Abstract: This invention relates to enhancing a gas-phase reaction in a plasma comprising: creating plasma by at least one plasma source, and wherein that the method further comprises: generating ultrasonic high intensity and high power acoustic waves having a predetermined amount of acoustic energy by at least one ultrasonic high intensity and high power gas-jet acoustic wave generator, where said ultrasonic high intensity and high power acoustic waves are directed to propagate towards said plasma so that at least a part of said predetermined amount of acoustic energy is absorbed into said plasma, and where a sound pressure level of said generated ultrasonic high intensity and high power acoustic waves is at least substantially 140 dB and where an acoustic power of said generated ultrasonic high intensity and high power acoustic waves is at least substantially 100 W.

Abstract: The invention relates to an apparatus for treating a surface with a at least one gliding arc source comprising at least one gas flow controlling unit (104); and a set of electrodes (102); wherein the at least one gas flow controlling unit (104) and the set of electrodes (102) are controlled to provide a plasma comprising a gas temperature at the set of electrodes (102) above approximately 2000 K. In this way, an optimal or substantially optimal plasma for treating surfaces of samples is achieved.

Abstract: This invention relates to a plasma surface modification process (and a corresponding a system) of a solid object (100) comprising creating plasma (104) by a plasma source (106), application of the plasma (104) to at least a part of a surface (314) of the solid object (100), generating ultrasonic high intensity and high power acoustic waves (102) by at least one ultrasonic high intensity and high power acoustic wave generator (101), wherein the ultrasonic acoustic waves are directed to propagate towards said surface (314) of the object (100) so that a laminar boundary layer (313) of a gas or a mixture of gases (500) flow in contact with said solid object (100) is thinned or destructed for at least a part of said surface (314). In this way, the plasma can more efficiently access and influence the surface of the solid object to be treated by the plasma, which speeds the process time up significantly.

Abstract: The invention relates to an apparatus for treating a surface with a at least one gliding arc source comprising at least one gas flow controlling unit (104); and a set of electrodes (102); wherein the at least one gas flow controlling unit (104) and the set of electrodes (102) are controlled to provide a plasma comprising a gas temperature at the set of electrodes (102) above approximately 2000 K. In this way, an optimal or substantially optimal plasma for treating surfaces of samples is achieved.

Abstract: This invention relates to enhancing a gas-phase reaction in a plasma comprising: creating plasma (104) by at least one plasma source (106), and wherein that the method further comprises: generating ultrasonic high intensity and high power acoustic waves (102) having a predetermined amount of acoustic energy by at least one ultrasonic high intensity and high power gas-jet acoustic wave generator (101), where said ultrasonic high intensity and high power acoustic waves are directed to propagate towards said plasma (104) so that at least a part of said predetermined amount of acoustic energy is absorbed into said plasma (104), and where a sound pressure level of said generated ultrasonic high intensity and high power acoustic waves (102) is at least substantially 140 dB and where an acoustic power of said generated ultrasonic high intensity and high power acoustic waves (102) is at least substantially 100 W.

Abstract: This invention relates to a plasma surface modification process (and a corresponding a system) of a solid object (100) comprising creating plasma (104) by a plasma source (106), application of the plasma (104) to at least a part of a surface (314) of the solid object (100), generating ultrasonic high intensity and high power acoustic waves (102) by at least one ultrasonic high intensity and high power acoustic wave generator (101), wherein the ultrasonic acoustic waves are directed to propagate towards said surface (314) of the object (100) so that a laminar boundary layer (313) of a gas or a mixture of gases (500) flow in contact with said solid object (100) is thinned or destructed for at least a part of said surface (314). In this way, the plasma can more efficiently access and influence the surface of the solid object to be treated by the plasma, which speeds the process time up significantly.

Abstract: A transparent conductive film comprising a polymer film and a transparent conductive layer provided thereon, especially a transparent conductive film improved in durability and mechanical and electrical properties, a process for the preparation thereof, and a touch panel provided with the transparent conductive film, as well as transparent conductive plate and the process for the preparation thereof. The transparent conductive film comprising a polymer film, an undercoat layer and a transparent conductive layer which are superposed in this order, and the undercoat layer contains a compound having at least one selected from an amino group and a phosphoric acid group.

Abstract: A method of producing an anti-reflection film includes forming a first layer on a transparent substrate, forming a second layer on the first layer, and forming the third layer on the second layer. When an optical admittance Y at a surface of the second layer is represented by, Y = H E = ( x + iy ) where i is the imaginary number unit, thicknesses and reflective indexes of the substrate, first layer, second layer, and third layer are selected so that x and y satisfy the following formula, 0.9x{(n2?n02)/2n0}2<{x?(n2+n02)/2n0}2+y2<1.1x{(n2?n02)/2n0}2 where n is a refractive index of the third layer and n0 is a refractive index of an outer region at an outside of the anti-reflection film.

Abstract: A touch panel includes a transparent electro-conductive film. The transparent electro-conductive film comprises a primary layer formed on a polymer film, and a transparent electro-conductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electro-conductive-metal layer is formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm3 or more.

Abstract: A pneumatic tire which comprises a pair of right and left bead portions, a carcass layer disposed extending between the bead portions, a tread portion arranged at an outside of the carcass layer in a radial direction of the tire, a pair of side wall portions arranged at right and left sides of the tread portion and at least one pair of rubber members selected from a pair of rubber members constituted with a rigid rubber and arranged in the bead portions and a pair of rubber members disposed in the side wall portions, wherein at least one pair of rubber members selected from a pair of rubber members arranged in the bead portions and a pair of rubber members disposed in the side wall portions are constituted with rubber composition having a minimum value of a dynamic storage modulus within a temperature range of 200 to 250° C. which is 75% of a dynamic storage modulus at 50° C. or more.

Abstract: A touch panel includes a transparent electro-conductive film. The transparent electro-conductive film comprises a primary layer formed on a polymer film, and a transparent electro-conductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electro-conductive-metal layer is formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm3 or more.

Abstract: A transparent conductive film has a polymer film 4 and a transparent conductive layer 5 formed on the polymer film 4. The transparent conductive layer includes indium oxide, a zinc oxide system and a tin oxide system. A covering layer 9, made of material different from that of the transparent conductive layer 5, is formed on the transparent conductive layer 5. A touch panel is provided with the transparent conductive film as its upper electrode 6A or lower electrode. The surface of the transparent conductive layer is covered with the covering layer, so that physical or chemical stresses generated during the input to the touch panel do not affect transparent conductive layer directly, thus preventing damages and delamination of the transparent conductive layer. Furthermore, the covering layer formed on the transparent conductive layer improves the strength of the transparent conductive film, thereby enhancing a resistance to wear.

Abstract: A film deposition apparatus equipped with a vacuum chamber, comprising a pair of rollers for vertically traveling a continuous sheet as a substrate, and a pair of sputtering cathodes for continuously depositing the film on the surfaces of the sheet in the vacuum chamber. The cathodes are vertically arranged and horizontally faced each other. The sheet is traveled between a pair of the cathodes. The apparatus and the film deposition process using it make it possible to deposit a film even on surfaces of a flexible sheet without causing problems such as defective film deposition or abnormal discharge, while ensuring stable, continuous, long-term operation.

Abstract: A transparent conductive film comprising a polymer film and a transparent conductive layer provided thereon, especially a transparent conductive film improved in durability and mechanical and electrical properties, a process for the preparation thereof, and a touch panel provided with the transparent conductive film, as well as transparent conductive plate and the process for the preparation thereof. The transparent conductive film comprising a polymer film, an undercoat layer and a transparent conductive layer which are superposed in this order, and the undercoat layer contains a compound having at least one selected from an amino group and a phosphoric acid group.

Abstract: A method of producing an anti-reflection film includes forming a first layer on a transparent substrate, forming a second layer on the first layer, and forming the third layer on the second layer.

Abstract: A provided transparent electroconductive film has a polymer film and a transparent electroconductive layer deposited on the polymer film, which has no problem of damages and removal of the transparent electroconductive layer. The transparent electroconductive film has a polymer film 4 and a transparent electroconductive layer 5 deposited on the polymer film 4. A protective layer 9 made of material different from that of the transparent electroconductive layer 5 is formed on the transparent electroconductive layer 5. A touch panel has the transparent electroconductive film as an upper electrode 6A or a lower electrode.

Abstract: A touch panel includes a transparent electro-conductive film. The transparent electro-conductive film comprises a primary layer formed on a polymer film, and a transparent electro-conductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electro-conductive-metal layer is formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm3 or more.

Abstract: A touch panel includes a transparent electro-conductive film. The transparent electro-conductive film comprises a primary layer formed on a polymer film, and a transparent electro-conductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electro-conductive-metal layer is formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm3 or more.

Abstract: A transparent electroconductive film has a polymer film, a primary layer formed on the polymer film, and a transparent electroconductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electroconductive-metal layer, formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm3 or more.

Abstract: An anti-reflection film having quite a low reflectivity comprises a transparent substrate and first to N-th layers formed thereon, wherein, when the optical admittance of the interface between the N-th layer and (N-1)-th layer is represented by (x+iy), x and y satisfy the following inequality: 0.9×[(n2−n02)/2n0]2<[x−(n2+n02)/2n0]2+y2<1.1−[(n2−n02)/2n0]2 wherein n0 is the refractive index of the region outside the outermost layer (such as air or adhesive), and n is the refractive index of the outermost layer (the N-th layer).