Abstract: This anode for a lithium secondary battery is formed of an aluminum alloy containing Al, at least one element M1 selected from the group consisting of C, Si, Ge, Sn, and Pb, and at least one element M2 selected from the group consisting of Sr, Na, Sb, Ca, Te, Ba, Li, and K, in which a ratio of a mass of the element M1 to a total mass of the aluminum alloy is 0.01 mass % or more and 8 mass % or less, and a ratio of a total mass of the element M2 to the total mass of the aluminum alloy is more than 0.001 mass % and 1.0 mass % or less.

Abstract: A membrane electrode assembly of the present disclosure is a membrane electrode assembly including a first electrode and an electrolyte membrane that contains an oxide having proton conductivity, in which the first electrode contains a first oxide and a second oxide, the first oxide is a first perovskite compound represented by Compositional Formula ABO3, where in the first perovskite compound, constituent elements of an A site include at least one selected from the group consisting of La, Sr, and Ba, and constituent elements of a B site include at least one selected from the group consisting of Co and Fe, and the second oxide is a second perovskite compound formed of Ba, Zr, Yb, one or more of first transition elements including at least Co, and O.

Abstract: An infrared sensor according to the present disclosure includes a transistor, a cavity layer, and a sensor layer. The cavity layer includes a cavity. The sensor layer includes a phononic crystal in which holes are arranged. In plan view, the infrared sensor includes a first region and a second region. The first region includes a transistor. The second region includes the cavity. The cavity layer includes a flat major surface. The major surface is disposed around the cavity, and extends across both the first region and the second region. The sensor layer is disposed on the major surface.

Abstract: An object is to provide an electroless copper plating solution with excellent solution stability and easy composition control while being used in a neutral range. To achieve the object, a reducing electroless copper plating solution used in a neutral range is employed that contains a copper salt serving as a copper ion supply source, a complexing agent for chelating copper ions, a reducing agent, a surfactant, an aromatic compound containing nitrogen, and contains a tellurium compound serving as a deposition stabilizer, and that has a solution pH of 6 to 9.

Abstract: An object of the present invention is to provide an electroless Ni—Fe alloy plating solution with which continuous plating can be carried out in a stable manner. An electroless Ni—Fe alloy plating solution comprising a nickel ion source, an iron ion source, a complexing agent and a reducing agent, wherein the iron ion source is a ferric ion source is provided. It is preferable that the ferric ion source is one or two or more iron salts selected from the group consisting of iron (III) sulfate, iron (III) chloride, iron alum, iron (III) oxide and iron (III) hydroxide. It is preferable that the content of the ferric ion is 0.001 to 1.0 mol/L at the time of the initial make-up of plating bath. It is preferable that the content of the ferrous ion is 0.1 mol/L or less at the time of the initial make-up of plating bath.

Abstract: A method for producing a thin film according to the present disclosure comprises a step of forming the thin film on a substrate using a target. The target is formed of a mixture containing a first material and a second material. The first material has a composition represented by ATiO3 (where A is at least one selected from the group consisting of Ba and Sr). The second material has a composition represented by EH2 (where E is at least one selected from the group consisting of Ti and Zr). The thin film is formed of a first oxide containing A, Ti, and O. Some of oxide ions contained in the first oxide have been replaced by hydride ions.

Abstract: The desorbing process of the present disclosure includes a step of bringing a solution containing a hydrogenated aromatic compound, at least one of [P((CH2)mCH3)3((CH2)nCH3) (5?m?24, 13?n?24)]+ and [N((CH2)mCH3)3((CH2)nCH3) (5?m?24, 13?n?24)]+, and an anion into contact with an anode; and desorbing hydrogen from the hydrogenated aromatic compound.

Abstract: A hydrogen desorption method includes a step of bringing a liquid containing an alicyclic saturated hydrocarbon having a tertiary carbon atom bearing a saturated hydrocarbon side chain, a quinone, and an electrolyte into contact with a anode and a step of desorbing hydrogen from the alicyclic saturated hydrocarbon having a tertiary carbon atom bearing a saturated hydrocarbon side chain.

Abstract: A hydrogen desorption method includes a step of bringing a liquid containing an alicyclic saturated hydrocarbon having a tertiary carbon atom bearing a saturated hydrocarbon side chain, a quinone, and an electrolyte into contact with a anode and a step of desorbing hydrogen from the alicyclic saturated hydrocarbon having a tertiary carbon atom bearing a saturated hydrocarbon side chain.

Abstract: The desorbing process of the present disclosure includes a step of bringing a solution containing a hydrogenated aromatic compound, at least one of [P((CH2)mCH3)3((CH2)nCH3) (5?m?24, 13?n?24)]+ and [N((CH2)mCH3)3((CH2)nCH3) (5?m?24, 13?n?24)]+, and an anion into contact with an anode; and desorbing hydrogen from the hydrogenated aromatic compound.