Patents by Inventor Zain Saidin
Zain Saidin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9710903Abstract: Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof are provided. One system is configured to detect design defects and process defects at locations on a wafer at which images are acquired by an electron beam review subsystem based on defects in a design, additional defects in the design, which are detected by comparing an image of a die in the design printed on the wafer acquired by the electron beam review subsystem to an image of the die stored in a database, and defects detected on the wafer by a wafer inspection system.Type: GrantFiled: June 5, 2009Date of Patent: July 18, 2017Assignee: KLA-Tencor Corp.Inventors: Christophe Fouquet, Zain Saidin, Sergio Edelstein, Savitha Nanjangud, Carl Hess
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Patent number: 8804137Abstract: A combined metrology mark, a system, and a method for calculating alignment on a semiconductor circuit are disclosed. The combined metrology mark may include a mask misregistration structure and a wafer overlay mark structure.Type: GrantFiled: June 21, 2010Date of Patent: August 12, 2014Assignee: KLA-Tencor CorporationInventors: DongSub Choi, Amir Widmann, Zain Saidin, Frank Laske, John Robinson
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Publication number: 20120223227Abstract: One embodiment relates to a method of real-time three-dimensional electron beam imaging of a substrate surface. A primary electron beam is scanned over the substrate surface causing electrons to be emitted therefrom. The emitted electrons are simultaneously detection using a plurality of at least two off-axis sensors so as to generate a plurality of image data frames, each image data frame being due to electrons emitted from the substrate surface at a different view angle. The plurality of image data frames are automatically processed to generate a three-dimensional representation of the substrate surface. Multiple views of the three-dimensional representation are then displayed. Other embodiments, aspects and features are also disclosed.Type: ApplicationFiled: March 4, 2011Publication date: September 6, 2012Inventors: Chien-Huei CHEN, Paul D. MacDONALD, Rajasekhar KUPPA, Takuji TADA, Gordon ABBOTT, Cho TEH, Hedong YANG, Stephen LANG, Mark A. NEIL, Zain SAIDIN
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Publication number: 20110276935Abstract: Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof are provided.Type: ApplicationFiled: June 5, 2009Publication date: November 10, 2011Applicant: KLA-TENCOR CORPORATIONInventors: Christophe Fouquet, Zain Saidin, Sergio Edelstein, Savitha Nanjangud, Carl Hess
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Publication number: 20110051150Abstract: A combined metrology mark, a system, and a method for calculating alignment on a semiconductor circuit are disclosed. The combined metrology mark may include a mask misregistration structure and a wafer overlay mark structure.Type: ApplicationFiled: June 21, 2010Publication date: March 3, 2011Applicant: KLA-TENCOR CORPORATIONInventors: DongSub Choi, Amir Widmann, Zain Saidin, Frank Laske, John Robinson
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Publication number: 20090324054Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: June 22, 2009Publication date: December 31, 2009Inventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Publication number: 20080133160Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: October 31, 2007Publication date: June 5, 2008Inventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Publication number: 20070140548Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: November 22, 2006Publication date: June 21, 2007Inventors: Anthony Vacca, Thomas Vavul, Donald Parker, Zain Saidin, Sterling Watson, James Wiley
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Publication number: 20060240336Abstract: Disclosed are systems and methods for mitigating variances (e.g., critical dimension variances) on a patterned wafer are provided. In general, variances of a patterned wafer are predicted using one or more reticle fabrication and/or wafer processing models. The predicted variances are used to modify selected transparent portions of the reticle that is to be used to produce the patterned wafer. In a specific implementation, an optical beam, such as a femto-second laser, is applied to the reticle at a plurality of embedded positions, and the optical beam is configured to form specific volumes of altered optical properties within the transparent material of the reticle at the specified positions. These reticle volumes that are created at specific positions of the reticle result in varying amounts of light transmission or dose through the reticle at such specific positions so as to mitigate the identified variances on a wafer that is patterned using the modified reticle.Type: ApplicationFiled: March 31, 2006Publication date: October 26, 2006Inventors: Sterling Watson, Ady Levy, Chris Mack, Stanley Stokowski, Zain Saidin
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Publication number: 20060236294Abstract: Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.Type: ApplicationFiled: January 31, 2005Publication date: October 19, 2006Inventors: Zain Saidin, Yalin Xiong, Lance Glasser, Carl Hess, Moshe Preil
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Publication number: 20060234144Abstract: Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a lithography process, as the radiation may “heal” the SEs. Disclosed are techniques for monitoring a reticle in order to maintain confidence about the reticle's optical properties and the uniformity of patterns on wafers that are to be printed using the reticle. Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography process.Type: ApplicationFiled: March 29, 2006Publication date: October 19, 2006Inventors: Sterling Watson, Ady Levy, Chris Mack, Stanley Stokowski, Zain Saidin
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Publication number: 20060234139Abstract: Disclosed are systems and methods for modifying a reticle. In general, inspection results from a plurality of wafers or prediction results from a lithographic model are used to individually decrease the dose or any other optical property at specific locations of the reticle. In one embodiment, any suitable optical property of the reticle is modified by an optical beam, such as a femto-second laser, at specific locations on the reticle so as to widen the process window for such optical property. Examples of optical properties include dose, phase, illumination angle, and birefringence. Techniques for adjusting optical properties at specific locations on a reticle using an optical beam may be practiced for other purposes besides widening the process window.Type: ApplicationFiled: March 31, 2006Publication date: October 19, 2006Inventors: Sterling Watson, Ady Levy, Chris Mack, Stanley Stokowski, Zain Saidin, Larry Zurbrick
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Publication number: 20060234145Abstract: Disclosed are techniques for determining and correcting reticle variations using a reticle global variation map generated by comparing a set of measured reticle parameters to a set of reference reticle parameters. The measured reticle parameters are obtained by reticle inspection, and the variation map identifies reticle regions and associated levels of correction. In one embodiment, the variation data is communicated to a system which modifies the reticle by embedding scattering centers within the reticle at identified reticle regions, thereby improving the variations. In another embodiment the variation data is transferred to a wafer stepper or scanner which in turn modifies the conditions under which the reticle is used to manufacture wafers, thereby compensating for the variations and producing wafers that are according to design.Type: ApplicationFiled: March 29, 2006Publication date: October 19, 2006Inventors: Sterling Watson, Ady Levy, Chris Mack, Stanley Stokowski, Zain Saidin
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Publication number: 20050140970Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: February 25, 2005Publication date: June 30, 2005Inventors: Anthony Vacca, Thomas Vavul, Donald Parker, Zain Saidin, Sterling Watson, James Wiley
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Publication number: 20040096094Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: November 13, 2003Publication date: May 20, 2004Applicant: KLA-TENCOR CORPORATIONInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Patent number: 6731787Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: GrantFiled: April 30, 2002Date of Patent: May 4, 2004Assignee: KLA-Tencor CorporationInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Publication number: 20030138138Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: January 13, 2003Publication date: July 24, 2003Applicant: KLA-TENCOR CORPORATIONInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Publication number: 20020126888Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: ApplicationFiled: February 11, 2002Publication date: September 12, 2002Applicant: KLA-TENCOR CORPORATIONInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Patent number: 6381358Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: GrantFiled: April 27, 2000Date of Patent: April 30, 2002Assignee: KLA-Tencor CorporationInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley
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Patent number: 6076465Abstract: A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect.Type: GrantFiled: September 19, 1997Date of Patent: June 20, 2000Assignee: KLA-Tencor CorporationInventors: Anthony Vacca, Thomas Vavul, Donald J. Parker, Zain Saidin, Sterling G. Watson, James N. Wiley