Patents by Inventor Yuki Tashiro

Yuki Tashiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210356902
    Abstract: An image forming apparatus includes: a sheet cassette; an image forming unit configured to form an image on a sheet fed from the sheet cassette; a first frame including: a first strut; a side plate spaced apart from the first strut; and a stay coupling the first strut and the side plate, the first frame supporting the sheet cassette, the sheet cassette being capable of slide-moving in a direction in which the stay extends; a second frame provided on the first frame in a vertical direction, the second frame including a second strut coupled to the first strut, the second frame supporting the image forming unit; and a grip provided pivotably at the first strut, the grip being graspable by an operator.
    Type: Application
    Filed: April 14, 2021
    Publication date: November 18, 2021
    Inventors: Yuki TASHIRO, Takuya MATSUMURA
  • Patent number: 9091920
    Abstract: [Object] To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that. [Means] The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.
    Type: Grant
    Filed: May 17, 2012
    Date of Patent: July 28, 2015
    Assignee: Merck Patent GmbH
    Inventors: Takashi Sekito, Daishi Yokoyama, Takashi Fuke, Yuki Tashiro, Toshiaki Nonaka, Yasuaki Tanaka
  • Publication number: 20140335448
    Abstract: [Object] To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that. [Means] The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.
    Type: Application
    Filed: May 17, 2012
    Publication date: November 13, 2014
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Takashi Sekito, Daishi Yokoyama, Takashi Fuke, Yuki Tashiro, Toshiaki Nonaka, Yasuaki Tanaka
  • Patent number: 5903014
    Abstract: A semiconductor device includes an insulating substrate; a plurality of pixel electrodes arranged in a matrix on the insulating substrate; first thin film transistors for individually driving the pixel electrodes; and driving circuits composed of second thin film transistors formed on the insulating substrate. In this semiconductor device, each of the first and second thin film transistors has a bottom-gate structure comprising a gate electrode patterned on the insulating substrate; a gate insulating film covering the gate electrode; and a semiconducting thin film having a channel region and a source/drain region, which is formed on the gate insulating film. Each of the second thin film transistors has a lightly doped region at least between a drain side highly doped region and the channel region.
    Type: Grant
    Filed: November 27, 1996
    Date of Patent: May 11, 1999
    Assignee: Sony Corporation
    Inventors: Masumitsu Ino, Toshikazu Maekawa, Yuki Tashiro, Yasushi Shimogaichi, Shintaro Morita