Abstract: A rod assembly includes a turnbuckle that extends along a central axis, a first rod that is to be screwed into a first adjustment hole of the turnbuckle, a second rod that is to be screwed into a second adjustment hole of the turnbuckle, a first nut that is fitted to a first adjustment end portion of the first rod, and a second nut that is fitted to a second adjustment end portion of the second rod. A first turnbuckle-welded portion is provided between the first nut and the turnbuckle, and a second turnbuckle-welded portion is provided between the second nut and the turnbuckle. A first rod-welded portion is provided between the first nut and the first rod, and a second rod-welded portion is provided between the second nut and the second rod.

Abstract: There is provided a method of performing a surface treatment with respect to a metal mounting table for mounting a substrate to be plasma-processed, the mounting table functioning as a lower electrode configured to generate a plasma by a high frequency power applied between an upper electrode and the lower electrode. The method includes: performing a first surface treatment by spraying a non-sublimation blast material as a non-sublimation material onto a mounting surface of the metal mounting table on which the substrate is mounted, followed by a second surface treatment by spraying a sublimation blast material as a sublimation material onto the mounting surface.

Abstract: A seal structure for a turbocharger, including: a seal ring; a seal groove in which the seal ring is disposed; and a treated portion, which is formed at least at a part of one or both of the seal ring and the seal groove, and is subjected to surface treatment for anti-oxidation.

Abstract: A rod assembly includes a turnbuckle that extends along a central axis, a first rod that is to be screwed into a first adjustment hole of the turnbuckle, a second rod that is to be screwed into a second adjustment hole of the turnbuckle, a first nut that is fitted to a first adjustment end portion of the first rod, and a second nut that is fitted to a second adjustment end portion of the second rod. A first turnbuckle-welded portion is provided between the first nut and the turnbuckle, and a second turnbuckle-welded portion is provided between the second nut and the turnbuckle. A first rod-welded portion is provided between the first nut and the first rod, and a second rod-welded portion is provided between the second nut and the second rod.

Abstract: There is provided a method of performing a surface treatment with respect to a metal mounting table for mounting a substrate to be plasma-processed, the mounting table functioning as a lower electrode configured to generate a plasma by a high frequency power applied between an upper electrode and the lower electrode. The method includes: performing a first surface treatment by spraying a non-sublimation blast material as a non-sublimation material onto a mounting surface of the metal mounting table on which the substrate is mounted, followed by a second surface treatment by spraying a sublimation blast material as a sublimation material onto the mounting surface.

Abstract: A heat radiation structure for an electric device includes: at least one multi-layer substrate including a plurality of base parts made of insulation material and a conductor pattern, which are stacked in a multi-layer structure so that the conductor pattern is electrically coupled with an interlayer connection portion in the base parts; the electric device having at least one of a first electric element built in the at least one multi-layer substrate and a second electric element, which is not built in the multi-layer substrate; and a low heat resistance element opposed to the electric device. The low heat resistance element has a heat resistance lower than the insulation material.

Abstract: A heat radiation structure for an electric device includes: at least one multi-layer substrate including a plurality of base parts made of insulation material and a conductor pattern, which are stacked in a multi-layer structure so that the conductor pattern is electrically coupled with an interlayer connection portion in the base parts; the electric device having at least one of a first electric element built in the at least one multi-layer substrate and a second electric element, which is not built in the multi-layer substrate; and a low heat resistance element opposed to the electric device. The low heat resistance element has a heat resistance lower than the insulation material.

Abstract: A heat dissipation structure includes a multilayer board and a heat dissipator for dissipating heat generated in an electronic device incorporated in the multilayer board. The multilayer board has multiple base portions layered together and made of electrically insulating material. The base portion located between the electronic device and the heat dissipator has no interlayer connection conductor made of electrically conducting material and serves as an electrically insulating layer for providing electrical isolation between the electronic device and the heat dissipator.

Abstract: A composition containing an inorganic particle of the present invention contains an organic compound (A1) having a terpene skeleton and a viscosity of 10,000 to 1,000,000 mPa·s at 25° C. and an inorganic particle, in which the content of the organic compound (A1) is 50% by mass to 95% by mass relative to the whole amount of organic compounds contained in the composition containing an inorganic particle.

Abstract: A baking apparatus according to one embodiment of the invention includes a hotplate which performs heat treatment to a substrate placed on the hotplate, a base which has at least three support pins passing through through-holes made in the hotplate and supporting the substrate on the hotplate from a backside of the substrate and is vertically movably placed, and a plurality of sensors which are provided at a tip portion of each support pin respectively and sense contact with the substrate. A pattern forming method according to one embodiment of the invention includes forming an antireflection film and a resist film on a substrate to be processed and forming a resist pattern by performing pattern exposing.

Abstract: A baking apparatus according to one embodiment of the invention includes a hotplate which performs heat treatment to a substrate placed on the hotplate, a base which has at least three support pins passing through through-holes made in the hotplate and supporting the substrate on the hotplate from a backside of the substrate and is vertically movably placed, and a plurality of sensors which are provided at a tip portion of each support pin respectively and sense contact with the substrate.

Abstract: A card issuer first visually confirms that a person who requests the issue of a user card is an adult. The card issuer then issues a user card on which data unique to the card has been previously recorded. The person writes his (her) name, address and the like on the card. The card is then inserted into a card reading section. An apparatus for identifying minors performs certain processing of the data unique to the card read in the card reading section to output an identification number unique to the card, which is displayed on a number display. The user memorizes this identification number as a code number. In buying a product, the user inserts the issued card into the card reading section and, in addition, inputs the code number through a ten key. When the identification number of the card is identical to the input code number, the apparatus for identifying minors outputs a sale permission signal.

Abstract: The individual identification apparatus is provided for comparing a target pattern of an arbitrary person with a recorded reference pattern of a specific person, thereby judging whether the arbitrary person is the specific person. The apparatus has a calculation processing portion 60. In order to previously record a pattern of the specific person as a reference pattern, the portion 60 calculates correlations between the pattern of the specific person and comparative patterns which belong to other people. The portion 60 records the pattern of the specific person as a reference pattern only when the correlations between the pattern of the specific person and the comparative patterns are equal to or lower than a threshold. The portion 60 refuses to record, as a reference pattern, such a pattern that provides high correlations with regards to the other people's patterns and therefore that has a high similarity with regards to the other people's patterns.