Patents by Inventor Yutaka Wada

Yutaka Wada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11192216
    Abstract: A polishing method of polishing a substrate while preventing coarse particles from being discharged onto a polishing pad is disclosed. In this polishing method, a substrate is brought into sliding contact with a polishing pad while a polishing liquid, which has passed through a filter, is supplied onto the polishing pad. The polishing method includes: passing the polishing liquid through the filter while increasing a physical quantity of the polishing liquid until the physical quantity reaches a predetermined set value, the physical quantity being one of flow rate and pressure of the polishing liquid; and polishing the substrate W on the polishing pad while supplying the polishing liquid that has passed through the filter onto the polishing pad.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: December 7, 2021
    Assignee: EBARA CORPORATION
    Inventors: Hiromitsu Watanabe, Kuniaki Yamaguchi, Itsuki Kobata, Yutaka Wada
  • Patent number: 10139524
    Abstract: A method for designing anti-reflective structure in which plurality of nanostructures formed of projected portions on substrate surface are provided at intervals equal to or less than visible light wavelength, in order to reduce chroma (?(a*2+b*2)) of reflected light with respect to white light to as close to zero as possible, average height of nanostructures from flat portion of substrate surface is 180 nm or greater and 290 nm or less; and filling rate of nanostructures, i.e., ratio of area of bottom surface of nanostructures to area of substrate surface in plan view of anti-reflective structure is defined, in terms of relationship between filling rate and chroma (?(a*2+b*2)) of reflected light from anti-reflective structure with respect to white light, so as to fall within range of ±5% of filling rate at which chroma takes on minimum value.
    Type: Grant
    Filed: January 5, 2015
    Date of Patent: November 27, 2018
    Assignee: DEXERIALS CORPORATION
    Inventors: Yutaka Wada, Mitsuo Arima
  • Publication number: 20180169831
    Abstract: A polishing method of polishing a substrate while preventing coarse particles from being discharged onto a polishing pad is disclosed. In this polishing method, a substrate is brought into sliding contact with a polishing pad while a polishing liquid, which has passed through a filter, is supplied onto the polishing pad. The polishing method includes: passing the polishing liquid through the filter while increasing a physical quantity of the polishing liquid until the physical quantity reaches a predetermined set value, the physical quantity being one of flow rate and pressure of the polishing liquid; and polishing the substrate W on the polishing pad while supplying the polishing liquid that has passed through the filter onto the polishing pad.
    Type: Application
    Filed: February 15, 2018
    Publication date: June 21, 2018
    Inventors: Hiromitsu WATANABE, Kuniaki YAMAGUCHI, Itsuki KOBATA, Yutaka WADA
  • Publication number: 20180136376
    Abstract: An optical member, which includes: a first optical transparent layer having convex-concave shapes, and being transparent to visible light; a wavelength-selective reflective layer, which is formed on the convex-concave shapes of the first optical transparent layer, and is configured to selectively reflect certain wavelengths of infrared light; and a second optical transparent layer formed on the wavelength-selective reflective layer, wherein the wavelength-selective reflective layer includes at least an amorphous high-refractive-index layer, a metal layer, and a crystalline high-refractive-index layer in contact with the second optical transparent layer.
    Type: Application
    Filed: December 22, 2017
    Publication date: May 17, 2018
    Inventors: Yutaka WADA, Ryosuke MURAKAMI, Taketoshi SATO, Tsutomu NAGAHAMA
  • Publication number: 20170205546
    Abstract: An optical member, which includes: a first optical transparent layer having convex-concave shapes, and being transparent to visible light; a wavelength-selective reflective layer, which is formed on the convex-concave shapes of the first optical transparent layer, and is configured to selectively reflect certain wavelengths of infrared light; and a second optical transparent layer formed on the wavelength-selective reflective layer, wherein the wavelength-selective reflective layer includes at least an amorphous high-refractive-index layer, a metal layer, and a crystalline high-refractive-index layer in contact with the second optical transparent layer.
    Type: Application
    Filed: July 9, 2015
    Publication date: July 20, 2017
    Inventors: Yutaka WADA, Ryosuke MURAKAMI, Taketoshi SATO, Tsutomu NAGAHAMA
  • Publication number: 20160313474
    Abstract: A method for designing anti-reflective structure in which plurality of nanostructures formed of projected portions on substrate surface are provided at intervals equal to or less than visible light wavelength, in order to reduce chroma (?(a*2+b*2)) of reflected light with respect to white light to as close to zero as possible, average height of nanostructures from flat portion of substrate surface is 180 nm or greater and 290 nm or less; and filling rate of nanostructures, i.e., ratio of area of bottom surface of nanostructures to area of substrate surface in plan view of anti-reflective structure is defined, in terms of relationship between filling rate and chroma (?(a*2+b*2)) of reflected light from anti-reflective structure with respect to white light, so as to fall within range of ±5% of filling rate at which chroma takes on minimum value.
    Type: Application
    Filed: January 5, 2015
    Publication date: October 27, 2016
    Applicant: DEXERIALS CORPORATION
    Inventors: Yutaka WADA, Mitsuo ARIMA
  • Patent number: 9229587
    Abstract: A sensor apparatus includes a first member, a second member, and a detection mechanism. The second member is relatively movable in a first direction with respect to the first member. The detection mechanism includes an elastic member arranged between the first member and the second member, a support that is provided between the first member and the elastic member and forms an air layer between the first member and the elastic member, the air layer having a thickness changed by an elastic deformation of the elastic member, and an electrode pair that forms a plurality of capacitances including a capacitance component changed in accordance with a change of the thickness of the air layer. The detection mechanism outputs a detection signal on a movement amount of the second member in the first direction based on a change of a combined capacitance of the electrode pair.
    Type: Grant
    Filed: March 16, 2011
    Date of Patent: January 5, 2016
    Assignee: SONY CORPORATION
    Inventors: Hiroto Kawaguchi, Yutaka Wada
  • Publication number: 20150223328
    Abstract: A conductive optical device includes: a base; a plurality of structures supported by the base, and arranged at a pitch that is equal to or shorter than a wavelength of visible light; and a transparent conductive layer provided on a surface-side of the structures, and having a shape that follows along a surface shape of the structures. The following relational expressions are satisfied: y??1.785x+3.238 y?0.686 where x is a refractive index and y is an aspect ratio, of each of the structures.
    Type: Application
    Filed: July 2, 2013
    Publication date: August 6, 2015
    Applicant: Dexerials Corporation
    Inventors: Sohmei Endoh, Yutaka Wada, Tomoo Fukuda
  • Publication number: 20150140907
    Abstract: A polishing method of polishing a substrate while preventing coarse particles from being discharged onto a polishing pad is disclosed. In this polishing method, a substrate is brought into sliding contact with a polishing pad while a polishing liquid, which has passed through a filter, is supplied onto the polishing pad. The polishing method includes: passing the polishing liquid through the filter while increasing a physical quantity of the polishing liquid until the physical quantity reaches a predetermined set value, the physical quantity being one of flow rate and pressure of the polishing liquid; and polishing the substrate W on the polishing pad while supplying the polishing liquid that has passed through the filter onto the polishing pad.
    Type: Application
    Filed: October 21, 2014
    Publication date: May 21, 2015
    Inventors: Hiromitsu WATANABE, Kuniaki YAMAGUCHI, Itsuki KOBATA, Yutaka WADA
  • Patent number: 8965555
    Abstract: A method dresses a polishing member with a diamond dresser having diamond particles arranged on a surface thereof. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the determined dressing conditions. The simulation includes calculating the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.
    Type: Grant
    Filed: January 8, 2014
    Date of Patent: February 24, 2015
    Assignee: Ebara Corporation
    Inventors: Akira Fukuda, Yoshihiro Mochizuki, Yutaka Wada, Yoichi Shiokawa, Hirokuni Hiyama
  • Publication number: 20150023387
    Abstract: A steel plate quality assurance system according to a steel plate manufacturing line, and facilities thereof are provided.
    Type: Application
    Filed: October 10, 2014
    Publication date: January 22, 2015
    Applicant: JFE STEEL CORPORATION
    Inventors: Koji Narihara, Toshikazu Akita, Yukihiro Okada, Yutaka Wada, Kouhel Obara, Toru Takahashi
  • Patent number: 8920024
    Abstract: The present invention provides a steel plate quality assurance system and facilities thereof, wherein the steel plate quality assurance system measures, with a steel plate manufacturing line including a finishing mill of a steel plate manufacturing line, and accelerated cooling equipment disposed on the downstream side of the finishing mill in the advancing direction of the steel plate manufacturing line, temperature of at least the whole area of the upper surface of a steel plate, or the whole area of the lower surface of a steel plate to perform quality assurance, and includes temperature measurement means; temperature analysis means; and mechanical property determining means.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: December 30, 2014
    Assignee: JFE Steel Corporation
    Inventors: Koji Narihara, Toshikazu Akita, Yukihiro Okada, Yutaka Wada, Kouhei Obara, Toru Takahashi
  • Patent number: 8913031
    Abstract: A sensor apparatus includes: a display cover including an operation area that is pressed by an operator and a circumferential area located on the circumference of the operation area; a frame including an opening covered by the operation area and a fixing portion that fixes the circumferential area; a touch panel that is supported by the display cover to be positioned at the opening and detects a position at which the operator comes into contact with the operation area; and a pressure-sensitive sensor that is provided between the display cover and the frame, includes a first electrode and a second electrode opposed to the first electrode, and detects a pressing force with respect to the operation area based on a change of a capacitance between the first electrode and the second electrode that corresponds to a deflection amount of the display cover.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: December 16, 2014
    Assignee: Sony Corporation
    Inventors: Hidetoshi Honda, Hiroki Kanehira, Hiroto Kawaguchi, Kazutomo Miyata, Masato Ishigaki, Yutaka Wada, Hiroshi Akama
  • Publication number: 20140120808
    Abstract: A method dresses a polishing member with a diamond dresser having diamond particles arranged on a surface thereof. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the determined dressing conditions. The simulation includes calculating the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.
    Type: Application
    Filed: January 8, 2014
    Publication date: May 1, 2014
    Applicant: EBARA CORPORATION
    Inventors: Akira FUKUDA, Yoshihiro MOCHIZUKI, Yutaka WADA, Yoichi SHIOKAWA, Hirokuni HIYAMA
  • Patent number: 8711122
    Abstract: A sensor apparatus includes: a sensor panel that includes an input operation surface and is configured to detect positional coordinates of a detection object that comes into contact with the input operation surface; a casing; and a pressure-sensitive sensor that includes a first electrode fixed on the sensor panel side, a second electrode fixed on the casing side, and an elastic member that is provided between the sensor panel and the casing and elastically supports the sensor panel with respect to the casing, includes, between the first electrode and the second electrode, a first area formed with a first capacitance and a second area formed with a second capacitance larger than the first capacitance, and is configured to detect a pressing force input to the input operation surface as a change in a capacitance between the first electrode and the second electrode.
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: April 29, 2014
    Assignee: Sony Corporation
    Inventors: Yutaka Wada, Naohiro Takahashi, Takashi Itaya
  • Patent number: 8655478
    Abstract: A method dresses a polishing member with a diamond dresser having diamond particles arranged on a surface thereof. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the determined dressing conditions. The simulation includes calculating the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.
    Type: Grant
    Filed: September 24, 2009
    Date of Patent: February 18, 2014
    Assignee: Ebara Corporation
    Inventors: Akira Fukuda, Yoshihiro Mochizuki, Yutaka Wada, Yoichi Shiokawa, Hirokuni Hiyama
  • Patent number: 8449964
    Abstract: An optical recording medium includes: an inorganic recording layer; and a protective layer including a composite oxide containing an indium oxide provided on at least one surface of the inorganic recording layer, wherein the composite oxide is represented by the formula [(In2O3)1-X(A)X], wherein A is cerium oxide or gallium oxide and X satisfies a range of 0.15?X?0.75.
    Type: Grant
    Filed: May 24, 2011
    Date of Patent: May 28, 2013
    Assignee: Sony Corporation
    Inventors: Hiroshi Tabata, Yousuke Fujii, Yutaka Wada
  • Patent number: D967138
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: October 18, 2022
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Susumu Sekine, Tomoyuki Yamazaki, Toshiyuki Wada, Hiroto Akitaya, Yutaka Kano
  • Patent number: D967139
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: October 18, 2022
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Susumu Sekine, Tomoyuki Yamazaki, Toshiyuki Wada, Hiroto Akitaya, Yutaka Kano
  • Patent number: D967140
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: October 18, 2022
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Susumu Sekine, Tomoyuki Yamazaki, Toshiyuki Wada, Hiroto Akitaya, Yutaka Kano