Patents by Inventor Yukikazu Uemura

Yukikazu Uemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4812551
    Abstract: A novolak resin for a positive photoresist is provided herein, which resin is produced by the addition condensation reaction of a phenol with formaldehyde. This novolak resin has improved heat resistant and sensitivity properties and the thickness retention of the novolak resins are very high.
    Type: Grant
    Filed: November 9, 1987
    Date of Patent: March 14, 1989
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Fumio Oi, Haruyoshi Osaki, Akihiro Furuta, Yukikazu Uemura, Takao Ninomiya, Yasunori Uetani, Makoto Hanabata
  • Patent number: 4297945
    Abstract: Relieved pattern of a resin original pattern plate, which does not exhibit fluidity at transferring temperature and possesses elastic modulus no smaller than 10 kg/cm.sup.2, preferably no smaller than 100 kg/cm.sup.2, is transferred onto thermoplastic resin material having fluidity at the transferring temperature (ASTM D1238, load 21.6 kg) of at least 0.01 dg/min, preferably at least 0.1 dg/min, by pressing the thermoplastic resin material to the original pattern plate under a pressure condition where elastic deformation of the original pattern plate is kept within 10%. The resin original pattern plate is prepared by controlling the photo-polymerizable resin composition to adjust its crosslink-ability and then photo-polymerizing, whereby the resulting resin original pattern plate possesses an elastic modulus of 10 kg/cm.sup.2 or higher at transferring temperature.
    Type: Grant
    Filed: March 9, 1979
    Date of Patent: November 3, 1981
    Assignee: Sumitomo Chemical Company, Ltd.
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura
  • Patent number: 4247621
    Abstract: An original pattern plate obtained by the use of a photo-sensitive resin composition comprising:(A) an unsaturated polyester having an acid value of from 10 to 40 and having not less than 50% by mole of unsaturated acids in the acid component,(B) a photo-polymerizable, ethylenically unsaturated compound which essentially contains a compound having a photo-polymerizable, ethylenically unsaturated linkage and at least one hydroxyl group,(C) a melamine compound of the formula:(C.sub.3 H.sub.6-(m+n) N.sub.6)(CH.sub.2 OH).sub.m (CH.sub.2 OR).sub.nwherein R is an alkyl group having 1 to 4 carbon atoms, m is from 0 to 6, n is from 0 to 6 and m+n is from 1.5 to 6, or its condensate having an average condensation degree of not more than 4,(D) a photo-polymerization initiator, and(E) a thermal polymerization inhibitor,the weight proportion of the components (A), (B) and (C) satisfying the relationships of the following equations: 1/5.ltoreq.B/(A+B).ltoreq.3/5 and 1/50.ltoreq.C/(A+B+C).ltoreq.
    Type: Grant
    Filed: March 26, 1976
    Date of Patent: January 27, 1981
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura, Akihiro Furuta
  • Patent number: 4189549
    Abstract: A polyester resin composition having excellent mechanical properties, processability, transparency and surface glossiness of the formed product thereof, which comprises 1 to 99% by weight of an aromatic polyester produced by polycondensing para-hydroxybenzoic acid or a functional derivative thereof (I), 2,2-bis(4'-hydroxyphenyl)propane or a functional derivative thereof (II), and terephthalic acid or a functional derivative thereof (III) and/or isophthalic acid or a functional derivative thereof (IV) in a molar ratio of (I):(II)=1:100 to 100:1 and (II):(III) and/or (IV)=1:10 to 10:1 and 99 to 1% by weight of a polycarbonate or an aliphatic polyester.
    Type: Grant
    Filed: June 29, 1977
    Date of Patent: February 19, 1980
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hiroomi Matsunaga, Yukikazu Uemura, Teruo Saito, Hiroshi Ishida
  • Patent number: 4156389
    Abstract: Relieved pattern of a resin original pattern plate, which does not exhibit fluidity at transferring temperature and possesses elastic modulus no smaller than 10 kg/cm.sup.2, preferably no smaller than 100 kg/cm.sup.2, is transferred onto thermoplastic resin material having fluidity at the transferring temperature (ASTM D1238, load 21.6 kg) of at least 0.01 dg/min, preferably at least 0.1 dg/min, by pressing the thermoplastic resin material to the original pattern plate under a pressure condition where elastic deformation of the original pattern plate is kept within 10%. The resin original pattern plate is prepared by controlling the photopolymerizable resin composition to adjust its cross-linkability and then photo-polymerizing, whereby the resulting resin original pattern plate possesses an elastic modulus of 10 kg/cm.sup.2 or higher at transferring temperature.
    Type: Grant
    Filed: May 3, 1976
    Date of Patent: May 29, 1979
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura
  • Patent number: 4140605
    Abstract: A crosslinkable composition comprising:(I) a melamine compound of the formula:(C.sub.3 H.sub.6-(m+n) N.sub.6) (CH.sub.2 OH.sub.m (CH.sub.2 OR).sub.nwherein R is an alkyl group having 1 to 4 carbon atoms, m is from 0 to 6, n is from 0 to 6 and m + n is from 1.5 to 6, or its condensate having an average condensation degree of not more than 4;(II) a compound having at least two functional groups condensable with the component (I) and an average molecular weight of not less than 1,000;(III) a compound having an ethylenically un-unsaturated linkage photopolymerizable by actinic light;(IV) a photopolymerization initiator; and(V) a thermal polymerization inhibitor.
    Type: Grant
    Filed: April 21, 1977
    Date of Patent: February 20, 1979
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura, Akihiro Furuta
  • Patent number: 4120931
    Abstract: A method for producing a high-strength film of amorphous aromatic high polymers comprising rolling said polymer between rolls, and stretching the rolled film of said polymer.
    Type: Grant
    Filed: May 26, 1977
    Date of Patent: October 17, 1978
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Fukushima, Yukikazu Uemura, Takuzo Okumura, Haruo Hayashida
  • Patent number: 3960685
    Abstract: A photosensitive resin composition comprising pullulan, which is a polymer having repetition units of maltotriose and is represented by the formula, ##SPC1##Wherein n is an integer of 20 to 8,000, and/or a derivative thereof, a photopolymerizable monomer, a photosensitizer and a thermal polymerization inhibitor, or comprising the said pullulan, which has been incorporated with a photoactive reaction group to provide photosensitivity, and a photosensitizer, is a novel composition low in viscosity which can be prepared by use of water and can be formed into a photosensitive plate capable of being developed with water to give a clear image. Since the pullulan in said composition has no toxicity, the waste water formed at the time of development of said photosensitive plate can be treated with ease.
    Type: Grant
    Filed: November 5, 1974
    Date of Patent: June 1, 1976
    Assignees: Sumitomo Chemical Company, Limited, Hayashibara Biochemical Laboratories, Incorporated
    Inventors: Takezo Sano, Yukikazu Uemura, Akihiro Furuta