Patents by Inventor Yuichiro ENOMOTO

Yuichiro ENOMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160009946
    Abstract: Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.
    Type: Application
    Filed: September 22, 2015
    Publication date: January 14, 2016
    Applicant: FUJIFILM CORPORATION
    Inventors: Hirotaka KITAGAWA, Yuichiro ENOMOTO
  • Patent number: 9223219
    Abstract: Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.
    Type: Grant
    Filed: January 7, 2011
    Date of Patent: December 29, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Akinori Shibuya
  • Publication number: 20150293454
    Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
    Type: Application
    Filed: June 24, 2015
    Publication date: October 15, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro ENOMOTO, Shinji TARUTANI, Sou KAMIMURA, Kaoru IWATO, Keita KATO, Kana FUJII
  • Patent number: 9116437
    Abstract: A pattern forming method, including: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using a developer containing an organic solvent, wherein the chemical amplification resist composition contains: (A) a resin capable of decreasing a solubility of the resin (A) in the developer containing an organic solvent by an action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a basic, compound or ammonium salt compound whose basicity decreases upon irradiation with an actinic ray or radiation, and a resist composition used for the pattern forming method and a resist film formed from the resist composition are provided.
    Type: Grant
    Filed: June 14, 2010
    Date of Patent: August 25, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Sou Kamimura, Shinji Tarutani
  • Publication number: 20150228498
    Abstract: To obtain a good pattern having a good profile of etched pattern. A method for manufacturing an adhesive film for imprints, the method comprising applying an adhesive composition for imprints in a base, and then rinsing the adhesive composition for imprints.
    Type: Application
    Filed: April 27, 2015
    Publication date: August 13, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Akiko HATTORI, Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro ENOMOTO
  • Patent number: 9097973
    Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: August 4, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii
  • Publication number: 20150185606
    Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. THe curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.
    Type: Application
    Filed: March 10, 2015
    Publication date: July 2, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Hirotaka KITAGAWA, Yuichiro GOTO, Yuichiro ENOMOTO
  • Patent number: 8999621
    Abstract: A pattern forming method includes: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using an organic solvent-containing developer, wherein the chemical amplification resist composition contains: (A) a resin substantially insoluble in alkali; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a crosslinking agent; and (D) a solvent, a negative chemical amplification resist composition used in the method, and a resist film formed from the negative chemical amplification resist composition.
    Type: Grant
    Filed: October 5, 2010
    Date of Patent: April 7, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Sou Kamimura, Shinji Tarutani, Keita Kato, Kaoru Iwato
  • Publication number: 20150079793
    Abstract: Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content.
    Type: Application
    Filed: November 21, 2014
    Publication date: March 19, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Akiko HATTORI, Hirotaka KITAGAWA, Yuichiro ENOMOTO
  • Publication number: 20150079804
    Abstract: An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).
    Type: Application
    Filed: November 20, 2014
    Publication date: March 19, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka KITAGAWA, Akiko HATTORI, Yuichiro ENOMOTO
  • Publication number: 20150014819
    Abstract: Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent.
    Type: Application
    Filed: September 24, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Akiko HATTORI, Hirotaka KITAGAWA, Yuichiro ENOMOTO, Tadashi OOMATSU
  • Patent number: 8933144
    Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: January 13, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Kunihiko Kodama, Shinji Tarutani
  • Patent number: 8911930
    Abstract: According to one embodiment, a method of forming a pattern includes the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition.
    Type: Grant
    Filed: June 3, 2010
    Date of Patent: December 16, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Akinori Shibuya, Shuhei Yamaguchi
  • Patent number: 8877828
    Abstract: Provided is a method of producing a curable composition for imprints including (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent which is capable of effectively suppressing lifting or separation of patterns, excellent in coatability, and excellent in time-dependent stability. The method of producing a curable composition for imprints comprises preparing one species of liquid (D) which contains at least either one of the polymerizable monomer (A) and the polymerization initiator (B), passing the liquid (D) through a filter, and then adding the solvent (C).
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: November 4, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Kunihiko Kodama, Shinji Tarutani
  • Patent number: 8871642
    Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a developer containing an organic solvent, and (d) rinsing the developed film with a rinse liquid containing an organic solvent, which rinse liquid has a specific gravity larger than that of the developer.
    Type: Grant
    Filed: August 26, 2011
    Date of Patent: October 28, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Keita Kato, Kana Fujii
  • Publication number: 20140255662
    Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.
    Type: Application
    Filed: March 14, 2014
    Publication date: September 11, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Kunihiko KODAMA, Shinji TARUTANI
  • Patent number: 8820541
    Abstract: A method for producing a curable composition for imprints includes the step of passing a curable composition containing a polymerizable monomer (A) and a polymerization initiator (B) through a filter having an effective filter area of 200 cm2 or more at least one time. The method suppresses pattern-peeling when peeling the mold employed in forming a pattern using the curable composition for imprints, and thus provides excellent patternability.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: September 2, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Kunihiko Kodama, Shinji Tarutani
  • Patent number: 8808965
    Abstract: A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the chemical amplification resist composition contains (A) a resin containing a repeating unit having two or more hydroxyl groups, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent and (D) a solvent; a pattern formed by the pattern forming method; a chemical amplification resist composition used in the pattern forming method; and a resist film formed using the chemical amplification resist composition.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: August 19, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Iwato, Shinji Tarutani, Yuichiro Enomoto, Sou Kamimura, Keita Kato
  • Publication number: 20140227493
    Abstract: Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 14, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Kunihiko KODAMA, Shinji TARUTANI
  • Publication number: 20140220353
    Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.
    Type: Application
    Filed: April 4, 2014
    Publication date: August 7, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Kunihiko KODAMA, Shinji TARUTANI, Yuichiro ENOMOTO, Tadashi OOMATSU, Takayuki ITO, Hirotaka KITAGAWA, Akiko HATTORI