Patents by Inventor Yukinori Satoh

Yukinori Satoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6632956
    Abstract: A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlCl3 or AlBr3 and a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlCl3 or the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.
    Type: Grant
    Filed: August 15, 2002
    Date of Patent: October 14, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Akihito Tsukuno, Hiroyuki Kobayashi, Yukinori Satoh, Hideaki Ozeki, Yoshihiro Shirota, Susumu Ueno
  • Publication number: 20030109735
    Abstract: A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlCl3 or AlBr3 and a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlCl3 or the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.
    Type: Application
    Filed: August 15, 2002
    Publication date: June 12, 2003
    Inventors: Akihito Tsukuno, Hiroyuki Kobayashi, Yukinori Satoh, Hideaki Ozeki, Yoshihiro Shirota, Susumu Ueno
  • Patent number: 6225490
    Abstract: For the continuous hydrolysis of organochlorosilane, a reaction system comprising at least three stages of hydrolysis is used. Each stage includes a reactor and a phase separator wherein hydrolysis is effected to form a hydrolysis mixture which is separated into a hydrolyzate and a hydrogen chloride-containing aqueous medium. The separated aqueous medium is circulated to the reactor. The hydrolyzate is conveyed to the reactor of the subsequent stage. The organochlorosilane is fed into the first stage reactor, the aqueous medium containing an amount of water corresponding to the consumption in one stage is fed into one stage reactor from the subsequent stage, and an amount of water corresponding to the consumption in the overall reaction system is fed in the last stage. Then the entire amount of hydrogen chloride generated in multiple stages of hydrolysis is recovered as anhydrous hydrogen chloride from the first stage.
    Type: Grant
    Filed: May 27, 1998
    Date of Patent: May 1, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Nakayama, Naoyuki Ida, Hiroyuki Kobayashi, Yukinori Satoh, Yoshihiro Shirota, Masaaki Furuya
  • Patent number: 6090966
    Abstract: Alkylhalosilanes are produced by first fluidizing a metallic silicon powder with an inert gas, preheating the silicon powder at a temperature between 200.degree. C. and a steady reaction temperature while keeping the silicon powder fluidized, adding a copper catalyst to the preheated silicon powder to form a contact mass, and feeding an alkyl halide into the contact mass whereby the alkylhalosilanes are formed by direct synthesis. This process prevents the copper catalyst from being sintered by thermal hysteresis and activates a high catalysis on the contact mass at the start of reaction. The desired dialkyldihalosilane can be produced at a high selectivity.
    Type: Grant
    Filed: May 12, 1998
    Date of Patent: July 18, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuo Nakanishi, Tetsuya Inukai, Kazumasa Tsukioka, Hiroshi Nakayama, Yukinori Satoh
  • Patent number: 6025513
    Abstract: An alkylhalosilane is prepared by charging a reactor with a contact mass comprising a metallic silicon powder and a copper catalyst, and feeding an alkyl halide into the reactor whereby the silane is formed by direct synthesis. The contact mass contains 1-10,000 ppm of elemental boron. The addition of boron to the contact mass is effective for increasing the throughput of dialkyldihalosilane at desired STY in an inexpensive manner while suppressing formation of unnecessary hydrosilanes and disilanes.
    Type: Grant
    Filed: June 29, 1998
    Date of Patent: February 15, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuo Nakanishi, Tetsuya Inukai, Kazumasa Tsukioka, Hiroshi Nakayama, Yukinori Satoh
  • Patent number: 5986123
    Abstract: An alkylhalosilane is prepared by charging a reactor with a contact mass comprising a metallic silicon powder and a copper catalyst, and feeding an alkyl halide into the reactor whereby the silane is formed by direct synthesis. The use of a metallic silicon powder having a specific particle size distribution ensures effective fluidization whereby the alkylhalosilane of quality is formed at a high selectivity and in high yields.
    Type: Grant
    Filed: April 1, 1998
    Date of Patent: November 16, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Nakayama, Tetsuo Nakanishi, Kazumasa Tsukioka, Yukinori Satoh
  • Patent number: 5961695
    Abstract: A silane-containing gas is treated by contacting it with a liquid containing silanes or disilanes which are higher boiling than the silanes in the silane-containing gas, thereby easily removing or reducing the amount of silanes in the gas and enabling the recovery of these silanes.
    Type: Grant
    Filed: March 25, 1998
    Date of Patent: October 5, 1999
    Assignee: Shin-Etsu Chemical Col., Ltd.
    Inventors: Masayuki Hasegawa, Kazuo Ogiwara, Hiroyuki Kobayashi, Yukinori Satoh, Yoshihiro Shirata, Masaaki Furuya
  • Patent number: 5922893
    Abstract: The direct synthesis of methylchlorosilanes to react metallic silicon with methyl chloride in the presence of a copper catalyst yields a high-boiling fraction of methylchlorodisilanes as by-products. The invention provides a method for preparing monosilanes from the high-boiling fraction by reacting it with hydrogen chloride in the presence of an amine or amide catalyst. The reaction is effected under the condition that the amount of iron, aluminum, zinc, tin and compounds thereof present in the reaction system is less than the equimolar amount with respect to the catalyst. This increases the conversion of disilanes into monosilanes.
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: July 13, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Akihito Tsukuno, Yukinori Satoh, Masao Maruyama, Kesaji Harada, Shoichi Tanaka, Masaaki Furuya
  • Patent number: 5917099
    Abstract: Methyl chloride is prepared by effecting liquid-phase reaction between hydrogen chloride and methanol in the absence of a catalyst. The reaction is effected in divided stages including at least an early stage and a last stage. The early stage of reaction is effected in a stoichiometric excess of hydrogen chloride. The last stage of reaction is effected in a stoichiometric excess of methanol. The invention is industrially advantageous in that methyl chloride can be prepared at a high conversion of hydrogen chloride while suppressing the formation of dimethyl ether by-product.
    Type: Grant
    Filed: May 14, 1998
    Date of Patent: June 29, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tomomi Narita, Hiroyuki Kobayashi, Yukinori Satoh, Yoshihiro Shirota
  • Patent number: 5847181
    Abstract: An alkylhalosilane is prepared by charging a reactor with a contact mass comprising metallic silicon powder and a copper catalyst and feeding a reactant gas containing an alkyl halide into the reactor whereby the silane is formed by direct synthesis. A phosphorus compound is added to the contact mass in an amount of 3,000-10,000 ppm calculated as phosphorus. The invention produces a more amount of dialkyldihalosilane in a desirable STY while minimizing the amount of unnecessary disilanes.
    Type: Grant
    Filed: March 4, 1997
    Date of Patent: December 8, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuo Nakanishi, Tetsuya Inukai, Kazumasa Tsukioka, Hiroshi Nakayama, Yukinori Satoh
  • Patent number: 5783721
    Abstract: An (alkylhalo)silane is prepared by charging a reactor with a contact mass comprising metallic silicon powder and a copper catalyst and feeding a gas containing an alkyl halide into the reactor whereby the silane is formed by direct synthesis. The contact mass in the reactor during reaction consists of particles having a mean particle size of 5-150 .mu.m and containing 10-80% by weight of particles having a particle size of up to 30 .mu.m and 10-90% by weight of particles having a particle size of at least 90 .mu.m. The contact mass is well fluidized to ensure rapid and uniform reaction whereby the (alkylhalo)silane is prepared at high selectivity with a minimized elutriating loss of contact mass.
    Type: Grant
    Filed: January 10, 1997
    Date of Patent: July 21, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Tsumura, Tetsuo Nakanishi, Hiroshi Nakayama, Yukinori Satoh
  • Patent number: 5712405
    Abstract: An (alkylhalo)silane is prepared by using a fluidized bed reactor equipped with a feed line for reactant gas and a delivery line for product gas, charging the reactor with a contact mass comprising metallic silicon powder and a copper catalyst, and feeding a reactant gas containing an alkyl halide through the feed line into the reactor whereby the silane is formed by direct synthesis. A dust collector is connected to the delivery line for collecting the contact mass carried over with the product gas, which is fed back to the reactor. The feed of the reactant gas is controlled such that a linear velocity multiplied by a density may range from 0.2-2 kg/m.sup.2 .multidot.sec.
    Type: Grant
    Filed: January 10, 1997
    Date of Patent: January 27, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Nakayama, Hiroshi Tsumura, Tetsuo Nakanishi, Yukinori Satoh