Patents by Inventor Zheng John Ye

Zheng John Ye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8878926
    Abstract: Embodiments of the present invention provide methods and apparatus for analyzing thermal properties of bonding materials within a composite structure. One embodiment of the present invention provides an apparatus for analyzing thermal property of a bonding material within a structure. The apparatus comprises a structure support having a supporting surface configured to support the structure, a heat source configured to direct a heat flux to the structure supported by the supporting surface of the structure support, and a camera facing the structure supported on the structure support and configured to capture thermal images of the structure supported on the structure support.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: November 4, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Zheng John Ye, Kartik Ramaswamy, Troy S. Detrick, Kenneth S. Collins
  • Publication number: 20140302256
    Abstract: Embodiments provide a plasma processing apparatus, substrate support assembly, and method of controlling a plasma process. The apparatus and substrate support assembly include a substrate support pedestal, a tuning assembly that includes a tuning electrode that is disposed in the pedestal and electrically coupled to a radio frequency (RF) tuner, and a heating assembly that includes one or more heating elements disposed within the pedestal for controlling a temperature profile of the substrate, where at least one of the heating elements is electrically coupled to an RF filter circuit that includes a first inductor configured in parallel with a formed capacitance of the first inductor to ground. The high impedance of the RF filters can be achieved by tuning the resonance of the RF filter circuit, which results in less RF leakage and better substrate processing results.
    Type: Application
    Filed: March 27, 2014
    Publication date: October 9, 2014
    Applicant: Applied Materials, Inc.
    Inventors: Jian J. CHEN, Mohamad A. AYOUB, Juan Carlos ROCHA-ALVAREZ, Zheng John YE, Ramprakash SANKARAKRISHNAN, Jianhua ZHOU
  • Publication number: 20140209027
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side; a gas distribution plate disposed proximate the second side of the base; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed between the base and gas distribution plate.
    Type: Application
    Filed: March 15, 2013
    Publication date: July 31, 2014
    Inventors: DMITRY LUBOMIRSKY, VLADIMIR KNYAZIK, HAMID NOORBAKHSH, JASON DELLA ROSA, ZHENG JOHN YE, JENNIFER Y. SUN, SUMANTH BANDA
  • Publication number: 20120069174
    Abstract: Embodiments of the present invention provide methods and apparatus for analyzing thermal properties of bonding materials within a composite structure. One embodiment of the present invention provides an apparatus for analyzing thermal property of a bonding material within a structure. The apparatus comprises a structure support having a supporting surface configured to support the structure, a heat source configured to direct a heat flux to the structure supported by the supporting surface of the structure support, and a camera facing the structure supported on the structure support and configured to capture thermal images of the structure supported on the structure support.
    Type: Application
    Filed: September 19, 2011
    Publication date: March 22, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Zheng John Ye, Kartik Ramaswamy, Troy S. Detrick, Kenneth S. Collins
  • Publication number: 20120043023
    Abstract: The disclosure pertains to a capactively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a folded structure and symmetrical power distribution.
    Type: Application
    Filed: March 14, 2011
    Publication date: February 23, 2012
    Applicant: Applied Materials, Inc.
    Inventors: Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins, Shahid Rauf, Nipun Misra, Leonid Dorf, Zheng John Ye