at least two components of different polarities. The device is designed, for example, to be inserted in a separation system that the device supplies with a carrier fluid of stabilized composition. The device includes a storage tank (3) receiving a mixture coming from the separation system and at least one auxiliary vessel (6) containing one of the components of the mixture. To control the transfer of this component from auxiliary vessel (6) to storage tank (3), the device further includes at least one tubular capacitive sonde (CS) totally immersed in the fluid mixture, a sonde (TS) for measuring the temperature of the mixture, and a sondc (LS) for measuring the mixture level in storage tank (3).
    Type: Grant
    Filed: March 19, 2001
    Date of Patent: July 13, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Yuichi Satsu, Harukazu Nakai, Akio Takahashi, Masao Suzuki, Katsuo Sugawara
  • Publication number: 20040121221
    Abstract: A catalytic material and electrode of the present invention are characterized in that the catalyst carrier constituting the above-mentioned catalytic material and electrode includes at least one member selected from the group consisting of nitrogen atoms, oxygen atoms, phosphor atoms, and sulfur atoms. Since the cohesion or growth of catalyst grains can hereby be suppressed, it is possible to provide a highly active catalyst, a high-performance electrode, and a high-output-density fuel cell which uses the same.
    Type: Application
    Filed: December 12, 2003
    Publication date: June 24, 2004
    Inventors: Shuichi Suzuki, Chahn Lee, Yuichi Satsu, Kishio Hidaka, Mitsuo Hayashibara, Yoshiyuki Takamori, Tomoichi Kamo, Yasuhisa Aono
  • Publication number: 20040007769
    Abstract: A solvent-free thermosetting resin composition which comprises an epoxy resin (a) and a product (b) of the reaction of an organosilicon compound, represented by the general formula (1) (where R is an organic group containing a functional group reactive with an epoxy resin by addition reaction; and R1 is a methyl or ethyl group), with water, the product (b) containing organosilicon compound polycondensates formed in the epoxy resin (a) and having a degree of polycondensation of 2 or higher, and which has a low viscosity at a room temperature (25° C.) and gives a cured resin having intact material properties, especially intact high-temperature mechanical properties; a process for producing the resin composition; and a product obtained by applying the composition.
    Type: Application
    Filed: June 25, 2003
    Publication date: January 15, 2004
    Inventors: Akio Takahashi, Yuichi Satsu, Harukazu Nakai, Masao Suzuki, Yuzo Ito, Shuichi Oohara
  • Patent number: 6638631
    Abstract: The present invention provides a thermal stable low elastic modulus material, which has high thermal stability, is little in change in dynamic characteristics such as coefficient of thermal expansion and elastic modulus within a temperature of −50° C. to 300° C., has an elastic modulus at room temperature of 2-0.01 GPa and is high in reliability of electric insulation regardless of a temperature fluctuation, and provides a semiconductor device using the same. The present invention also provides a thermal stable low elastic modulus resin composition obtained by heat-curing a mixture containing a polyimide, polyamide-imide or polyamide resin or resin precursor, whose cured product has an elastic modulus measured at −50° C. of 2-0.01 GPa, and an oligomer of an organosilicon compound having a functional group capable of causing addition reaction with an NH and/or COOH group.
    Type: Grant
    Filed: July 5, 2002
    Date of Patent: October 28, 2003
    Assignee: Hitachi, ltd.
    Inventors: Yuichi Satsu, Morimichi Umino, Takumi Ueno, Akio Takahashi, Akira Nagai, Toshiya Satoh, Shinji Yamada, Kazuhiro Suzuki
  • Patent number: 6638352
    Abstract: The present invention provides a thermal stable low elastic modulus material, which has high thermal stability, is little in change in dynamic characteristics such as coefficient of thermal expansion and elastic modulus within a temperature of −50° C. to 300° C., has an elastic modulus at room temperature of 2-0.01 GPa and is high in reliability of electric insulation regardless of a temperature fluctuation, and provides a semiconductor device using the same. The present invention also provides a thermal stable low elastic modulus resin composition obtained by heat-curing a mixture containing a polyimide, polyamide-imide or polyamide resin or resin precursor, whose cured product has an elastic modulus measured at −50° C. of 2-0.01 GPa, and an oligomer of an organosilicon compound having a functional group capable of causing addition reaction with an NH and/or COOH group.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: October 28, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Yuichi Satsu, Morimichi Umino, Takumi Ueno, Akio Takahashi, Akira Nagai, Toshiya Satoh, Shinji Yamada, Kazuhiro Suzuki
  • Publication number: 20030047351
    Abstract: The present invention provides a thermal stable low elastic modulus material, which has high thermal stability, is little in change in dynamic characteristics such as coefficient of thermal expansion and elastic modulus within a temperature of −50° C. to 300° C., has an elastic modulus at room temperature of 2-0.01 GPa and is high in reliability of electric insulation regardless of a temperature fluctuation, and provides a semiconductor device using the same.
    Type: Application
    Filed: July 5, 2002
    Publication date: March 13, 2003
    Inventors: Yuichi Satsu, Morimichi Umino, Takumi Ueno, Akio Takahashi, Akira Nagai, Toshiya Satoh, Shinji Yamada, Kazuhiro Suzuki
  • Publication number: 20030049193
    Abstract: The present invention provides a thermal stable low elastic modulus material, which has high thermal stability, is little in change in dynamic characteristics such as coefficient of thermal expansion and elastic modulus within a temperature of −50° C. to 300° C., has an elastic modulus at room temperature of 2-0.01 GPa and is high in reliability of electric insulation regardless of a temperature fluctuation, and provides a semiconductor device using the same.
    Type: Application
    Filed: March 15, 2002
    Publication date: March 13, 2003
    Inventors: Yuichi Satsu, Morimichi Umino, Takumi Ueno, Akio Takahashi, Akira Nagai, Toshiya Satoh, Shinji Yamada, Kazuhiro Suzuki
  • Publication number: 20030030999
    Abstract: A high dielectric composite material obtained by subjecting submicron particles of an inorganic filler containing a metal as its essential component to an insulating treatment such as a chemical treatment, further subjecting to a surface treatment for improving their compatibility with organic resins, and then dispersing in an organic resin, has a dielectric constant of 15 or above, with its dielectric loss tangent in the frequency region of from 100 MHz to 80 GHz being 0.1 or less, and can therefore be used effectively for multilayer wiring boards and module substrates.
    Type: Application
    Filed: August 7, 2002
    Publication date: February 13, 2003
    Applicant: HITACHI, LTD.
    Inventors: Yuichi Satsu, Akio Takahashi, Tadashi Fujieda, Takumi Ueno, Haruo Akahoshi
  • Publication number: 20020168510
    Abstract: A high dielectric composite material obtained by subjecting submicron particles of an inorganic filler containing a metal as its essential component to an insulating treatment such as a chemical treatment, further subjecting to a surface treatment for improving their compatibility with organic resins, and then dispersing in an organic resin, has a dielectric constant of 15 or above, with its dielectric loss tangent in the frequency region of from 100 MHz to 80 GHz being 0.1 or less, and can therefore be used effectively for multilayer wiring boards and module substrates.
    Type: Application
    Filed: February 5, 2002
    Publication date: November 14, 2002
    Inventors: Yuichi Satsu, Akio Takahashi, Tadashi Fujieda, Takumi Ueno, Haruo Akahoshi