Patents by Inventor Yukako Harada
Yukako Harada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8378016Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.Type: GrantFiled: March 18, 2011Date of Patent: February 19, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Nobuo Ando, Ichiki Takemoto, Isao Yoshida, Yukako Harada
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Patent number: 8124803Abstract: The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ?O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).Type: GrantFiled: March 28, 2006Date of Patent: February 28, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Isao Yoshida, Yukako Harada, Satoshi Yamaguchi, Nobuo Ando
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Publication number: 20110165519Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.Type: ApplicationFiled: March 18, 2011Publication date: July 7, 2011Inventors: Nobuo ANDO, Ichiki TAKEMOTO, Isao YOSHIDA, Yukako HARADA
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Patent number: 7932334Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.Type: GrantFiled: December 21, 2006Date of Patent: April 26, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Nobuo Ando, Ichiki Takemoto, Isao Yoshida, Yukako Harada
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Patent number: 7862980Abstract: The present invention provides a salt represented by the formula (I): wherein P1, P2, P3, Q1, Q2 and R are defined in the specification and the present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).Type: GrantFiled: July 30, 2007Date of Patent: January 4, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Yoshiyuki Takata
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Patent number: 7786322Abstract: The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).Type: GrantFiled: November 17, 2006Date of Patent: August 31, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Satoshi Yamaguchi, Yukako Harada, Isao Yoshida
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Patent number: 7759045Abstract: A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+?O3S—R??(I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.Type: GrantFiled: June 24, 2008Date of Patent: July 20, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Makoto Akita, Isao Yoshida, Yukako Harada
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Patent number: 7667050Abstract: The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH2— in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH2— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.Type: GrantFiled: August 15, 2007Date of Patent: February 23, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Junji Shigematsu, Isao Yoshida, Yukako Harada, Masumi Suetsugu
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Patent number: 7612217Abstract: The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.Type: GrantFiled: August 10, 2007Date of Patent: November 3, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Hiromu Sakamoto, Yukako Harada
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Patent number: 7579132Abstract: The present invention provides a salt represented by the formula (I): wherein X represents an n-valent connecting group, Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 2 or 3, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).Type: GrantFiled: June 4, 2007Date of Patent: August 25, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Satoshi Yamaguchi
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Patent number: 7579497Abstract: The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH2— group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).Type: GrantFiled: March 28, 2006Date of Patent: August 25, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Ichiki Takemoto, Kouji Toishi
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Patent number: 7531686Abstract: The present invention provides a salt of the formula (I): wherein ring X represents polycyclic hydrocarbon group having tricycle or more and having 10 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; n shows an integer of 1 to 12; and A+ represents a cation selected from the group consist of a cation of the following formulae (IIa), (IIb) and (IIc): The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).Type: GrantFiled: October 26, 2006Date of Patent: May 12, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Satoshi Yamaguchi
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Patent number: 7527910Abstract: The present invention provides a salt of the formula (I): wherein X represents alkylene group or substituted alkylene group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows 0 or 1. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I), and a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.Type: GrantFiled: December 26, 2006Date of Patent: May 5, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Satoshi Yamaguchi, Isao Yoshida, Yukako Harada
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Publication number: 20090004601Abstract: A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+?O3S—R??(I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.Type: ApplicationFiled: June 24, 2008Publication date: January 1, 2009Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Makoto Akita, Isao Yoshida, Yukako Harada
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Patent number: 7439006Abstract: A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).Type: GrantFiled: August 10, 2007Date of Patent: October 21, 2008Assignee: Sumitomo Chemical Company, LimitedInventors: Isao Yoshida, Yukako Harada, Takayuki Miyagawa
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Publication number: 20080086014Abstract: The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH2— in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH2— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.Type: ApplicationFiled: August 15, 2007Publication date: April 10, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Junji Shigematsu, Isao Yoshida, Yukako Harada, Masumi Suetsugu
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Publication number: 20080081925Abstract: The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.Type: ApplicationFiled: August 10, 2007Publication date: April 3, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hiromu Sakamoto, Yukako Harada
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Publication number: 20080081293Abstract: The present invention provides a salt represented by the formula (I): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, provided that all of P1, P2 and P3 are not simultaneously phenyl groups which may be substituted, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and R represents a group represented by the formula: wherein A1 represents —OH or —Y1—OH, n represents an integer of 1 to 9, and Y1 represents a divalent C1-C6 saturated aliphatic hydrocarbon group; a group represented by the formula: wherein ring X1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH2— group is substituted with —CO—, and at least one hydrogen atom in the monType: ApplicationFiled: July 30, 2007Publication date: April 3, 2008Applicant: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Yoshiyuki Takata
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Publication number: 20080076063Abstract: A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).Type: ApplicationFiled: August 10, 2007Publication date: March 27, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Isao Yoshida, Yukako Harada, Takayuki Miyagawa
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Publication number: 20080044738Abstract: The present invention provides a salt represented by the formula (I): wherein X represents an n-valent connecting group, Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 2 or 3, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).Type: ApplicationFiled: June 4, 2007Publication date: February 21, 2008Applicant: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Satoshi Yamaguchi